JPS49134404A - - Google Patents

Info

Publication number
JPS49134404A
JPS49134404A JP48125062A JP12506273A JPS49134404A JP S49134404 A JPS49134404 A JP S49134404A JP 48125062 A JP48125062 A JP 48125062A JP 12506273 A JP12506273 A JP 12506273A JP S49134404 A JPS49134404 A JP S49134404A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP48125062A
Other versions
JPS5636413B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS49134404A publication Critical patent/JPS49134404A/ja
Publication of JPS5636413B2 publication Critical patent/JPS5636413B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/265—Selective reaction with inorganic or organometallic reagents after image-wise exposure, e.g. silylation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Graft Or Block Polymers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP12506273A 1972-11-09 1973-11-08 Expired JPS5636413B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US00305209A US3847609A (en) 1972-11-09 1972-11-09 Photopolymer process forming graft polymers in exposed areas

Publications (2)

Publication Number Publication Date
JPS49134404A true JPS49134404A (ja) 1974-12-24
JPS5636413B2 JPS5636413B2 (ja) 1981-08-24

Family

ID=23179814

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12506273A Expired JPS5636413B2 (ja) 1972-11-09 1973-11-08

Country Status (7)

Country Link
US (1) US3847609A (ja)
JP (1) JPS5636413B2 (ja)
BE (1) BE807148A (ja)
CA (1) CA1006391A (ja)
DE (1) DE2356149A1 (ja)
FR (1) FR2206525B1 (ja)
GB (1) GB1421400A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50134649A (ja) * 1974-04-10 1975-10-24
WO1989001187A1 (en) * 1987-07-27 1989-02-09 Hitachi, Ltd. Pattern-forming process utilizing radiation-induced graft polymerization reaction

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1389548A (en) * 1972-11-22 1975-04-03 Ilford Ltd Photographic colloid layers in silver halide materials
CA1110899A (en) * 1976-11-08 1981-10-20 David A. Simpson Process for making photographic images using a photosensitive composition which forms peroxides on irradiation with u.v. light
US4563413A (en) * 1984-04-23 1986-01-07 Hercules Incorporated Photopolymer process and composition employing a photooxidizable component capable of forming endoperoxides
US4666824A (en) * 1984-04-23 1987-05-19 Hercules Incorporated Photopolymer process and composition employing a photooxidizable component capable of forming endoperoxides
US5316895A (en) * 1990-10-31 1994-05-31 Texas Instruments Incorporated Photolithographic method using non-photoactive resins
US5919604A (en) * 1997-07-30 1999-07-06 Polyfibron Technologies, Inc. Rubber-based aqueous developable photopolymers and photocurable elements comprising same
CN106814540B (zh) * 2015-11-30 2020-04-10 乐凯华光印刷科技有限公司 水洗凸版用感光组合物、含有该水洗凸版用感光组合物的水洗凸版及水洗凸版的制备方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL126770C (ja) * 1955-04-29 1900-01-01
US3201336A (en) * 1956-07-27 1965-08-17 Ct Nat De La Rech Scient Minis Graft polymerization utilizing ionizing radiation
US2951798A (en) * 1957-11-13 1960-09-06 Monsanto Chemicals Photoxidation processes utilizing aromatic porphyrin catalysts
US3405071A (en) * 1963-12-30 1968-10-08 Ibm Process of making microcapsules
CH518572A (de) * 1967-06-07 1972-01-31 Monsanto Co Photographische Komposition und ihre Verwendung
US3674591A (en) * 1969-11-28 1972-07-04 Stromberg Datagraphix Inc Surface deformation imaging process
US3703402A (en) * 1970-11-23 1972-11-21 Gen Electric Electron sensitive compositions

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50134649A (ja) * 1974-04-10 1975-10-24
WO1989001187A1 (en) * 1987-07-27 1989-02-09 Hitachi, Ltd. Pattern-forming process utilizing radiation-induced graft polymerization reaction

Also Published As

Publication number Publication date
US3847609A (en) 1974-11-12
FR2206525A1 (ja) 1974-06-07
FR2206525B1 (ja) 1982-03-19
BE807148A (fr) 1974-03-01
DE2356149C2 (ja) 1988-01-14
CA1006391A (en) 1977-03-08
GB1421400A (en) 1976-01-14
JPS5636413B2 (ja) 1981-08-24
DE2356149A1 (de) 1974-05-22

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