JPS4329256Y1 - - Google Patents
Info
- Publication number
- JPS4329256Y1 JPS4329256Y1 JP6843065U JP6843065U JPS4329256Y1 JP S4329256 Y1 JPS4329256 Y1 JP S4329256Y1 JP 6843065 U JP6843065 U JP 6843065U JP 6843065 U JP6843065 U JP 6843065U JP S4329256 Y1 JPS4329256 Y1 JP S4329256Y1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6843065U JPS4329256Y1 (en) | 1965-08-20 | 1965-08-20 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6843065U JPS4329256Y1 (en) | 1965-08-20 | 1965-08-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS4329256Y1 true JPS4329256Y1 (en) | 1968-12-02 |
Family
ID=31801044
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6843065U Expired JPS4329256Y1 (en) | 1965-08-20 | 1965-08-20 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS4329256Y1 (en) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5516475A (en) * | 1978-07-21 | 1980-02-05 | Nec Corp | Plasma processing unit |
| JPS59114814A (en) * | 1982-12-21 | 1984-07-03 | Fujitsu Ltd | Vacuum exhausting method |
| JPS60138909A (en) * | 1983-12-27 | 1985-07-23 | Semiconductor Energy Lab Co Ltd | Manufacturing equipment of vapor phase reaction film and manufacture thereof |
| JPS60170234A (en) * | 1984-02-15 | 1985-09-03 | Semiconductor Energy Lab Co Ltd | Vapor-phase reaction apparatus and manufacture of vapor-phase reaction film |
| JPS62163241A (en) * | 1986-01-14 | 1987-07-20 | Mitsubishi Electric Corp | Gas evacuation method for cathode-ray tube |
| JPH02138731A (en) * | 1989-09-08 | 1990-05-28 | Semiconductor Energy Lab Co Ltd | Plasma vapor reactor |
| JPH03209719A (en) * | 1990-06-22 | 1991-09-12 | Semiconductor Energy Lab Co Ltd | Manufacture of vapor-phase reaction film |
| JPH05231368A (en) * | 1991-07-09 | 1993-09-07 | Ebara Corp | Operation control system for vacuum pump |
| JPH06342759A (en) * | 1991-06-07 | 1994-12-13 | Semiconductor Energy Lab Co Ltd | Filling method for reactive gas |
| JPH07307299A (en) * | 1994-12-27 | 1995-11-21 | Semiconductor Energy Lab Co Ltd | Method of chemical vapor deposition |
-
1965
- 1965-08-20 JP JP6843065U patent/JPS4329256Y1/ja not_active Expired
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5516475A (en) * | 1978-07-21 | 1980-02-05 | Nec Corp | Plasma processing unit |
| JPS59114814A (en) * | 1982-12-21 | 1984-07-03 | Fujitsu Ltd | Vacuum exhausting method |
| JPS60138909A (en) * | 1983-12-27 | 1985-07-23 | Semiconductor Energy Lab Co Ltd | Manufacturing equipment of vapor phase reaction film and manufacture thereof |
| JPS60170234A (en) * | 1984-02-15 | 1985-09-03 | Semiconductor Energy Lab Co Ltd | Vapor-phase reaction apparatus and manufacture of vapor-phase reaction film |
| JPS62163241A (en) * | 1986-01-14 | 1987-07-20 | Mitsubishi Electric Corp | Gas evacuation method for cathode-ray tube |
| JPH0523009B2 (en) * | 1986-01-14 | 1993-03-31 | Mitsubishi Electric Corp | |
| JPH02138731A (en) * | 1989-09-08 | 1990-05-28 | Semiconductor Energy Lab Co Ltd | Plasma vapor reactor |
| JPH03209719A (en) * | 1990-06-22 | 1991-09-12 | Semiconductor Energy Lab Co Ltd | Manufacture of vapor-phase reaction film |
| JPH06342759A (en) * | 1991-06-07 | 1994-12-13 | Semiconductor Energy Lab Co Ltd | Filling method for reactive gas |
| JPH05231368A (en) * | 1991-07-09 | 1993-09-07 | Ebara Corp | Operation control system for vacuum pump |
| JPH07307299A (en) * | 1994-12-27 | 1995-11-21 | Semiconductor Energy Lab Co Ltd | Method of chemical vapor deposition |