JPS4980848U - - Google Patents

Info

Publication number
JPS4980848U
JPS4980848U JP12545372U JP12545372U JPS4980848U JP S4980848 U JPS4980848 U JP S4980848U JP 12545372 U JP12545372 U JP 12545372U JP 12545372 U JP12545372 U JP 12545372U JP S4980848 U JPS4980848 U JP S4980848U
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12545372U
Other languages
Japanese (ja)
Other versions
JPS5244852Y2 (fr
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1972125453U priority Critical patent/JPS5244852Y2/ja
Priority to DE19732354592 priority patent/DE2354592A1/de
Publication of JPS4980848U publication Critical patent/JPS4980848U/ja
Application granted granted Critical
Publication of JPS5244852Y2 publication Critical patent/JPS5244852Y2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3014—Imagewise removal using liquid means combined with ultrasonic means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03D—APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
    • G03D13/00—Processing apparatus or accessories therefor, not covered by groups G11B3/00 - G11B11/00
    • G03D13/02—Containers; Holding-devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03D—APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
    • G03D3/00—Liquid processing apparatus involving immersion; Washing apparatus involving immersion
    • G03D3/02—Details of liquid circulation
    • G03D3/04—Liquid agitators

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photographic Processing Devices Using Wet Methods (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP1972125453U 1972-11-01 1972-11-01 Expired JPS5244852Y2 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP1972125453U JPS5244852Y2 (fr) 1972-11-01 1972-11-01
DE19732354592 DE2354592A1 (de) 1972-11-01 1973-10-31 Photoresist-entwicklungsverfahren und vorrichtung zur durchfuehrung desselben

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1972125453U JPS5244852Y2 (fr) 1972-11-01 1972-11-01

Publications (2)

Publication Number Publication Date
JPS4980848U true JPS4980848U (fr) 1974-07-12
JPS5244852Y2 JPS5244852Y2 (fr) 1977-10-12

Family

ID=14910454

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1972125453U Expired JPS5244852Y2 (fr) 1972-11-01 1972-11-01

Country Status (2)

Country Link
JP (1) JPS5244852Y2 (fr)
DE (1) DE2354592A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3122544A1 (de) * 1981-06-05 1982-12-30 Siemens AG, 1000 Berlin und 8000 München Verfahren und vorrichtung zum aetzen von durchbruechen in glasplatten

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
CIRCUITS MANUFACTURING=1972 *

Also Published As

Publication number Publication date
JPS5244852Y2 (fr) 1977-10-12
DE2354592A1 (de) 1974-05-09

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