JPS4831026A - - Google Patents
Info
- Publication number
- JPS4831026A JPS4831026A JP6533371A JP6533371A JPS4831026A JP S4831026 A JPS4831026 A JP S4831026A JP 6533371 A JP6533371 A JP 6533371A JP 6533371 A JP6533371 A JP 6533371A JP S4831026 A JPS4831026 A JP S4831026A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
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- Digital Computer Display Output (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6533371A JPS5215185B2 (ja�@�@) | 1971-08-25 | 1971-08-25 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6533371A JPS5215185B2 (ja�@�@) | 1971-08-25 | 1971-08-25 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4831026A true JPS4831026A (ja�@�@) | 1973-04-24 |
| JPS5215185B2 JPS5215185B2 (ja�@�@) | 1977-04-27 |
Family
ID=13283873
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6533371A Expired JPS5215185B2 (ja�@�@) | 1971-08-25 | 1971-08-25 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5215185B2 (ja�@�@) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5576059A (en) * | 1978-11-27 | 1980-06-07 | Rca Corp | Production of polishing material layer |
| US4283439A (en) * | 1977-12-23 | 1981-08-11 | Vlsi Technology Research Association | Method of manufacturing a semiconductor device by forming a tungsten silicide or molybdenum silicide electrode |
-
1971
- 1971-08-25 JP JP6533371A patent/JPS5215185B2/ja not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4283439A (en) * | 1977-12-23 | 1981-08-11 | Vlsi Technology Research Association | Method of manufacturing a semiconductor device by forming a tungsten silicide or molybdenum silicide electrode |
| JPS5576059A (en) * | 1978-11-27 | 1980-06-07 | Rca Corp | Production of polishing material layer |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5215185B2 (ja�@�@) | 1977-04-27 |