JPS4889290A - - Google Patents
Info
- Publication number
- JPS4889290A JPS4889290A JP1605773A JP1605773A JPS4889290A JP S4889290 A JPS4889290 A JP S4889290A JP 1605773 A JP1605773 A JP 1605773A JP 1605773 A JP1605773 A JP 1605773A JP S4889290 A JPS4889290 A JP S4889290A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US22492972A | 1972-02-09 | 1972-02-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS4889290A true JPS4889290A (en) | 1973-11-21 |
Family
ID=22842819
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1605773A Pending JPS4889290A (en) | 1972-02-09 | 1973-02-08 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPS4889290A (en) |
| DE (1) | DE2306531A1 (en) |
| FR (1) | FR2171326A1 (en) |
| IT (1) | IT977259B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6372710A (en) * | 1986-09-12 | 1988-04-02 | Ube Ind Ltd | Photocurable composition |
| JPH01219736A (en) * | 1988-02-26 | 1989-09-01 | Ueno Kagaku Kogyo Kk | Photosensitive resin composition |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5971048A (en) * | 1982-10-18 | 1984-04-21 | Mitsubishi Chem Ind Ltd | Photopolymerizable photosensitive composition |
| DE3512560C1 (en) * | 1985-04-06 | 1986-07-10 | Dynamit Nobel Ag, 5210 Troisdorf | Water-soluble, quaternary ammonium or pyridinium groups and alkoxysilyl-bearing polymers, processes for their preparation and their use |
| US5910395A (en) * | 1995-04-27 | 1999-06-08 | Minnesota Mining And Manufacturing Company | Negative-acting no-process printing plates |
| JPH11504435A (en) * | 1995-04-27 | 1999-04-20 | ミネソタ・マイニング・アンド・マニュファクチャリング・カンパニー | Negative processing unnecessary printing plate |
| US5646215A (en) * | 1996-10-31 | 1997-07-08 | Dow Corning Corporation | Polybutylene containing reactive unsaturated functionality |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3448089A (en) * | 1966-03-14 | 1969-06-03 | Du Pont | Photopolymerizable polymers containing free acid or acid anhydride groups reacted with glycidyl acrylate or glycidyl methacrylate |
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1973
- 1973-02-08 JP JP1605773A patent/JPS4889290A/ja active Pending
- 1973-02-08 IT IT4813773A patent/IT977259B/en active
- 1973-02-08 FR FR7304543A patent/FR2171326A1/en active Granted
- 1973-02-08 DE DE19732306531 patent/DE2306531A1/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6372710A (en) * | 1986-09-12 | 1988-04-02 | Ube Ind Ltd | Photocurable composition |
| JPH01219736A (en) * | 1988-02-26 | 1989-09-01 | Ueno Kagaku Kogyo Kk | Photosensitive resin composition |
Also Published As
| Publication number | Publication date |
|---|---|
| IT977259B (en) | 1974-09-10 |
| DE2306531A1 (en) | 1973-08-30 |
| FR2171326B1 (en) | 1976-06-11 |
| FR2171326A1 (en) | 1973-09-21 |