JPS491225A - - Google Patents

Info

Publication number
JPS491225A
JPS491225A JP47037702A JP3770272A JPS491225A JP S491225 A JPS491225 A JP S491225A JP 47037702 A JP47037702 A JP 47037702A JP 3770272 A JP3770272 A JP 3770272A JP S491225 A JPS491225 A JP S491225A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP47037702A
Other languages
Japanese (ja)
Other versions
JPS515935B2 (US06174465-20010116-C00003.png
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP47037702A priority Critical patent/JPS515935B2/ja
Priority to US350012A priority patent/US3884703A/en
Priority to GB1798473A priority patent/GB1414837A/en
Priority to DE2318855A priority patent/DE2318855B2/de
Priority to FR7313721A priority patent/FR2180850B1/fr
Publication of JPS491225A publication Critical patent/JPS491225A/ja
Publication of JPS515935B2 publication Critical patent/JPS515935B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/0085—Azides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Graft Or Block Polymers (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
JP47037702A 1972-04-17 1972-04-17 Expired JPS515935B2 (US06174465-20010116-C00003.png)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP47037702A JPS515935B2 (US06174465-20010116-C00003.png) 1972-04-17 1972-04-17
US350012A US3884703A (en) 1972-04-17 1973-04-11 Bisazide sensitized photoresistor composition with diacetone acrylamide
GB1798473A GB1414837A (en) 1972-04-17 1973-04-13 Photoresist composition
DE2318855A DE2318855B2 (de) 1972-04-17 1973-04-13 Photolack
FR7313721A FR2180850B1 (US06174465-20010116-C00003.png) 1972-04-17 1973-04-16

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP47037702A JPS515935B2 (US06174465-20010116-C00003.png) 1972-04-17 1972-04-17

Publications (2)

Publication Number Publication Date
JPS491225A true JPS491225A (US06174465-20010116-C00003.png) 1974-01-08
JPS515935B2 JPS515935B2 (US06174465-20010116-C00003.png) 1976-02-24

Family

ID=12504849

Family Applications (1)

Application Number Title Priority Date Filing Date
JP47037702A Expired JPS515935B2 (US06174465-20010116-C00003.png) 1972-04-17 1972-04-17

Country Status (5)

Country Link
US (1) US3884703A (US06174465-20010116-C00003.png)
JP (1) JPS515935B2 (US06174465-20010116-C00003.png)
DE (1) DE2318855B2 (US06174465-20010116-C00003.png)
FR (1) FR2180850B1 (US06174465-20010116-C00003.png)
GB (1) GB1414837A (US06174465-20010116-C00003.png)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5089066A (US06174465-20010116-C00003.png) * 1973-12-07 1975-07-17
JPS50108003A (US06174465-20010116-C00003.png) * 1974-02-01 1975-08-26
JPS56167210U (US06174465-20010116-C00003.png) * 1981-04-21 1981-12-10
JPS57179115U (US06174465-20010116-C00003.png) * 1981-05-11 1982-11-13
JPS6161413U (US06174465-20010116-C00003.png) * 1984-09-28 1986-04-25
WO1989001186A1 (en) * 1987-07-28 1989-02-09 Nippon Kayaku Kabushiki Kaisha Photosensitive resin composition and color filter
JPH0271115A (ja) * 1988-05-31 1990-03-09 Ichikoh Ind Ltd 光電的水準装置

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4086090A (en) * 1973-07-25 1978-04-25 Hitachi, Ltd. Formation of pattern using acrylamide-diacetoneacrylamide copolymer
JPS5847811B2 (ja) * 1974-06-17 1983-10-25 株式会社日立製作所 ケイコウメンノ セイゾウホウホウ
JPS51149021A (en) * 1974-12-28 1976-12-21 Fuji Yakuhin Kogyo Kk Water soluble photosensitive resin composition
JPS5590145U (US06174465-20010116-C00003.png) * 1978-12-19 1980-06-21
JPS6338693Y2 (US06174465-20010116-C00003.png) * 1979-01-26 1988-10-12
JPS56101144A (en) * 1980-01-16 1981-08-13 Kimoto & Co Ltd Photosensitive material and its developing method
JPS56137347A (en) * 1980-03-29 1981-10-27 Tokyo Ohka Kogyo Co Ltd Photosensitive composition for dry development
JPS5744143A (en) * 1980-08-29 1982-03-12 Tokyo Ohka Kogyo Co Ltd Composition and method for forming micropattern
EP0555749B1 (en) * 1992-02-14 1999-05-19 Shipley Company Inc. Radiation sensitive compositions and processes
DE19705909A1 (de) * 1996-08-23 1998-08-20 Inst Physikalische Hochtech Ev Neuartige Dünnschichten für die Mikrosystemtechnik und Mikrostrukturierung sowie ihre Verwendung
KR20020077948A (ko) 2001-04-03 2002-10-18 삼성에스디아이 주식회사 칼라음극선관용 포토레지스트 제조용 단량체,칼라음극선관용 포토레지스트 중합체, 칼라음극선관용포토레지스트 조성물 및 칼라음극선관용 형광막 조성물
US7329618B2 (en) * 2005-06-28 2008-02-12 Micron Technology, Inc. Ion implanting methods
US20080047930A1 (en) * 2006-08-23 2008-02-28 Graciela Beatriz Blanchet Method to form a pattern of functional material on a substrate

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL150528B (nl) * 1949-05-14 Hollandse Signaalapparaten Bv Werkwijze voor het vervaardigen van twistloos of nagenoeg twistloos garen en het door toepassing van deze werkwijze verkregen garen.
GB678599A (en) * 1949-10-10 1952-09-03 Kalle & Co Ag Improvements relating to the production of colloid photo-images for use in photomechanical printing
NL256406A (US06174465-20010116-C00003.png) * 1959-10-02
BE595534A (US06174465-20010116-C00003.png) * 1959-10-02
US3278305A (en) * 1963-07-12 1966-10-11 Gevaert Photo Prod Nv Photochemical cross-linking of polymers
US3475176A (en) * 1966-09-06 1969-10-28 Eastman Kodak Co Azide sensitized photosensitive prepolymer compositions
GB1230772A (US06174465-20010116-C00003.png) * 1967-03-31 1971-05-05
US3615538A (en) * 1968-08-02 1971-10-26 Printing Dev Inc Photosensitive printing plates
US3616370A (en) * 1969-02-24 1971-10-26 Lubrizol Corp Crosslinking of unsaturated polyesters with n-3-oxohydrocarbon-substituted acrylamides
BE759079A (nl) * 1969-12-23 1971-05-18 Agfa Gevaert Nv Verknoping onder invloed van licht van lichtgevoelige polymere samenstellingen die azidogroepen bevatten
US3816559A (en) * 1970-07-20 1974-06-11 Lubrizol Corp Solid,curable compositions containing oxoalkyl acrylamides
US3715210A (en) * 1971-02-19 1973-02-06 Howson Algraphy Ltd Lithographic printing plates
JPS5033767B1 (US06174465-20010116-C00003.png) * 1971-03-11 1975-11-04
US3737319A (en) * 1971-03-15 1973-06-05 Eastman Kodak Co Photographic elements comprising photo-sensitive polymers
US3725231A (en) * 1971-08-20 1973-04-03 Lubrizol Corp Photosensitive diacetone acrylamide resins

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5089066A (US06174465-20010116-C00003.png) * 1973-12-07 1975-07-17
JPS50108003A (US06174465-20010116-C00003.png) * 1974-02-01 1975-08-26
JPS56167210U (US06174465-20010116-C00003.png) * 1981-04-21 1981-12-10
JPS57179115U (US06174465-20010116-C00003.png) * 1981-05-11 1982-11-13
JPS6161413U (US06174465-20010116-C00003.png) * 1984-09-28 1986-04-25
WO1989001186A1 (en) * 1987-07-28 1989-02-09 Nippon Kayaku Kabushiki Kaisha Photosensitive resin composition and color filter
JPH0271115A (ja) * 1988-05-31 1990-03-09 Ichikoh Ind Ltd 光電的水準装置

Also Published As

Publication number Publication date
JPS515935B2 (US06174465-20010116-C00003.png) 1976-02-24
GB1414837A (en) 1975-11-19
FR2180850B1 (US06174465-20010116-C00003.png) 1976-05-21
US3884703A (en) 1975-05-20
DE2318855A1 (de) 1973-10-25
FR2180850A1 (US06174465-20010116-C00003.png) 1973-11-30
DE2318855B2 (de) 1975-07-17

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