JPH1184925A - Heating body, heating device and image forming device - Google Patents
Heating body, heating device and image forming deviceInfo
- Publication number
- JPH1184925A JPH1184925A JP25285697A JP25285697A JPH1184925A JP H1184925 A JPH1184925 A JP H1184925A JP 25285697 A JP25285697 A JP 25285697A JP 25285697 A JP25285697 A JP 25285697A JP H1184925 A JPH1184925 A JP H1184925A
- Authority
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- Japan
- Prior art keywords
- substrate
- heating element
- heating
- heat
- element according
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- Control Of Resistance Heating (AREA)
- Resistance Heating (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、被加熱材を加熱す
るための加熱体、該加熱体を備えた加熱装置、及び該加
熱装置を像加熱手段として備えた画像形成装置に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a heating member for heating a material to be heated, a heating device provided with the heating member, and an image forming apparatus provided with the heating device as image heating means.
【0002】特に電子写真プロセス・静電記録プロセス
等の適宜の画像形成プロセスを用いた画像形成装置、該
画像形成装置においてトナー像(顕画剤像)を被加熱体
に熱定着させる像加熱定着装置としての加熱装置、該加
熱定着装置に使用する加熱体に好適なものである。In particular, an image forming apparatus using an appropriate image forming process such as an electrophotographic process or an electrostatic recording process, and an image heating and fixing method in which a toner image (developing agent image) is thermally fixed to a member to be heated in the image forming apparatus. It is suitable for a heating device as a device and a heating element used in the heat fixing device.
【0003】[0003]
【従来の技術】従来、複写機・プリンタ等の画像形成装
置における加熱装置としては熱ローラ方式が多く使われ
てきた。この方式は、ハロゲンヒータ等の内蔵熱源によ
り所定の加熱温度に維持させた加熱ローラ(定着ロー
ラ)と、これに圧接させた弾性加圧ローラとの圧接ニッ
プ部(定着ニップ部)に被記録材を導入して挟持搬送さ
せ、加熱ローラの熱で被記録材面の未定着画像を加熱定
着させるものである。2. Description of the Related Art Conventionally, a heat roller system has been often used as a heating device in an image forming apparatus such as a copying machine or a printer. In this method, a recording material is fixed to a press nip (fixing nip) between a heating roller (fixing roller) maintained at a predetermined heating temperature by a built-in heat source such as a halogen heater and an elastic pressing roller pressed against the heating roller. And heats and fixes an unfixed image on the surface of the recording material by the heat of the heating roller.
【0004】しかしこの熱ローラ方式の画像加熱定着装
置としての加熱装置は、いつでもすぐに画像出力がなさ
れるようにするために加熱ローラの温度を常時高温に維
持しておかなければならず、そのために消費エネルギー
が大きく、また待機中も機内に熱を放出するため機内昇
温の問題も発生していた。また電源を投入してから加熱
ローラが被加熱材としての被記録材を加熱するのに適し
た所定温度に昇温するまでにかなりの待ち時間を要す
る。However, in the heating device as the image heating fixing device of the heat roller type, the temperature of the heating roller must be constantly maintained at a high temperature so that an image can be output immediately at any time. In addition, the energy consumption is large, and heat is released into the machine even during standby, causing a problem of temperature rise in the machine. Also, a considerable waiting time is required from when the power is turned on to when the heating roller rises to a predetermined temperature suitable for heating the recording material as the material to be heated.
【0005】最近では、フィルム加熱方式の加熱装置が
提案され、実用化されている。この加熱装置は、被加熱
材を加熱体に耐熱フィルムを介して密着させ、加熱体と
耐熱フィルムとを相対移動させて加熱体の熱を耐熱フィ
ルムを介して被加熱材へ与える方式・構成のものであ
り、未定着トナー画像を該画像を担持している被記録材
面に永久固着画像として加熱定着処理する手段として活
用できる。Recently, a heating apparatus of a film heating type has been proposed and put into practical use. This heating device has a method and configuration in which a material to be heated is closely attached to a heating body via a heat-resistant film, and the heating body and the heat-resistant film are relatively moved to give heat of the heating body to the material to be heated via the heat-resistant film. That is, it can be used as a means for heat-fixing an unfixed toner image as a permanently fixed image on the surface of a recording material carrying the image.
【0006】このようなフィルム加熱方式の加熱装置
は、昇温の速い低熱容量の加熱体や薄膜のフィルムを用
いることができるために短時間に加熱体の温度が上昇
し、待機中に加熱体の通電加熱を行なう必要がなくな
り、被加熱材としての被記録材をすぐに通紙しても該被
記録材が定着部位に到達するまでに加熱体を所定温度ま
で十分に昇温させることができ、画像形成装置等の本機
の機内昇温を低下させることができる等の利点を有し、
効果的なものである。[0006] In such a film heating type heating apparatus, a heating element having a low heat capacity or a thin film having a high temperature rise can be used. Therefore, even if the recording material as the material to be heated is immediately passed, the heating member can be sufficiently heated to a predetermined temperature before the recording material reaches the fixing portion. And has the advantage that the temperature rise in the machine such as an image forming apparatus can be reduced,
It is effective.
【0007】図9(a)にフィルム加熱方式の加熱装置
(画像加熱定着装置)の一例の要部横断面模型図を示し
た。図9(b)は加熱体の一部切欠き平面模型図であ
る。FIG. 9A is a schematic cross-sectional view of an essential part of an example of a film heating type heating device (image heating fixing device). FIG. 9B is a partially cutaway plan view of the heating element.
【0008】10は加熱体であり、ヒータ基板12、該
ヒータ基板12の片面側に形成した抵抗発熱体(通電発
熱体)パターン13a・13b、導電パターン23、2
つの給電電極パターン21・22、該抵抗発熱体パター
ン13a・13bを被覆させた表面保護層11等よりな
る。Reference numeral 10 denotes a heating element, which includes a heater substrate 12, resistance heating elements (electric heating elements) patterns 13a and 13b formed on one side of the heater substrate 12, and conductive patterns 23 and 2.
The power supply electrode patterns 21 and 22 and the surface protection layer 11 which covers the resistance heating element patterns 13a and 13b.
【0009】ヒータ基板12は、後述する耐熱性フィル
ム15、被加熱材としての被記録材Pの搬送・移動方向
Aに対して直交する方向を長手とする横長・薄肉の形状
を有し、例えば、長さ270mm・幅7mm・厚さ0.
635mmの、アルミナ等の耐熱性・電気絶縁性・低熱
容量のセラミック基材である。The heater substrate 12 has a horizontally long and thin shape whose longitudinal direction is perpendicular to the conveying / moving direction A of the recording material P as a material to be heated, which will be described later. , Length 270mm, width 7mm, thickness 0.
It is a 635 mm ceramic substrate of heat resistance, electrical insulation and low heat capacity such as alumina.
【0010】抵抗発熱体パターン13a・13bは、例
えば、銀パラジウム(Ag/Pb)・Ta2N等の電気
抵抗材料ペースト(抵抗ペースト)を例えば厚さ10μ
m、幅1mmの細帯状にセラミック基材面長手に沿って
略並行にスクリーン印刷等により塗工し焼成することで
形成したものである。The resistance heating element patterns 13a and 13b are made of, for example, an electric resistance material paste (resistance paste) such as silver palladium (Ag / Pb).
It is formed by applying and firing by screen printing or the like substantially in parallel with the length of the ceramic base material in the form of a narrow strip having a width of 1 mm and a width of 1 mm.
【0011】2つの給電電極パターン21・22はセラ
ミック基材12の一端部側に並べて具備させてある。Two power supply electrode patterns 21 and 22 are provided side by side on one end side of the ceramic base material 12.
【0012】そして、抵抗発熱体パターン13a・13
bの一端部側は上記2つの給電電極パターン21・22
のそれぞれと導電パターン23を介して導通させてあ
る。また抵抗発熱体パターン13aと抵抗発熱体パター
ン13bの他端部は互いに導通させてある。The resistance heating element patterns 13a and 13
b is connected to the two power supply electrode patterns 21 and 22
Are electrically connected to each other via the conductive pattern 23. The other ends of the resistance heating element pattern 13a and the resistance heating element pattern 13b are electrically connected to each other.
【0013】上記導電パターン23、2つの給電電極パ
ターン21・22はいずれもAg等の導電材料ペースト
をスクリーン印刷等によりセラミック基材12の面にパ
ターン塗工し焼成することで形成したものである。The conductive pattern 23 and the two power supply electrode patterns 21 and 22 are both formed by applying a pattern of a conductive material paste such as Ag on the surface of the ceramic base material 12 by screen printing or the like and firing it. .
【0014】この加熱体10を、抵抗発熱体パターン1
3a・13bを形成した面側を下向きにして露呈させ、
剛性・断熱性を有する加熱体ホルダ(ステイ)16に保
持させて固定配設している。The heating element 10 is connected to the resistance heating element pattern 1.
Exposure with the surface side on which 3a and 13b are formed facing downward,
The heating element holder (stay) 16 having rigidity and heat insulation properties is held and fixedly arranged.
【0015】この加熱体10は給電電極パターン21・
22に不図示の給電回路から給電され、抵抗発熱体パタ
ーン13a・13bが長手全長にわたって発熱すること
で昇温し、その昇温が温度検知素子14で検知され、そ
の温度検知情報が不図示の温度制御回路へフィードバッ
クされて加熱体10の温度が所定の温度に維持されるよ
うに抵抗発熱体パターン13a・13bへの通電が制御
される。The heating element 10 has a power supply electrode pattern 21.
22 is fed from a power supply circuit (not shown), and the resistance heating element patterns 13a and 13b are heated over their entire length to increase the temperature. The temperature rise is detected by the temperature detecting element 14, and the temperature detection information is not shown. The power supply to the resistance heating element patterns 13a and 13b is controlled so that the temperature of the heating element 10 is maintained at a predetermined temperature by being fed back to the temperature control circuit.
【0016】15は、例えば厚さ30μm〜100μm
程度のポリイミド等の耐熱性フィルム、17は該耐熱性
フィルム15を加熱体10のフィルム摺動面である表面
保護層11面に圧接する加圧部材としての加圧ローラで
ある。Reference numeral 15 denotes, for example, a thickness of 30 μm to 100 μm.
A heat-resistant film 17 made of polyimide or the like has a pressing roller 17 as a pressing member for pressing the heat-resistant film 15 against the surface protective layer 11 which is the film sliding surface of the heater 10.
【0017】耐熱性フィルム15はこの加圧ローラ17
により加熱体10に圧接されつつ、回転駆動力により、
矢印A方向に所定速度で加熱体10面(表面保護層11
面)上を摺動しながら回転移動する。The heat-resistant film 15 is
While being pressed against the heating body 10 by the
The surface of the heating element 10 (surface protection layer 11
Surface) and rotate.
【0018】而して抵抗発熱体パターン13a・13b
に対する通電により加熱体10を所定温度に昇温させ、
また、耐熱性フィルム15を加熱体10と圧接して摺動
移動させた状態において、耐熱性フィルム15を挟んで
形成される加熱体10と加圧ローラ17との圧接ニップ
部(定着ニップ部)Nの耐熱性フィルム15と加圧ロー
ラ17との間に、被加熱材としての画像定着すべき被記
録材Pを導入して耐熱性フィルム15と一緒に定着ニッ
プ部Nを挟持搬送させることにより、加熱体10からの
熱を耐熱性フィルム15を介して被記録材Pに付与して
該被記録材P上の未定着トナー画像Tを被記録材P面に
加熱定着させるものである。定着ニップ部Nを通った被
記録材Pは耐熱性フィルム15の面から分離させて搬送
される。Thus, the resistance heating element patterns 13a and 13b
The heating body 10 is heated to a predetermined temperature by energizing
Further, in a state where the heat-resistant film 15 is slid while being pressed against the heating member 10, a pressure-contact nip portion (fixing nip portion) between the heating member 10 formed with the heat-resistant film 15 interposed therebetween and the pressure roller 17. The recording material P to be image-fixed as a material to be heated is introduced between the heat-resistant film 15 of N and the pressure roller 17, and the fixing nip N is conveyed together with the heat-resistant film 15. The heat from the heating body 10 is applied to the recording material P via the heat-resistant film 15 to heat and fix the unfixed toner image T on the recording material P to the surface of the recording material P. The recording material P that has passed through the fixing nip N is transported separately from the surface of the heat-resistant film 15.
【0019】[0019]
【発明が解決しようとする課題】しかしこの方法では、
過大な電力を供給した場合に加熱体内の一部の温度が急
激に上昇するため加熱体の基材であるセラミック基材の
内部で大きな温度差が生じ、基材強度を越える熱ストレ
スが加わることで加熱体が破損するという問題が発生し
ていた。However, in this method,
When excessive power is supplied, the temperature of a part of the heating element rises rapidly, causing a large temperature difference inside the ceramic substrate that is the substrate of the heating element, and applying thermal stress exceeding the substrate strength This has caused a problem that the heating element is damaged.
【0020】また、本体が制御不能になった場合、例え
ばトライアック故障や温度ヒューズ不良によってセラミ
ック基材が不特定に割れてしまうことがあるが、セラミ
ック基材の割れ方によっては温度検出素子からの通電パ
ターンのみが遮断されることがあり、温度制御回路故障
のときはまだ加熱体は暖まっていないと誤認知して電力
を供給し続け過昇温することで定着器周辺から発煙等を
引き起こしてしまう場合があった。また、発熱を促す一
次ACと、温度検知を行なう二次系DCの絶縁耐圧を満
足することができなく、時には本体に漏れた電流によっ
て二次系回路を破壊してしまう可能性があった。When the main body becomes uncontrollable, the ceramic base may be broken unspecified due to, for example, a triac failure or a defective thermal fuse. Only the energization pattern may be interrupted, and in the case of a temperature control circuit failure, it is erroneously recognized that the heating element has not warmed up yet, and it continues to supply power and overheats, causing smoke and the like from around the fuser. There was a case. In addition, the dielectric strength of the primary AC that promotes heat generation and the withstand voltage of the secondary DC that performs temperature detection cannot be satisfied, and sometimes the secondary circuit may be destroyed by current leaking to the main body.
【0021】そこで本発明では、過昇温時に意図した個
所で加熱体基板を確実に割ることのできる構成として安
全性を向上させた加熱体、加熱装置及び画像形成装置の
提供を目的とする。Accordingly, an object of the present invention is to provide a heating element, a heating apparatus, and an image forming apparatus having improved safety as a configuration capable of surely breaking a heating element substrate at a point intended at an excessive temperature rise.
【0022】[0022]
〔1〕:基板に発熱体を具備したヒータにおいて、過昇
温時に該基板を割ることを意図した個所を有し、該個所
以外の任意の個所に基板補強部材を有することを特徴と
する加熱体。[1]: A heater provided with a heating element on a substrate, having a portion intended to crack the substrate at an excessively high temperature, and having a substrate reinforcing member at an arbitrary portion other than the portion. body.
【0023】〔2〕:発熱中心が基板内で基板幅中心に
対して幅方向にずれるように発熱体を基板の片面側に配
置した加熱体において、過昇温時に該基板を割ることを
意図した個所を有し、該個所以外の任意の個所に基板補
強部材を有することを特徴とする加熱体。[2]: A heating element in which a heating element is arranged on one side of the substrate such that the center of heat generation is shifted in the width direction with respect to the center of the substrate width within the substrate. A heating element, comprising: a substrate reinforcing member at an arbitrary position other than the above-mentioned position.
【0024】〔3〕:基板の一方面側に発熱体を配置
し、他方面側に温度検知部材を配置したことを特徴とす
る請求項1又は2に記載の加熱体。[3] The heating element according to claim 1, wherein a heating element is disposed on one side of the substrate and a temperature detecting member is disposed on the other side.
【0025】〔4〕:過昇温時に基板を割ることを意図
した個所と温度検知部材とが異なる位置に配置され、該
個所よりも温度検知部材側に基板補強部材を設けたこと
を特徴とする請求項3に記載の加熱体。[4]: A place where the substrate is intended to be broken at the time of excessive temperature rise and a temperature detecting member are arranged at different positions, and a substrate reinforcing member is provided on the temperature detecting member side of the place. The heating body according to claim 3, wherein
【0026】〔5〕:前記温度検知部材の電極を前記基
板補強部材としたことを特徴とする請求項3又は4に記
載の加熱体。[5] The heating element according to claim 3 or 4, wherein the electrode of the temperature detecting member is the substrate reinforcing member.
【0027】〔6〕:発熱体を基板内長手方向で折り返
し、長手方向片側の基板端に該発熱体の電極を具備さ
せ、前記過昇温時に基板を割ることを意図した個所を基
板長手中心より該電極側に具備させたことを特徴とする
請求項1〜5のいずれか1項に記載の加熱体。[6]: The heating element is folded back in the longitudinal direction in the substrate, an electrode of the heating element is provided at one end of the substrate in the longitudinal direction, and a portion intended to break the substrate when the temperature is excessively raised is set at the center of the substrate longitudinal direction. The heating element according to any one of claims 1 to 5, wherein the heating element is provided on the electrode side.
【0028】〔7〕:前記発熱体電極と反対側の基板端
に前記温度検知部材の電極を配置したことを特徴とする
請求項6に記載の加熱体。[7] The heating element according to claim 6, wherein an electrode of the temperature detecting member is disposed at an end of the substrate opposite to the electrode of the heating element.
【0029】〔8〕:前記温度検知部材が、前記基板上
に形成された導電パターンと、該導電パターンに接続さ
れた温度検知素子とを有し、該導電パターンが前記基板
補強部材を兼ねていることを特徴とする請求項1〜7の
いずれか1項に記載の加熱体。[8]: The temperature detecting member has a conductive pattern formed on the substrate and a temperature detecting element connected to the conductive pattern, and the conductive pattern also serves as the substrate reinforcing member. The heating element according to claim 1, wherein the heating element is provided.
【0030】[0030]
〔9〕:前記基板がセラミックであること
を特徴とする請求項1〜8のいずれか1項に記載の加熱
体。[9] The heating element according to any one of claims 1 to 8, wherein the substrate is ceramic.
【0031】〔10〕:過昇温時に基板を割ることを意
図する個所が、基板に設けられたスルーホールであるこ
とを特徴とする請求項1〜9のいずれか1項に記載の加
熱体。[10] The heating element according to any one of claims 1 to 9, wherein the portion intended to crack the substrate when the temperature is excessively raised is a through hole provided in the substrate. .
【0032】〔11〕:前記基板補強部材が基板以上の
強度、弾性、延性、塑性、良熱伝導性、良断熱性のいず
れか或いはそれらの組み合わせを有していることを特徴
とする請求項1〜10のいずれか1項に記載の加熱体。[11] The substrate reinforcing member has any one of strength, elasticity, ductility, plasticity, good thermal conductivity, good heat insulation and a combination thereof, which is higher than that of the substrate. 11. The heating element according to any one of 1 to 10.
【0033】〔12〕:前記基板補強部材が基板幅方向
において発熱体よりも広い幅で形成されていることを特
徴とする請求項1〜11のいずれか1項に記載の加熱
体。[12] The heating element according to any one of claims 1 to 11, wherein the substrate reinforcing member is formed to have a width wider than the heating element in the substrate width direction.
【0034】〔13〕:前記基板補強部材は基板の幅内
において0.1mm以上から任意の幅寸法で形成されて
いることを特徴とする請求項1〜12のいずれか1項に
記載の加熱体。[13] The heating according to any one of claims 1 to 12, wherein the substrate reinforcing member is formed to have an arbitrary width from 0.1 mm or more within the width of the substrate. body.
【0035】〔14〕:前記基板補強部材はセラミック
基板の長手方向において1.0mm以上から任意の長さ
で形成されていることを特徴とする請求項1〜13のい
ずれか1項に記載の加熱体。[14] The apparatus according to any one of claims 1 to 13, wherein the substrate reinforcing member is formed to have an arbitrary length from 1.0 mm or more in the longitudinal direction of the ceramic substrate. Heating body.
【0036】〔15〕:前記基板補強部材は1.0μm
以上から任意の厚さで形成されていることを特徴とする
請求項1〜14いずれか1項に記載の加熱体。[15]: The substrate reinforcing member is 1.0 μm
The heating element according to any one of claims 1 to 14, wherein the heating element is formed with an arbitrary thickness.
【0037】〔16〕:前記基板補強部材は前記物性の
異なる複数種の部材を用いてセラミック基板裏面内に複
数個所の部分を具備させてあっても良いことを特徴とす
る請求項1〜15のいずれか1項請求項1に記載の加熱
体。[16] The substrate reinforcing member may have a plurality of portions on the back surface of the ceramic substrate by using a plurality of types of members having different physical properties. The heating element according to claim 1.
【0038】〔17〕:被加熱材を加熱する加熱体とし
て、前記請求項1〜16のいずれか1項に記載の加熱体
を備えたことを特徴とする加熱装置。[17] A heating device comprising the heating element according to any one of claims 1 to 16 as a heating element for heating a material to be heated.
【0039】〔18〕:被加熱材を耐熱性フィルムを介
して加熱体に密着させ、加熱体の熱を耐熱性フィルムを
介して被加熱材に与える加熱装置であり、加熱体が前記
請求項1〜16のいずれか1項に記載の加熱体であるこ
とを特徴とする加熱装置。[18] A heating device in which a material to be heated is brought into close contact with a heating body through a heat-resistant film, and heat of the heating body is applied to the material to be heated through the heat-resistant film. A heating device comprising the heating element according to any one of 1 to 16.
【0040】〔19〕:加熱体と加圧ローラとの間に耐
熱性フィルムを挟ませて加熱ニップ部を形成させ、該加
熱ニップ部の耐熱性フィルムと加圧ローラとの間に被加
熱材を導入して耐熱性フィルムと一緒に加熱ニップ部を
挟持搬送させて被加熱材を熱処理する加熱装置であり、
加熱体が前記請求項1〜16のいずれかに記載の加熱体
であることを特徴とする加熱装置。[19]: A heat nip is formed by sandwiching a heat-resistant film between the heating element and the pressure roller, and a material to be heated is interposed between the heat-resistant film and the pressure roller in the heat nip. Is a heating device that heats the material to be heated by nipping and transporting the heating nip together with the heat-resistant film,
A heating device, wherein the heating element is the heating element according to claim 1.
【0041】〔20〕:被加熱材が未定着画像を担持し
た記録媒体であり、該未定着画像を記録媒体に熱定着さ
せる装置であることを特徴とした請求項17,18又は
19に記載の加熱装置。[20] The apparatus according to claim 17, wherein the material to be heated is a recording medium carrying an unfixed image, and the apparatus is a device for thermally fixing the unfixed image to the recording medium. Heating equipment.
【0042】〔21〕:記録媒体に顕画剤像を形成する
像形成手段と、この顕画剤像を加熱処理する像加熱手段
を有し、該像加熱手段が前記請求項17〜20のいずれ
か1項に記載の加熱装置であることを特徴とした画像形
成装置。[21]: An image forming means for forming a developer image on a recording medium, and an image heating means for heating the developer image, wherein the image heating means according to claim 17 to 20. An image forming apparatus, which is the heating apparatus according to any one of the preceding claims.
【0043】〈作用〉過昇温時に該基板を割ることを意
図した個所以外の任意の個所に基板補強部材を設けたこ
とにより、該基板補強部材を設けた個所の強度を高める
ことや、熱ストレスを抑え、過昇温時に意図した個所で
加熱体基板を確実に割ることができるようにしている。<Function> By providing the substrate reinforcing member at any place other than the place where the substrate is intended to be broken at the time of excessive temperature rise, the strength of the place where the substrate reinforcing member is provided can be increased, Stress is suppressed, and the heating body substrate can be reliably broken at the intended location at the time of excessive temperature rise.
【0044】特に、過昇温時に基板を割ることを意図し
た個所と温度検知部材とを各々、基板の異なる位置に配
置し、該個所よりも温度検知部材側に基板補強部材を設
けたことにより、過昇温時に該温度検知部材形成位置で
加熱体基板が割れることを防止して安全性を向上させて
いる。In particular, a point intended to break the substrate at the time of excessive temperature rise and a temperature detecting member are respectively arranged at different positions on the substrate, and a substrate reinforcing member is provided on the temperature detecting member side of the point. In addition, when the temperature is excessively raised, the heating substrate is prevented from being cracked at the position where the temperature detecting member is formed, thereby improving safety.
【0045】[0045]
〈実施形態例1〉 §1.加熱装置の全体構成 図1は、本発明に基づく加熱体10を保持させたフィル
ム加熱方式の加熱装置の概略構成模型図を示している。
本形態例の加熱装置は加圧ローラ駆動式であり、本発明
に基づく加熱体10を保持させた加熱体ホルダ16を、
円筒状の耐熱性フィルム15を介して加圧ローラ17に
所定の押圧力をもって圧接させ、加熱体10との間に定
着ニップ部Nを形成している。<First embodiment> §1. Overall Configuration of Heating Apparatus FIG. 1 shows a schematic configuration model diagram of a film heating type heating apparatus holding a heating body 10 according to the present invention.
The heating device of this embodiment is a pressure roller drive type, and a heating element holder 16 holding the heating element 10 according to the present invention is
The fixing roller is pressed against the pressure roller 17 with a predetermined pressing force via the cylindrical heat-resistant film 15 to form a fixing nip portion N with the heating element 10.
【0046】この加圧ローラ17は不図示の駆動手段に
より矢印Aの方向に回転駆動される。該加圧ローラ17
の回転駆動による該加圧ローラ17と耐熱性フィルム1
5の外面との摩擦力により該耐熱性フィルム15に回転
力が作用して、該耐熱性フィルム15が加熱体10を保
持させた加熱体ホルダ16の外回りを矢印Aの方向(加
熱体10の幅方向)に回転する。The pressure roller 17 is driven to rotate in the direction of arrow A by driving means (not shown). The pressure roller 17
Roller 17 and heat-resistant film 1 by rotating the
5, a rotational force acts on the heat-resistant film 15 due to the frictional force with the outer surface of the heater 5, and the heat-resistant film 15 rotates around the heater holder 16 holding the heater 10 in the direction of arrow A (the direction of the heater 10). (Width direction).
【0047】そして加圧ローラ17の回転駆動により耐
熱性フィルム15の回転がなされ、加熱体10に対する
通電により加熱体10が所定の温度に昇温した状態にお
いて、定着ニップ部Nの耐熱性フィルム15と加圧ロー
ラ17との間に被加熱材である未定着トナー像Tを担持
した被記録材Pが投入されることで、加熱体10からの
熱が耐熱性フィルム15を介して被記録材Pに付与さ
れ、未定着トナー像Tが被記録材P面に熱定着される。
該定着ニップ部Nを通過した被記録材Pは耐熱性フィル
ム15の面から曲率分離されて搬送される。When the heat-resistant film 15 is rotated by the rotation of the pressure roller 17 and the heating element 10 is heated to a predetermined temperature by energizing the heating element 10, the heat-resistant film 15 in the fixing nip portion N is heated. A recording material P carrying an unfixed toner image T, which is a material to be heated, is inserted between the recording material P and the pressure roller 17 so that heat from the heating body 10 is transferred via the heat-resistant film 15 to the recording material P. The unfixed toner image T is heat-fixed to the surface of the recording material P.
The recording material P that has passed through the fixing nip N is conveyed after being separated from the surface of the heat-resistant film 15 by a curvature.
【0048】§2.加熱体10 図2は、本形態例1に基づく加熱体10表面の概略平面
図、図3はその裏面(背面)の概略平面図である。§2. Heating Body 10 FIG. 2 is a schematic plan view of the surface of the heating body 10 based on the first embodiment, and FIG. 3 is a schematic plan view of the back surface (back surface).
【0049】本形態例装置における加熱体10は、セラ
ミック基板12の表面に、その長手方向に沿う抵抗発熱
体パターン13aや、該発熱体パターン13aの片側端
部と接続された給電電極パターン21、該電極パターン
21と反対側の端部で発熱体パターン13aと接続され
該給電電極パターン21側へ折り返すAC導電パターン
13c等が形成されている。また該AC導電パターン1
3cが通電用のスルーホール26を介して基板裏面側に
形成された給電電極22と接続され、これらの給電電極
21→発熱体パターン13a→AC導電パターン13c
→給電電極22が一次回路を構成している。そして抵抗
発熱体パターン13a、AC導電パターン13cは外部
との絶縁耐圧を保つためにガラスペースト等をスクリー
ン印刷して乾燥、焼成させた表面保護層11aで被覆さ
れている。The heating element 10 of the apparatus of the present embodiment has a resistance heating element pattern 13a along the longitudinal direction thereof on the surface of the ceramic substrate 12 and a power supply electrode pattern 21 connected to one end of the heating element pattern 13a. An AC conductive pattern 13c, which is connected to the heating element pattern 13a at the end opposite to the electrode pattern 21 and is folded toward the power supply electrode pattern 21, is formed. The AC conductive pattern 1
3c is connected to a power supply electrode 22 formed on the back surface of the substrate via a through-hole 26 for current supply, and the power supply electrode 21 → the heating element pattern 13a → the AC conductive pattern 13c.
→ The power supply electrode 22 forms a primary circuit. The resistance heating element pattern 13a and the AC conductive pattern 13c are covered with a surface protection layer 11a that is screen-printed with glass paste or the like, dried, and fired in order to maintain a withstand voltage against the outside.
【0050】一方、本形態例における加熱体10は、そ
の背面に温度検知素子14や、該温度検知素子14と接
続されたDC導電パターン24a・24b等よりなる2
次回路(温度検知手段)が設けられ、該2次回路の導電
パターン24a・24b中の銀イオンによるマイグレー
ション防止のため、該導電パターン24a・24b上に
はガラスペースト等をスクリーン印刷して、乾燥、焼成
させた保護層11bが被覆されている。該二次回路はD
C導電パターン24a・24bが各々表面側に形成され
た2次電極25a・25bとスルーホール25c・25
dを介して接続され、不図示の温度制御回路と通じてい
る。On the other hand, the heating element 10 according to the present embodiment includes a temperature detecting element 14 on its back surface, and DC conductive patterns 24a and 24b connected to the temperature detecting element 14, and the like.
A secondary circuit (temperature detecting means) is provided, and a glass paste or the like is screen-printed on the conductive patterns 24a and 24b to prevent migration by silver ions in the conductive patterns 24a and 24b of the secondary circuit, and dried. And the fired protective layer 11b. The secondary circuit is D
Secondary electrodes 25a and 25b and through holes 25c and 25 having C conductive patterns 24a and 24b formed on the surface side, respectively.
d, and communicates with a temperature control circuit (not shown).
【0051】本形態例では、DC導電パターン24a・
24bと保護層11bとが基板補強部材を兼ねており、
DC導電パターン24aの幅を発熱体13よりも広く
し、また、該DC導電パターン24aとDC導電パター
ン24bとを、幅方向すなわち紙搬送方向において、発
熱体13aより上流側から、折り返し導電パターン13
cより下流側にかけて設けている。このようにセラミッ
ク基板12よりも熱伝導率の高い導電パターン24a,
24bを基板幅方向に広く配設したことにより、熱の伝
達を速くし、熱ストレスを緩和させている。さらに保護
層11により、この部分の屈折強度を高めている。In this embodiment, the DC conductive patterns 24a
24b and the protective layer 11b also serve as a substrate reinforcing member,
The width of the DC conductive pattern 24a is made wider than that of the heating element 13, and the DC conductive pattern 24a and the DC conductive pattern 24b are folded from the upstream side of the heating element 13a in the width direction, that is, in the paper conveyance direction.
It is provided downstream from c. As described above, the conductive patterns 24a, 24a,
By arranging 24b wide in the substrate width direction, heat transfer is accelerated and thermal stress is reduced. Further, the protective layer 11 increases the refraction intensity in this portion.
【0052】本形態例において該セラミック基板12
は、ニップ側面における被記録材Pの搬送・移動方向に
対して直交する幅方向を長手とする横長・薄肉の形状を
有し、例えば、長さ270mm・幅7mm・厚さ0.6
35mmの、アルミナ等の耐熱性・電気絶縁性・低熱容
量のセラミック基材である。In this embodiment, the ceramic substrate 12
Has a horizontally long and thin shape whose longitudinal direction is the width direction perpendicular to the conveying / moving direction of the recording material P on the nip side surface. For example, the length is 270 mm, the width is 7 mm, and the thickness is 0.6.
35 mm heat-resistant, electrically insulating, low heat capacity ceramic substrate such as alumina.
【0053】抵抗発熱体パターン13aは、例えば、銀
パラジウム(Ag/Pb)・Ta2N等の電気抵抗材料
ペースト(抵抗ペースト)を厚さ10μm、幅1mmの
細帯状にセラミック基材面長手に沿って略並行にスクリ
ーン印刷等により塗工し焼成することで形成したもので
ある。The resistive heating element pattern 13a is formed by applying an electric resistance material paste (resistive paste) such as silver palladium (Ag / Pb) .Ta2N into a strip having a thickness of 10 μm and a width of 1 mm along the length of the ceramic substrate surface. It is formed by applying and firing by screen printing or the like substantially in parallel.
【0054】そして、DC導電パターン24a,24b
はAg等のペーストをスクリーン印刷等により塗工し焼
成することで形成したものであり、例えばDC導電パタ
ーン24bを厚さ30μm、幅4mmの細帯状に基板面
の片側長辺に沿って形成し、これと平行にDC導電パタ
ーン24aを厚さ15μm、幅0.7mmで形成してい
る。Then, the DC conductive patterns 24a, 24b
Is formed by applying a paste of Ag or the like by screen printing and baking. For example, a DC conductive pattern 24b is formed in a narrow band shape of 30 μm in thickness and 4 mm in width along one long side of the substrate surface. In parallel with this, a DC conductive pattern 24a is formed with a thickness of 15 μm and a width of 0.7 mm.
【0055】尚、本例の如くDC導電パターン24a,
24bを基板補強部材として用いる場合、該DC導電パ
ターン24a,24bを基板以上の強度、弾性、延性、
塑性、良熱伝導性、良断熱性のいずれか或いはそれらの
組み合わせを有する材質で構成することや、基板幅内に
おいて0.1mm以上の幅、基板長手方向において1.
0mm以上の長さ、そして1.0μm以上の厚さで形成
するのが良い。更に望ましくは、該基板補強部材の幅を
1.0mm以上、該長さを1.0mm以上、そして該厚
さを20μm以上で形成するのが良い。The DC conductive patterns 24a, 24a,
When 24b is used as a substrate reinforcing member, the DC conductive patterns 24a and 24b are formed to have strength, elasticity, ductility,
It may be made of a material having any of plasticity, good thermal conductivity, good heat insulation or a combination thereof, a width of 0.1 mm or more within the width of the substrate, and 1.
It is preferable to form it with a length of 0 mm or more and a thickness of 1.0 μm or more. More preferably, the substrate reinforcing member is formed to have a width of 1.0 mm or more, a length of 1.0 mm or more, and a thickness of 20 μm or more.
【0056】而して、該給電電極21・22間にAC電
力が供給されることで発熱体パターン13aが発熱し、
このときの加熱体温度を温度検知手段で検知し、該温度
検知情報に基づいて温度制御回路により一次回路へのA
C電力を調整して加熱体10を所定の定着温度に制御し
ている。When the AC power is supplied between the power supply electrodes 21 and 22, the heating element pattern 13a generates heat,
At this time, the temperature of the heating element is detected by a temperature detecting means, and A is sent to a primary circuit by a temperature control circuit based on the temperature detection information.
The heating element 10 is controlled to a predetermined fixing temperature by adjusting the C power.
【0057】図4は、本例装置の通常稼働時における、
ヒータ基板の図2、図3中G線で示した位置での温度分
布を示した概略図である。同図中のグラフは、横軸に加
熱体の幅方向の位置、縦軸に温度をとっている。通常稼
働時は、加圧ローラ17及びフィルム15は回転してい
るため、加熱体10によりうけた熱を下流側へ運ぶ。そ
のため温度分布のピークは、発熱体中心より下流側へず
れ、屈折強度の最も強い基板中央x0に位置している。FIG. 4 shows a state in which the apparatus of this embodiment operates normally.
FIG. 4 is a schematic diagram illustrating a temperature distribution of a heater substrate at a position indicated by a G line in FIGS. 2 and 3. In the graph in the figure, the horizontal axis represents the position in the width direction of the heating element, and the vertical axis represents the temperature. During normal operation, since the pressure roller 17 and the film 15 are rotating, the heat received by the heating element 10 is transferred to the downstream side. Therefore, the peak of the temperature distribution shifts to the downstream side from the center of the heating element and is located at the substrate center x0 having the highest refraction intensity.
【0058】一方図5は、上記加熱装置のヒータ10に
おいて通電制御系の暴走などにより、急激に過剰の電流
が流れ、過剰の発熱がおきた瞬間のG線で示した位置で
の温度分布である。この場合、加圧ローラ17やフィル
ム15によって熱が下流へ運ばれるよりも早く瞬間的に
熱量が増えるため、温度分布のピークは、通常稼働時よ
りも高い温度αで、発熱体中心x1上に位置し、上流側
の基板端により近くなる。そのため温度ピークと下流基
板端との温度差が大きくなり熱ストレスが大きい。なお
本加熱装置の立ち上げ時、加圧ローラ17の停止を伴う
加熱装置の暴走時においてもこれと同様な傾向の温度分
布となる。On the other hand, FIG. 5 shows the temperature distribution at the position indicated by the G line at the moment when excessive current flows suddenly due to runaway of the power supply control system in the heater 10 of the heating device and excessive heat is generated. is there. In this case, since the amount of heat instantaneously increases faster than the heat is transferred downstream by the pressure roller 17 and the film 15, the peak of the temperature distribution has a higher temperature α than in the normal operation, and the temperature distribution peaks on the heating element center x1. Located closer to the upstream substrate edge. Therefore, the temperature difference between the temperature peak and the downstream substrate end increases, and the thermal stress increases. When the heating device is started up and the heating device goes out of control with the stop of the pressure roller 17, the temperature distribution has the same tendency.
【0059】また図6は、やはり通電制御系の暴走など
により、急激に過剰の電流が流れ、過剰の発熱がおきた
瞬間の図3中H線で示した位置での温度分布である。こ
の時、H線位置においても通常使用時よりも高い値βの
温度ピークがやはり基板上流側に存在するが、DCパタ
ーン24および保護層11bによって基板上に熱が伝わ
りやすくなっているため、基板端部から中央部にかけて
の温度も均され、温度ピークは、G線位置と比べて低く
なるので、該G線位置よりも熱ストレスが少ない。さら
にDC導伝パターン24、保護層11bが基板12の屈
折強度をあげているのに対してG線位置近傍にはスルー
ホール27があるため、屈折強度は、相対的にH線位置
の方が高くなる。したがって急激に過剰の発熱が起きた
場合にG線位置で確実に割ることができ、二次回路の断
線を防止できる。FIG. 6 shows the temperature distribution at the position indicated by the line H in FIG. 3 at the moment when excessive current flows rapidly due to runaway of the power supply control system and excessive heat is generated. At this time, even at the H-line position, a temperature peak having a higher value β than that in the normal use still exists on the upstream side of the substrate. However, since the DC pattern 24 and the protective layer 11b facilitate heat transfer on the substrate, The temperature from the end to the center is also equalized, and the temperature peak is lower than the G-line position, so that the thermal stress is lower than at the G-line position. Further, while the DC conduction pattern 24 and the protective layer 11b increase the refraction intensity of the substrate 12, the through-hole 27 is provided near the G-line position. Get higher. Therefore, when excessive heat is suddenly generated, it can be surely divided at the G-line position, and disconnection of the secondary circuit can be prevented.
【0060】なおDC導電パターン24、保護層11b
の熱容量は加熱装置全体の熱容量に対して十分に小さい
ため、通常使用時のような定常的状態においては、断面
Hの温度分布はG線位置と同じく図4の様になる。その
ため、G線位置とH線位置の定着性、および熱ストレス
は変わらない。The DC conductive pattern 24 and the protective layer 11b
Is sufficiently smaller than the heat capacity of the entire heating device, and in a steady state such as during normal use, the temperature distribution of the cross section H is as shown in FIG. Therefore, the fixability of the G-line position and the H-line position and the thermal stress do not change.
【0061】以上のように本形態例によれば、通常使用
時の定着性の長手方向のむらを生じることがなく、急激
に過剰の発熱を生じた場合に、過昇温時に割れることを
意図した個所(スルーホール27形成個所)よりも2次
回路形成部分の方の熱ストレスが少なく、基板の強度も
高いため、破損すると1次回路と2次回路の縁面距離が
確保しにくい2次回路形成部分での加熱体破損を防ぎ、
意図した個所で確実に割れる構成とし、このマージンを
上げて安全性を向上させることができた。As described above, according to the present embodiment, it is intended that the fixing property does not become uneven in the longitudinal direction during normal use, and that when excessive heat is generated suddenly, cracking occurs when the temperature rises excessively. Since the thermal stress in the portion where the secondary circuit is formed is smaller than that in the portion where the through hole 27 is formed, and the strength of the substrate is higher, it is difficult to secure the edge surface distance between the primary circuit and the secondary circuit if broken. Prevent breakage of the heating element in the forming part,
The structure was designed so that it could be reliably split at the intended location, and this margin was increased to improve safety.
【0062】〈実施形態例2〉図7は、本形態例に基づ
く加熱体10の概略平面図を示している。本形態例は、
加熱体破損時に1次回路と2次回路の縁面距離が確保し
にくい加熱体基板上DC導電パターン側に、銀ペースト
のダミー電極24cをスクリーン印刷し、その上を形態
例1と同様にマイグレーション対策に保護層11bで被
覆したものであり、その他の構成は、形態例1と略同じ
である。<Embodiment 2> FIG. 7 is a schematic plan view of a heating element 10 based on this embodiment. In this embodiment,
A dummy electrode 24c of silver paste is screen-printed on the side of the DC conductive pattern on the heater substrate where it is difficult to secure an edge distance between the primary circuit and the secondary circuit when the heater is damaged, and migration is performed in the same manner as in the first embodiment. This is covered with a protective layer 11b as a countermeasure, and the other configuration is substantially the same as that of the first embodiment.
【0063】本形態例では、DC導電パターン24a・
24b、ダミー電極24c及び保護層11bが基板補強
部材を構成しており、これらの部材を形成形成したこと
によって屈折強度を増し、破損しにくくしていると共
に、基板12よりも熱伝導率の高いDC導電パターン2
4a・24b、ダミー電極24cが基板幅方向の広い範
囲にわたって設けられているために、急速に昇温した場
合等でも基板端部と中央部との温度を速やかに均すこと
ができ、熱ストレスの発生を抑えている。In this embodiment, the DC conductive patterns 24a
24b, the dummy electrode 24c, and the protective layer 11b constitute a substrate reinforcing member. By forming and forming these members, the refraction intensity is increased, the material is hardly damaged, and the thermal conductivity is higher than that of the substrate 12. DC conductive pattern 2
Since the dummy electrodes 4a and 24b and the dummy electrodes 24c are provided over a wide range in the substrate width direction, even when the temperature is rapidly increased, the temperature between the edge and the central portion of the substrate can be quickly equalized, and thermal stress can be reduced. The occurrence of is suppressed.
【0064】また本形態例では、基板補強部材の一要素
としてのダミー電極24cをDC導電パターン24a・
24bと同じ材料で形成しており、別種の材料を必要と
しない。また、ダミー電極24cは、結線されていない
ので比較的自由に所要の範囲に設けることができ、更
に、DC導電パターン24a・24bと同時に形成でき
るので製造工程数を増やすことがなく、製造が容易であ
る。In this embodiment, the dummy electrode 24c as one element of the substrate reinforcing member is connected to the DC conductive pattern 24a.
It is made of the same material as 24b, and does not require another kind of material. Further, since the dummy electrodes 24c are not connected, they can be provided relatively freely within a required range. Further, since the dummy electrodes 24c can be formed simultaneously with the DC conductive patterns 24a and 24b, the number of manufacturing steps is not increased, and manufacturing is easy. It is.
【0065】以上のように本形態例によれば、通常使用
時の定着性の長手方向のむらを生じることがなく、急激
に過剰の発熱を生じた場合には、2次回路形成部分での
加熱体破損を防ぎ且つ意図した個所で割れる構成とし、
このマージンを上げて安全性を向上させることができ
た。As described above, according to this embodiment, there is no unevenness in the longitudinal direction of the fixing property during normal use. To prevent body damage and to break at the intended location,
The safety was improved by increasing this margin.
【0066】尚、以上の形態例において、過昇温時に割
れることを意図した個所は、スルーホールを設けた構成
を示したが、本発明はこれに限らず、溝や未貫通孔等に
より基板の所要位置に脆弱部を形成する構成でも良い。
また脆弱部に限らず基板を保持する部材(ホルダー1
6)に突起等を設け、基板が熱膨張により変形(例えば
加熱体10のように発熱体中心と基板中心とをずらして
形成したものであれば基板幅方向両端部での熱膨張量の
差による湾曲)した際、該基板が該突起等に突き当たる
ように加熱体を保持させ、これにより過昇温時には該突
起等の突き当て位置で基板を割るように構成したもので
も良い。 〈画像形成装置例〉図8は画像形成装置例の概略構成図
である。本例の画像形成装置は転写式電子写真プロセス
利用の複写機或はプリンタである。In the above-described embodiment, the portion intended to be broken at the time of excessive temperature rise has a configuration in which a through hole is provided. However, the present invention is not limited to this. A fragile portion may be formed at a required position.
In addition, a member (holder 1) for holding a substrate, not only a fragile portion.
6) is provided with a projection or the like, and the substrate is deformed by thermal expansion (for example, if the substrate is formed with the center of the heating element and the center of the substrate displaced like the heating element 10, the difference in the amount of thermal expansion between both ends in the substrate width direction) The substrate may be configured to hold the heating element such that the substrate abuts on the projections or the like when the substrate is bent, thereby breaking the substrate at the abutting position of the projections or the like when the temperature rises excessively. <Example of Image Forming Apparatus> FIG. 8 is a schematic configuration diagram of an example of the image forming apparatus. The image forming apparatus of this embodiment is a copying machine or a printer using a transfer type electrophotographic process.
【0067】41は回転ドラム型の電子写真感光体であ
り、矢印の時計方向に所定のプロセススピード(周速
度)をもって回転駆動される。Reference numeral 41 denotes a rotating drum type electrophotographic photosensitive member, which is rotated at a predetermined process speed (peripheral speed) in a clockwise direction indicated by an arrow.
【0068】42は感光体帯電手段としての接触帯電ロ
ーラであり、所定の帯電バイアスが印加されていて、こ
の帯電ローラ42により回転感光体41面が所定の極性
・電位に一様に帯電処理される。Reference numeral 42 denotes a contact charging roller as a photosensitive member charging means. A predetermined charging bias is applied to the contact charging roller 42. The surface of the rotating photosensitive member 41 is uniformly charged to a predetermined polarity and potential by the charging roller 42. You.
【0069】この回転感光体41の帯電処理面に対して
不図示の画像情報露光手段部(原稿画像のスリット結像
露光手段、レーザビーム走査露光手段等)により目的の
画像情報の露光Lがなされて、回転感光体41面に目的
の画像情報に対応した静電潜像が形成される。Exposure L of the target image information is performed on the charged processing surface of the rotating photoreceptor 41 by an image information exposure unit (not shown) such as a slit image exposure unit of a document image and a laser beam scanning exposure unit. Thus, an electrostatic latent image corresponding to the target image information is formed on the surface of the rotating photoconductor 41.
【0070】そして現像装置43により該潜像形成面に
対し顕画剤(トナー)が付与されて該潜像が顕画化(ト
ナー像化)される。Then, a developing agent (toner) is applied to the latent image forming surface by the developing device 43 to visualize the latent image (toner image).
【0071】そのトナー画像が、回転感光体41とこれ
に対向配置された転写ローラ44との間(転写部)にお
いて、不図示の給紙部から所定のタイミングにて搬送さ
れた被記録材としての転写材Pに対して転写されてい
く。The toner image is transferred between the rotating photoreceptor 41 and the transfer roller 44 disposed opposite thereto (transfer section) as a recording material conveyed at a predetermined timing from a paper supply section (not shown). Is transferred to the transfer material P.
【0072】該転写部を通過してトナー画像の転写を受
けた転写材Pは回転感光体41面から分離され、前述の
フィルム加熱方式の加熱装置である像加熱装置Rに搬送
導入されて未定着トナー画像の加熱定着処理を受け、コ
ピー或はプリントとして出力される。The transfer material P that has received the transfer of the toner image after passing through the transfer section is separated from the surface of the rotating photoreceptor 41, is conveyed to the image heating device R, which is the above-described film heating type heating device, and is undecided. The toner image is subjected to a heat fixing process, and is output as a copy or a print.
【0073】一方、転写材Pに対するトナー画像転写後
の回転感光体41面はクリーニング装置45により転写
残りトナー等の残留付着物の除去を受けて清掃され、繰
り返して作像に供される。On the other hand, the surface of the rotary photoreceptor 41 after the transfer of the toner image to the transfer material P is cleaned by the cleaning device 45 to remove residual deposits such as untransferred toner, and is repeatedly provided for image formation.
【0074】[0074]
【発明の効果】以上説明したように、本発明によれば、
過昇温時に意図した個所で加熱体基板を確実に割ること
のできる構成とした加熱体、加熱装置及び画像形成装置
を提供することができる。As described above, according to the present invention,
It is possible to provide a heating element, a heating device, and an image forming apparatus having a configuration in which a heating element substrate can be reliably split at a position intended at an excessive temperature rise.
【図1】 本発明にかかる実施形態例1の加熱装置の断
面模型図FIG. 1 is a schematic cross-sectional view of a heating device according to a first embodiment of the present invention.
【図2】 実施形態例1の加熱体表面の平面模型図FIG. 2 is a plan model view of the surface of a heating body according to the first embodiment.
【図3】 実施形態例1の加熱体裏面の平面模型図FIG. 3 is a schematic plan view of the back surface of the heating body according to the first embodiment.
【図4】 通常駆動時の加熱体G線位置での温度分布図FIG. 4 is a temperature distribution diagram at a position of a heating element G line during normal driving.
【図5】 過昇温時の加熱体G線位置での温度分布図FIG. 5 is a temperature distribution diagram at a position of a heating body G line at the time of excessive temperature rise.
【図6】 過昇温時の加熱体H線位置での温度分布図FIG. 6 is a temperature distribution diagram at a position of a heating body H line at the time of excessive temperature rise.
【図7】 実施形態例2の加熱体の平面模型図FIG. 7 is a plan view of a heating element according to the second embodiment.
【図8】 本発明の画像形成装置の概略構成図FIG. 8 is a schematic configuration diagram of an image forming apparatus of the present invention.
【図9】 従来の加熱装置の概略構成図FIG. 9 is a schematic configuration diagram of a conventional heating device.
10 加熱体 11a,11b 保護層 12 加熱体基板 13a,13b 抵抗発熱体 13c 抵抗発熱体の折り返し導電パターン 14 温度検知素子 15 耐熱性フィルム 16 加熱体ホルダ 17 加圧ローラ 21,22給電電極パターン 24a,24b DC導電パターン 25a,25b 二次電極 25c,25d,26 通電用スルーホール 27 スルーホール Reference Signs List 10 heating element 11a, 11b protective layer 12 heating element substrate 13a, 13b resistance heating element 13c folded conductive pattern of resistance heating element 14 temperature sensing element 15 heat resistant film 16 heating element holder 17 pressure roller 21, 22 power supply electrode pattern 24a, 24b DC conductive pattern 25a, 25b Secondary electrode 25c, 25d, 26 Through-hole for conduction 27 Through-hole
Claims (21)
て、過昇温時に該基板を割ることを意図した個所を有
し、該個所以外の任意の個所に基板補強部材を有するこ
とを特徴とする加熱体。1. A heater having a heating element on a substrate, wherein the heater has a portion intended to break the substrate when the temperature is excessively increased, and a substrate reinforcing member is provided at an arbitrary portion other than the portion. Heating body.
幅方向にずれるように発熱体を基板の片面側に配置した
加熱体において、過昇温時に該基板を割ることを意図し
た個所を有し、該個所以外の任意の個所に基板補強部材
を有することを特徴とする加熱体。2. A heating element in which a heating element is arranged on one side of a substrate so that a heat generation center is shifted in a width direction with respect to a substrate width center in the substrate. And a substrate reinforcing member at an arbitrary location other than the above location.
面側に温度検知部材を配置したことを特徴とする請求項
1又は2に記載の加熱体。3. The heating element according to claim 1, wherein a heating element is disposed on one side of the substrate, and a temperature detecting member is disposed on the other side.
所と温度検知部材とが異なる位置に配置され、該個所よ
りも温度検知部材側に基板補強部材を設けたことを特徴
とする請求項3に記載の加熱体。4. A temperature sensor according to claim 1, wherein a portion intended to crack the substrate when the temperature is excessively elevated and a temperature detecting member are arranged at different positions, and a substrate reinforcing member is provided on the temperature detecting member side of the portion. Item 4. A heating element according to Item 3.
部材としたことを特徴とする請求項3又は4に記載の加
熱体。5. The heating element according to claim 3, wherein the electrode of the temperature detecting member is the substrate reinforcing member.
を基板内長手方向で折り返し、長手方向片側の基板端に
該発熱体の電極を具備させ、前記過昇温時に基板を割る
ことを意図した個所を基板長手中心より該電極側に具備
させたことを特徴とする請求項1〜5のいずれか1項に
記載の加熱体。6. A heating element or a conductive path connected to the heating element is folded back in the longitudinal direction of the substrate, an electrode of the heating element is provided at one end of the substrate in the longitudinal direction, and the substrate is broken at the time of the excessive temperature rise. The heating element according to any one of claims 1 to 5, wherein the portion is provided on the electrode side from the longitudinal center of the substrate.
記温度検知部材の電極を配置したことを特徴とする請求
項6に記載の加熱体。7. The heating element according to claim 6, wherein an electrode of the temperature detecting member is disposed at an end of the substrate opposite to the electrode of the heating element.
された導電パターンと、該導電パターンに接続された温
度検知素子とを有し、該導電パターンが前記基板補強部
材を兼ねていることを特徴とする請求項1〜7のいずれ
か1項に記載の加熱体。8. The temperature detecting member has a conductive pattern formed on the substrate and a temperature detecting element connected to the conductive pattern, and the conductive pattern also serves as the substrate reinforcing member. The heating element according to claim 1, wherein:
とする請求項1〜8のいずれか1項に記載の加熱体。9. The heating element according to claim 1, wherein the substrate is made of ceramic.
個所が、基板に設けられたスルーホールであることを特
徴とする請求項1〜9のいずれか1項に記載の加熱体。10. The heating element according to claim 1, wherein a portion intended to crack the substrate when the temperature is excessively raised is a through hole provided in the substrate.
弾性、延性、塑性、良熱伝導性、良断熱性のいずれか或
いはそれらの組み合わせを有していることを特徴とする
請求項1〜10のいずれか1項に記載の加熱体。11. The substrate reinforcing member has strength equal to or higher than that of a substrate.
The heating element according to any one of claims 1 to 10, wherein the heating element has any one of elasticity, ductility, plasticity, good thermal conductivity, and good thermal insulation or a combination thereof.
て発熱体よりも広い幅で形成されていることを特徴とす
る請求項1〜11のいずれか1項に記載の加熱体。12. The heating element according to claim 1, wherein the substrate reinforcing member is formed to have a width wider than a heating element in a substrate width direction.
て0.1mm以上から任意の幅寸法で形成されているこ
とを特徴とする請求項1〜12のいずれか1項に記載の
加熱体。13. The heating element according to claim 1, wherein the substrate reinforcing member is formed to have an arbitrary width from 0.1 mm or more within the width of the substrate.
長手方向において1.0mm以上から任意の長さで形成
されていることを特徴とする請求項1〜13のいずれか
1項に記載の加熱体。14. The heating element according to claim 1, wherein the substrate reinforcing member is formed to have an arbitrary length from 1.0 mm or more in a longitudinal direction of the ceramic substrate. .
ら任意の厚さで形成されていることを特徴とする請求項
1〜14いずれか1項に記載の加熱体。15. The heating element according to claim 1, wherein the substrate reinforcing member is formed to have an arbitrary thickness from 1.0 μm or more.
複数種の部材を用いてセラミック基板裏面内に複数個所
の部分を具備させてあっても良いことを特徴とする請求
項1〜15のいずれか1項に記載の加熱体。16. The ceramic substrate as claimed in claim 1, wherein the substrate reinforcing member has a plurality of portions on the back surface of the ceramic substrate by using a plurality of kinds of members having different physical properties. Or a heating element according to claim 1.
記請求項1〜16のいずれか1項に記載の加熱体を備え
たことを特徴とする加熱装置。17. A heating device comprising the heating element according to claim 1 as a heating element for heating a material to be heated.
熱体に密着させ、加熱体の熱を耐熱性フィルムを介して
被加熱材に与える加熱装置であり、加熱体が前記請求項
1〜16のいずれか1項に記載の加熱体であることを特
徴とする加熱装置。18. A heating apparatus for bringing a material to be heated into close contact with a heating body via a heat-resistant film and applying heat of the heating body to the material to be heated via the heat-resistant film. A heating device comprising the heating element according to any one of Claims 16 to 16.
ィルムを挟ませて加熱ニップ部を形成させ、該加熱ニッ
プ部の耐熱性フィルムと加圧ローラとの間に被加熱材を
導入して耐熱性フィルムと一緒に加熱ニップ部を挟持搬
送させて被加熱材を熱処理する加熱装置であり、加熱体
が前記請求項1〜16のいずれかに記載の加熱体である
ことを特徴とする加熱装置。19. A heating nip portion is formed by sandwiching a heat-resistant film between a heating element and a pressure roller, and a material to be heated is introduced between the heat-resistant film and the pressure roller in the heating nip portion. It is a heating device for heat-treating the material to be heated by sandwiching and transporting the heating nip portion together with the heat-resistant film, wherein the heating element is the heating element according to any one of claims 1 to 16. Heating equipment.
媒体であり、該未定着画像を記録媒体に熱定着させる装
置であることを特徴とした請求項17,18又は19に
記載の加熱装置。20. The heating apparatus according to claim 17, wherein the material to be heated is a recording medium carrying an unfixed image, and the apparatus is a device for thermally fixing the unfixed image to the recording medium. apparatus.
手段と、この顕画剤像を加熱処理する像加熱手段を有
し、該像加熱手段が前記請求項17〜20のいずれか1
項に記載の加熱装置であることを特徴とした画像形成装
置。21. An image forming means for forming a developer image on a recording medium, and an image heating means for heat-treating the developer image, wherein the image heating means is one of the above-mentioned claims 17 to 20. 1
An image forming apparatus, wherein the image forming apparatus is the heating apparatus described in the above section.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25285697A JPH1184925A (en) | 1997-09-02 | 1997-09-02 | Heating body, heating device and image forming device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25285697A JPH1184925A (en) | 1997-09-02 | 1997-09-02 | Heating body, heating device and image forming device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH1184925A true JPH1184925A (en) | 1999-03-30 |
Family
ID=17243132
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP25285697A Pending JPH1184925A (en) | 1997-09-02 | 1997-09-02 | Heating body, heating device and image forming device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH1184925A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8669495B2 (en) | 2006-02-07 | 2014-03-11 | Canon Kabushiki Kaisha | Heater having heat generating resistor on substrate and image heating apparatus mounting heater thereon |
JP2018156069A (en) * | 2017-03-17 | 2018-10-04 | ゼロックス コーポレイションXerox Corporation | Solid body fixation heater and operation method |
JP2019203945A (en) * | 2018-05-22 | 2019-11-28 | キヤノン株式会社 | Fixing device |
-
1997
- 1997-09-02 JP JP25285697A patent/JPH1184925A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8669495B2 (en) | 2006-02-07 | 2014-03-11 | Canon Kabushiki Kaisha | Heater having heat generating resistor on substrate and image heating apparatus mounting heater thereon |
JP2018156069A (en) * | 2017-03-17 | 2018-10-04 | ゼロックス コーポレイションXerox Corporation | Solid body fixation heater and operation method |
JP2019203945A (en) * | 2018-05-22 | 2019-11-28 | キヤノン株式会社 | Fixing device |
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