JPS4898905A - - Google Patents

Info

Publication number
JPS4898905A
JPS4898905A JP3075472A JP3075472A JPS4898905A JP S4898905 A JPS4898905 A JP S4898905A JP 3075472 A JP3075472 A JP 3075472A JP 3075472 A JP3075472 A JP 3075472A JP S4898905 A JPS4898905 A JP S4898905A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3075472A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP3075472A priority Critical patent/JPS4898905A/ja
Publication of JPS4898905A publication Critical patent/JPS4898905A/ja
Pending legal-status Critical Current

Links

JP3075472A 1972-03-29 1972-03-29 Pending JPS4898905A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3075472A JPS4898905A (en) 1972-03-29 1972-03-29

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3075472A JPS4898905A (en) 1972-03-29 1972-03-29

Publications (1)

Publication Number Publication Date
JPS4898905A true JPS4898905A (en) 1973-12-15

Family

ID=12312458

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3075472A Pending JPS4898905A (en) 1972-03-29 1972-03-29

Country Status (1)

Country Link
JP (1) JPS4898905A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6020093A (en) * 1998-05-13 2000-02-01 Toyo Gosei Kogyo, Ltd. Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions
US6140007A (en) * 1997-04-30 2000-10-31 Toyo Gosei Kogyo Co., Ltd. Photosensitive compositions and pattern formation method
US6342330B2 (en) 1998-09-24 2002-01-29 Toyo Gosei Kogyo Co., Ltd. Photosensitive compositions and pattern formation method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6140007A (en) * 1997-04-30 2000-10-31 Toyo Gosei Kogyo Co., Ltd. Photosensitive compositions and pattern formation method
US6020093A (en) * 1998-05-13 2000-02-01 Toyo Gosei Kogyo, Ltd. Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions
US6342330B2 (en) 1998-09-24 2002-01-29 Toyo Gosei Kogyo Co., Ltd. Photosensitive compositions and pattern formation method

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