JPS4943572A - - Google Patents

Info

Publication number
JPS4943572A
JPS4943572A JP5420073A JP5420073A JPS4943572A JP S4943572 A JPS4943572 A JP S4943572A JP 5420073 A JP5420073 A JP 5420073A JP 5420073 A JP5420073 A JP 5420073A JP S4943572 A JPS4943572 A JP S4943572A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5420073A
Other languages
Japanese (ja)
Other versions
JPS5225295B2 (cs
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4943572A publication Critical patent/JPS4943572A/ja
Publication of JPS5225295B2 publication Critical patent/JPS5225295B2/ja
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02Elements
    • C30B29/06Silicon
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02Epitaxial-layer growth

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
JP5420073A 1972-05-20 1973-05-17 Expired JPS5225295B2 (cs)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7206877A NL7206877A (cs) 1972-05-20 1972-05-20

Publications (2)

Publication Number Publication Date
JPS4943572A true JPS4943572A (cs) 1974-04-24
JPS5225295B2 JPS5225295B2 (cs) 1977-07-06

Family

ID=19816097

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5420073A Expired JPS5225295B2 (cs) 1972-05-20 1973-05-17

Country Status (7)

Country Link
JP (1) JPS5225295B2 (cs)
CA (1) CA990626A (cs)
DE (1) DE2324127A1 (cs)
FR (1) FR2185445B1 (cs)
GB (1) GB1406760A (cs)
IT (1) IT985922B (cs)
NL (1) NL7206877A (cs)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006070342A (ja) * 2004-09-03 2006-03-16 Sumitomo Electric Ind Ltd 気相成膜装置、サセプタおよび気相成膜方法
KR20170030554A (ko) 2014-07-08 2017-03-17 바스프 코팅스 게엠베하 2성분 페인트 조성물 및 그를 사용한 다층 코팅 형성 방법

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3166609D1 (en) * 1980-07-28 1984-11-15 Monsanto Co Improved method for producing semiconductor grade silicon
JPS6169116A (ja) * 1984-09-13 1986-04-09 Toshiba Ceramics Co Ltd シリコンウエハ−の連続cvdコ−テイング用サセプター
JP3725598B2 (ja) * 1996-01-12 2005-12-14 東芝セラミックス株式会社 エピタキシャルウェハの製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006070342A (ja) * 2004-09-03 2006-03-16 Sumitomo Electric Ind Ltd 気相成膜装置、サセプタおよび気相成膜方法
KR20170030554A (ko) 2014-07-08 2017-03-17 바스프 코팅스 게엠베하 2성분 페인트 조성물 및 그를 사용한 다층 코팅 형성 방법

Also Published As

Publication number Publication date
DE2324127A1 (de) 1973-12-06
IT985922B (it) 1974-12-30
GB1406760A (en) 1975-09-17
NL7206877A (cs) 1973-11-22
FR2185445A1 (cs) 1974-01-04
CA990626A (en) 1976-06-08
FR2185445B1 (cs) 1976-06-11
JPS5225295B2 (cs) 1977-07-06

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