JPS50109674A - - Google Patents
Info
- Publication number
- JPS50109674A JPS50109674A JP1421874A JP1421874A JPS50109674A JP S50109674 A JPS50109674 A JP S50109674A JP 1421874 A JP1421874 A JP 1421874A JP 1421874 A JP1421874 A JP 1421874A JP S50109674 A JPS50109674 A JP S50109674A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1421874A JPS50109674A (ko) | 1974-02-04 | 1974-02-04 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1421874A JPS50109674A (ko) | 1974-02-04 | 1974-02-04 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS50109674A true JPS50109674A (ko) | 1975-08-28 |
Family
ID=11854933
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1421874A Pending JPS50109674A (ko) | 1974-02-04 | 1974-02-04 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS50109674A (ko) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3615956A (en) * | 1969-03-27 | 1971-10-26 | Signetics Corp | Gas plasma vapor etching process |
-
1974
- 1974-02-04 JP JP1421874A patent/JPS50109674A/ja active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3615956A (en) * | 1969-03-27 | 1971-10-26 | Signetics Corp | Gas plasma vapor etching process |