JPS49107226A - - Google Patents
Info
- Publication number
- JPS49107226A JPS49107226A JP48017716A JP1771673A JPS49107226A JP S49107226 A JPS49107226 A JP S49107226A JP 48017716 A JP48017716 A JP 48017716A JP 1771673 A JP1771673 A JP 1771673A JP S49107226 A JPS49107226 A JP S49107226A
- Authority
- JP
- Japan
- Prior art keywords
- group
- hydrogen atom
- methyl group
- methyl
- bromine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 abstract 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 abstract 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 abstract 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 abstract 1
- 229910052794 bromium Inorganic materials 0.000 abstract 1
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 abstract 1
- 125000004432 carbon atom Chemical group C* 0.000 abstract 1
- 229910052801 chlorine Inorganic materials 0.000 abstract 1
- 239000000460 chlorine Substances 0.000 abstract 1
- 125000004093 cyano group Chemical group *C#N 0.000 abstract 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 abstract 1
- 125000005843 halogen group Chemical group 0.000 abstract 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 abstract 1
- 239000000178 monomer Substances 0.000 abstract 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C51/00—Preparation of carboxylic acids or their salts, halides or anhydrides
- C07C51/58—Preparation of carboxylic acid halides
- C07C51/60—Preparation of carboxylic acid halides by conversion of carboxylic acids or their anhydrides or esters, lactones, salts into halides with the same carboxylic acid part
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/20—Esters of polyhydric alcohols or phenols, e.g. 2-hydroxyethyl (meth)acrylate or glycerol mono-(meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/14—Esterification
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2810/00—Chemical modification of a polymer
- C08F2810/30—Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- General Chemical & Material Sciences (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1771673A JPS5637244B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1973-02-13 | 1973-02-13 | |
| US05/441,782 US3933885A (en) | 1973-02-13 | 1974-02-12 | Cinnamylideneacetic acid esters |
| US05/621,103 US4065430A (en) | 1973-02-13 | 1975-10-09 | Functional group containing polymer and method of preparing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1771673A JPS5637244B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1973-02-13 | 1973-02-13 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS49107226A true JPS49107226A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1974-10-11 |
| JPS5637244B2 JPS5637244B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1981-08-29 |
Family
ID=11951461
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1771673A Expired JPS5637244B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1973-02-13 | 1973-02-13 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US3933885A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
| JP (1) | JPS5637244B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4059449A (en) * | 1976-09-30 | 1977-11-22 | Rca Corporation | Photoresist containing a thiodipropionate compound |
| JPS54135525A (en) * | 1978-04-12 | 1979-10-20 | Konishiroku Photo Ind Co Ltd | Photosensitive material |
| US4268602A (en) * | 1978-12-05 | 1981-05-19 | Toray Industries, Ltd. | Photosensitive O-quinone diazide containing composition |
| US4518473A (en) * | 1981-08-06 | 1985-05-21 | The Upjohn Company | Compositions and process |
| US4446247A (en) * | 1981-08-06 | 1984-05-01 | The Upjohn Company | Compositions and process |
| US4425208A (en) | 1981-08-06 | 1984-01-10 | The Upjohn Company | Compositions and process |
| IT1206738B (it) * | 1985-07-01 | 1989-05-03 | Eniricerche Spa | Metodo per la terminazione di polimeri viventi ottenuti per polimerizzazione anionica di monomeri dienici e/o vinilaromatici e composti adatti allo scopo. |
| JPS6210104A (ja) * | 1985-07-05 | 1987-01-19 | Nitto Boseki Co Ltd | 新規な感光性樹脂の製造方法 |
| US4696990A (en) * | 1986-03-31 | 1987-09-29 | Eastman Kodak Company | Novel photocrosslinkable liquid crystalline polymers |
| US5254473A (en) * | 1990-03-16 | 1993-10-19 | Jp Laboratories | Solid state device for monitoring integral values of time and temperature of storage of perishables |
| US5990193A (en) * | 1995-12-12 | 1999-11-23 | University Of Pittsburgh | Polymers for reversible photoinduced sol gel transitions |
| NL1002627C2 (nl) * | 1996-03-15 | 1997-09-17 | Stork Screens Bv | Fotogevoelige harssamenstelling en deze samenstelling omvattende lak. |
| NL1002628C2 (nl) * | 1996-03-15 | 1997-09-17 | Stork Screens Bv | Fotogevoelige harssamenstelling en deze samenstelling omvattende lak. |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4929683B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1970-09-16 | 1974-08-06 | ||
| US3751399A (en) * | 1971-05-24 | 1973-08-07 | Lee Pharmaceuticals | Polyacrylate resin compositions |
-
1973
- 1973-02-13 JP JP1771673A patent/JPS5637244B2/ja not_active Expired
-
1974
- 1974-02-12 US US05/441,782 patent/US3933885A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5637244B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1981-08-29 |
| US3933885A (en) | 1976-01-20 |
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