JPS50108005A - - Google Patents

Info

Publication number
JPS50108005A
JPS50108005A JP1321274A JP1321274A JPS50108005A JP S50108005 A JPS50108005 A JP S50108005A JP 1321274 A JP1321274 A JP 1321274A JP 1321274 A JP1321274 A JP 1321274A JP S50108005 A JPS50108005 A JP S50108005A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1321274A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1321274A priority Critical patent/JPS50108005A/ja
Priority to DE19752504130 priority patent/DE2504130A1/de
Publication of JPS50108005A publication Critical patent/JPS50108005A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP1321274A 1974-01-31 1974-01-31 Pending JPS50108005A (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP1321274A JPS50108005A (fr) 1974-01-31 1974-01-31
DE19752504130 DE2504130A1 (de) 1974-01-31 1975-01-31 Verfahren zum entwickeln einer lichtempfindlichen flachdruckplatte

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1321274A JPS50108005A (fr) 1974-01-31 1974-01-31

Publications (1)

Publication Number Publication Date
JPS50108005A true JPS50108005A (fr) 1975-08-26

Family

ID=11826837

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1321274A Pending JPS50108005A (fr) 1974-01-31 1974-01-31

Country Status (2)

Country Link
JP (1) JPS50108005A (fr)
DE (1) DE2504130A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS552213A (en) * 1978-06-19 1980-01-09 Chiyou Lsi Gijutsu Kenkyu Kumiai Developing method

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2834958A1 (de) * 1978-08-10 1980-02-21 Hoechst Ag Verfahren zum entwickeln von belichteten lichtempfindlichen druckplatten
JPS5587151A (en) * 1978-12-25 1980-07-01 Mitsubishi Chem Ind Ltd Developing solution composition for lithographic printing plate
JPS55121447A (en) * 1979-03-15 1980-09-18 Fuji Photo Film Co Ltd Lithographic printing plate correcting agent
JPS56132345A (en) * 1980-03-21 1981-10-16 Mitsubishi Chem Ind Ltd Developer composition for lithographic plate
DE3140186A1 (de) * 1981-10-09 1983-04-28 Hoechst Ag, 6230 Frankfurt Entwickler und verfahren zum entwickeln fuer belichtete negativ-arbeitende reproduktionsschichten
US4436807A (en) * 1982-07-15 1984-03-13 American Hoechst Corporation Developer composition with sodium, lithium and/or potassium salts for developing negative working imaged photographic material
EP0134407B1 (fr) * 1983-08-25 1987-05-06 American Hoechst Corporation Révélateur et procédé pour le dépouillement des pellicules pour reproduction exposées, ayant une couche photorésistante négative
EP0199303B1 (fr) * 1985-04-18 1992-06-24 Oki Electric Industry Company, Limited Procédé pour obtenir des structures formant un agent de photoréserve
DE3532346A1 (de) * 1985-09-11 1987-03-12 Hoechst Ag Verfahren zum herstellen von druckformen

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS552213A (en) * 1978-06-19 1980-01-09 Chiyou Lsi Gijutsu Kenkyu Kumiai Developing method
JPS6129494B2 (fr) * 1978-06-19 1986-07-07 Cho Eru Esu Ai Gijutsu Kenkyu Kumiai

Also Published As

Publication number Publication date
DE2504130A1 (de) 1975-08-07

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