JPS4890739A - - Google Patents

Info

Publication number
JPS4890739A
JPS4890739A JP47023342A JP2334272A JPS4890739A JP S4890739 A JPS4890739 A JP S4890739A JP 47023342 A JP47023342 A JP 47023342A JP 2334272 A JP2334272 A JP 2334272A JP S4890739 A JPS4890739 A JP S4890739A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP47023342A
Other languages
Japanese (ja)
Other versions
JPS5218023B2 (enExample
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP47023342A priority Critical patent/JPS5218023B2/ja
Publication of JPS4890739A publication Critical patent/JPS4890739A/ja
Publication of JPS5218023B2 publication Critical patent/JPS5218023B2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP47023342A 1972-03-07 1972-03-07 Expired JPS5218023B2 (enExample)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP47023342A JPS5218023B2 (enExample) 1972-03-07 1972-03-07

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP47023342A JPS5218023B2 (enExample) 1972-03-07 1972-03-07

Publications (2)

Publication Number Publication Date
JPS4890739A true JPS4890739A (enExample) 1973-11-27
JPS5218023B2 JPS5218023B2 (enExample) 1977-05-19

Family

ID=12107905

Family Applications (1)

Application Number Title Priority Date Filing Date
JP47023342A Expired JPS5218023B2 (enExample) 1972-03-07 1972-03-07

Country Status (1)

Country Link
JP (1) JPS5218023B2 (enExample)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50117901U (enExample) * 1974-03-08 1975-09-26
JPS50129202U (enExample) * 1974-04-05 1975-10-23
JPS50134771A (enExample) * 1974-04-03 1975-10-25
JPS51129302A (en) * 1975-04-30 1976-11-10 Fuji Photo Film Co Ltd Photoosensitive material printing form
JPS54143231A (en) * 1978-04-28 1979-11-08 Hitachi Chemical Co Ltd Method of fabricating photoresist image
JPS5887147U (ja) * 1981-12-08 1983-06-13 日本コロムビア株式会社 フオトレジストマスタ−盤
JPS61189640A (ja) * 1985-02-18 1986-08-23 エヌ・ベー・フイリツプス・フルーイランペンフアブリケン 半導体装置の製造方法
JPS62266541A (ja) * 1986-04-29 1987-11-19 フィリップス エレクトロニクス ネムローゼ フェンノートシャップ 半導体デバイスの製造方法
JP2014074787A (ja) * 2012-10-04 2014-04-24 Sumitomo Chemical Co Ltd 保護膜の製造方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58148777U (ja) * 1982-03-30 1983-10-06 株式会社サンペツクス カ−トリツジにおけるテ−プの逆回転防止構造

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50117901U (enExample) * 1974-03-08 1975-09-26
JPS50134771A (enExample) * 1974-04-03 1975-10-25
JPS50129202U (enExample) * 1974-04-05 1975-10-23
JPS51129302A (en) * 1975-04-30 1976-11-10 Fuji Photo Film Co Ltd Photoosensitive material printing form
JPS54143231A (en) * 1978-04-28 1979-11-08 Hitachi Chemical Co Ltd Method of fabricating photoresist image
JPS5887147U (ja) * 1981-12-08 1983-06-13 日本コロムビア株式会社 フオトレジストマスタ−盤
JPS61189640A (ja) * 1985-02-18 1986-08-23 エヌ・ベー・フイリツプス・フルーイランペンフアブリケン 半導体装置の製造方法
JPS62266541A (ja) * 1986-04-29 1987-11-19 フィリップス エレクトロニクス ネムローゼ フェンノートシャップ 半導体デバイスの製造方法
JP2014074787A (ja) * 2012-10-04 2014-04-24 Sumitomo Chemical Co Ltd 保護膜の製造方法

Also Published As

Publication number Publication date
JPS5218023B2 (enExample) 1977-05-19

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