JPS4751896B1 - - Google Patents

Info

Publication number
JPS4751896B1
JPS4751896B1 JP1315169A JP1315169A JPS4751896B1 JP S4751896 B1 JPS4751896 B1 JP S4751896B1 JP 1315169 A JP1315169 A JP 1315169A JP 1315169 A JP1315169 A JP 1315169A JP S4751896 B1 JPS4751896 B1 JP S4751896B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1315169A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4751896B1 publication Critical patent/JPS4751896B1/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D257/00—Heterocyclic compounds containing rings having four nitrogen atoms as the only ring hetero atoms
    • C07D257/02—Heterocyclic compounds containing rings having four nitrogen atoms as the only ring hetero atoms not condensed with other rings
    • C07D257/04—Five-membered rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
    • C07D233/54—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members
    • C07D233/66—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D233/84—Sulfur atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D235/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings
    • C07D235/02—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings condensed with carbocyclic rings or ring systems
    • C07D235/04—Benzimidazoles; Hydrogenated benzimidazoles
    • C07D235/20—Two benzimidazolyl-2 radicals linked together directly or via a hydrocarbon or substituted hydrocarbon radical
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D235/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings
    • C07D235/02—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings condensed with carbocyclic rings or ring systems
    • C07D235/04—Benzimidazoles; Hydrogenated benzimidazoles
    • C07D235/24—Benzimidazoles; Hydrogenated benzimidazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 2
    • C07D235/28—Sulfur atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
    • C07D249/02—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms not condensed with other rings
    • C07D249/08—1,2,4-Triazoles; Hydrogenated 1,2,4-triazoles
    • C07D249/10—1,2,4-Triazoles; Hydrogenated 1,2,4-triazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D249/12—Oxygen or sulfur atoms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
    • G03C1/34—Fog-inhibitors; Stabilisers; Agents inhibiting latent image regression

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Plural Heterocyclic Compounds (AREA)
JP1315169A 1968-02-22 1969-02-20 Pending JPS4751896B1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB865368A GB1239017A (en) 1968-02-22 1968-02-22

Publications (1)

Publication Number Publication Date
JPS4751896B1 true JPS4751896B1 (en) 1972-12-27

Family

ID=9856631

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1315169A Pending JPS4751896B1 (en) 1968-02-22 1969-02-20

Country Status (5)

Country Link
JP (1) JPS4751896B1 (en)
BE (1) BE728728A (en)
DE (1) DE1906952C2 (en)
FR (1) FR2002373A1 (en)
GB (1) GB1239017A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013166911A (en) * 2012-02-15 2013-08-29 Samsung Electro-Mechanics Co Ltd Alkylsulfonated tetrazole compound, method for producing the same, epoxy resin containing the same, and substrate manufactured therefrom
JP2014129529A (en) * 2012-12-28 2014-07-10 Samsung Electro-Mechanics Co Ltd Silica surface modified by alkyl sulfonated tetrazole compound, its manufacturing method and resin composition containing the same
JP2015036417A (en) * 2013-08-13 2015-02-23 サムソン エレクトロ−メカニックス カンパニーリミテッド． Resin composition, printed circuit board using the same, and method for producing the same
JP2015036419A (en) * 2013-08-13 2015-02-23 サムソン エレクトロ−メカニックス カンパニーリミテッド． Resin composition, printed circuit board using the composition, and method of manufacturing the same

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3216843C2 (en) * 1982-05-05 1986-10-23 Ludwig Heumann & Co GmbH, 8500 Nürnberg 3-Thiomethyl-pyridine derivatives, processes for their preparation and pharmaceuticals containing these compounds
EP0218753B1 (en) * 1985-10-10 1989-08-09 Agfa-Gevaert N.V. Image-recieving element for the silver salt diffusion transfer reversal process
JPH0833642B2 (en) * 1986-10-24 1996-03-29 富士写真フイルム株式会社 Development processing method of silver halide photographic light-sensitive material
DE69327217T2 (en) * 1992-10-01 2000-05-18 Sterling Diagnostic Imaging Silver halide emulsions stabilized with improved antifoggants

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE498286A (en) * 1949-09-24
BE498287A (en) * 1949-09-24
DE1177481B (en) * 1963-05-18 1964-09-03 Agfa Ag Photographic light-sensitive material having at least one sensitized halide silver emulsion layer
DE1213240B (en) * 1964-02-13 1966-03-24 Agfa Gevaert Ag Light-sensitive photographic material with at least one optically sensitized halogen silver emulsion layer containing at least one azo dye for the silver dye bleaching process

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013166911A (en) * 2012-02-15 2013-08-29 Samsung Electro-Mechanics Co Ltd Alkylsulfonated tetrazole compound, method for producing the same, epoxy resin containing the same, and substrate manufactured therefrom
JP2014129529A (en) * 2012-12-28 2014-07-10 Samsung Electro-Mechanics Co Ltd Silica surface modified by alkyl sulfonated tetrazole compound, its manufacturing method and resin composition containing the same
JP2015036417A (en) * 2013-08-13 2015-02-23 サムソン エレクトロ−メカニックス カンパニーリミテッド． Resin composition, printed circuit board using the same, and method for producing the same
JP2015036419A (en) * 2013-08-13 2015-02-23 サムソン エレクトロ−メカニックス カンパニーリミテッド． Resin composition, printed circuit board using the composition, and method of manufacturing the same

Also Published As

Publication number Publication date
GB1239017A (en) 1971-07-14
DE1906952C2 (en) 1983-04-07
DE1906952A1 (en) 1969-09-25
BE728728A (en) 1969-08-21
FR2002373A1 (en) 1969-10-17

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