JPS50105550A - - Google Patents
Info
- Publication number
- JPS50105550A JPS50105550A JP48137349A JP13734973A JPS50105550A JP S50105550 A JPS50105550 A JP S50105550A JP 48137349 A JP48137349 A JP 48137349A JP 13734973 A JP13734973 A JP 13734973A JP S50105550 A JPS50105550 A JP S50105550A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP48137349A JPS50105550A (enExample) | 1973-12-11 | 1973-12-11 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP48137349A JPS50105550A (enExample) | 1973-12-11 | 1973-12-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS50105550A true JPS50105550A (enExample) | 1975-08-20 |
Family
ID=15196559
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP48137349A Pending JPS50105550A (enExample) | 1973-12-11 | 1973-12-11 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS50105550A (enExample) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59170270A (ja) * | 1983-03-15 | 1984-09-26 | Toshiba Corp | 膜形成装置 |
| JPS59184519A (ja) * | 1983-04-05 | 1984-10-19 | Agency Of Ind Science & Technol | イオン化クラスタビーム発生方法 |
| JPS6191918A (ja) * | 1984-10-11 | 1986-05-10 | Futaba Corp | 化合物薄膜の製造装置 |
| JPH04354865A (ja) * | 1991-05-31 | 1992-12-09 | Res Dev Corp Of Japan | 超低速クラスターイオンビームによる表面処理方法 |
| WO2007108525A1 (en) * | 2006-03-17 | 2007-09-27 | Canon Kabushiki Kaisha | Film deposition apparatus and method of film deposition |
| CN109786204A (zh) * | 2019-01-18 | 2019-05-21 | 东莞亚纳纳米科技有限公司 | 一种利用气体团簇溅射靶材引出离子束流的方法及离子源 |
-
1973
- 1973-12-11 JP JP48137349A patent/JPS50105550A/ja active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59170270A (ja) * | 1983-03-15 | 1984-09-26 | Toshiba Corp | 膜形成装置 |
| JPS59184519A (ja) * | 1983-04-05 | 1984-10-19 | Agency Of Ind Science & Technol | イオン化クラスタビーム発生方法 |
| JPS6191918A (ja) * | 1984-10-11 | 1986-05-10 | Futaba Corp | 化合物薄膜の製造装置 |
| JPH04354865A (ja) * | 1991-05-31 | 1992-12-09 | Res Dev Corp Of Japan | 超低速クラスターイオンビームによる表面処理方法 |
| WO2007108525A1 (en) * | 2006-03-17 | 2007-09-27 | Canon Kabushiki Kaisha | Film deposition apparatus and method of film deposition |
| CN109786204A (zh) * | 2019-01-18 | 2019-05-21 | 东莞亚纳纳米科技有限公司 | 一种利用气体团簇溅射靶材引出离子束流的方法及离子源 |