JPS4951928A - - Google Patents
Info
- Publication number
- JPS4951928A JPS4951928A JP9305772A JP9305772A JPS4951928A JP S4951928 A JPS4951928 A JP S4951928A JP 9305772 A JP9305772 A JP 9305772A JP 9305772 A JP9305772 A JP 9305772A JP S4951928 A JPS4951928 A JP S4951928A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9305772A JPS4951928A (cs) | 1972-09-16 | 1972-09-16 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9305772A JPS4951928A (cs) | 1972-09-16 | 1972-09-16 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS4951928A true JPS4951928A (cs) | 1974-05-20 |
Family
ID=14071866
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9305772A Pending JPS4951928A (cs) | 1972-09-16 | 1972-09-16 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS4951928A (cs) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57133514A (en) * | 1981-02-06 | 1982-08-18 | Sumitomo Special Metals Co Ltd | Gap forming composite target and gap formation of magnetic head |
| JPH06172994A (ja) * | 1992-12-09 | 1994-06-21 | Kawasaki Heavy Ind Ltd | 金属酸化物焼結体スパッタリングターゲット及びその製造方法 |
-
1972
- 1972-09-16 JP JP9305772A patent/JPS4951928A/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57133514A (en) * | 1981-02-06 | 1982-08-18 | Sumitomo Special Metals Co Ltd | Gap forming composite target and gap formation of magnetic head |
| JPH06172994A (ja) * | 1992-12-09 | 1994-06-21 | Kawasaki Heavy Ind Ltd | 金属酸化物焼結体スパッタリングターゲット及びその製造方法 |