JPS4898905A - - Google Patents
Info
- Publication number
- JPS4898905A JPS4898905A JP3075472A JP3075472A JPS4898905A JP S4898905 A JPS4898905 A JP S4898905A JP 3075472 A JP3075472 A JP 3075472A JP 3075472 A JP3075472 A JP 3075472A JP S4898905 A JPS4898905 A JP S4898905A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3075472A JPS4898905A (en) | 1972-03-29 | 1972-03-29 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3075472A JPS4898905A (en) | 1972-03-29 | 1972-03-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS4898905A true JPS4898905A (en) | 1973-12-15 |
Family
ID=12312458
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3075472A Pending JPS4898905A (en) | 1972-03-29 | 1972-03-29 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS4898905A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6020093A (en) * | 1998-05-13 | 2000-02-01 | Toyo Gosei Kogyo, Ltd. | Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions |
US6140007A (en) * | 1997-04-30 | 2000-10-31 | Toyo Gosei Kogyo Co., Ltd. | Photosensitive compositions and pattern formation method |
US6342330B2 (en) | 1998-09-24 | 2002-01-29 | Toyo Gosei Kogyo Co., Ltd. | Photosensitive compositions and pattern formation method |
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1972
- 1972-03-29 JP JP3075472A patent/JPS4898905A/ja active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6140007A (en) * | 1997-04-30 | 2000-10-31 | Toyo Gosei Kogyo Co., Ltd. | Photosensitive compositions and pattern formation method |
US6020093A (en) * | 1998-05-13 | 2000-02-01 | Toyo Gosei Kogyo, Ltd. | Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions |
US6342330B2 (en) | 1998-09-24 | 2002-01-29 | Toyo Gosei Kogyo Co., Ltd. | Photosensitive compositions and pattern formation method |