JPS50141403A - - Google Patents

Info

Publication number
JPS50141403A
JPS50141403A JP4647674A JP4647674A JPS50141403A JP S50141403 A JPS50141403 A JP S50141403A JP 4647674 A JP4647674 A JP 4647674A JP 4647674 A JP4647674 A JP 4647674A JP S50141403 A JPS50141403 A JP S50141403A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4647674A
Other languages
Japanese (ja)
Other versions
JPS53325B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP4647674A priority Critical patent/JPS53325B2/ja
Publication of JPS50141403A publication Critical patent/JPS50141403A/ja
Priority to US05/766,348 priority patent/US4191571A/en
Publication of JPS53325B2 publication Critical patent/JPS53325B2/ja
Expired legal-status Critical Current

Links

JP4647674A 1974-04-26 1974-04-26 Expired JPS53325B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP4647674A JPS53325B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1974-04-26 1974-04-26
US05/766,348 US4191571A (en) 1974-04-26 1977-02-07 Method of pattern forming in a photosensitive composition having a reciprocity law failing property

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4647674A JPS53325B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1974-04-26 1974-04-26

Publications (2)

Publication Number Publication Date
JPS50141403A true JPS50141403A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1975-11-13
JPS53325B2 JPS53325B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1978-01-07

Family

ID=12748235

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4647674A Expired JPS53325B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1974-04-26 1974-04-26

Country Status (1)

Country Link
JP (1) JPS53325B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01198615A (ja) * 1987-07-28 1989-08-10 Nippon Kayaku Co Ltd 感光性樹脂組成物
US6020093A (en) * 1998-05-13 2000-02-01 Toyo Gosei Kogyo, Ltd. Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions
US6610791B2 (en) 2000-02-14 2003-08-26 Toyo Gosai Kogyo Co., Ltd. Photosensitive compound and photosensitive resin
EP1348690A1 (en) 2002-03-29 2003-10-01 Toyo Gosei Kogyo Co., Ltd. Cinnamaldehyde compound having an azido group
US6861456B2 (en) 2002-03-29 2005-03-01 Toyo Gosei Kogyo Co., Ltd. Photosensitive compound, photosensitive resin, and photosensitive composition
WO2020255529A1 (ja) 2019-06-17 2020-12-24 東洋合成工業株式会社 細胞培養基板、該細胞培養基板の製造方法及び該細胞培養基板を用いたスクリーニング方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01135511U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1988-03-04 1989-09-18

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01198615A (ja) * 1987-07-28 1989-08-10 Nippon Kayaku Co Ltd 感光性樹脂組成物
US6020093A (en) * 1998-05-13 2000-02-01 Toyo Gosei Kogyo, Ltd. Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions
US6610791B2 (en) 2000-02-14 2003-08-26 Toyo Gosai Kogyo Co., Ltd. Photosensitive compound and photosensitive resin
EP1348690A1 (en) 2002-03-29 2003-10-01 Toyo Gosei Kogyo Co., Ltd. Cinnamaldehyde compound having an azido group
US6768027B2 (en) 2002-03-29 2004-07-27 Toyo Gosei Kogyo Co. Ltd. Cinnamaldehyde compound having an azido group
US6861456B2 (en) 2002-03-29 2005-03-01 Toyo Gosei Kogyo Co., Ltd. Photosensitive compound, photosensitive resin, and photosensitive composition
WO2020255529A1 (ja) 2019-06-17 2020-12-24 東洋合成工業株式会社 細胞培養基板、該細胞培養基板の製造方法及び該細胞培養基板を用いたスクリーニング方法

Also Published As

Publication number Publication date
JPS53325B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1978-01-07

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