JPS4945035A - - Google Patents
Info
- Publication number
- JPS4945035A JPS4945035A JP9058372A JP9058372A JPS4945035A JP S4945035 A JPS4945035 A JP S4945035A JP 9058372 A JP9058372 A JP 9058372A JP 9058372 A JP9058372 A JP 9058372A JP S4945035 A JPS4945035 A JP S4945035A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9058372A JPS5341142B2 (en:Method) | 1972-09-08 | 1972-09-08 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9058372A JPS5341142B2 (en:Method) | 1972-09-08 | 1972-09-08 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4945035A true JPS4945035A (en:Method) | 1974-04-27 |
| JPS5341142B2 JPS5341142B2 (en:Method) | 1978-10-31 |
Family
ID=14002451
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9058372A Expired JPS5341142B2 (en:Method) | 1972-09-08 | 1972-09-08 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5341142B2 (en:Method) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60156662A (ja) * | 1984-01-25 | 1985-08-16 | Eiwa Kasei Kogyo Kk | Ｐ，ｐ′−オキシビス（ベンゼンスルホニルクロライド）の製造方法 |
| US4554046A (en) * | 1983-09-22 | 1985-11-19 | Kabushiki Kaisha Toshiba | Method of selectively etching high impurity concentration semiconductor layer |
| JPS62106631A (ja) * | 1985-10-31 | 1987-05-18 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | 選択性エツチング剤 |
| US5266152A (en) * | 1991-10-09 | 1993-11-30 | Nissan Motor Co., Ltd. | Method of etching |
| US5376214A (en) * | 1992-09-22 | 1994-12-27 | Nissan Motor Co., Ltd. | Etching device |
-
1972
- 1972-09-08 JP JP9058372A patent/JPS5341142B2/ja not_active Expired
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4554046A (en) * | 1983-09-22 | 1985-11-19 | Kabushiki Kaisha Toshiba | Method of selectively etching high impurity concentration semiconductor layer |
| JPS60156662A (ja) * | 1984-01-25 | 1985-08-16 | Eiwa Kasei Kogyo Kk | Ｐ，ｐ′−オキシビス（ベンゼンスルホニルクロライド）の製造方法 |
| JPS62106631A (ja) * | 1985-10-31 | 1987-05-18 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | 選択性エツチング剤 |
| US5266152A (en) * | 1991-10-09 | 1993-11-30 | Nissan Motor Co., Ltd. | Method of etching |
| US5376214A (en) * | 1992-09-22 | 1994-12-27 | Nissan Motor Co., Ltd. | Etching device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5341142B2 (en:Method) | 1978-10-31 |