JPS48100117A - - Google Patents

Info

Publication number
JPS48100117A
JPS48100117A JP48007995A JP799573A JPS48100117A JP S48100117 A JPS48100117 A JP S48100117A JP 48007995 A JP48007995 A JP 48007995A JP 799573 A JP799573 A JP 799573A JP S48100117 A JPS48100117 A JP S48100117A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP48007995A
Other languages
Japanese (ja)
Other versions
JPS5549295B2 (https=
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS48100117A publication Critical patent/JPS48100117A/ja
Publication of JPS5549295B2 publication Critical patent/JPS5549295B2/ja
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C247/00Compounds containing azido groups
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/008Azides
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/12Nitrogen compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
JP799573A 1972-02-28 1973-01-19 Expired JPS5549295B2 (https=)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US23003372A 1972-02-28 1972-02-28

Publications (2)

Publication Number Publication Date
JPS48100117A true JPS48100117A (https=) 1973-12-18
JPS5549295B2 JPS5549295B2 (https=) 1980-12-11

Family

ID=22863690

Family Applications (1)

Application Number Title Priority Date Filing Date
JP799573A Expired JPS5549295B2 (https=) 1972-02-28 1973-01-19

Country Status (5)

Country Link
US (1) US3749713A (https=)
JP (1) JPS5549295B2 (https=)
DE (1) DE2308580A1 (https=)
FR (1) FR2173998B1 (https=)
GB (1) GB1405323A (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5988450A (ja) * 1982-11-12 1984-05-22 Hitachi Ltd ビスアジド系光架橋剤の製造方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4197133A (en) * 1977-10-14 1980-04-08 Ciba-Geigy Corporation Photo-curable compositions of matter containing bis-azidophthalimidyl derivatives
DE2919840A1 (de) * 1979-05-16 1980-11-20 Siemens Ag Verfahren zur phototechnischen herstellung von reliefstrukturen
DE2951101A1 (de) * 1979-12-19 1981-06-25 Merck Patent Gmbh, 6100 Darmstadt Verfahren zur herstellung von azidobenzalverbindungen
JPS59222833A (ja) * 1983-06-01 1984-12-14 Hitachi Chem Co Ltd 感光性組成物
JPS62165592U (https=) * 1986-04-10 1987-10-21
EP1348690A1 (en) * 2002-03-29 2003-10-01 Toyo Gosei Kogyo Co., Ltd. Cinnamaldehyde compound having an azido group

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5988450A (ja) * 1982-11-12 1984-05-22 Hitachi Ltd ビスアジド系光架橋剤の製造方法

Also Published As

Publication number Publication date
JPS5549295B2 (https=) 1980-12-11
FR2173998A1 (https=) 1973-10-12
DE2308580A1 (de) 1973-09-13
US3749713A (en) 1973-07-31
GB1405323A (en) 1975-09-10
FR2173998B1 (https=) 1976-04-30

Similar Documents

Publication Publication Date Title
JPS5615949B2 (https=)
FR2173998B1 (https=)
JPS4924333A (https=)
JPS4919096A (https=)
JPS5434346B2 (https=)
JPS4921825A (https=)
JPS4988697A (https=)
JPS5112343Y2 (https=)
JPS4916425A (https=)
JPS4891796A (https=)
JPS505065A (https=)
JPS4897312U (https=)
JPS4991711U (https=)
JPS48100287U (https=)
CH566557A5 (https=)
CH565560A5 (https=)
CH562000A5 (https=)
CH565276A (https=)
CH567151A5 (https=)
CH566949A5 (https=)
CH566910A5 (https=)
CH561994A5 (https=)
CH564714A5 (https=)
CH561826A5 (https=)
CH566534A5 (https=)