JPS4890738A - - Google Patents
Info
- Publication number
- JPS4890738A JPS4890738A JP47022252A JP2225272A JPS4890738A JP S4890738 A JPS4890738 A JP S4890738A JP 47022252 A JP47022252 A JP 47022252A JP 2225272 A JP2225272 A JP 2225272A JP S4890738 A JPS4890738 A JP S4890738A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP47022252A JPS5228370B2 (cg-RX-API-DMAC10.html) | 1972-03-06 | 1972-03-06 | |
| DE19732309062 DE2309062C3 (de) | 1972-02-25 | 1973-02-23 | Verfahren zur Herstellung von Reliefbildern und dafür brauchbare Gemische und Aufzeichnungsmaterialien |
| GB903473A GB1418169A (en) | 1972-02-25 | 1973-02-23 | Resist image formation process and resin compositions and materials for use in said process |
| US05/594,870 US4035189A (en) | 1972-02-25 | 1975-07-10 | Image forming curable resin compositions |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP47022252A JPS5228370B2 (cg-RX-API-DMAC10.html) | 1972-03-06 | 1972-03-06 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4890738A true JPS4890738A (cg-RX-API-DMAC10.html) | 1973-11-27 |
| JPS5228370B2 JPS5228370B2 (cg-RX-API-DMAC10.html) | 1977-07-26 |
Family
ID=12077582
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP47022252A Expired JPS5228370B2 (cg-RX-API-DMAC10.html) | 1972-02-25 | 1972-03-06 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5228370B2 (cg-RX-API-DMAC10.html) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61208050A (ja) * | 1985-03-12 | 1986-09-16 | Daicel Chem Ind Ltd | 導電性フイルムのパタ−ン形成法 |
| JPH02262150A (ja) * | 1989-03-31 | 1990-10-24 | Toshiba Corp | パターン形成方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3469982A (en) * | 1968-09-11 | 1969-09-30 | Jack Richard Celeste | Process for making photoresists |
| US3622334A (en) * | 1969-12-31 | 1971-11-23 | Du Pont | Photopolymerizable compositions and elements containing heterocyclic nitrogen-containing compounds |
| JPS4887904A (cg-RX-API-DMAC10.html) * | 1972-02-03 | 1973-11-19 |
-
1972
- 1972-03-06 JP JP47022252A patent/JPS5228370B2/ja not_active Expired
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3469982A (en) * | 1968-09-11 | 1969-09-30 | Jack Richard Celeste | Process for making photoresists |
| US3622334A (en) * | 1969-12-31 | 1971-11-23 | Du Pont | Photopolymerizable compositions and elements containing heterocyclic nitrogen-containing compounds |
| JPS4887904A (cg-RX-API-DMAC10.html) * | 1972-02-03 | 1973-11-19 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61208050A (ja) * | 1985-03-12 | 1986-09-16 | Daicel Chem Ind Ltd | 導電性フイルムのパタ−ン形成法 |
| JPH02262150A (ja) * | 1989-03-31 | 1990-10-24 | Toshiba Corp | パターン形成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5228370B2 (cg-RX-API-DMAC10.html) | 1977-07-26 |