JPS4931272A - - Google Patents
Info
- Publication number
- JPS4931272A JPS4931272A JP2168872A JP2168872A JPS4931272A JP S4931272 A JPS4931272 A JP S4931272A JP 2168872 A JP2168872 A JP 2168872A JP 2168872 A JP2168872 A JP 2168872A JP S4931272 A JPS4931272 A JP S4931272A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2168872A JPS4931272A (cs) | 1972-03-02 | 1972-03-02 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2168872A JPS4931272A (cs) | 1972-03-02 | 1972-03-02 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS4931272A true JPS4931272A (cs) | 1974-03-20 |
Family
ID=12061993
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2168872A Pending JPS4931272A (cs) | 1972-03-02 | 1972-03-02 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS4931272A (cs) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4978640A (cs) * | 1972-12-06 | 1974-07-29 | ||
| JPS57162420A (en) * | 1981-03-16 | 1982-10-06 | Atlantic Richfield Co | Method and device for optically controlling layer thickness |
| JPS6027692A (ja) * | 1983-07-25 | 1985-02-12 | Ulvac Corp | インプロセスモニタ可能な気相エピタキシヤル成長用化学反応装置 |
| JPH05152221A (ja) * | 1991-11-30 | 1993-06-18 | Res Dev Corp Of Japan | 半導体結晶のエピタキシヤル成長方法 |
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1972
- 1972-03-02 JP JP2168872A patent/JPS4931272A/ja active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4978640A (cs) * | 1972-12-06 | 1974-07-29 | ||
| JPS57162420A (en) * | 1981-03-16 | 1982-10-06 | Atlantic Richfield Co | Method and device for optically controlling layer thickness |
| JPS6027692A (ja) * | 1983-07-25 | 1985-02-12 | Ulvac Corp | インプロセスモニタ可能な気相エピタキシヤル成長用化学反応装置 |
| JPH05152221A (ja) * | 1991-11-30 | 1993-06-18 | Res Dev Corp Of Japan | 半導体結晶のエピタキシヤル成長方法 |