JPS46218Y1 - - Google Patents
Info
- Publication number
- JPS46218Y1 JPS46218Y1 JP11474866U JP11474866U JPS46218Y1 JP S46218 Y1 JPS46218 Y1 JP S46218Y1 JP 11474866 U JP11474866 U JP 11474866U JP 11474866 U JP11474866 U JP 11474866U JP S46218 Y1 JPS46218 Y1 JP S46218Y1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11474866U JPS46218Y1 (de) | 1966-12-17 | 1966-12-17 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11474866U JPS46218Y1 (de) | 1966-12-17 | 1966-12-17 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS46218Y1 true JPS46218Y1 (de) | 1971-01-07 |
Family
ID=42862302
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11474866U Expired JPS46218Y1 (de) | 1966-12-17 | 1966-12-17 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS46218Y1 (de) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5807657A (en) * | 1995-12-11 | 1998-09-15 | Toyo Gosei Kogyo Co., Ltd. | Polyvinyl alcohol base photosensitive resin, photosensitive composition, and method for pattern-formation using the same |
-
1966
- 1966-12-17 JP JP11474866U patent/JPS46218Y1/ja not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5807657A (en) * | 1995-12-11 | 1998-09-15 | Toyo Gosei Kogyo Co., Ltd. | Polyvinyl alcohol base photosensitive resin, photosensitive composition, and method for pattern-formation using the same |