JPS49108971A - - Google Patents
Info
- Publication number
- JPS49108971A JPS49108971A JP2035873A JP2035873A JPS49108971A JP S49108971 A JPS49108971 A JP S49108971A JP 2035873 A JP2035873 A JP 2035873A JP 2035873 A JP2035873 A JP 2035873A JP S49108971 A JPS49108971 A JP S49108971A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2035873A JPS49108971A (es) | 1973-02-20 | 1973-02-20 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2035873A JPS49108971A (es) | 1973-02-20 | 1973-02-20 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS49108971A true JPS49108971A (es) | 1974-10-16 |
Family
ID=12024865
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2035873A Pending JPS49108971A (es) | 1973-02-20 | 1973-02-20 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS49108971A (es) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3140966A (en) * | 1962-05-29 | 1964-07-14 | Siemens Ag | Vapor deposition onto stacked semiconductor wafers followed by particular cooling |
US3140965A (en) * | 1961-07-22 | 1964-07-14 | Siemens Ag | Vapor deposition onto stacked semiconductor wafers followed by particular cooling |
US3142596A (en) * | 1960-10-10 | 1964-07-28 | Bell Telephone Labor Inc | Epitaxial deposition onto semiconductor wafers through an interaction between the wafers and the support material |
-
1973
- 1973-02-20 JP JP2035873A patent/JPS49108971A/ja active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3142596A (en) * | 1960-10-10 | 1964-07-28 | Bell Telephone Labor Inc | Epitaxial deposition onto semiconductor wafers through an interaction between the wafers and the support material |
US3140965A (en) * | 1961-07-22 | 1964-07-14 | Siemens Ag | Vapor deposition onto stacked semiconductor wafers followed by particular cooling |
US3140966A (en) * | 1962-05-29 | 1964-07-14 | Siemens Ag | Vapor deposition onto stacked semiconductor wafers followed by particular cooling |