JPS4945452B1 - - Google Patents
Info
- Publication number
- JPS4945452B1 JPS4945452B1 JP3672069A JP3672069A JPS4945452B1 JP S4945452 B1 JPS4945452 B1 JP S4945452B1 JP 3672069 A JP3672069 A JP 3672069A JP 3672069 A JP3672069 A JP 3672069A JP S4945452 B1 JPS4945452 B1 JP S4945452B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Preventing Corrosion Or Incrustation Of Metals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3672069A JPS4945452B1 (enExample) | 1969-05-13 | 1969-05-13 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3672069A JPS4945452B1 (enExample) | 1969-05-13 | 1969-05-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS4945452B1 true JPS4945452B1 (enExample) | 1974-12-04 |
Family
ID=12477570
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3672069A Pending JPS4945452B1 (enExample) | 1969-05-13 | 1969-05-13 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS4945452B1 (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0314082U (enExample) * | 1989-06-19 | 1991-02-13 | ||
| US11186771B2 (en) | 2017-06-05 | 2021-11-30 | Versum Materials Us, Llc | Etching solution for selectively removing silicon nitride during manufacture of a semiconductor device |
-
1969
- 1969-05-13 JP JP3672069A patent/JPS4945452B1/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0314082U (enExample) * | 1989-06-19 | 1991-02-13 | ||
| US11186771B2 (en) | 2017-06-05 | 2021-11-30 | Versum Materials Us, Llc | Etching solution for selectively removing silicon nitride during manufacture of a semiconductor device |