JPS49115541U - - Google Patents
Info
- Publication number
- JPS49115541U JPS49115541U JP1648273U JP1648273U JPS49115541U JP S49115541 U JPS49115541 U JP S49115541U JP 1648273 U JP1648273 U JP 1648273U JP 1648273 U JP1648273 U JP 1648273U JP S49115541 U JPS49115541 U JP S49115541U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Mechanical Operated Clutches (AREA)
- Hydraulic Clutches, Magnetic Clutches, Fluid Clutches, And Fluid Joints (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1648273U JPS49115541U (de) | 1973-02-06 | 1973-02-06 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1648273U JPS49115541U (de) | 1973-02-06 | 1973-02-06 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS49115541U true JPS49115541U (de) | 1974-10-02 |
Family
ID=28098890
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1648273U Pending JPS49115541U (de) | 1973-02-06 | 1973-02-06 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS49115541U (de) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8871422B2 (en) | 2005-09-22 | 2014-10-28 | Hitachi Chemical Dupont Microsystems Ltd. | Negative-type photosensitive resin composition, pattern forming method and electronic parts |
| US11333975B2 (en) | 2020-04-14 | 2022-05-17 | International Business Machines Corporation | Polymer, photosensitive resin composition, patterning method, method of forming cured film, interlayer insulating film, surface protective film, and electronic component |
| US11572442B2 (en) | 2020-04-14 | 2023-02-07 | International Business Machines Corporation | Compound, polyimide resin and method of producing the same, photosensitive resin composition, patterning method and method of forming cured film, interlayer insulating film, surface protective film, and electronic component |
-
1973
- 1973-02-06 JP JP1648273U patent/JPS49115541U/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8871422B2 (en) | 2005-09-22 | 2014-10-28 | Hitachi Chemical Dupont Microsystems Ltd. | Negative-type photosensitive resin composition, pattern forming method and electronic parts |
| US11333975B2 (en) | 2020-04-14 | 2022-05-17 | International Business Machines Corporation | Polymer, photosensitive resin composition, patterning method, method of forming cured film, interlayer insulating film, surface protective film, and electronic component |
| US11572442B2 (en) | 2020-04-14 | 2023-02-07 | International Business Machines Corporation | Compound, polyimide resin and method of producing the same, photosensitive resin composition, patterning method and method of forming cured film, interlayer insulating film, surface protective film, and electronic component |