JPS4990685A - - Google Patents
Info
- Publication number
- JPS4990685A JPS4990685A JP130173A JP130173A JPS4990685A JP S4990685 A JPS4990685 A JP S4990685A JP 130173 A JP130173 A JP 130173A JP 130173 A JP130173 A JP 130173A JP S4990685 A JPS4990685 A JP S4990685A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP130173A JPS4990685A (xx) | 1972-12-29 | 1972-12-29 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP130173A JPS4990685A (xx) | 1972-12-29 | 1972-12-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS4990685A true JPS4990685A (xx) | 1974-08-29 |
Family
ID=11497639
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP130173A Pending JPS4990685A (xx) | 1972-12-29 | 1972-12-29 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS4990685A (xx) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5037685A (xx) * | 1973-08-07 | 1975-04-08 | ||
JPS5681671A (en) * | 1979-12-04 | 1981-07-03 | Matsushita Electric Ind Co Ltd | Ion plating apparatus |
WO1987002026A1 (en) * | 1984-05-28 | 1987-04-09 | Shuhara Akira | Process for producing silicon dioxide film |
JPS637158U (xx) * | 1986-06-26 | 1988-01-18 |
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1972
- 1972-12-29 JP JP130173A patent/JPS4990685A/ja active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5037685A (xx) * | 1973-08-07 | 1975-04-08 | ||
JPS5232759B2 (xx) * | 1973-08-07 | 1977-08-23 | ||
JPS5681671A (en) * | 1979-12-04 | 1981-07-03 | Matsushita Electric Ind Co Ltd | Ion plating apparatus |
JPS622032B2 (xx) * | 1979-12-04 | 1987-01-17 | Matsushita Electric Ind Co Ltd | |
WO1987002026A1 (en) * | 1984-05-28 | 1987-04-09 | Shuhara Akira | Process for producing silicon dioxide film |
JPS637158U (xx) * | 1986-06-26 | 1988-01-18 | ||
JPS6350289Y2 (xx) * | 1986-06-26 | 1988-12-23 |