JPS4949703A - - Google Patents
Info
- Publication number
- JPS4949703A JPS4949703A JP9193672A JP9193672A JPS4949703A JP S4949703 A JPS4949703 A JP S4949703A JP 9193672 A JP9193672 A JP 9193672A JP 9193672 A JP9193672 A JP 9193672A JP S4949703 A JPS4949703 A JP S4949703A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Epoxy Resins (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9193672A JPS5423574B2 (en) | 1972-09-13 | 1972-09-13 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9193672A JPS5423574B2 (en) | 1972-09-13 | 1972-09-13 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS4949703A true JPS4949703A (en) | 1974-05-14 |
JPS5423574B2 JPS5423574B2 (en) | 1979-08-15 |
Family
ID=14040465
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9193672A Expired JPS5423574B2 (en) | 1972-09-13 | 1972-09-13 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5423574B2 (en) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5136932A (en) * | 1974-09-25 | 1976-03-29 | Unitika Ltd | KANKOSEISOSEIBUTSU |
JPS61194441A (en) * | 1985-02-19 | 1986-08-28 | ウセベ ソシエテ アノニム | Adhesive resin composition |
JPS62164045A (en) * | 1986-01-13 | 1987-07-20 | ロ−ム アンド ハ−ス コンパニ− | Negative photoresist composition and formation of image |
JPH0252348A (en) * | 1988-06-25 | 1990-02-21 | Hoechst Ag | High energy irradiation ray hardenable composition and high energy irradiation ray recording |
JPH04110945A (en) * | 1990-08-31 | 1992-04-13 | Mitsubishi Kasei Corp | Negative type photosensitive composition |
JPH04136941A (en) * | 1990-09-28 | 1992-05-11 | Mitsubishi Kasei Corp | Negative type photosensitive composition |
JPH04215658A (en) * | 1990-12-13 | 1992-08-06 | Nippon Kayaku Co Ltd | Radioactive ray sensitive negative type resist composition material |
US6794109B2 (en) | 2001-02-23 | 2004-09-21 | Massachusetts Institute Of Technology | Low abosorbing resists for 157 nm lithography |
WO2019098338A1 (en) * | 2017-11-20 | 2019-05-23 | 三菱瓦斯化学株式会社 | Composition for forming film for lithography, film for lithography, resist pattern forming method, and circuit pattern forming method |
-
1972
- 1972-09-13 JP JP9193672A patent/JPS5423574B2/ja not_active Expired
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5136932A (en) * | 1974-09-25 | 1976-03-29 | Unitika Ltd | KANKOSEISOSEIBUTSU |
JPS5751091B2 (en) * | 1974-09-25 | 1982-10-30 | ||
JPS61194441A (en) * | 1985-02-19 | 1986-08-28 | ウセベ ソシエテ アノニム | Adhesive resin composition |
JPS62164045A (en) * | 1986-01-13 | 1987-07-20 | ロ−ム アンド ハ−ス コンパニ− | Negative photoresist composition and formation of image |
JPH0252348A (en) * | 1988-06-25 | 1990-02-21 | Hoechst Ag | High energy irradiation ray hardenable composition and high energy irradiation ray recording |
JPH04110945A (en) * | 1990-08-31 | 1992-04-13 | Mitsubishi Kasei Corp | Negative type photosensitive composition |
JPH04136941A (en) * | 1990-09-28 | 1992-05-11 | Mitsubishi Kasei Corp | Negative type photosensitive composition |
JPH04215658A (en) * | 1990-12-13 | 1992-08-06 | Nippon Kayaku Co Ltd | Radioactive ray sensitive negative type resist composition material |
US6794109B2 (en) | 2001-02-23 | 2004-09-21 | Massachusetts Institute Of Technology | Low abosorbing resists for 157 nm lithography |
WO2019098338A1 (en) * | 2017-11-20 | 2019-05-23 | 三菱瓦斯化学株式会社 | Composition for forming film for lithography, film for lithography, resist pattern forming method, and circuit pattern forming method |
JPWO2019098338A1 (en) * | 2017-11-20 | 2020-12-17 | 三菱瓦斯化学株式会社 | Composition for forming a film for lithography, a film for lithography, a resist pattern forming method, and a circuit pattern forming method. |
Also Published As
Publication number | Publication date |
---|---|
JPS5423574B2 (en) | 1979-08-15 |