JPH1194608A - Flowmeter and substrate processing device using the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To measure the flow rate of a fluid such as a processing liquid with high accuracy. SOLUTION: The flowmeter 10 includes a pipe 12 having a fluid passage 121 therein, a float 14 placed within the fluid passage 121 in such a way as to move up and down according to the flow rate of a fluid, and a detection means 16 for detecting the position of the float 14. A first magnet 122 is placed at the top of the pipe 12 in such a way as to surround the fluid passage 121, and a second magnet 123 is placed at the bottom of the pipe 12 in such a way as to surround the fluid passage 121. A first upwardly extending rod-shaped element 124 and a second downwardly extending rod-shaped element 125 are joined with the float 14, the first rod-shaped element 124 being fitted with a third magnet 126 holding the first rod-shaped element 14 at the position of the axis of the fluid passage 121 by means of magnetic forces working against each other between the first and third magnets 122, 126, the second rod-shaped element 125 being fitted with a fourth magnet 127 holding the second rod-shaped element 125 at the position of the axis of the fluid passage 121 by means of magnetic forces working against each other between the second and fourth magnets 123, 127.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

[0001] 1. Field of the Invention [0002] The present invention relates to a flow meter for measuring a flow rate of a fluid, and a substrate processing apparatus for processing a surface of a substrate such as a semiconductor wafer to which the flow meter is applied.

[0002]

2. Description of the Related Art Conventionally, in a substrate processing apparatus or the like for performing a predetermined process on a surface of a substrate such as a semiconductor wafer housed in a processing tank, a flow meter is used to measure a flow rate of a fluid such as a processing liquid. Have been. This flow meter is, for example, as shown in FIG.
A float 203 made of a magnetic material that moves up and down according to the flow rate of the fluid is provided therein, and a primary coil 204 and a secondary coil 2 constituting a differential transformer are provided around the outer periphery of the tube 201.
05 and 206 are provided.
The flow meter thus configured detects the position of the float 203, which changes according to the flow rate of the fluid, based on the value of the AC voltage induced in the secondary coils 205, 206 according to the position, thereby detecting the flow rate. It is designed to measure.

[0003]

In the flow meter configured as described above, minute vibrations in the horizontal direction and vertical direction are generated in the float 203 due to Karman vortices and the like generated on the back surface on the downstream side of the float 203. As shown in FIG. 10, the noise generated by the vibration is superimposed and the output waveforms from the secondary coils 205 and 206 are disturbed. Such a disturbance of the output waveform has not been a particularly significant problem in the past.

However, in the technical field such as a semiconductor wafer substrate processing apparatus in recent years, it has become necessary to measure the flow rate of the processing liquid with high accuracy. The flow meter cannot measure the flow rate of the processing liquid with high accuracy.

Accordingly, an object of the present invention is to provide a flow meter capable of measuring a flow rate of a fluid such as a processing liquid with high accuracy, and a substrate processing apparatus to which the flow meter is applied.

[0006]

To achieve the above object, a float meter according to a first aspect of the present invention includes a tube having a fluid passage through which a fluid passes upward and a fluid passage corresponding to a flow rate of the fluid. A float having a first rod extending upward and a second rod extending downward, which is disposed in the fluid passage so as to move up and down, and is disposed so as to surround the fluid passage at an upper portion of the tube. A first magnet body, a second magnet body disposed so as to surround a fluid passage below the tube, and a first magnet body disposed on the first rod-shaped body. A third magnet body holding the first rod body at an axial position of the fluid passage by a magnetic force acting between the third magnet body and the second magnet body disposed on the second rod body. The second rod-shaped body is axially positioned in the fluid passage by the magnetic force acting between the rods. It is characterized with the fourth magnet body that holds, further comprising a detecting means for detecting a position of the float.

[0007] According to the above configuration, at the upper part of the tube, the first and third magnets are balanced by the magnetic force acting on each other, and the first rod-like body is connected to the fluid passage. While being held at the axial position, the lower part of the tube is balanced by the magnetic force acting between the second and fourth magnet bodies, and the second rod-shaped body is positioned at the axis of the fluid passage. It will be held in the center position. As a result, the float moves up and down in the fluid passage in accordance with the flow rate of the fluid while being held at the axial position of the fluid passage. Therefore, the vibration of the float due to the Karman vortex or the like is suppressed, and the disturbance of the output waveform from the detection unit is suppressed.

According to a second aspect of the present invention, there is provided a flow meter according to the first aspect, wherein each of the first to fourth magnet bodies comprises a plurality of magnet pieces, respectively, while the first magnet Each of the magnet pieces constituting the body is disposed so that the same magnetic pole faces the third magnet body side, and each of the magnetic pole pieces constituting the second magnet body has the same magnetic pole. The magnet pieces that are arranged so as to face the fourth magnet body side and that constitute the third magnet body are arranged so that the same magnetic poles are arranged so as to face the first magnet body side, respectively. Each of the magnet pieces constituting the magnet body of No. 4 is characterized in that the same magnetic pole is disposed so as to face the second magnet body.

According to the above structure, in the upper part of the tube, the magnetic forces acting on each other between the plurality of magnet pieces constituting the first magnet body and the plurality of magnet pieces constituting the third magnet body. (When the opposing magnetic poles of the respective magnet pieces constituting the first magnet body and the respective magnet pieces constituting the third magnet body have the same polarity) or an attraction force (composes the first magnet body). (When the opposite magnetic poles of the respective magnet pieces and the respective magnet pieces constituting the third magnet body have different polarities), the first rod-shaped body is held at the axial center position of the fluid passage, and the tube body In the lower part of the figure, a repulsive force due to a magnetic force acting between a plurality of magnet pieces constituting the second magnet body and a plurality of magnet pieces constituting the fourth magnet body (constituting the second magnet body) When the opposite magnetic poles of each magnet piece and each magnet piece constituting the fourth magnet body have the same polarity, ) Or attractive force (when the opposite magnetic poles of the respective magnet pieces constituting the second magnet body and the respective magnet pieces constituting the fourth magnet body have different polarities), and the second rod-shaped body is balanced. Is held at the axial position of the fluid passage,
In this state, the float moves up and down in the fluid passage in accordance with the flow rate of the fluid.

[0010] In a third aspect of the present invention, in the flow meter according to the first or second aspect, the float is made of a magnetic material, and the detecting means is provided on an outer periphery of the tube. And a secondary coil disposed above and below the primary coil and connected in series with opposite polarities.

According to the above-described structure, the float made of the magnetic material moves up and down in the fluid passage according to the flow rate of the fluid, so that the coupling coefficient between the primary coil and each secondary coil changes. As a result, the output value, which is the difference between the AC voltages induced in the respective secondary coils, changes, so that the flow rate of the fluid can be measured.

According to a fourth aspect of the present invention, there is provided a substrate processing apparatus for processing a surface of a substrate, a processing liquid supply unit having a supply pipe for supplying a processing liquid to the substrate processing unit, and a processing liquid supply unit. 4. A flow meter according to claim 1, wherein said flow meter is provided in a supply pipe of the section, and an adjusting means for adjusting a supply amount of the processing liquid in accordance with an output signal from the flow meter. Features.

According to the above configuration, as a result of outputting a stable signal from the flow meter, the supply amount of the processing liquid to the substrate processing section is stabilized. Therefore, stable processing is performed on the surface of the substrate.

[0014]

1 is a longitudinal sectional view of a flow meter according to an embodiment of the present invention, FIG. 2 is a transverse sectional view taken along line AA of FIG. 1, and FIG. 3 is a sectional view taken along line BB of FIG. FIG. In these figures, a flow meter 10 includes a pipe 12 that allows a fluid to pass upward from below, and a float 14 that is disposed inside the pipe 12 so as to move up and down according to the flow rate of the fluid. Detecting means 16 for detecting the position of the float 14 in the vertical direction of the tube 12.

The pipe 12 is made of a resin material or the like having excellent chemical resistance, and has a tapered fluid passage 121 whose upper (downstream) inner diameter is larger than the lower (upstream) inner diameter.
It has. In addition, the fluid passage 1 is provided in the upper part of the pipe 12.
A first magnet body 122 is embedded so as to surround 21,
A second magnet body 123 is embedded in the lower part of the tube body 12 so as to surround the fluid passage 121. As shown in FIG. 2, the first magnet body 122 includes a plurality
The poles are arranged at equal intervals in the circumferential direction of the tube body 12 so as to face the fluid passage 121 (ie, a third magnet body 126 described later). Further, the second magnet body 123 is connected to the first magnet body 122 as shown in FIG.
Similarly, the plurality of magnet pieces 123a connect each S pole to the fluid passage 1.
It is configured such that it is disposed at equal intervals in the circumferential direction of the tube body 12 so as to face the 21 side (that is, the fourth magnet body 127 side described later).

The float 14 is made of a magnetic material,
The first rod-shaped member 124 has a shape having a taper in a direction in which an upper outer diameter is larger than a lower outer diameter, and is formed of a resin material or the like having excellent chemical resistance at an axial center position at an upper end thereof.
Are extended so as to extend upward (downstream side), and a second rod-like body 125 made of a resin material or the like having excellent chemical resistance is extended downward (upstream side) at an axial center position at the lower end thereof. It is installed continuously. These first and second rods 124, 12
5 indicates that the float 14 is the tube 1 in this embodiment.
In the state located at the center of the tube 2, it has such a length as to protrude outward from the tube 12. Note that the outer surface of the float 14 is coated with a coating material such as resin having excellent chemical resistance, so that generation of particles is prevented. Of course, if the magnetic material constituting the float 14 itself has excellent chemical resistance, there is no need to cover it with a coating material.

A third magnet 126 is buried in the upper part of the first rod 124 so as to oppose the entire area of the fluid passage 121 on the outer periphery, and a lower part of the second rod 125 is provided in the lower part of the second rod 125. A fourth magnet body 127 is embedded so as to face the entire area of the fluid passage 121. This third magnet body 126
A plurality of magnet pieces 126a are arranged at equal intervals in the circumferential direction of the first rod-shaped member 124 so that each S pole faces the fluid passage 121 side (that is, the first magnet body 122 side). Have been. Further, the fourth magnet body 127 is configured so that the plurality of magnet pieces 127a direct each S pole toward the fluid passage 121 (ie, the second magnet body 123).
Are arranged at equal intervals in the circumferential direction of the rod-shaped body 125.

The vertical dimension of the third magnet body 126 is longer than the vertical dimension of the first magnet body 122, and the vertical dimension of the fourth magnet body 127 is
The length is longer than the vertical dimension of the second magnet body 123. This is because even when the float 14 moves up and down in accordance with the flow rate of the fluid, the first magnet body 122 and the third magnet body 1
This is because at least a part of the second magnet body 26 and at least a part of the second magnet body 123 and the fourth magnet body 127 face each other. Of course, the first magnet body 122
And the second magnet 123 may be longer than the fourth magnet 127.

Further, if the float 14 moves up and down, a part thereof is opposed to each other.
The second and third magnet bodies 126 and the second and fourth magnet bodies 123 and 127 may have the same dimensions. Further, the first to fourth magnet bodies 122, 12
3, 126, 127 may have a predetermined size by arranging a plurality of magnet bodies in the up-down direction.

As a result, the first rod-shaped body 124 is balanced by the repulsive force generated by the magnetic force acting between the first magnet body 122 and the third magnet body 126, and the shaft of the fluid passage 121 is balanced. While being held at the center position, the second rod-shaped body 125 is balanced by the repulsive force generated by the magnetic force acting between the second magnet body 123 and the fourth magnet body 127 and the fluid passage 121 is formed. As a result, the float 14 is held at the axial position of the fluid passage 121, and can be moved up and down in the fluid passage 121.

The detecting means 16 is based on the principle of a differential transformer, and is provided at a primary coil 161 disposed at the center of the outer periphery of the tube 12 and above and below the primary coil 161. And two secondary coils 162 and 163 having the same number of turns and connected in series with opposite polarities. Then, as shown in FIG.
The AC voltage output from the transmitter 164 is applied to 61, and each secondary coil 162,
The difference between the AC voltages induced at 163 is output between terminals A and B.

That is, the float 14 is connected to the primary coil 16
When the primary coil 16 is at the center position facing
Since the respective coupling coefficients between the primary coil 162 and the secondary coil 162 and between the primary coil 161 and the secondary coil 163 are substantially equal, the AC voltages induced in the respective secondary coils 162, 163 have the same value and the terminal A , B become zero. When the float 14 is located near the secondary coil 162, the coupling coefficient between the primary coil 161 and the secondary coil 162 becomes larger than the coupling coefficient between the primary coil 161 and the secondary coil 163. The AC voltage induced in 162 has a larger value than the voltage induced in secondary coil 163.

When the float 14 is located near the secondary coil 163, the primary coil 161 and the secondary coil 16
The coupling coefficient between the primary coil 161 and the secondary coil 162
The secondary coil 163
Is greater than the AC voltage induced in the secondary coil 1162. In addition, float 1
4 is closer to the secondary coil 162 and the secondary coil 1
When it is closer to 63, the phases of the induced AC voltages are inverted by 180 ° from each other. Therefore, the tube 12
By previously associating the position of the float 14 determined by the flow rate of the fluid flowing through the fluid passage 121 with the output value between the terminals A and B, the flow rate of the fluid is measured based on the output value between the terminals A and B. Will be able to do that.

The detecting means 16 is not limited to one using the principle of a differential transformer, but may be of a type for measuring Coriolis force, for example.

The flow meter 10 configured as described above
In FIG. 5, the first and second rods 124 and 125 are magnetically held at the axial center position of the fluid passage 121 of the tube 12, so that the vibration of the float 14 caused by Karman vortex or the like is suppressed. As shown, a stable output from which noise is largely removed is obtained from the detection means 16. Here, the meaning that the first and second rod-shaped bodies 124 and 125 are held at the axial center position of the fluid passage 121 of the tube body 12 is as follows.
Synonymous with that the first and second rods 124 and 125 are held at radially intermediate positions of the fluid passage 121,
The axial centers of the first and second rods 124 and 125 and the fluid passage 1
21 as well as the axis of the first and second rods 124 and 125 and the axis of the fluid passage 121 as long as the float 14 does not contact the tube 12. Is included.

The flow meter 1 according to the above embodiment
0 indicates that the S poles of the magnet pieces 122a and 123a constituting the first and second magnet bodies 122 and 123 are the third and fourth S poles, respectively.
So that the south poles of the magnet pieces 126a and 127a constituting the third and fourth magnet bodies 126 and 127 face the first and second magnet bodies 122 and 123, respectively. The first and second magnet bodies 1
The respective north poles of the magnet pieces 122a and 123a constituting the magnet pieces 22 and 123 face the third and fourth magnet bodies 126 and 127, respectively, and the magnet pieces 126a and the magnet pieces 126a and 127 constituting the third and fourth magnet bodies 126 and 127 respectively. 127a are the first and second N poles respectively.
May be configured to face the magnet bodies 122 and 123.

Each of the south poles of the magnet piece 122a constituting the first magnet body 122 faces the third magnet body 126 side, and the magnet piece 12a constituting the second magnet body 123 is formed.
Each of the N poles 3a faces the fourth magnet body 127 side,
Each south pole of the magnet piece 126a forming the third magnet body 126 faces the first magnet body 122 side, and each north pole of the magnet piece 127a forming the fourth magnet body 127 becomes the second magnet piece. It may be configured to face the magnet body 123 side.

Further, each N pole of the magnet piece 122a constituting the first magnet body 122 is connected to the third magnet body 126
And the respective south poles of the magnet pieces 123a forming the second magnet body 123 face the fourth magnet body 127 side, and the respective north poles of the magnet pieces 126a forming the third magnet body 126 Each of the south poles of the magnet pieces 127a constituting the fourth magnet body 127 may be configured to face the second magnet body 123, respectively, while facing the first magnet body 122 side.

In short, each magnet piece 1a is so formed that a repulsive force is generated between each magnet piece 122a constituting the first magnet body 122 and each magnet piece 126a constituting the third magnet body 126.
22a and 123a are provided, and each of the magnet pieces 123a, 123a, 123a, 127a may be provided.

As shown in FIG. 6 (corresponding to FIG. 2),
The magnet pieces 122a constituting the first magnet body 122 are disposed so that the respective south poles face the third magnet bodies 126, respectively. The N poles are arranged so as to face the first magnet body 122, respectively, while the magnet pieces 12 constituting the second magnet body 123 are arranged as shown in FIG. 7 (corresponding to FIG. 3).
3a is arranged so that each south pole faces the fourth magnet body 127, and a magnet piece 127a constituting the fourth magnet body 127 directs each north pole toward the second magnet body 123. It may be arranged in such a manner.

In this case, the first rod-shaped body 124 is balanced by the attractive force generated by the magnetic force acting between the first magnet body 122 and the third magnet body 126, and the fluid passage 121 is balanced. While being held at the axial center position, the second rod-shaped body 125 is balanced by the attractive force generated by the magnetic force acting between the second magnet body 123 and the fourth magnet body 127, and the fluid passage is formed. As a result, the float 14 is held at the axial position of the fluid passage 121, and can move up and down in the fluid passage 121. In order to hold the first and second rods 124 and 125 at the axial position of the fluid passage 121 by the attractive force of the magnet, the following configuration may be adopted.

That is, each south pole of the magnet piece 122a constituting the first magnet body 122 is connected to the third magnet body 126, respectively.
And the respective N poles of the magnet pieces 123a constituting the second magnet body 123 face the respective fourth magnet bodies 127, and the respective N poles of the magnet pieces 126a constituting the third magnet body 126 Each of the south poles of the magnet pieces 127a constituting the fourth magnet body 127 may be configured to face the second magnet body 123, respectively, while facing the first magnet body 122 side.

Further, the respective north poles of the magnet pieces 122a constituting the first magnet body 122 face the third magnet body 126, respectively, and the magnet pieces 12a constituting the second magnet body 123 are formed.
The respective south poles 3a face the fourth magnet body 127 side,
Each south pole of the magnet piece 126a forming the third magnet body 126 faces the first magnet body 122 side, and each north pole of the magnet piece 127a forming the fourth magnet body 127 becomes the second magnet piece. It may be configured to face the magnet body 123 side.

Further, each N pole of the magnet piece 122a constituting the first magnet body 122 is connected to the third magnet body 126
And the respective north poles of the magnet pieces 123a constituting the second magnet body 123 face the fourth magnet body 127, and the respective south poles of the magnet pieces 126a constituting the third magnet body 126 Each of the south poles of the magnet pieces 127a constituting the fourth magnet body 127 may be configured to face the second magnet body 123, respectively, while facing the first magnet body 122 side.

In short, each magnet piece 1a is so formed that an attractive force is generated between each magnet piece 122a constituting the first magnet body 122 and each magnet piece 126a constituting the third magnet body 126.
22a and 123a are provided, and each magnet piece 123a, 123a, 123a, 127a may be provided.

In any of the above embodiments,
First to fourth magnet bodies 122, 123, 126, 127
Are a plurality of magnet pieces 122a, 123a, 126, respectively.
a, 127a, but the first to fourth magnet bodies 122, 123, 126, and 127 may each be constituted by one ring-shaped magnet body. In addition, even in the case where the plurality of magnet pieces 122a, 123a, 126a, and 127a are used, the first and second magnet bodies 122,
The magnet pieces 122a, 123a constituting the magnet 123 are disposed so that both magnetic poles thereof are located along the circumferential direction of the tube 12, and the magnet pieces 126a constituting the third and fourth magnet bodies 126, 127 are arranged. , 127a can be arranged such that both magnetic poles thereof are located along the circumferential direction of the first and second rods 124, 125. In any case, a first magnet body 122 provided to surround the fluid passage 121 at an upper portion of the tube 12 and a second magnet provided to surround the fluid passage 121 at a lower portion of the tube 12. Magnet body 1
And a third rod disposed on the first rod-shaped member and holding the first rod-shaped member at an axial center position of the fluid passage by magnetic force acting between the first rod-shaped member and the first magnet. The magnet body 126 and the second rod-shaped body 125
And a fourth magnet body 127 that holds the second rod 125 at the axial position of the fluid passage 121 by a magnetic force acting on each other with the magnet body 123.

FIG. 8 is a diagram showing a schematic configuration of a substrate processing apparatus 100 to which the above-described flow meter according to the present invention is applied. In this figure, a substrate processing apparatus 100 includes a substrate processing tank 110 for performing chemical processing and rinsing processing on a substrate W such as a semiconductor wafer, a chemical supply unit 120 for supplying a chemical to the substrate processing tank 110 side, A pure water supply unit 130 that supplies pure water as a rinse liquid to the tank 100 side, a mixing valve 140 that mixes a chemical solution supplied from the chemical solution supply unit 120 and pure water supplied from the pure water supply unit 130,
A control unit 150 for controlling the operation of the entire apparatus.

The substrate processing tank 110 has a substantially V-shape in side view and a substantially rectangular shape in plan view, and a carrier (not shown) in which a substrate W is housed is held and carried by a transfer robot. The processing liquid supply pipe 111 serving also as a supply path for the chemical liquid and the pure water is connected to the bottom thereof.

Further, on the outer periphery of the upper part of the substrate processing tank 110,
A drainage tank 113 for receiving a chemical solution or pure water overflowing from the opening 112 is integrally formed. The chemical or pure water discharged into the drainage tank 113 is supplied to the outside of the apparatus via a drainage pipe 114 having one end connected to the bottom thereof and a drainage port 115 connected to the other end of the drainage pipe 114. Is to be discharged.

The chemical liquid supply section 120 supplies the chemical liquid stored in a chemical liquid container (not shown) to the mixing valve 140 via a supply pipe 121 by a pressure pump. The supply pipe 121 extends from the upstream side to the downstream side. Flow meter 12
2. The flow control regulator 123 and the air valve 124 are arranged in order. The flow meter 122 has a configuration according to the present invention.

The pure water supply section 130 supplies pure water from a pure water supply source (not shown) to the mixing valve 140 via a pure water supply pipe 131 by a pressure pump.
31 is a flow meter 13 from the upstream side to the downstream side.
2. A flow control regulator 133 and an air valve 134 are provided. The flow meter 132 has a configuration according to the present invention.

The mixing valve 140 is connected to the substrate processing tank 1
10 is connected to the processing liquid supply pipe 111 of the
Chemical solution (stock solution) fed from 0 and pure water supply unit 130
Is mixed with pure water supplied from the company to make a chemical solution of a predetermined concentration, and then supplied into the substrate processing tank 110.

The control unit 150 performs C for performing predetermined arithmetic processing.
PU 151, R storing a predetermined processing program
RAM 1 for temporarily storing OM 152 and processing data
53, and controls the operation of the substrate processing apparatus 100 in accordance with the predetermined processing program. That is, the control unit 150 receives the predetermined signal from the start switch, the sensor, the flow meters 122 and 123, and thereby controls the flow rate regulator 123 and the air valve 124 of the chemical solution supply unit 120 and the pure water supply unit 130. Of the air flow regulator 134 and the air valve 134 are controlled.

The substrate processing apparatus 10 configured as described above
0 operates as follows. That is, the substrate processing tank 11
When a predetermined concentration of the chemical solution is supplied into the inside of the
The zero air valve 124 is opened, and the chemical solution (stock solution) is supplied to the mixing valve 140 via the chemical solution supply pipe 121. At this time, the flow rate regulator 123 is adjusted according to the output from the flow meter 122, and the supply amount of the chemical solution is adjusted to a predetermined value.

On the other hand, the air valve 134 of the pure water supply unit 130 is opened, and pure water is supplied to the mixing valve 140 via the pure water supply pipe 131. At this time, the flow meter 1
The flow control regulator 133 is adjusted according to the output from the control unit 32 to adjust the supply amount of pure water to a predetermined value. As a result, the chemical solution and the pure water are mixed by the mixing valve 140 and a chemical solution having a predetermined concentration is supplied into the substrate processing tank 110 through the processing liquid supply pipe 111.

When the chemical solution is supplied for a certain period of time as described above and the chemical solution processing for the substrate W is completed, the air valve 1
24 is closed and the supply of the chemical solution from the chemical solution supply unit 120 is stopped, while the flow rate regulator 133 of the pure water supply unit 130 is adjusted so that the supply amount of the pure water is reduced by the flow meter 1.
32 is increased to a predetermined value based on the output from
The liquid is supplied into the substrate processing tank 110 via the mixing valve 140 and is replaced with the chemical solution in the substrate processing tank 110. Then, a predetermined amount of pure water is continuously supplied for a certain time,
A rinsing process is performed on the substrate W. When the rinsing process is completed, the air valve 134 is closed and the pure water supply unit 130 is closed.
Supply of pure water from is stopped. The substrate processing tank 11
Chemical solution and pure water overflowing from the top of
13 and is discharged out of the apparatus via a discharge pipe 114 and a liquid discharge port 115.

According to the substrate processing apparatus 100 described above, the flow meters 122 and 13 having the configuration according to the present invention are provided.
Since the output from 2 is stable as described above and the supply amounts of the chemical solution and the pure water are accurately measured, the concentration of the chemical solution mixed with the pure water also becomes highly accurate, and the appropriate Processing can be performed. In addition, the flow meter 12
The tube 12 constituting the tube 2 and 132 is made of a resin having excellent chemical resistance, and the outer surface of the float 14 is coated with a coating material having excellent chemical resistance, or the float 14 itself has excellent chemical resistance. Since the processing liquid is made of a material, there is no possibility that the processing liquid that has passed through the flow meters 122 and 132 is contaminated by particles or the like.

The substrate processing apparatus to which the flow meter according to the present invention is applied is not limited to the above-described configuration, but may have another configuration. That is, the substrate W carried into the substrate processing tank 110 may be placed directly on the substrate guide in the tank without being stored in the carrier, or an air valve or the like may be used instead of the flow rate regulator 133. Other flow control means may be used. Even with a normal ON / OFF air valve, the flow rate can be controlled by precisely controlling the air pressure. Further, the flow meter according to the present invention can be applied only to the chemical solution supply unit, or can be applied only to the pure water supply unit. In short, by arranging the flow meter having the configuration according to the present invention on the supply pipe of the processing liquid supply unit that supplies various processing liquids such as a chemical solution and pure water, the flow rate of the fluid can be measured with high accuracy. Becomes possible.

[0049]

As described above, according to the flowmeters of the first to third aspects, the fluid meter is disposed so as to surround the fluid passage at the upper portion of the pipe having the fluid passage through which the fluid passes upward from below. A first magnet body, a second magnet body disposed at a lower portion of the tube so as to surround a fluid passage, and a first rod body disposed on a first rod extending above a float; A third magnet body holding the first rod body at an axial position of the fluid passage by a magnetic force acting on each other between the body and a second rod body extending below the float; And a fourth magnet body for holding the second rod-shaped body at the axial position of the fluid passage by a magnetic force acting between the second magnet body and the second magnet body, so that the vibration of the float is suppressed. The flow rate of the fluid can be measured with high accuracy.

According to the substrate processing apparatus of the fourth aspect,
4. A substrate processing unit for processing a surface of a substrate, a processing liquid supply unit having a supply pipe for supplying a processing liquid to the substrate processing unit, and a supply pipe of the processing liquid supply unit. And the adjusting means for adjusting the supply amount of the processing liquid in accordance with the output signal from the flow meter, so that the flow meter can measure the supply amount of the processing liquid with high accuracy. As a result, appropriate processing can be performed on the substrate.

[Brief description of the drawings]

FIG. 1 is a longitudinal sectional view of a flow meter according to an embodiment of the present invention.

FIG. 2 is a cross-sectional view taken along line AA of the flow meter shown in FIG.

FIG. 3 is a cross-sectional view of the flow meter shown in FIG. 1 taken along line BB.

FIG. 4 is a circuit diagram illustrating an operation of a detection unit of the flow meter shown in FIG. 1;

FIG. 5 is a diagram showing output characteristics of the flow meter shown in FIG.

FIG. 6 is a cross-sectional view corresponding to FIG. 2 of a flow meter according to another embodiment of the present invention.

FIG. 7 is a cross-sectional view corresponding to FIG. 3 of a flow meter according to another embodiment of the present invention.

FIG. 8 is a diagram illustrating a schematic configuration of a substrate processing apparatus to which the flow meter according to the present invention is applied.

FIG. 9 is a longitudinal sectional view of a conventional flow meter.

FIG. 10 is a diagram showing output characteristics of the flow meter shown in FIG.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 10 Flow meter 12 Tube 14 Float 16 Detecting means 121 Fluid passage 122 First magnet body 123 Second magnet body 124 First rod body 125 Second rod body 126 Third magnet body 127 Fourth magnet body 122a Magnet piece constituting the first magnet body 123a Magnet piece constituting the second magnet body 126a Magnet piece constituting the third magnet body 127a Magnet piece constituting the fourth magnet body 161 Primary coil 162, 163 Secondary coil 100 Substrate processing tank (substrate processing section) 120 Chemical liquid supply section (processing liquid supply section) 121 Chemical liquid supply pipe (supply pipe) 123, 133 Flow rate regulator (adjustment means) 130 Pure water supply section (processing liquid supply Part) 131 pure water supply pipe (supply pipe) 150 control part (adjustment means) W substrate

Claims (4)

[Claims] 1. A first rod-shaped member which is disposed in a fluid passage so as to move up and down in accordance with a flow rate of a fluid and has a first rod-shaped member which extends upward according to a flow rate of the fluid. A float having a second rod-shaped body extending downward, a first magnet body disposed to surround a fluid passage at an upper part of the tube, and a first magnet body arranged to surround a fluid passage at a lower part of the tube. The first rod-shaped member is disposed on the first rod-shaped member, and the first rod-shaped member is disposed on the first rod-shaped member by a magnetic force acting on the first rod-shaped member. And a third magnet body that is held on the second rod-shaped body, and the second rod-shaped body is disposed at the axial position of the fluid passage by a magnetic force acting between the third magnet body and the second magnet body. And a detecting means for detecting the position of the float. A flow meter, characterized in that: 2. Each of the first to fourth magnet bodies is composed of a plurality of magnet pieces, while each of the magnet pieces constituting the first magnet body has the same magnetic pole as the third magnet piece.
And the magnetic pole pieces constituting the second magnet body are arranged so that the same magnetic poles are respectively oriented toward the fourth magnet body side, and the third magnetic pole piece is arranged so as to face the fourth magnet body side. Each of the magnet pieces constituting the magnet body is disposed so that the same magnetic pole faces the first magnet body side,
2. The flow meter according to claim 1, wherein the magnet pieces constituting the magnet body are arranged such that the same magnetic pole faces the second magnet body. 3. The float is made of a magnetic material, and the detecting means is provided on a primary coil disposed on an outer periphery of the tube, and on a top and a bottom of the primary coil, respectively. 3. The flow meter according to claim 1, further comprising a secondary coil connected in series with opposite polarities. 4. A processing liquid supply unit having a substrate processing unit for processing a surface of a substrate, a supply pipe for supplying a processing liquid to the substrate processing unit, and a supply pipe provided in the processing liquid supply unit. 4. A substrate processing apparatus, comprising: the flow meter according to any one of Items 1 to 3; and an adjusting unit that adjusts a supply amount of the processing liquid according to an output signal from the flow meter.