JPS50115985A - - Google Patents

Info

Publication number
JPS50115985A
JPS50115985A JP50016155A JP1615575A JPS50115985A JP S50115985 A JPS50115985 A JP S50115985A JP 50016155 A JP50016155 A JP 50016155A JP 1615575 A JP1615575 A JP 1615575A JP S50115985 A JPS50115985 A JP S50115985A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50016155A
Other languages
Japanese (ja)
Other versions
JPS5714031B2 (en:Method
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS50115985A publication Critical patent/JPS50115985A/ja
Publication of JPS5714031B2 publication Critical patent/JPS5714031B2/ja
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26Bombardment with radiation
    • H01L21/263Bombardment with radiation with high-energy radiation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00Subject matter not provided for in other groups of this subclass

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Bipolar Transistors (AREA)
  • Recrystallisation Techniques (AREA)
JP1615575A 1974-02-08 1975-02-07 Expired JPS5714031B2 (en:Method)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB586574A GB1447723A (en) 1974-02-08 1974-02-08 Semiconductor devices

Publications (2)

Publication Number Publication Date
JPS50115985A true JPS50115985A (en:Method) 1975-09-10
JPS5714031B2 JPS5714031B2 (en:Method) 1982-03-20

Family

ID=9804073

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1615575A Expired JPS5714031B2 (en:Method) 1974-02-08 1975-02-07

Country Status (6)

Country Link
US (1) US3961989A (en:Method)
JP (1) JPS5714031B2 (en:Method)
CA (1) CA1016270A (en:Method)
DE (1) DE2505276A1 (en:Method)
FR (1) FR2260867B1 (en:Method)
GB (1) GB1447723A (en:Method)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4030943A (en) * 1976-05-21 1977-06-21 Hughes Aircraft Company Planar process for making high frequency ion implanted passivated semiconductor devices and microwave integrated circuits
GB2050802B (en) * 1979-06-12 1983-03-02 Imp Group Ltd Feeding tobacco webs
DE3839210A1 (de) * 1988-11-19 1990-05-23 Asea Brown Boveri Verfahren zum axialen einstellen der traegerlebensdauer
US7332750B1 (en) 2000-09-01 2008-02-19 Fairchild Semiconductor Corporation Power semiconductor device with improved unclamped inductive switching capability and process for forming same
DE102006002903A1 (de) * 2006-01-20 2007-08-02 Infineon Technologies Austria Ag Verfahren zur Behandlung eines Sauerstoff enthaltenden Halbleiterwafers und Halbleiterbauelement
ATE522927T1 (de) * 2006-01-20 2011-09-15 Infineon Technologies Austria Verfahren zur herstellung einer n-dotierten zone in einem halbleiterwafer und halbleiterbauelement

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3509428A (en) * 1967-10-18 1970-04-28 Hughes Aircraft Co Ion-implanted impatt diode
US3595716A (en) * 1968-05-16 1971-07-27 Philips Corp Method of manufacturing semiconductor devices
GB1332931A (en) * 1970-01-15 1973-10-10 Mullard Ltd Methods of manufacturing a semiconductor device
US3756862A (en) * 1971-12-21 1973-09-04 Ibm Proton enhanced diffusion methods

Also Published As

Publication number Publication date
FR2260867A1 (en:Method) 1975-09-05
DE2505276A1 (de) 1975-08-14
FR2260867B1 (en:Method) 1978-10-27
US3961989A (en) 1976-06-08
GB1447723A (en) 1976-08-25
JPS5714031B2 (en:Method) 1982-03-20
CA1016270A (en) 1977-08-23

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