JPS50139037A - - Google Patents
Info
- Publication number
- JPS50139037A JPS50139037A JP4724874A JP4724874A JPS50139037A JP S50139037 A JPS50139037 A JP S50139037A JP 4724874 A JP4724874 A JP 4724874A JP 4724874 A JP4724874 A JP 4724874A JP S50139037 A JPS50139037 A JP S50139037A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4724874A JPS50139037A (ja) | 1974-04-26 | 1974-04-26 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4724874A JPS50139037A (ja) | 1974-04-26 | 1974-04-26 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS50139037A true JPS50139037A (ja) | 1975-11-06 |
Family
ID=12769933
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4724874A Pending JPS50139037A (ja) | 1974-04-26 | 1974-04-26 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS50139037A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5240487A (en) * | 1975-09-26 | 1977-03-29 | Nobuo Nishida | Exterior parts for watch and its process for production |
JPS5322877A (en) * | 1976-08-17 | 1978-03-02 | Youichi Murayama | Process for forming silicon nitride film by highhfrequency ionic plating method |
JPS53139872U (ja) * | 1977-04-11 | 1978-11-06 |
-
1974
- 1974-04-26 JP JP4724874A patent/JPS50139037A/ja active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5240487A (en) * | 1975-09-26 | 1977-03-29 | Nobuo Nishida | Exterior parts for watch and its process for production |
JPS5322877A (en) * | 1976-08-17 | 1978-03-02 | Youichi Murayama | Process for forming silicon nitride film by highhfrequency ionic plating method |
JPS5511745B2 (ja) * | 1976-08-17 | 1980-03-27 | ||
JPS53139872U (ja) * | 1977-04-11 | 1978-11-06 | ||
JPS5743889Y2 (ja) * | 1977-04-11 | 1982-09-28 |