JPS4710730U - - Google Patents
Info
- Publication number
- JPS4710730U JPS4710730U JP1344771U JP1344771U JPS4710730U JP S4710730 U JPS4710730 U JP S4710730U JP 1344771 U JP1344771 U JP 1344771U JP 1344771 U JP1344771 U JP 1344771U JP S4710730 U JPS4710730 U JP S4710730U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1344771U JPS4710730U (en) | 1971-03-03 | 1971-03-03 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1344771U JPS4710730U (en) | 1971-03-03 | 1971-03-03 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS4710730U true JPS4710730U (en) | 1972-10-07 |
Family
ID=27861005
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1344771U Pending JPS4710730U (en) | 1971-03-03 | 1971-03-03 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS4710730U (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55118631A (en) * | 1979-03-07 | 1980-09-11 | Fujitsu Ltd | Diffusion furnace for treatment of semiconductor wafer |
| JPS602667A (en) * | 1983-06-17 | 1985-01-08 | Kokusai Electric Co Ltd | Sublimating and supplying device of solid raw material |
| JPS6057921A (en) * | 1983-08-15 | 1985-04-03 | モトローラ・インコーポレーテツド | Device and method of controlling accumulated and diffused source |
| JPH01205517A (en) * | 1988-02-12 | 1989-08-17 | Nippon Steel Corp | Method and apparatus for vapor growth |
-
1971
- 1971-03-03 JP JP1344771U patent/JPS4710730U/ja active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55118631A (en) * | 1979-03-07 | 1980-09-11 | Fujitsu Ltd | Diffusion furnace for treatment of semiconductor wafer |
| JPS6250970B2 (en) * | 1979-03-07 | 1987-10-28 | Fujitsu Ltd | |
| JPS602667A (en) * | 1983-06-17 | 1985-01-08 | Kokusai Electric Co Ltd | Sublimating and supplying device of solid raw material |
| JPS6057921A (en) * | 1983-08-15 | 1985-04-03 | モトローラ・インコーポレーテツド | Device and method of controlling accumulated and diffused source |
| JPH01205517A (en) * | 1988-02-12 | 1989-08-17 | Nippon Steel Corp | Method and apparatus for vapor growth |