JPS4962130A - - Google Patents

Info

Publication number
JPS4962130A
JPS4962130A JP48050601A JP5060173A JPS4962130A JP S4962130 A JPS4962130 A JP S4962130A JP 48050601 A JP48050601 A JP 48050601A JP 5060173 A JP5060173 A JP 5060173A JP S4962130 A JPS4962130 A JP S4962130A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP48050601A
Other languages
Japanese (ja)
Other versions
JPS5328092B2 (US07696358-20100413-C00002.png
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4962130A publication Critical patent/JPS4962130A/ja
Publication of JPS5328092B2 publication Critical patent/JPS5328092B2/ja
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00Photographic printing apparatus
    • G03B27/02Exposure apparatus for contact printing
    • G03B27/14Details
    • G03B27/18Maintaining or producing contact pressure between original and light-sensitive material
    • G03B27/20Maintaining or producing contact pressure between original and light-sensitive material by using a vacuum or fluid pressure
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2002Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP5060173A 1972-05-08 1973-05-07 Expired JPS5328092B2 (US07696358-20100413-C00002.png)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US25138472A 1972-05-08 1972-05-08

Publications (2)

Publication Number Publication Date
JPS4962130A true JPS4962130A (US07696358-20100413-C00002.png) 1974-06-17
JPS5328092B2 JPS5328092B2 (US07696358-20100413-C00002.png) 1978-08-12

Family

ID=22951734

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5060173A Expired JPS5328092B2 (US07696358-20100413-C00002.png) 1972-05-08 1973-05-07

Country Status (8)

Country Link
US (1) US3751250A (US07696358-20100413-C00002.png)
JP (1) JPS5328092B2 (US07696358-20100413-C00002.png)
CA (1) CA981095A (US07696358-20100413-C00002.png)
DE (1) DE2322874A1 (US07696358-20100413-C00002.png)
FR (1) FR2184314A5 (US07696358-20100413-C00002.png)
GB (1) GB1402491A (US07696358-20100413-C00002.png)
IT (1) IT982561B (US07696358-20100413-C00002.png)
NL (1) NL7306349A (US07696358-20100413-C00002.png)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63124329A (ja) * 1986-11-12 1988-05-27 Toshiba Corp カラ−ブラウン管用シヤドウマスクの露光方法

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3904291A (en) * 1972-12-18 1975-09-09 Gerber Scientific Instr Co Photoexposure mechanism and contact printer therefor
US3986876A (en) * 1974-05-24 1976-10-19 The United States Of America As Represented By The Secretary Of The Navy Method for making a mask having a sloped relief
US4230781A (en) * 1976-02-19 1980-10-28 Rca Corporation Method for making etch-resistant stencil with dichromate-sensitized alkali-caseinate coating
US4061529A (en) * 1977-02-28 1977-12-06 Rca Corporation Method for making etch-resistant stencil with dichromate-sensitized casein coating
US4201581A (en) * 1978-03-13 1980-05-06 Eastman Kodak Company Method of providing close contact for contact printing
IT8121966V0 (it) * 1981-06-03 1981-06-03 Repro Master Electonic Srl Perfezionamento nelle macchine grafiche del tipo foto-lito, repro, serigrafico, bromografico.
DE3243144A1 (de) * 1982-11-22 1984-05-24 Hoechst Ag, 6230 Frankfurt Belichtungsvorrichtung
US4588676A (en) * 1983-06-24 1986-05-13 Rca Corporation Photoexposing a photoresist-coated sheet in a vacuum printing frame
US4664996A (en) * 1983-06-24 1987-05-12 Rca Corporation Method for etching a flat apertured mask for use in a cathode-ray tube
US4656107A (en) * 1983-06-24 1987-04-07 Rca Corporation Photographic printing plate for use in a vacuum printing frame
US4669871A (en) * 1986-08-01 1987-06-02 Rca Corporation Photographic printing plate and method of exposing a coated sheet using same
CS263521B1 (en) * 1987-04-24 1989-04-14 Slavata Bohumil Chuck frame of contact copying machine for working masks copying
CN1033345C (zh) * 1989-03-02 1996-11-20 东芝株式会社 荫罩的图形印相版
US5323209A (en) * 1993-04-30 1994-06-21 Sony Electronics Inc. Apparatus for precision alignment of plates used in two-sided contact printing
US5854672A (en) * 1995-03-07 1998-12-29 R. R. Donnelley & Sons Company Vacuum exposure frame with unworked glass insert/plate exposer and optionally having separate ID viewing area

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2536383A (en) * 1943-10-13 1951-01-02 Buckbee Mears Co Process for making reticles and other precision articles by etching from both sides of the blank
US3259046A (en) * 1963-10-14 1966-07-05 Dainippon Screen Mfg Vacuum suction type film holder
US3600243A (en) * 1966-11-09 1971-08-17 Us Army Method of making chromium mask for photoresist application
US3547537A (en) * 1968-03-25 1970-12-15 Ncr Co Pressurable contact printing mechanism
US3658417A (en) * 1970-06-11 1972-04-25 Teledyne Inc Contact printing apparatus and method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63124329A (ja) * 1986-11-12 1988-05-27 Toshiba Corp カラ−ブラウン管用シヤドウマスクの露光方法

Also Published As

Publication number Publication date
AU5512673A (en) 1974-11-07
DE2322874A1 (de) 1973-11-22
JPS5328092B2 (US07696358-20100413-C00002.png) 1978-08-12
US3751250A (en) 1973-08-07
IT982561B (it) 1974-10-21
CA981095A (en) 1976-01-06
NL7306349A (US07696358-20100413-C00002.png) 1973-11-12
FR2184314A5 (US07696358-20100413-C00002.png) 1973-12-21
GB1402491A (en) 1975-08-06

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