JPS50135560A - - Google Patents
Info
- Publication number
- JPS50135560A JPS50135560A JP50039705A JP3970575A JPS50135560A JP S50135560 A JPS50135560 A JP S50135560A JP 50039705 A JP50039705 A JP 50039705A JP 3970575 A JP3970575 A JP 3970575A JP S50135560 A JPS50135560 A JP S50135560A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2037—Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/919—Camouflaged article
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/143—Electron beam
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/2481—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including layer of mechanically interengaged strands, strand-portions or strand-like strips
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electron Beam Exposure (AREA)
- ing And Chemical Polishing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2416186A DE2416186C3 (de) | 1974-04-03 | 1974-04-03 | Maske zur Strukturierung dünner Schichten |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS50135560A true JPS50135560A (US06653308-20031125-C00199.png) | 1975-10-27 |
Family
ID=5912038
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50039705A Pending JPS50135560A (US06653308-20031125-C00199.png) | 1974-04-03 | 1975-04-01 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US4061814A (US06653308-20031125-C00199.png) |
| JP (1) | JPS50135560A (US06653308-20031125-C00199.png) |
| DE (1) | DE2416186C3 (US06653308-20031125-C00199.png) |
| FR (1) | FR2266955B1 (US06653308-20031125-C00199.png) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2832408A1 (de) * | 1978-07-24 | 1980-02-14 | Siemens Ag | Verfahren zur herstellung von praezisionsflachteilen, insbesondere mit mikrooeffnungen |
| AT371947B (de) * | 1979-12-27 | 1983-08-10 | Rudolf Sacher Ges M B H | Freitragende maske, verfahren zur herstellung derselben und verfahren zum maskieren von substraten |
| DE3024213C2 (de) * | 1980-06-27 | 1982-09-02 | Vdo Adolf Schindling Ag, 6000 Frankfurt | Verfahren zur Herstellung von auf einen Träger aufgebrachten Leiterbahnen |
| JPS5779848U (US06653308-20031125-C00199.png) * | 1980-10-31 | 1982-05-17 | ||
| JPS57211732A (en) * | 1981-06-24 | 1982-12-25 | Toshiba Corp | X ray exposing mask and manufacture thereof |
| US4456677A (en) * | 1981-08-19 | 1984-06-26 | The United Stated Of America As Represented By The Secretary Of The Army | Composite resist structures for submicron processing in electron/ion lithography |
| AT383438B (de) * | 1981-12-04 | 1987-07-10 | Rudolf Sacher Ges M B H | Freitragende maske |
| US4957835A (en) * | 1987-05-15 | 1990-09-18 | Kevex Corporation | Masked electron beam lithography |
| US6044096A (en) * | 1997-11-03 | 2000-03-28 | Sdl, Inc. | Packaged laser diode array system and method with reduced asymmetry |
| DE10137493A1 (de) * | 2001-07-31 | 2003-04-10 | Heidenhain Gmbh Dr Johannes | Verfahren zur Herstellung einer selbsttragenden elektronenoptisch durchstrahlbaren Struktur und nach dem Verfahren hergestellte Struktur |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2779269A (en) * | 1954-04-08 | 1957-01-29 | Burdick Company | Method of making advertising signs |
| US3118050A (en) * | 1960-04-06 | 1964-01-14 | Alloyd Electronics Corp | Electron beam devices and processes |
| US3192136A (en) * | 1962-09-14 | 1965-06-29 | Sperry Rand Corp | Method of preparing precision screens |
| US3476658A (en) * | 1965-11-16 | 1969-11-04 | United Aircraft Corp | Method of making microcircuit pattern masks |
| US3402110A (en) * | 1966-01-17 | 1968-09-17 | Zenith Radio Corp | Mask electroforming process |
| US3878061A (en) * | 1974-02-26 | 1975-04-15 | Rca Corp | Master matrix for making multiple copies |
-
1974
- 1974-04-03 DE DE2416186A patent/DE2416186C3/de not_active Expired
-
1975
- 1975-04-01 FR FR7510108A patent/FR2266955B1/fr not_active Expired
- 1975-04-01 JP JP50039705A patent/JPS50135560A/ja active Pending
- 1975-04-01 US US05/564,105 patent/US4061814A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| FR2266955A1 (US06653308-20031125-C00199.png) | 1975-10-31 |
| FR2266955B1 (US06653308-20031125-C00199.png) | 1977-04-15 |
| DE2416186B2 (de) | 1978-05-03 |
| US4061814A (en) | 1977-12-06 |
| DE2416186A1 (de) | 1975-10-16 |
| DE2416186C3 (de) | 1978-12-21 |
