JPS494738A - - Google Patents
Info
- Publication number
- JPS494738A JPS494738A JP4177472A JP4177472A JPS494738A JP S494738 A JPS494738 A JP S494738A JP 4177472 A JP4177472 A JP 4177472A JP 4177472 A JP4177472 A JP 4177472A JP S494738 A JPS494738 A JP S494738A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Epoxy Resins (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4177472A JPS494738A (en) | 1972-04-27 | 1972-04-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4177472A JPS494738A (en) | 1972-04-27 | 1972-04-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS494738A true JPS494738A (en) | 1974-01-16 |
Family
ID=12617713
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4177472A Pending JPS494738A (en) | 1972-04-27 | 1972-04-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS494738A (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6335609A (en) * | 1986-07-30 | 1988-02-16 | Toyo Ink Mfg Co Ltd | Production of curable resin composition having ethylenically unsaturated group |
| JPH03274558A (en) * | 1990-03-26 | 1991-12-05 | Toray Ind Inc | Photosensitive resin composition |
| JPH04283749A (en) * | 1991-03-12 | 1992-10-08 | Toray Ind Inc | Photosensitive resin composition |
| US5200464A (en) * | 1989-12-22 | 1993-04-06 | Nitto Chemical Industry Co. Ltd. | Water-soluble radical-curing polyvinyl alcohol derivative |
| US5750313A (en) * | 1994-02-28 | 1998-05-12 | Toray Industries, Inc. | Photosensitive resin composition and process for producing the same |
| JP2009057488A (en) * | 2007-08-31 | 2009-03-19 | Nippon Shokubai Co Ltd | Production method of side chain-containing polymer |
| JP2010518223A (en) * | 2007-02-08 | 2010-05-27 | エルジー・ケム・リミテッド | Alkali developable resin, process for producing the same, and photosensitive resin composition containing the alkali developable resin |
| JP2019038935A (en) * | 2017-08-24 | 2019-03-14 | 株式会社クラレ | Polyvinyl alcohol composition and use therefor |
-
1972
- 1972-04-27 JP JP4177472A patent/JPS494738A/ja active Pending
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6335609A (en) * | 1986-07-30 | 1988-02-16 | Toyo Ink Mfg Co Ltd | Production of curable resin composition having ethylenically unsaturated group |
| US5200464A (en) * | 1989-12-22 | 1993-04-06 | Nitto Chemical Industry Co. Ltd. | Water-soluble radical-curing polyvinyl alcohol derivative |
| JPH03274558A (en) * | 1990-03-26 | 1991-12-05 | Toray Ind Inc | Photosensitive resin composition |
| JPH04283749A (en) * | 1991-03-12 | 1992-10-08 | Toray Ind Inc | Photosensitive resin composition |
| US5750313A (en) * | 1994-02-28 | 1998-05-12 | Toray Industries, Inc. | Photosensitive resin composition and process for producing the same |
| JP2010518223A (en) * | 2007-02-08 | 2010-05-27 | エルジー・ケム・リミテッド | Alkali developable resin, process for producing the same, and photosensitive resin composition containing the alkali developable resin |
| JP2009057488A (en) * | 2007-08-31 | 2009-03-19 | Nippon Shokubai Co Ltd | Production method of side chain-containing polymer |
| JP2019038935A (en) * | 2017-08-24 | 2019-03-14 | 株式会社クラレ | Polyvinyl alcohol composition and use therefor |