JPS49132987A - - Google Patents
Info
- Publication number
- JPS49132987A JPS49132987A JP4617973A JP4617973A JPS49132987A JP S49132987 A JPS49132987 A JP S49132987A JP 4617973 A JP4617973 A JP 4617973A JP 4617973 A JP4617973 A JP 4617973A JP S49132987 A JPS49132987 A JP S49132987A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Production Of Multi-Layered Print Wiring Board (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4617973A JPS5728950B2 (cs) | 1973-04-25 | 1973-04-25 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4617973A JPS5728950B2 (cs) | 1973-04-25 | 1973-04-25 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS49132987A true JPS49132987A (cs) | 1974-12-20 |
| JPS5728950B2 JPS5728950B2 (cs) | 1982-06-19 |
Family
ID=12739791
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4617973A Expired JPS5728950B2 (cs) | 1973-04-25 | 1973-04-25 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5728950B2 (cs) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5893261A (ja) * | 1981-11-30 | 1983-06-02 | Toshiba Corp | 半導体装置の製造方法 |
| WO1987005441A1 (fr) * | 1986-03-05 | 1987-09-11 | Sumitomo Electric Industries, Ltd. | Dispositif semi-conducteur et procede de production |
-
1973
- 1973-04-25 JP JP4617973A patent/JPS5728950B2/ja not_active Expired
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5893261A (ja) * | 1981-11-30 | 1983-06-02 | Toshiba Corp | 半導体装置の製造方法 |
| WO1987005441A1 (fr) * | 1986-03-05 | 1987-09-11 | Sumitomo Electric Industries, Ltd. | Dispositif semi-conducteur et procede de production |
| US4757033A (en) * | 1986-03-05 | 1988-07-12 | Sumitomo Electric Industries, Ltd. | Semiconductor device manufacturing by sequential ion and wet etchings prior to lift-off metallization |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5728950B2 (cs) | 1982-06-19 |