JPS4929580A - - Google Patents

Info

Publication number
JPS4929580A
JPS4929580A JP47070225A JP7022572A JPS4929580A JP S4929580 A JPS4929580 A JP S4929580A JP 47070225 A JP47070225 A JP 47070225A JP 7022572 A JP7022572 A JP 7022572A JP S4929580 A JPS4929580 A JP S4929580A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP47070225A
Other languages
Japanese (ja)
Other versions
JPS5134268B2 (US07122547-20061017-C00273.png
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP47070225A priority Critical patent/JPS5134268B2/ja
Priority to GB3338973A priority patent/GB1436255A/en
Priority to DE19732335503 priority patent/DE2335503A1/de
Priority to CA176,348A priority patent/CA984975A/en
Priority to US378449A priority patent/US3925803A/en
Priority to AT622273A priority patent/AT352783B/de
Publication of JPS4929580A publication Critical patent/JPS4929580A/ja
Publication of JPS5134268B2 publication Critical patent/JPS5134268B2/ja
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/04Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt
    • C30B11/08Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt every component of the crystal composition being added during the crystallisation
    • C30B11/12Vaporous components, e.g. vapour-liquid-solid-growth
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/025Deposition multi-step
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/053Field effect transistors fets
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/085Isolated-integrated
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/122Polycrystalline
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/15Silicon on sapphire SOS
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00Semiconductor device manufacturing: process
    • Y10S438/914Doping
    • Y10S438/922Diffusion along grain boundaries

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Metallurgy (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Computer Hardware Design (AREA)
  • Junction Field-Effect Transistors (AREA)
  • Element Separation (AREA)
  • Semiconductor Integrated Circuits (AREA)
JP47070225A 1972-07-13 1972-07-13 Expired JPS5134268B2 (US07122547-20061017-C00273.png)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP47070225A JPS5134268B2 (US07122547-20061017-C00273.png) 1972-07-13 1972-07-13
GB3338973A GB1436255A (en) 1972-07-13 1973-07-12 Semi-conductor device and method of making the same
DE19732335503 DE2335503A1 (de) 1972-07-13 1973-07-12 Halbleiteranordnung und verfahren zu ihrer herstellung
CA176,348A CA984975A (en) 1972-07-13 1973-07-12 Semiconductor device
US378449A US3925803A (en) 1972-07-13 1973-07-12 Oriented polycrystal jfet
AT622273A AT352783B (de) 1972-07-13 1973-07-13 Als feldeffekttransistor betreibbare mehrkanal-halbleiteranordnung mit laenglichen halbleiterkristallen

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP47070225A JPS5134268B2 (US07122547-20061017-C00273.png) 1972-07-13 1972-07-13

Publications (2)

Publication Number Publication Date
JPS4929580A true JPS4929580A (US07122547-20061017-C00273.png) 1974-03-16
JPS5134268B2 JPS5134268B2 (US07122547-20061017-C00273.png) 1976-09-25

Family

ID=13425382

Family Applications (1)

Application Number Title Priority Date Filing Date
JP47070225A Expired JPS5134268B2 (US07122547-20061017-C00273.png) 1972-07-13 1972-07-13

Country Status (6)

Country Link
US (1) US3925803A (US07122547-20061017-C00273.png)
JP (1) JPS5134268B2 (US07122547-20061017-C00273.png)
AT (1) AT352783B (US07122547-20061017-C00273.png)
CA (1) CA984975A (US07122547-20061017-C00273.png)
DE (1) DE2335503A1 (US07122547-20061017-C00273.png)
GB (1) GB1436255A (US07122547-20061017-C00273.png)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5329551B2 (US07122547-20061017-C00273.png) * 1974-08-19 1978-08-22
US4107724A (en) * 1974-12-17 1978-08-15 U.S. Philips Corporation Surface controlled field effect solid state device
DE2926741C2 (de) * 1979-07-03 1982-09-09 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Feldeffekt-Transistor und Verfahren zu seiner Herstellung
JPS56116670A (en) * 1980-02-20 1981-09-12 Hitachi Ltd Semiconductor integrated circuit device and manufacture thereof
GB2089119A (en) * 1980-12-10 1982-06-16 Philips Electronic Associated High voltage semiconductor devices
US4427457A (en) 1981-04-07 1984-01-24 Oregon Graduate Center Method of making depthwise-oriented integrated circuit capacitors
EP0227739A4 (en) * 1985-05-20 1988-05-10 Univ California DIFFERENTIAL IMAGING DEVICE.
US5362972A (en) * 1990-04-20 1994-11-08 Hitachi, Ltd. Semiconductor device using whiskers
US5098862A (en) * 1990-11-07 1992-03-24 Gte Laboratories Incorporated Method of making ohmic electrical contact to a matrix of semiconductor material
US5332910A (en) * 1991-03-22 1994-07-26 Hitachi, Ltd. Semiconductor optical device with nanowhiskers
TW386238B (en) 1997-01-20 2000-04-01 Semiconductor Energy Lab Semiconductor device and method of manufacturing the same
DE19840032C1 (de) 1998-09-02 1999-11-18 Siemens Ag Halbleiterbauelement und Herstellungsverfahren dazu
US6819089B2 (en) * 2001-11-09 2004-11-16 Infineon Technologies Ag Power factor correction circuit with high-voltage semiconductor component
US6828609B2 (en) * 2001-11-09 2004-12-07 Infineon Technologies Ag High-voltage semiconductor component
US7053404B2 (en) * 2003-12-05 2006-05-30 Stmicroelectronics S.A. Active semiconductor component with an optimized surface area
US20050121691A1 (en) * 2003-12-05 2005-06-09 Jean-Luc Morand Active semiconductor component with a reduced surface area

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2954307A (en) * 1957-03-18 1960-09-27 Shockley William Grain boundary semiconductor device and method
US2979427A (en) * 1957-03-18 1961-04-11 Shockley William Semiconductor device and method of making the same
NL249774A (US07122547-20061017-C00273.png) * 1959-03-26
FR1317256A (fr) * 1961-12-16 1963-02-08 Teszner Stanislas Perfectionnements aux dispositifs semi-conducteurs dits tecnetrons multibâtonnets
US3332810A (en) * 1963-09-28 1967-07-25 Matsushita Electronics Corp Silicon rectifier device
DE1519869B1 (de) * 1965-03-18 1970-01-15 Siemens Ag Verfahren zum Herstellen einer Faserstruktur in einem Koerper aus einer halbleitenden Verbindung
US3624467A (en) * 1969-02-17 1971-11-30 Texas Instruments Inc Monolithic integrated-circuit structure and method of fabrication

Also Published As

Publication number Publication date
AT352783B (de) 1979-10-10
DE2335503A1 (de) 1974-01-31
CA984975A (en) 1976-03-02
JPS5134268B2 (US07122547-20061017-C00273.png) 1976-09-25
GB1436255A (en) 1976-05-19
US3925803A (en) 1975-12-09
ATA622273A (de) 1979-03-15

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