JPS4934390B1 - - Google Patents

Info

Publication number
JPS4934390B1
JPS4934390B1 JP45086826A JP8682670A JPS4934390B1 JP S4934390 B1 JPS4934390 B1 JP S4934390B1 JP 45086826 A JP45086826 A JP 45086826A JP 8682670 A JP8682670 A JP 8682670A JP S4934390 B1 JPS4934390 B1 JP S4934390B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP45086826A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP45086826A priority Critical patent/JPS4934390B1/ja
Publication of JPS4934390B1 publication Critical patent/JPS4934390B1/ja
Pending legal-status Critical Current

Links

Landscapes

  • Non-Adjustable Resistors (AREA)
JP45086826A 1970-10-02 1970-10-02 Pending JPS4934390B1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP45086826A JPS4934390B1 (de) 1970-10-02 1970-10-02

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP45086826A JPS4934390B1 (de) 1970-10-02 1970-10-02

Publications (1)

Publication Number Publication Date
JPS4934390B1 true JPS4934390B1 (de) 1974-09-13

Family

ID=13897602

Family Applications (1)

Application Number Title Priority Date Filing Date
JP45086826A Pending JPS4934390B1 (de) 1970-10-02 1970-10-02

Country Status (1)

Country Link
JP (1) JPS4934390B1 (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006009218A1 (ja) * 2004-07-22 2006-01-26 Nippon Telegraph And Telephone Corporation 2安定抵抗値取得装置及びその製造方法並びに金属酸化物薄膜及びその製造方法
WO2007023569A1 (ja) * 2005-08-26 2007-03-01 Fujitsu Limited 不揮発性半導体記憶装置及びその書き込み方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006009218A1 (ja) * 2004-07-22 2006-01-26 Nippon Telegraph And Telephone Corporation 2安定抵抗値取得装置及びその製造方法並びに金属酸化物薄膜及びその製造方法
US7696502B2 (en) 2004-07-22 2010-04-13 Nippon Telegraph And Telephone Corporation Bistable resistance value acquisition device, manufacturing method thereof, metal oxide thin film, and manufacturing method thereof
US7875872B2 (en) 2004-07-22 2011-01-25 Nippon Telegraph And Telephone Corporation Bistable resistance value acquisition device, manufacturing method thereof, metal oxide thin film, and manufacturing method thereof
WO2007023569A1 (ja) * 2005-08-26 2007-03-01 Fujitsu Limited 不揮発性半導体記憶装置及びその書き込み方法

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