JPH1184459A - Exposure controller - Google Patents

Exposure controller

Info

Publication number
JPH1184459A
JPH1184459A JP9246940A JP24694097A JPH1184459A JP H1184459 A JPH1184459 A JP H1184459A JP 9246940 A JP9246940 A JP 9246940A JP 24694097 A JP24694097 A JP 24694097A JP H1184459 A JPH1184459 A JP H1184459A
Authority
JP
Japan
Prior art keywords
diaphragm
aperture
stop
exposure control
changing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9246940A
Other languages
Japanese (ja)
Other versions
JP3663850B2 (en
Inventor
Katsuaki Hirota
克明 廣田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP24694097A priority Critical patent/JP3663850B2/en
Publication of JPH1184459A publication Critical patent/JPH1184459A/en
Application granted granted Critical
Publication of JP3663850B2 publication Critical patent/JP3663850B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Diaphragms For Cameras (AREA)
  • Studio Devices (AREA)
  • Exposure Control For Cameras (AREA)

Abstract

PROBLEM TO BE SOLVED: To prevent the occurrence of diffraction at a diaphragm position (intermediate diaphragm) where the greater part of the aperture part of a diaphragm is made so as to be shut with a neutral density(ND) filter in an exposure controller in which the ND filter is fitted to the diaphragm. SOLUTION: This controller is equipped with an optical system 2 provided with a lens and a diaphragm 1 and in which an ND filter is fitted to a diaphragm blade constituting the diaphragm 1 to project it to the aperture part of the diaphragm 1, a driving means 7 adjusting the diaphragm position of the diaphragm 1, a detection means 9 detecting the diaphragm position of the diaphragm 1, an image pickup means 12 converting light passing through the diaphragm 1 to an electric signal and a control means 11 changing the diaphragm position of the diaphragm 1 by the driving means 7 in response to the output level of the image pickup means 12 while referring to the detected result of the detection means 9 and executing such control that the diaphragm position of the diaphragm 1 is fixed without the range when the output level of the image pickup means 12 is the level that the diaphragm position of the diaphragm 1 should be fixed within the range that diffraction occurs in the intermediate diaphragm and the output level of the image pickup means 12 is electrically corrected.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、絞りの開閉によっ
て入射光量を制御する露出制御装置に関し、特に、絞り
羽に光学フィルタを取り付けた露出制御装置において回
折の発生を防止できるようにしたものに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure control apparatus for controlling the amount of incident light by opening and closing an aperture, and more particularly to an exposure control apparatus in which an optical filter is attached to an aperture blade so as to prevent occurrence of diffraction. .

【0002】[0002]

【従来の技術】ビデオカメラや電子スチルカメラ等にお
いて、固体撮像素子(例えばCCD等)への入射光量を
制御するために用いられている露出制御装置の従来の構
成の一例を示すと、図3の通りである。被写体からの光
は、各種レンズと絞り(開口絞り)1とを含んだレンズ
ブロック2に入射される。絞り1は、例えば図4に示す
ように、厚さ方向上の位置を略厚さ分だけずらして向き
合って配置された2枚の平板状の絞り羽1a,1bを有
しており、この絞り羽1aと1bとが板面方向上で互い
に近づく向きまたは遠ざかる向きに変位することによ
り、それらの間の開口部分1cの大きさが変化する(即
ち絞り位置が変化する)ようになっている。
2. Description of the Related Art FIG. 3 shows an example of a conventional configuration of an exposure control device used for controlling the amount of light incident on a solid-state imaging device (for example, a CCD or the like) in a video camera, an electronic still camera, or the like. It is as follows. Light from a subject enters a lens block 2 including various lenses and a stop (aperture stop) 1. As shown in FIG. 4, for example, the diaphragm 1 has two flat plate-like diaphragm blades 1a and 1b which are arranged facing each other with their positions in the thickness direction shifted by substantially the thickness. When the wings 1a and 1b are displaced toward or away from each other in the direction of the plate surface, the size of the opening 1c between them changes (that is, the aperture position changes).

【0003】レンズブロック2を通った光は、CCD3
に結像されて電気信号に変換される。この電気信号は、
映像信号を生成するための信号処理部4に供給されると
ともに、検波回路5に送られて振幅レベルが検出され
る。
Light passing through the lens block 2 is transmitted to a CCD 3
And is converted into an electric signal. This electrical signal
The signal is supplied to a signal processing unit 4 for generating a video signal, and is also sent to a detection circuit 5 to detect an amplitude level.

【0004】マイクロコンピュータ6は、露出制御装置
の各部を制御するものであり、検波回路5の検出出力に
基づき(即ちCCD3への入射光量に基づき)、信号処
理部4への入力レベルを一定に保つための目標の絞り位
置を算出する。そして、絞り1の絞り位置を、絞り駆動
装置7でこの目標位置にまで変化させた後、絞り駆動装
置7を停止させて絞り位置を固定する。このようにし
て、CCD3への入射光量が制御される。
The microcomputer 6 controls each section of the exposure control device, and keeps the input level to the signal processing section 4 constant based on the detection output of the detection circuit 5 (ie, based on the amount of light incident on the CCD 3). Calculate the target aperture position to keep. Then, after the aperture position of the aperture 1 is changed to this target position by the aperture drive device 7, the aperture drive device 7 is stopped to fix the aperture position. In this way, the amount of light incident on the CCD 3 is controlled.

【0005】ところで、近年はCCD3の撮像面の小面
積化に伴ってレンズブロック2のレンズの口径が小さく
なっているので、入射光量が非常に増加した場合にそれ
に応じて絞り1を閉じていくと(以下、こうした絞り位
置を「小絞り」と呼ぶ)、絞り1の開口部分の面積が極
めて狭い状態で絞り位置が固定されることにより、絞り
1を通過する光に回折が生じてしまう。こうした回折が
生じると、レンズの結像性能が低下して画質の劣化を招
いてしまう。
In recent years, the aperture of the lens of the lens block 2 has become smaller as the area of the image pickup surface of the CCD 3 has become smaller. Therefore, when the amount of incident light greatly increases, the aperture 1 is closed accordingly. (Hereinafter, such a stop position is referred to as “small stop”), the light passing through the stop 1 is diffracted by fixing the stop position in a state where the area of the opening of the stop 1 is extremely small. When such diffraction occurs, the imaging performance of the lens is reduced, and the image quality is deteriorated.

【0006】こうした小絞りにおける回折の発生を防止
するために、従来は、例えば図4にも示しているよう
に、絞り羽1a,1bのうちの一方の絞り羽1aに、一
定濃度のNDフィルタ(中性フィルタ)8を、絞り1の
開口部分1cに突出させて取り付けるようにしていた。
これにより、入射光量が非常に増加した場合、回折が生
じる位置にまで絞り1を閉じなくても、光がNDフィル
タ8を透過するようになってCCD3への入射光量が減
少するようになる。
In order to prevent the occurrence of diffraction in such a small aperture, conventionally, as shown in FIG. 4, for example, an ND filter having a fixed density is applied to one of the aperture leaves 1a and 1b. The (neutral filter) 8 is mounted so as to protrude from the opening 1 c of the diaphragm 1.
As a result, when the amount of incident light greatly increases, even if the diaphragm 1 is not closed to a position where diffraction occurs, light passes through the ND filter 8 and the amount of incident light to the CCD 3 decreases.

【0007】[0007]

【発明が解決しようとする課題】しかし、このように絞
りにNDフィルタを取り付けた場合には、小絞りにおけ
る回折の発生を防止できるかわりに、NDフィルタを取
り付けない絞りでは回折が生じなかった別の絞り位置に
おいて、新たに回折が生じるという問題が生じていた。
However, when the ND filter is attached to the aperture as described above, diffraction can be prevented from occurring at the small aperture, but diffraction does not occur at the aperture without the ND filter. At the stop position, diffraction occurs newly.

【0008】その絞り位置とは、図5に示すように開口
部分1cの大半をNDフィルタ8が塞ぐようになった絞
り位置(以下、こうした絞り位置を「中間絞り」と呼
ぶ)であり、この中間絞りにおいて、NDフィルタ8に
塞がれていない部分(NDフィルタ8と絞り羽1bとの
隙間)の面積が極めて狭い状態で絞り位置が固定された
とき、この部分を通過する光に回折が生じてしまう。そ
の結果、この中間絞りにおいて、やはりレンズの結像性
能が低下して画質の劣化を招いてしまう。図6は、絞り
位置と、レンズの結像性能の指標であるMTF(Modula
tion Transfer Function)の値との関係の一例を示して
おり、中間絞りにおいて回折が生じる位置の範囲Aで
は、MTFの値が画質の劣化を招かないための許容レベ
ルLを下回っている様子が表れている。
The stop position is a stop position at which the ND filter 8 blocks most of the opening portion 1c as shown in FIG. 5 (hereinafter, such a stop position is called an "intermediate stop"). In the intermediate stop, when the stop position is fixed in a state where the area of the portion not closed by the ND filter 8 (the gap between the ND filter 8 and the stop blade 1b) is extremely small, the light passing through this portion is diffracted. Will happen. As a result, in the intermediate stop, the image forming performance of the lens is also lowered, and the image quality is deteriorated. FIG. 6 shows an aperture position and an MTF (Modula) which is an index of the imaging performance of the lens.
This shows an example of the relationship with the value of the MTF in the range A where the diffraction occurs at the intermediate aperture, where the MTF value is below the allowable level L for preventing the image quality from deteriorating. ing.

【0009】本発明は上述の点に鑑みてなされたもの
で、絞りにNDフィルタのような光学フィルタを取り付
けた露出制御装置において、中間絞りにおける回折の発
生を防止できるようにしたものを提供しようとするもの
である。
SUMMARY OF THE INVENTION The present invention has been made in view of the above points, and it is an object of the present invention to provide an exposure control apparatus in which an optical filter such as an ND filter is attached to an aperture so as to prevent diffraction at an intermediate aperture. It is assumed that.

【0010】[0010]

【課題を解決するための手段】本発明に係る露出制御装
置は、レンズ及び絞りを有しており、絞りを構成する絞
り羽に、絞りの開口部分に突出させて光学フィルタが取
り付けられた光学系と、絞りの絞り位置を調整する駆動
手段と、絞りの絞り位置を検出する検出手段と、この検
出手段の検出結果を参照しつつこの駆動手段で絞りの絞
り位置を変化させる制御手段であって、絞りの開口部分
において光学フィルタに塞がれていない部分を通る光に
回折が生じる範囲内(即ち中間絞りにおいて回折が生じ
る範囲内)では絞りの絞り位置を固定させない制御を行
う制御手段とを備えたことを特徴としている。
An exposure control device according to the present invention has a lens and a diaphragm, and an optical filter in which an optical filter is attached to a diaphragm blade constituting the diaphragm so as to protrude from an opening of the diaphragm. System, driving means for adjusting the diaphragm position of the diaphragm, detecting means for detecting the diaphragm position of the diaphragm, and control means for changing the diaphragm position of the diaphragm with this driving means while referring to the detection result of the detecting means. Control means for controlling the aperture position of the aperture so as not to be fixed within a range in which diffraction occurs in light passing through a portion of the aperture of the aperture not blocked by the optical filter (that is, in a range where diffraction occurs in the intermediate aperture). It is characterized by having.

【0011】この露出制御装置によれば、中間絞りにお
いて回折が生じる範囲内では、絞りの絞り位置を固定さ
せない制御が行われる。換言すれば、中間絞りにおいて
回折が生じる範囲は、絞り位置を固定することを禁止さ
れた禁止領域となる。これにより、中間絞りにおける回
折の発生が防止されるようになる。
According to this exposure control device, control is performed so that the stop position of the stop is not fixed within a range where diffraction occurs in the intermediate stop. In other words, the range in which diffraction occurs in the intermediate stop is a prohibited area where fixing of the stop position is prohibited. This prevents diffraction at the intermediate stop.

【0012】次に、本発明に係る露出制御装置は、レン
ズ及び絞りを有しており、絞りを構成する絞り羽に、絞
りの開口部分に突出させて光学フィルタが取り付けられ
た光学系と、絞りの絞り位置を変化させるための駆動手
段と、絞りの絞り位置を検出する検出手段と、絞りを通
った光を電気信号に変換する撮像手段と、この検出手段
の検出結果を参照しつつ、この撮像手段の出力レベルに
応じてこの駆動手段で絞りの絞り位置を変化させる制御
手段であって、撮像手段の出力レベルが、絞りの絞り位
置を前述の禁止領域内に固定させるべきレベルであると
き、絞り位置をこの禁止領域外に固定させるとともに撮
像手段の出力レベルを電気的に補正する制御を行う制御
手段とを備えたことを特徴としている。
Next, an exposure control device according to the present invention has an optical system having a lens and a diaphragm, and an optical system in which an optical filter is attached to a diaphragm blade forming the diaphragm so as to protrude from an opening of the diaphragm. Driving means for changing the aperture position of the aperture, detection means for detecting the aperture position of the aperture, imaging means for converting light passing through the aperture to an electric signal, and referring to the detection result of this detection means, Control means for changing the diaphragm position of the diaphragm by the driving means in accordance with the output level of the imaging means, wherein the output level of the imaging means is a level at which the diaphragm position of the diaphragm should be fixed within the above-described prohibited area. At this time, a control means for controlling the aperture position to be fixed outside the prohibited area and electrically correcting the output level of the imaging means is provided.

【0013】この露出制御装置によれば、撮像手段の出
力レベルが、絞りの絞り位置を禁止領域に固定させるべ
きレベルであるとき、絞り位置を禁止領域外に固定させ
るとともに撮像手段の出力レベルを電気的に補正する制
御が行われる。即ち、このとき、絞りを開閉する代わり
に信号レベルを電気的に補正することによって露出の制
御が行われる。これにより、中間絞りにおける回折の発
生が防止されるとともに、露出制御の連続的な実行が確
保されるようになる。
According to this exposure control device, when the output level of the imaging means is a level at which the aperture position of the aperture should be fixed in the prohibited area, the aperture position is fixed outside the prohibited area and the output level of the imaging means is reduced. Control for electrically correcting is performed. That is, at this time, the exposure is controlled by electrically correcting the signal level instead of opening and closing the aperture. As a result, the occurrence of diffraction at the intermediate stop is prevented, and continuous execution of exposure control is ensured.

【0014】[0014]

【発明の実施の形態】図1は本発明に係る露出制御装置
の構成の一例を示すものであり、図3と同一の部分には
同一の符号を付して重複説明を省略する。この露出制御
装置の絞り1にも、図3に示したのと同様にして、ND
フィルタが取り付けられている。
FIG. 1 shows an example of the configuration of an exposure control apparatus according to the present invention. The same parts as those in FIG. 3 are denoted by the same reference numerals, and redundant description will be omitted. In the same manner as shown in FIG.
Filter is installed.

【0015】図3の露出制御装置に対する相違点とし
て、この露出制御装置には、絞り1の絞り位置を検出す
る絞り位置検出装置9が設けられている。また、この装
置の各部を制御するマイクロコンピュータ10のROM
には、絞り1の絞り位置のうち、中間絞りにおいて回折
が生じる位置の範囲(図6における範囲A)のデータ
(例えばこの範囲を実測して得たデータ等)が、禁止領
域を示すデータとして予め記憶されている。
As a difference from the exposure control device of FIG. 3, the exposure control device is provided with an aperture position detection device 9 for detecting the aperture position of the aperture 1. Also, a ROM of a microcomputer 10 for controlling each part of the device.
In the stop position of the stop 1, data in a range (range A in FIG. 6) of a position where diffraction occurs at the intermediate stop (for example, data obtained by actually measuring this range) is used as data indicating a prohibited area. It is stored in advance.

【0016】この露出制御装置の動作例を説明すると、
次の通りである。マイクロコンピュータ10は、図3の
マイクロコンピュータ6と同様に、検波回路5の検出出
力に基づき、信号処理部4への入力レベルを一定に保つ
ための目標の絞り位置を算出する。そして、算出した目
標位置が、ROMに記憶した禁止領域外にある場合に
は、やはり図3のマイクロコンピュータ6と同様に、絞
り1の絞り位置を、絞り駆動装置7でこの目標位置にま
で変化させた後、絞り駆動装置7を停止させて絞り位置
を目標位置に固定する。
An operation example of the exposure control device will be described.
It is as follows. The microcomputer 10 calculates a target aperture position for keeping the input level to the signal processing unit 4 constant based on the detection output of the detection circuit 5, similarly to the microcomputer 6 of FIG. When the calculated target position is outside the prohibited area stored in the ROM, the aperture position of the aperture 1 is changed to the target position by the aperture driving device 7 as in the microcomputer 6 in FIG. After that, the aperture driving device 7 is stopped, and the aperture position is fixed at the target position.

【0017】これに対し、算出した目標位置が、ROM
に記憶した禁止領域内にある場合には、絞り位置検出装
置9の検出結果を参照しつつ、絞り駆動装置7で絞り1
の絞り位置を目標位置に向けて変化させ、禁止領域の直
前に達すると、絞り駆動装置7を停止させて絞り位置を
固定する。このように、中間絞りにおいて回折が生じる
位置の範囲内では、絞り1の絞り位置を固定させない制
御が行われるので、中間絞りにおける回折の発生が防止
されるようになる。
On the other hand, the calculated target position is stored in the ROM
If the stop position is within the prohibited area stored in the stop position, the stop driving device 7 refers to the detection result of the stop position
Is changed toward the target position, and when the stop reaches just before the prohibited area, the stop driving device 7 is stopped to fix the stop position. As described above, within the range of the position where diffraction occurs at the intermediate stop, control is performed so that the stop position of the stop 1 is not fixed, so that the occurrence of diffraction at the intermediate stop is prevented.

【0018】尚、このように禁止領域の直前で絞り位置
を固定する代わりに、禁止領域に入って目標位置に達し
ても絞り位置を変化させ続け、禁止領域を越えた直後に
絞り駆動装置7を停止させて絞り位置を固定するように
してもよい。特に、目標位置が禁止領域の直前の絞り位
置よりも禁止領域を越えた直後の絞り位置のほうに近い
場合には、このほうが望ましいといえる。
Instead of fixing the aperture position immediately before the prohibited area as described above, the aperture position continues to be changed even after entering the prohibited area and reaching the target position. May be stopped to fix the aperture position. This is particularly desirable when the target position is closer to the stop position immediately after passing through the prohibited area than to the stop position immediately before the prohibited area.

【0019】次に、図2は本発明に係る露出制御装置の
構成の別の一例を示すものであり、図1及び図3と同一
の部分には同一の符号を付して重複説明を省略する。こ
の露出制御装置の絞り1にもやはりNDフィルタが取り
付けられており、装置の各部を制御するマイクロコンピ
ュータ11のROMにはやはり禁止領域を示すデータが
記憶されている。
Next, FIG. 2 shows another example of the configuration of the exposure control apparatus according to the present invention. The same parts as those in FIGS. 1 and 3 are denoted by the same reference numerals, and redundant description is omitted. I do. An ND filter is also attached to the aperture 1 of the exposure control device, and data indicating a prohibited area is also stored in the ROM of the microcomputer 11 that controls each part of the exposure control device.

【0020】この露出制御装置には、電子シャッタ機能
が備わったCCD12と、CCD12から信号処理部4
に供給される信号を増幅する利得可変な増幅器13とが
設けられている。(但し、図1の露出制御装置でも、C
CD3に電子シャッタ機能が備わっていたり、CCD3
から信号処理部4に供給される信号を増幅する増幅器が
設けられていたりしてもよい。)
The exposure control device includes a CCD 12 having an electronic shutter function and a signal processing unit 4 from the CCD 12.
And a variable gain amplifier 13 for amplifying the signal supplied to the power supply. (However, even in the exposure control device of FIG. 1, C
CD3 has an electronic shutter function, CCD3
An amplifier for amplifying the signal supplied to the signal processing unit 4 may be provided. )

【0021】この露出制御装置の動作例を説明すると、
次の通りである。マイクロコンピュータ11は、図3の
マイクロコンピュータ6と同様に、検波回路5の検出出
力に基づき、信号処理部4への入力レベルを一定に保つ
ための目標の絞り位置を算出する。そして、算出した目
標位置が、ROMに記憶した禁止領域外にある場合に
は、やはり図3のマイクロコンピュータ6と同様に、絞
り1の絞り位置を、絞り駆動装置7でこの目標位置にま
で変化させた後、絞り駆動装置7を停止させて絞り位置
を目標位置に固定する。
An operation example of the exposure control device will be described.
It is as follows. The microcomputer 11 calculates a target aperture position for keeping the input level to the signal processing unit 4 constant based on the detection output of the detection circuit 5, similarly to the microcomputer 6 in FIG. When the calculated target position is outside the prohibited area stored in the ROM, the aperture position of the aperture 1 is changed to the target position by the aperture driving device 7 as in the microcomputer 6 in FIG. After that, the aperture driving device 7 is stopped, and the aperture position is fixed at the target position.

【0022】これに対し、算出した目標位置が、ROM
に記憶した禁止領域内にある場合には、マイクロコンピ
ュータ11は、絞り位置検出装置9の検出結果を参照し
つつ、絞り駆動装置7で絞り1の絞り位置を目標位置に
向けて変化させ、禁止領域の直前に達すると、絞り駆動
装置7を停止させて絞り位置を固定する。
On the other hand, the calculated target position is stored in the ROM
When the microcomputer 11 is in the prohibited area, the microcomputer 11 changes the aperture position of the aperture 1 toward the target position by the aperture driving device 7 while referring to the detection result of the aperture position detection device 9, and inhibits the microcomputer 11. When the stop reaches just before the area, the stop driving device 7 is stopped to fix the stop position.

【0023】そして、その固定した絞り位置における検
波回路5の検出出力に応じて増幅器13の利得またはC
CD3の電子シャッタのシャッタ速度のいずれか一方
(または両方)を変化させることにより、信号処理部4
への入力レベルを一定に保つようにする。
The gain of the amplifier 13 or the gain C of the amplifier 13 in accordance with the detection output of the detection circuit 5 at the fixed aperture position.
By changing one (or both) of the shutter speeds of the electronic shutter of the CD 3, the signal processing unit 4
To keep the input level constant.

【0024】即ち、その固定した絞り位置における検波
回路5の検出出力が、信号処理部4への入力レベルが上
記一定の入力レベルよりも高いことを示すものであると
きには、増幅器13の利得を下げること、または電子シ
ャッタのシャッタ速度を速くすること、のいずれか一方
(または両方)により、信号処理部4への入力レベルを
上記一定の入力レベルにまで下げる。他方、検波回路5
の検出出力が、信号処理部4への入力レベルが上記一定
の入力レベルよりも低いことを示すものであるときに
は、絞り1を開く代わりに、増幅器13の利得を上げる
こと、または電子シャッタのシャッタ速度を遅くするこ
と、のいずれか一方(または両方)により、信号処理部
4への入力レベルを上記一定の入力レベルにまで上げ
る。
That is, when the detection output of the detection circuit 5 at the fixed aperture position indicates that the input level to the signal processing section 4 is higher than the fixed input level, the gain of the amplifier 13 is reduced. And / or increasing the shutter speed of the electronic shutter, the input level to the signal processing unit 4 is reduced to the constant input level. On the other hand, the detection circuit 5
If the detected output indicates that the input level to the signal processing unit 4 is lower than the predetermined input level, the gain of the amplifier 13 is increased instead of opening the aperture 1 or the shutter of the electronic shutter The input level to the signal processing unit 4 is increased to the above-mentioned constant input level by either (or both) reducing the speed.

【0025】次に、このように絞り位置を禁止領域の直
前に固定した場合において、その後検波回路5の検出出
力が変動する(CCD3への入射光量が変動する)こと
に基づいて算出し直した目標位置が禁止領域外にあると
きには、マイクロコンピュータ11は、絞り1の絞り位
置を、絞り駆動装置7でこの目標位置にまで変化させた
後、絞り駆動装置7を停止させて絞り位置を目標位置に
固定する。
Next, in the case where the aperture position is fixed immediately before the prohibited area, the calculation is recalculated based on a change in the detection output of the detection circuit 5 (a change in the amount of light incident on the CCD 3). When the target position is outside the prohibited area, the microcomputer 11 changes the aperture position of the aperture 1 to the target position by the aperture driving device 7, and then stops the aperture driving device 7 to change the aperture position to the target position. Fixed to.

【0026】これに対し、絞り位置を禁止領域の直前に
固定した場合において、その後検波回路5の検出出力が
変動することに基づいて算出し直した目標位置がやはり
禁止領域内にあるときには、マイクロコンピュータ11
は、絞り1の絞り位置を固定させた状態のままで、前述
したのと同様にして増幅器13の利得またはCCD3の
電子シャッタのシャッタ速度のいずれか一方(または両
方)を変化させることにより、信号処理部4への入力レ
ベルを一定に保つようにする。
On the other hand, when the aperture position is fixed immediately before the prohibited area, and the target position recalculated based on the fluctuation of the detection output of the detection circuit 5 is still within the prohibited area, Computer 11
The signal is obtained by changing either one (or both) of the gain of the amplifier 13 or the shutter speed of the electronic shutter of the CCD 3 in the same manner as described above while keeping the aperture position of the aperture 1 fixed. The input level to the processing unit 4 is kept constant.

【0027】このように、中間絞りにおいて回折が生じ
る位置の範囲内では絞り1の絞り位置を固定させない制
御が行われるとともに、目標位置がこの範囲内にある場
合には絞り1を開閉する代わりに信号レベルを増幅器1
3の利得や電子シャッタのシャッタ速度を変化させて電
気的に補正して信号処理部4への入力レベルを一定に保
つ制御が行われることにより、中間絞りにおける回折の
発生が防止されるとともに、露出制御の連続的な実行が
確保される。
As described above, control is performed so that the stop position of the stop 1 is not fixed within the range of the position where diffraction occurs in the intermediate stop, and when the target position is within this range, the stop 1 is opened and closed instead of opening and closing. Amplifier 1 for signal level
By performing a control to keep the input level to the signal processing unit 4 constant by electrically correcting it by changing the gain of 3 and the shutter speed of the electronic shutter, the occurrence of diffraction at the intermediate diaphragm is prevented, Continuous execution of exposure control is ensured.

【0028】尚、以上の例では2枚の絞り羽を有する絞
りにNDフィルタを取り付けた光学系を有する露出制御
装置に本発明を適用しているが、2枚以外の適宜の枚数
の絞り羽を有する絞りにNDフィルタを取り付けた光学
系を有する露出制御装置に本発明を適用するようにして
よい。また、NDフィルタ以外の光学フィルタを絞りに
取り付けた露出制御装置にも本発明を適用してよい。
In the above example, the present invention is applied to an exposure control apparatus having an optical system in which an ND filter is attached to a diaphragm having two diaphragm blades. The present invention may be applied to an exposure control device having an optical system in which an ND filter is attached to a stop having the following. Further, the present invention may be applied to an exposure control device in which an optical filter other than the ND filter is attached to the stop.

【0029】また、以上の例ではCCDを用いた撮像装
置の露出制御装置に本発明を適用しているが、CCD以
外の固体撮像素子や撮像管を撮像手段として用いた撮像
装置の露出制御装置に本発明を適用するようにしてもよ
い。また、図1の例のように禁止領域内では絞り位置を
固定させない制御を行うが信号レベルを電気的に補正す
る制御は行わない露出制御装置は、ビデオカメラや電子
スチルカメラ等だけでなく、一般の写真機(スチルカメ
ラ)の露出制御装置にも適用してよい。
In the above example, the present invention is applied to an exposure control device of an image pickup device using a CCD. However, an exposure control device of an image pickup device using a solid-state image pickup device other than a CCD or an image pickup tube as an image pickup means. The present invention may be applied to a computer. Also, as in the example of FIG. 1, an exposure control device that performs control not to fix the aperture position in the prohibited area but does not perform control to electrically correct the signal level is not only a video camera or an electronic still camera, but also an exposure control device. The present invention may be applied to an exposure control device of a general camera (still camera).

【0030】また、本発明は、以上の実施例に限らず、
本発明の要旨を逸脱することなく、その他様々の構成を
とりうることはもちろんである。
The present invention is not limited to the above embodiment,
It goes without saying that various other configurations can be adopted without departing from the gist of the present invention.

【0031】[0031]

【発明の効果】以上のように、本発明に係る露出制御装
置によれば、中間絞りにおける回折の発生を、簡単な制
御により防止できるようになる。
As described above, according to the exposure control apparatus of the present invention, the generation of diffraction at the intermediate stop can be prevented by simple control.

【0032】また、絞りを通った光を電気信号に変換す
る撮像手段の出力レベルが、絞りの絞り位置を前述の禁
止領域内に固定させるべきレベルであるとき、絞り位置
をこの禁止領域外に固定させるとともに撮像手段の出力
レベルを電気的に補正する制御を行うようにした場合に
は、中間絞りにおける回折の発生を防止できるととも
に、露出制御の連続的な実行をも確保できるようにな
る。
When the output level of the imaging means for converting the light passing through the aperture into an electric signal is a level at which the aperture position of the aperture should be fixed within the above-described prohibited area, the aperture position is moved out of this prohibited area. In the case where the control for fixing the output level of the image pickup device is performed while the output level of the image pickup unit is fixed, it is possible to prevent the diffraction from occurring at the intermediate stop and to ensure the continuous execution of the exposure control.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係る露出制御装置の構成の一例を示す
ブロック図である。
FIG. 1 is a block diagram illustrating an example of a configuration of an exposure control device according to the present invention.

【図2】本発明に係る露出制御装置の構成の別の一例を
示すブロック図である。
FIG. 2 is a block diagram showing another example of the configuration of the exposure control device according to the present invention.

【図3】従来の露出制御装置の構成の一例を示すブロッ
ク図である。
FIG. 3 is a block diagram illustrating an example of a configuration of a conventional exposure control device.

【図4】絞りの構造の一例を示す図であり、Aは側面
図、Bは正面図である。
FIG. 4 is a diagram showing an example of the structure of the stop, where A is a side view and B is a front view.

【図5】図4の絞りの絞り位置が中間絞りである状態を
示す図であり、Aは側面図、Bは正面図である。
5 is a diagram showing a state where the stop position of the stop in FIG. 4 is an intermediate stop, where A is a side view and B is a front view.

【図6】レンズの結像性能と絞り位置との関係の一例を
示す図である。
FIG. 6 is a diagram illustrating an example of the relationship between the imaging performance of a lens and the aperture position.

【符号の説明】[Explanation of symbols]

1…絞り、 1a,1b…絞り羽、 1c…絞りの開口
部分、 2…レンズブロック、 3,12…CCD、
4…信号処理部、 5…検波回路、 6,10,11…
マイクロコンピュータ、 7…絞り駆動装置、 8…N
Dフィルタ、9…絞り位置検出装置、 13…増幅器
DESCRIPTION OF SYMBOLS 1 ... Aperture, 1a, 1b ... Aperture blade, 1c ... Aperture opening part, 2 ... Lens block, 3,12 ... CCD,
4 ... Signal processing unit, 5 ... Detection circuit, 6,10,11 ...
Microcomputer 7 ... Aperture drive device 8 ... N
D filter, 9 ... diaphragm position detector, 13 ... amplifier

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 レンズ及び絞りを有しており、該絞りを
構成する絞り羽に、該絞りの開口部分に突出させて光学
フィルタが取り付けられた光学系と、 前記絞りの絞り位置を変化させるための駆動手段と、 前記絞りの絞り位置を検出する検出手段と、 前記検出手段の検出結果を参照しつつ前記駆動手段で前
記絞りの絞り位置を変化させる制御手段であって、前記
開口部分において前記光学フィルタに塞がれていない部
分を通る光に回折が生じる範囲内では前記絞りの絞り位
置を固定させない制御を行う制御手段とを備えたことを
特徴とする露出制御装置。
1. An optical system having a lens and a diaphragm, wherein an optical system having an optical filter attached to a diaphragm blade constituting the diaphragm so as to protrude from an opening of the diaphragm, and changing a diaphragm position of the diaphragm. Driving means for detecting the stop position of the stop, control means for changing the stop position of the stop by the drive means with reference to the detection result of the detection means, An exposure control device comprising: a control unit that performs control so that a stop position of the stop is not fixed in a range in which diffraction occurs in light passing through a portion not blocked by the optical filter.
【請求項2】 レンズ及び絞りを有しており、該絞りを
構成する絞り羽に、該絞りの開口部分に突出させて光学
フィルタが取り付けられた光学系と、 前記絞りの絞り位置を変化させるための駆動手段と、 前記絞りの絞り位置を検出する検出手段と、 前記絞りを通った光を電気信号に変換する撮像手段と、 前記検出手段の検出結果を参照しつつ、前記撮像手段の
出力レベルに応じて前記駆動手段で前記絞りの絞り位置
を変化させる制御手段であって、前記撮像手段の出力レ
ベルが、前記開口部分において前記光学フィルタに塞が
れていない部分を通る光に回折が生じる範囲内に前記絞
りの絞り位置を固定させるべきレベルであるとき、前記
絞りの絞り位置を前記回折が生じる範囲外に固定させる
とともに前記撮像手段の出力レベルを電気的に補正する
制御を行う制御手段とを備えたことを特徴とする露出制
御装置。
2. An optical system having a lens and a diaphragm, wherein an optical system having an optical filter attached to a diaphragm blade forming the diaphragm so as to protrude from an opening of the diaphragm, and changing a diaphragm position of the diaphragm. A driving unit for detecting an aperture position of the aperture, an imaging unit for converting light passing through the aperture into an electric signal, and an output of the imaging unit while referring to a detection result of the detection unit. Control means for changing the diaphragm position of the diaphragm by the driving means in accordance with a level, wherein an output level of the imaging means is diffracted into light passing through a portion of the aperture not blocked by the optical filter. When the stop position of the stop is a level at which the stop position of the stop should be fixed within the range where the diffraction occurs, the stop position of the stop is fixed outside the range where the diffraction occurs, and the output level of the imaging unit is electrically set. Exposure control apparatus characterized by comprising a control means for positive control.
【請求項3】 請求項2に記載の露出制御装置におい
て、前記制御手段は、前記撮像手段の出力レベルを増幅
する利得可変な増幅器の利得を変化させることにより該
出力レベルを補正することを特徴とする露出制御装置。
3. The exposure control apparatus according to claim 2, wherein said control means corrects the output level by changing a gain of a variable gain amplifier for amplifying an output level of said imaging means. Exposure control device.
【請求項4】 請求項2または3に記載の露出制御装置
において、前記制御手段は、前記撮像手段の電子シャッ
タのシャッタ速度を変化させることにより該撮像手段の
出力レベルを補正することを特徴とする露出制御装置。
4. The exposure control device according to claim 2, wherein said control means corrects an output level of said image pickup means by changing a shutter speed of an electronic shutter of said image pickup means. Exposure control device.
JP24694097A 1997-09-11 1997-09-11 Exposure control device and exposure control method Expired - Fee Related JP3663850B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24694097A JP3663850B2 (en) 1997-09-11 1997-09-11 Exposure control device and exposure control method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24694097A JP3663850B2 (en) 1997-09-11 1997-09-11 Exposure control device and exposure control method

Publications (2)

Publication Number Publication Date
JPH1184459A true JPH1184459A (en) 1999-03-26
JP3663850B2 JP3663850B2 (en) 2005-06-22

Family

ID=17156013

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6930723B1 (en) * 1999-07-13 2005-08-16 Canon Kabushiki Kaisha Quantity-of-light adjusting apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6930723B1 (en) * 1999-07-13 2005-08-16 Canon Kabushiki Kaisha Quantity-of-light adjusting apparatus
US7557857B2 (en) 1999-07-13 2009-07-07 Canon Kabushiki Kaisha Quantity-of-light adjusting apparatus

Also Published As

Publication number Publication date
JP3663850B2 (en) 2005-06-22

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