JPS4810368B1 - - Google Patents

Info

Publication number
JPS4810368B1
JPS4810368B1 JP43084170A JP8417068A JPS4810368B1 JP S4810368 B1 JPS4810368 B1 JP S4810368B1 JP 43084170 A JP43084170 A JP 43084170A JP 8417068 A JP8417068 A JP 8417068A JP S4810368 B1 JPS4810368 B1 JP S4810368B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP43084170A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP43084170A priority Critical patent/JPS4810368B1/ja
Priority to US875912A priority patent/US3617347A/en
Publication of JPS4810368B1 publication Critical patent/JPS4810368B1/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1436—Composite particles, e.g. coated particles
    • C09K3/1445—Composite particles, e.g. coated particles the coating consisting exclusively of metals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Composite Materials (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
JP43084170A 1968-11-19 1968-11-19 Pending JPS4810368B1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP43084170A JPS4810368B1 (ja) 1968-11-19 1968-11-19
US875912A US3617347A (en) 1968-11-19 1969-11-12 Process for the production of a silicon-coated diamond power

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP43084170A JPS4810368B1 (ja) 1968-11-19 1968-11-19

Publications (1)

Publication Number Publication Date
JPS4810368B1 true JPS4810368B1 (ja) 1973-04-03

Family

ID=13823005

Family Applications (1)

Application Number Title Priority Date Filing Date
JP43084170A Pending JPS4810368B1 (ja) 1968-11-19 1968-11-19

Country Status (2)

Country Link
US (1) US3617347A (ja)
JP (1) JPS4810368B1 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60195897A (ja) * 1984-03-19 1985-10-04 Hitachi Medical Corp Ｘ線制御装置
JP2008532912A (ja) * 2005-03-14 2008-08-21 エボニック デグサ ゲーエムベーハー 被覆された炭素粒子の製造法およびリチウムイオン電池のためのアノード材料における該炭素粒子の使用
JP2012017225A (ja) * 2010-07-08 2012-01-26 Vision Development Co Ltd ケイ素及び／又はフッ素を有するダイヤモンド微粒子

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ZA714053B (en) * 1970-07-07 1972-02-23 Int Nickel Ltd Production of nickel and apparatus therefor
US3997689A (en) * 1975-07-17 1976-12-14 Uop Inc. Preparation of semiconducting pyropolymeric inorganic refractory oxide materials
US4173614A (en) * 1977-10-21 1979-11-06 General Electric Company Process for preparing a polycrystalline diamond body/silicon nitride substrate composite
US4171339A (en) * 1977-10-21 1979-10-16 General Electric Company Process for preparing a polycrystalline diamond body/silicon carbide substrate composite
US4151686A (en) * 1978-01-09 1979-05-01 General Electric Company Silicon carbide and silicon bonded polycrystalline diamond body and method of making it
US4242982A (en) * 1978-05-25 1981-01-06 International Standard Electric Corporation Apparatus for metal coating of powders
DE3021037C2 (de) * 1980-06-03 1982-06-16 Kernforschungsanlage Jülich GmbH, 5170 Jülich Vorrichtung und Verfahren zum Entladen eines Wirbelschichtofens für die Beschichtung von Hochtemperaturreaktor (HTR)-Brennstoffen
US4606738A (en) * 1981-04-01 1986-08-19 General Electric Company Randomly-oriented polycrystalline silicon carbide coatings for abrasive grains
US5015528A (en) * 1987-03-30 1991-05-14 Crystallume Fluidized bed diamond particle growth
US5164220A (en) * 1990-10-29 1992-11-17 Diamond Technologies Company Method for treating diamonds to produce bondable diamonds for depositing same on a substrate
GB2272703B (en) * 1992-11-20 1996-11-06 Suisse Electronique Microtech Abrasive tool having film-covered CBN grits bonded by brazing to a substrate
US5526768A (en) * 1994-02-03 1996-06-18 Harris Corporation Method for providing a silicon and diamond substrate having a carbon to silicon transition layer and apparatus thereof
US5624303A (en) * 1996-01-22 1997-04-29 Micron Technology, Inc. Polishing pad and a method for making a polishing pad with covalently bonded particles
US5938801A (en) * 1997-02-12 1999-08-17 Micron Technology, Inc. Polishing pad and a method for making a polishing pad with covalently bonded particles
US6062958A (en) 1997-04-04 2000-05-16 Micron Technology, Inc. Variable abrasive polishing pad for mechanical and chemical-mechanical planarization
US7279023B2 (en) 2003-10-02 2007-10-09 Materials And Electrochemical Research (Mer) Corporation High thermal conductivity metal matrix composites
US8110288B2 (en) * 2007-07-11 2012-02-07 Nissei Plastic Industrial Co., Ltd. Carbon nanocomposite material comprising a SiC film coating, and method of manufacturing the same
US10669635B2 (en) 2014-09-18 2020-06-02 Baker Hughes, A Ge Company, Llc Methods of coating substrates with composite coatings of diamond nanoparticles and metal
US9873827B2 (en) 2014-10-21 2018-01-23 Baker Hughes Incorporated Methods of recovering hydrocarbons using suspensions for enhanced hydrocarbon recovery
US10167392B2 (en) 2014-10-31 2019-01-01 Baker Hughes Incorporated Compositions of coated diamond nanoparticles, methods of forming coated diamond nanoparticles, and methods of forming coatings
US10155899B2 (en) 2015-06-19 2018-12-18 Baker Hughes Incorporated Methods of forming suspensions and methods for recovery of hydrocarbon material from subterranean formations
CN108503362B (zh) * 2018-05-25 2020-10-13 黑龙江省广盛达新材料科技有限公司 一种纳米石墨基研磨材料的制备方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2925375A (en) * 1956-11-26 1960-02-16 Union Oil Co Hydrocarbon refining and conversion process including removal of organic nitrogen compounds with azeolite
US3520667A (en) * 1967-08-15 1970-07-14 Carborundum Co Silicon carbide coated diamond abrasive grains

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60195897A (ja) * 1984-03-19 1985-10-04 Hitachi Medical Corp Ｘ線制御装置
JP2008532912A (ja) * 2005-03-14 2008-08-21 エボニック デグサ ゲーエムベーハー 被覆された炭素粒子の製造法およびリチウムイオン電池のためのアノード材料における該炭素粒子の使用
JP2012017225A (ja) * 2010-07-08 2012-01-26 Vision Development Co Ltd ケイ素及び／又はフッ素を有するダイヤモンド微粒子

Also Published As

Publication number Publication date
US3617347A (en) 1971-11-02

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