JPS4890738A - - Google Patents

Info

Publication number
JPS4890738A
JPS4890738A JP47022252A JP2225272A JPS4890738A JP S4890738 A JPS4890738 A JP S4890738A JP 47022252 A JP47022252 A JP 47022252A JP 2225272 A JP2225272 A JP 2225272A JP S4890738 A JPS4890738 A JP S4890738A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP47022252A
Other languages
Japanese (ja)
Other versions
JPS5228370B2 (enrdf_load_html_response
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP47022252A priority Critical patent/JPS5228370B2/ja
Priority to GB903473A priority patent/GB1418169A/en
Priority to DE19732309062 priority patent/DE2309062C3/de
Publication of JPS4890738A publication Critical patent/JPS4890738A/ja
Priority to US05/594,870 priority patent/US4035189A/en
Publication of JPS5228370B2 publication Critical patent/JPS5228370B2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
JP47022252A 1972-02-25 1972-03-06 Expired JPS5228370B2 (enrdf_load_html_response)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP47022252A JPS5228370B2 (enrdf_load_html_response) 1972-03-06 1972-03-06
GB903473A GB1418169A (en) 1972-02-25 1973-02-23 Resist image formation process and resin compositions and materials for use in said process
DE19732309062 DE2309062C3 (de) 1972-02-25 1973-02-23 Verfahren zur Herstellung von Reliefbildern und dafür brauchbare Gemische und Aufzeichnungsmaterialien
US05/594,870 US4035189A (en) 1972-02-25 1975-07-10 Image forming curable resin compositions

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP47022252A JPS5228370B2 (enrdf_load_html_response) 1972-03-06 1972-03-06

Publications (2)

Publication Number Publication Date
JPS4890738A true JPS4890738A (enrdf_load_html_response) 1973-11-27
JPS5228370B2 JPS5228370B2 (enrdf_load_html_response) 1977-07-26

Family

ID=12077582

Family Applications (1)

Application Number Title Priority Date Filing Date
JP47022252A Expired JPS5228370B2 (enrdf_load_html_response) 1972-02-25 1972-03-06

Country Status (1)

Country Link
JP (1) JPS5228370B2 (enrdf_load_html_response)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61208050A (ja) * 1985-03-12 1986-09-16 Daicel Chem Ind Ltd 導電性フイルムのパタ−ン形成法
JPH02262150A (ja) * 1989-03-31 1990-10-24 Toshiba Corp パターン形成方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3469982A (en) * 1968-09-11 1969-09-30 Jack Richard Celeste Process for making photoresists
US3622334A (en) * 1969-12-31 1971-11-23 Du Pont Photopolymerizable compositions and elements containing heterocyclic nitrogen-containing compounds
JPS4887904A (enrdf_load_html_response) * 1972-02-03 1973-11-19

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3469982A (en) * 1968-09-11 1969-09-30 Jack Richard Celeste Process for making photoresists
US3622334A (en) * 1969-12-31 1971-11-23 Du Pont Photopolymerizable compositions and elements containing heterocyclic nitrogen-containing compounds
JPS4887904A (enrdf_load_html_response) * 1972-02-03 1973-11-19

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61208050A (ja) * 1985-03-12 1986-09-16 Daicel Chem Ind Ltd 導電性フイルムのパタ−ン形成法
JPH02262150A (ja) * 1989-03-31 1990-10-24 Toshiba Corp パターン形成方法

Also Published As

Publication number Publication date
JPS5228370B2 (enrdf_load_html_response) 1977-07-26

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