JPS4616049Y1 - - Google Patents
Info
- Publication number
- JPS4616049Y1 JPS4616049Y1 JP5608469U JP5608469U JPS4616049Y1 JP S4616049 Y1 JPS4616049 Y1 JP S4616049Y1 JP 5608469 U JP5608469 U JP 5608469U JP 5608469 U JP5608469 U JP 5608469U JP S4616049 Y1 JPS4616049 Y1 JP S4616049Y1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5608469U JPS4616049Y1 (en) | 1969-06-13 | 1969-06-13 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5608469U JPS4616049Y1 (en) | 1969-06-13 | 1969-06-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS4616049Y1 true JPS4616049Y1 (en) | 1971-06-04 |
Family
ID=42877569
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5608469U Expired JPS4616049Y1 (en) | 1969-06-13 | 1969-06-13 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS4616049Y1 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20130012574A (en) | 2011-07-25 | 2013-02-04 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Chemically amplified positive resist composition and patterning process |
| KR20150141159A (en) | 2014-06-09 | 2015-12-17 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Chemically amplified positive resist composition and pattern forming process |
-
1969
- 1969-06-13 JP JP5608469U patent/JPS4616049Y1/ja not_active Expired
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20130012574A (en) | 2011-07-25 | 2013-02-04 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Chemically amplified positive resist composition and patterning process |
| KR20150141159A (en) | 2014-06-09 | 2015-12-17 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Chemically amplified positive resist composition and pattern forming process |
| US9519217B2 (en) | 2014-06-09 | 2016-12-13 | Shin-Etsu Chemical Co., Ltd. | Chemically amplified positive resist composition and patterning process |