JPS4897602A - - Google Patents
Info
- Publication number
- JPS4897602A JPS4897602A JP2894172A JP2894172A JPS4897602A JP S4897602 A JPS4897602 A JP S4897602A JP 2894172 A JP2894172 A JP 2894172A JP 2894172 A JP2894172 A JP 2894172A JP S4897602 A JPS4897602 A JP S4897602A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2894172A JPS4897602A (ja) | 1972-03-24 | 1972-03-24 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2894172A JPS4897602A (ja) | 1972-03-24 | 1972-03-24 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS4897602A true JPS4897602A (ja) | 1973-12-12 |
Family
ID=12262418
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2894172A Pending JPS4897602A (ja) | 1972-03-24 | 1972-03-24 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS4897602A (ja) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6020093A (en) * | 1998-05-13 | 2000-02-01 | Toyo Gosei Kogyo, Ltd. | Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions |
| US6140007A (en) * | 1997-04-30 | 2000-10-31 | Toyo Gosei Kogyo Co., Ltd. | Photosensitive compositions and pattern formation method |
| US6342330B2 (en) | 1998-09-24 | 2002-01-29 | Toyo Gosei Kogyo Co., Ltd. | Photosensitive compositions and pattern formation method |
-
1972
- 1972-03-24 JP JP2894172A patent/JPS4897602A/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6140007A (en) * | 1997-04-30 | 2000-10-31 | Toyo Gosei Kogyo Co., Ltd. | Photosensitive compositions and pattern formation method |
| US6020093A (en) * | 1998-05-13 | 2000-02-01 | Toyo Gosei Kogyo, Ltd. | Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions |
| US6342330B2 (en) | 1998-09-24 | 2002-01-29 | Toyo Gosei Kogyo Co., Ltd. | Photosensitive compositions and pattern formation method |