JPS50120327A - - Google Patents
Info
- Publication number
- JPS50120327A JPS50120327A JP2583774A JP2583774A JPS50120327A JP S50120327 A JPS50120327 A JP S50120327A JP 2583774 A JP2583774 A JP 2583774A JP 2583774 A JP2583774 A JP 2583774A JP S50120327 A JPS50120327 A JP S50120327A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Surface Treatment Of Glass (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2583774A JPS573052B2 (it) | 1974-03-06 | 1974-03-06 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2583774A JPS573052B2 (it) | 1974-03-06 | 1974-03-06 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS50120327A true JPS50120327A (it) | 1975-09-20 |
JPS573052B2 JPS573052B2 (it) | 1982-01-20 |
Family
ID=12176958
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2583774A Expired JPS573052B2 (it) | 1974-03-06 | 1974-03-06 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS573052B2 (it) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5282414A (en) * | 1975-12-29 | 1977-07-09 | Inst Borupurobodonikofu Akadem | Electromagnetic radiation and particle radiation sensitive material |
JPS5282425A (en) * | 1975-12-29 | 1977-07-09 | Inst Borupurobodonikofu Akadem | Method of producing embossed article using electromagnetic and particle radiation sensitive material |
JPS52111381A (en) * | 1976-03-15 | 1977-09-19 | Nippon Telegr & Teleph Corp <Ntt> | Photo-sensitive material for forming pattern having photo-sensitive ca lcogenide layer and the pattern forming method |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4825533A (it) * | 1971-08-02 | 1973-04-03 | ||
JPS4886523A (it) * | 1972-02-18 | 1973-11-15 |
-
1974
- 1974-03-06 JP JP2583774A patent/JPS573052B2/ja not_active Expired
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4825533A (it) * | 1971-08-02 | 1973-04-03 | ||
JPS4886523A (it) * | 1972-02-18 | 1973-11-15 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5282414A (en) * | 1975-12-29 | 1977-07-09 | Inst Borupurobodonikofu Akadem | Electromagnetic radiation and particle radiation sensitive material |
JPS5282425A (en) * | 1975-12-29 | 1977-07-09 | Inst Borupurobodonikofu Akadem | Method of producing embossed article using electromagnetic and particle radiation sensitive material |
JPS52111381A (en) * | 1976-03-15 | 1977-09-19 | Nippon Telegr & Teleph Corp <Ntt> | Photo-sensitive material for forming pattern having photo-sensitive ca lcogenide layer and the pattern forming method |
Also Published As
Publication number | Publication date |
---|---|
JPS573052B2 (it) | 1982-01-20 |