JPS4914390B1 - - Google Patents

Info

Publication number
JPS4914390B1
JPS4914390B1 JP44086216A JP8621669A JPS4914390B1 JP S4914390 B1 JPS4914390 B1 JP S4914390B1 JP 44086216 A JP44086216 A JP 44086216A JP 8621669 A JP8621669 A JP 8621669A JP S4914390 B1 JPS4914390 B1 JP S4914390B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP44086216A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP44086216A priority Critical patent/JPS4914390B1/ja
Priority to US84332A priority patent/US3665265A/en
Publication of JPS4914390B1 publication Critical patent/JPS4914390B1/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00Interconnections in chips, wafers or substrates
    • H10W20/40Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00Subject matter not provided for in other groups of this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00Encapsulations, e.g. protective coatings
    • H10W74/40Encapsulations, e.g. protective coatings characterised by their materials
    • H10W74/43Encapsulations, e.g. protective coatings characterised by their materials comprising oxides, nitrides or carbides, e.g. ceramics or glasses

Landscapes

  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP44086216A 1969-10-29 1969-10-29 Pending JPS4914390B1 (enExample)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP44086216A JPS4914390B1 (enExample) 1969-10-29 1969-10-29
US84332A US3665265A (en) 1969-10-29 1970-10-27 Mos integrated circuit semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP44086216A JPS4914390B1 (enExample) 1969-10-29 1969-10-29

Publications (1)

Publication Number Publication Date
JPS4914390B1 true JPS4914390B1 (enExample) 1974-04-06

Family

ID=13880571

Family Applications (1)

Application Number Title Priority Date Filing Date
JP44086216A Pending JPS4914390B1 (enExample) 1969-10-29 1969-10-29

Country Status (2)

Country Link
US (1) US3665265A (enExample)
JP (1) JPS4914390B1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS614637U (ja) * 1984-06-13 1986-01-11 弘之 上河 指圧器

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3122382A1 (de) * 1981-06-05 1982-12-23 Ibm Deutschland Verfahren zum herstellen einer gateisolations-schichtstruktur und die verwendung einer solchen struktur
SE465193B (sv) * 1989-12-06 1991-08-05 Ericsson Telefon Ab L M Foer hoegspaenning avsedd ic-krets
TW299475B (enExample) * 1993-03-30 1997-03-01 Siemens Ag
US5366911A (en) * 1994-05-11 1994-11-22 United Microelectronics Corporation VLSI process with global planarization
US7095101B2 (en) * 2000-11-15 2006-08-22 Jiahn-Chang Wu Supporting frame for surface-mount diode package

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS614637U (ja) * 1984-06-13 1986-01-11 弘之 上河 指圧器

Also Published As

Publication number Publication date
US3665265A (en) 1972-05-23

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