JPS4953380A - - Google Patents

Info

Publication number
JPS4953380A
JPS4953380A JP8252873A JP8252873A JPS4953380A JP S4953380 A JPS4953380 A JP S4953380A JP 8252873 A JP8252873 A JP 8252873A JP 8252873 A JP8252873 A JP 8252873A JP S4953380 A JPS4953380 A JP S4953380A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8252873A
Other languages
Japanese (ja)
Other versions
JPS5641989B2 (en, 2012
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4953380A publication Critical patent/JPS4953380A/ja
Publication of JPS5641989B2 publication Critical patent/JPS5641989B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/051—Etching
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/085—Isolated-integrated
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/106—Masks, special
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/15—Silicon on sapphire SOS

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • ing And Chemical Polishing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
JP8252873A 1972-07-20 1973-07-19 Expired JPS5641989B2 (en, 2012)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US00273560A US3814641A (en) 1972-07-20 1972-07-20 Process of fabricating silicon photomask

Publications (2)

Publication Number Publication Date
JPS4953380A true JPS4953380A (en, 2012) 1974-05-23
JPS5641989B2 JPS5641989B2 (en, 2012) 1981-10-01

Family

ID=23044450

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8252873A Expired JPS5641989B2 (en, 2012) 1972-07-20 1973-07-19

Country Status (2)

Country Link
US (1) US3814641A (en, 2012)
JP (1) JPS5641989B2 (en, 2012)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51948A (en) * 1974-06-21 1976-01-07 Dainippon Printing Co Ltd Hotomasukuno seizohoho
JPS5140874A (en, 2012) * 1974-10-04 1976-04-06 Toppan Printing Co Ltd
JPS5334474A (en) * 1976-09-11 1978-03-31 Nippon Chemical Ind Method of making colored opaque photomask blank material by ion plating method
JPS55121441A (en) * 1979-03-14 1980-09-18 Fujitsu Ltd Mask for far ultraviolet exposure

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2447225C2 (de) * 1974-10-03 1983-12-22 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren zum Ablösen von positiven Photolack
US4401367A (en) * 1980-11-03 1983-08-30 United Technologies Corporation Method for pattern masking objects and the products thereof
US4436593A (en) 1981-07-13 1984-03-13 Memorex Corporation Self-aligned pole tips
US5286581A (en) * 1991-08-19 1994-02-15 Motorola, Inc. Phase-shift mask and method for making
JP4951925B2 (ja) * 2005-10-11 2012-06-13 トヨタ自動車株式会社 燃料電池用ガスセパレータおよび燃料電池
JP2014135435A (ja) * 2013-01-11 2014-07-24 Toshiba Corp 半導体装置の製造方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51948A (en) * 1974-06-21 1976-01-07 Dainippon Printing Co Ltd Hotomasukuno seizohoho
JPS5140874A (en, 2012) * 1974-10-04 1976-04-06 Toppan Printing Co Ltd
JPS5334474A (en) * 1976-09-11 1978-03-31 Nippon Chemical Ind Method of making colored opaque photomask blank material by ion plating method
JPS55121441A (en) * 1979-03-14 1980-09-18 Fujitsu Ltd Mask for far ultraviolet exposure

Also Published As

Publication number Publication date
JPS5641989B2 (en, 2012) 1981-10-01
US3814641A (en) 1974-06-04

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