JPS314904B1 - - Google Patents
Info
- Publication number
- JPS314904B1 JPS314904B1 JP965654A JP965654A JPS314904B1 JP S314904 B1 JPS314904 B1 JP S314904B1 JP 965654 A JP965654 A JP 965654A JP 965654 A JP965654 A JP 965654A JP S314904 B1 JPS314904 B1 JP S314904B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP965654A JPS314904B1 (en) | 1954-05-12 | 1954-05-12 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP965654A JPS314904B1 (en) | 1954-05-12 | 1954-05-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS314904B1 true JPS314904B1 (en) | 1956-06-23 |
Family
ID=11726242
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP965654A Pending JPS314904B1 (en) | 1954-05-12 | 1954-05-12 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS314904B1 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003027273A (en) * | 2001-07-11 | 2003-01-29 | Tmc Kk | Method for electrolytically manufacturing cobalt |
| WO2003014421A1 (en) * | 2001-08-01 | 2003-02-20 | Nikko Materials Company, Limited | Method for producing high purity nickel, high purity nickel, sputtering target comprising the high purity nickel, and thin film formed by using said spattering target |
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1954
- 1954-05-12 JP JP965654A patent/JPS314904B1/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003027273A (en) * | 2001-07-11 | 2003-01-29 | Tmc Kk | Method for electrolytically manufacturing cobalt |
| WO2003014421A1 (en) * | 2001-08-01 | 2003-02-20 | Nikko Materials Company, Limited | Method for producing high purity nickel, high purity nickel, sputtering target comprising the high purity nickel, and thin film formed by using said spattering target |
| US7435325B2 (en) | 2001-08-01 | 2008-10-14 | Nippon Mining & Metals Co., Ltd | Method for producing high purity nickle, high purity nickle, sputtering target comprising the high purity nickel, and thin film formed by using said spattering target |