JPH117611A - Sal bias mr head - Google Patents

Sal bias mr head

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Publication number
JPH117611A
JPH117611A JP16013297A JP16013297A JPH117611A JP H117611 A JPH117611 A JP H117611A JP 16013297 A JP16013297 A JP 16013297A JP 16013297 A JP16013297 A JP 16013297A JP H117611 A JPH117611 A JP H117611A
Authority
JP
Japan
Prior art keywords
film
sal
head
magnetization
soft magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP16013297A
Other languages
Japanese (ja)
Inventor
Toshio Kobayashi
俊雄 小林
Chiharu Mitsumata
千春 三俣
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Proterial Ltd
Original Assignee
Hitachi Metals Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Metals Ltd filed Critical Hitachi Metals Ltd
Priority to JP16013297A priority Critical patent/JPH117611A/en
Publication of JPH117611A publication Critical patent/JPH117611A/en
Withdrawn legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To fix a magnetic domain of a soft magnetic film forming a SAL film by providing two layers of soft magnetic films having a film thickness through which a switched connection magnetic field of an antiferromagnetic film is sufficiently permeable and impressing a sufficient lateral bias magnetic field on a MR film. SOLUTION: After an insulating layer 8 of a lower part reproducing gap has been formed on a lower part shield film, a tantalum film is firstly formed on this insulating film 8 as a base film 5a, and following this, a second soft magnetic film 2b of NiFeCr, an antiferromagnetic film 4 of NiMn, a first soft magnetic film 2a of NiFeCr, and a spacer 5b of tantalum film are sequentially formed in this order, and further, a NiFe film is formed thereon as an MR film 1, and finally, another tantalum film is formed again as a cap. When forming each film, a magnetic field is vertically impressed, and SAL film biasing structure is formed before a predetermined heat treatment is operated to fix a magnetization of the ferro-diamagnetic film and the SAL film to the lateral direction.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明はハードディスクドラ
イブ等の磁気記録装置の分野に使用されるMRヘッドに
係わるものであり、特に線形な出力を得ることができる
SALバイアスMRヘッドに関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an MR head used in the field of a magnetic recording device such as a hard disk drive, and more particularly to a SAL bias MR head capable of obtaining a linear output.

【0002】[0002]

【従来の技術】SALバイアスMRヘッドは、センス電
流が発生する磁界によってSAL膜の磁化を横方向に向
かせて、このSAL膜と磁気的に結合させることによ
り、磁気抵抗効果膜(以下MR膜と称する)に横方向の
バイアス磁界を印加する。MR膜の磁区の固定のために
印加する縦方向バイアス磁界と前記横方向のバイアス磁
界により、MR膜の磁化は縦方向から傾いた方向に向け
られる。MR膜の磁化が縦方向から45°程度傾いた方
向を向くと、MR膜は媒体磁界に対して線形な出力を発
生する。
2. Description of the Related Art A SAL biased MR head has a magnetoresistive film (hereinafter referred to as an MR film) which has a magnetic field generated by a sense current and causes the magnetization of the SAL film to be oriented in a lateral direction and is magnetically coupled to the SAL film. ) Is applied. The magnetization of the MR film is directed in a direction inclined from the vertical direction by the vertical bias magnetic field applied for fixing the magnetic domain of the MR film and the horizontal bias magnetic field. When the magnetization of the MR film is oriented in a direction inclined by about 45 ° from the longitudinal direction, the MR film generates a linear output with respect to the medium magnetic field.

【0003】図3に従来のハードバイアス型のSALバ
イアスMRヘッドを示す。同図はMR膜1と、MR膜1
にスペーサ5bを介して隣接するSAL膜2と、MR膜
1とSAL膜2の両端に縦バイアス膜として設置した永
久磁石膜3と、永久磁石膜3を電極としてMR膜1にセ
ンス電流を供給する電源7を備える。また、MR膜の媒
体対向面(ABS面)はMR膜1の手前の面とし、横方
向(デプス方向)は媒体対向面にほぼ垂直な向きを表
し、縦方向(トラック幅方向)は永久磁石3の磁化方向
24にほぼ平行な向きを表す。 MR膜の磁化の傾斜角
度、いわゆるバイアス角はθで表す。なお、図3に示す
MR膜の形状をストライプと称する。
FIG. 3 shows a conventional hard bias type SAL bias MR head. The figure shows an MR film 1 and an MR film 1
A sense current is supplied to the MR film 1 using the SAL film 2 adjacent to the MR film 1 and the SAL film 2 at both ends thereof as longitudinal bias films, and the permanent magnet film 3 as an electrode. The power supply 7 is provided. The medium facing surface (ABS surface) of the MR film is the surface in front of the MR film 1, the lateral direction (depth direction) represents a direction substantially perpendicular to the medium facing surface, and the vertical direction (track width direction) represents a permanent magnet. 3 indicates a direction substantially parallel to the magnetization direction 24. The tilt angle of the magnetization of the MR film, so-called bias angle, is represented by θ. The shape of the MR film shown in FIG. 3 is called a stripe.

【0004】SAL膜からMR膜にバイアスを印加する
MRヘッドでは、センス電流の値によってSAL膜の磁
化の大きさと向きが変化し、これに伴ってMR膜の磁化
の傾斜角度θも変化する。MR膜の磁化の向きが変わる
とバイアス点が変わり、再生出力のピークが上下非対称
になる。SAL膜の磁化の大きさと向きを変化させる要
因としては、センス電流の変動の他に磁気ヘッドの記録
動作により発生する外乱磁界等がある。
In an MR head that applies a bias from the SAL film to the MR film, the magnitude and direction of the magnetization of the SAL film change according to the value of the sense current, and the inclination angle θ of the magnetization of the MR film changes accordingly. When the direction of magnetization of the MR film changes, the bias point changes, and the peak of the reproduction output becomes vertically asymmetric. Factors that change the magnitude and direction of the magnetization of the SAL film include a disturbance magnetic field generated by the recording operation of the magnetic head and the like in addition to the fluctuation of the sense current.

【0005】上記のような外乱磁界によらず、SAL膜
の磁化の向きを常に横方向に向けておくことができれ
ば、SAL膜と磁気的に結合しているMR膜の磁化の向
きは常に縦方向に対して約45°の方向を向く。同時に
再生出力の変動やピーク非対称性を低減することができ
る。
If the direction of magnetization of the SAL film can always be oriented in the horizontal direction regardless of the disturbance magnetic field as described above, the direction of magnetization of the MR film magnetically coupled to the SAL film will always be vertical. Orient at about 45 ° to the direction. At the same time, fluctuations in reproduction output and peak asymmetry can be reduced.

【0006】SAL膜の磁区を固定する先行技術とし
て、特開平7−230609号公報や特開平8−102
017号公報にSAL膜に反強磁性膜を接合する構造が
開示されている。この構造は反強磁性膜の及ぼす交換結
合磁界によってSAL膜の磁化を横方向に固定する。図
4及び図5にMR膜1、スペーサ5、SAL膜2、反強
磁性膜4を備えるSALバイアスMRヘッドを示す。こ
れは従来のSALバイアス構造において、SAL膜2の
MR膜1と対向しない側に反強磁性膜4を接合して、S
AL膜の磁化23を固定するものである。
As prior arts for fixing the magnetic domains of the SAL film, Japanese Patent Application Laid-Open Nos. 7-230609 and 8-102
No. 017 discloses a structure in which an antiferromagnetic film is joined to a SAL film. This structure fixes the magnetization of the SAL film in the lateral direction by the exchange coupling magnetic field exerted by the antiferromagnetic film. 4 and 5 show a SAL bias MR head including the MR film 1, the spacer 5, the SAL film 2, and the antiferromagnetic film 4. This is because, in a conventional SAL bias structure, an antiferromagnetic film 4 is bonded to a side of the SAL film 2 that does not face the MR film 1 so that
This is for fixing the magnetization 23 of the AL film.

【0007】[0007]

【発明が解決しようとする課題】記録媒体の高記録密度
化に伴い、MR膜のトラック幅がμmオーダーになり、
ストライプの縦横比が1に近づく。すると形状異方性の
効果により縦横比の大きい場合に比べてMR膜を単磁区
に維持することが困難になる。MR膜に複数の磁区が発
生すると再生出力にバルクハウゼンノイズが表れる。係
るノイズを低減するには、より大きい縦バイアス磁界を
印加してストライプを単磁区化する。しかし、SALバ
イアス構造において、縦バイアス磁界のみ増大したので
はMR膜の磁化を縦方向からほぼ45°程度の傾斜に保
つことができず、線形な再生出力を得ることができな
い。
As the recording density of the recording medium increases, the track width of the MR film becomes on the order of μm.
The aspect ratio of the stripe approaches 1. Then, it becomes more difficult to maintain the MR film in a single magnetic domain than the case where the aspect ratio is large due to the effect of shape anisotropy. When a plurality of magnetic domains are generated in the MR film, Barkhausen noise appears in the reproduced output. To reduce such noise, a larger longitudinal bias magnetic field is applied to make the stripe into a single magnetic domain. However, in the SAL bias structure, if only the longitudinal bias magnetic field is increased, the magnetization of the MR film cannot be maintained at an inclination of about 45 ° from the longitudinal direction, and a linear reproduction output cannot be obtained.

【0008】そこで、縦バイアス磁界のみならず横バイ
アス磁界も増大させる必要がある。横バイアス磁界を増
大するにはSAL膜の膜厚を増加してSAL膜の飽和磁
化を大きくすることが考えられる。一方、SAL膜の膜
厚を大きくすると、SAL膜の膜厚方向における磁区の
固定が不十分となり、SAL膜でバルクハウゼンノイズ
が発生するという問題が生じる。SAL膜にバルクハウ
ゼンノイズが発生すると、SAL膜の磁化状態がSAL
膜と磁気的に結合している(静磁結合)MR膜の磁化状
態を変化させ、再生出力のノイズを増加させる。
Therefore, it is necessary to increase not only the vertical bias magnetic field but also the horizontal bias magnetic field. To increase the lateral bias magnetic field, it is conceivable to increase the thickness of the SAL film to increase the saturation magnetization of the SAL film. On the other hand, when the thickness of the SAL film is increased, the magnetic domains in the thickness direction of the SAL film are insufficiently fixed, and a problem that Barkhausen noise occurs in the SAL film occurs. When Barkhausen noise occurs in the SAL film, the magnetization state of the SAL film changes to SAL.
The magnetization state of the MR film magnetically coupled to the film (magnetostatic coupling) is changed to increase the noise of the reproduction output.

【0009】従来の技術はSAL膜に反強磁性膜を接合
させ、交換結合磁界を印加することで,SAL膜の単磁
区化を図りバルクハウゼンノイズを抑制した。しかし、
反強磁性膜がSAL膜内の磁化に及ぼす交換結合磁界の
強さはSAL膜と反強磁性膜の界面から離れるにつれて
減少する。即ち、膜厚を増加するとSAL膜の単磁区化
が困難となり、SAL膜の磁化の一部が横方向に固定さ
れなくなる。固定されていない磁化は、外乱磁界により
その向きを変えてバルクハウゼンノイズの原因となる。
In the prior art, the SAL film is joined to an antiferromagnetic film, and an exchange coupling magnetic field is applied to make the SAL film a single magnetic domain and suppress Barkhausen noise. But,
The strength of the exchange coupling magnetic field exerted on the magnetization in the SAL film by the antiferromagnetic film decreases as the distance from the interface between the SAL film and the antiferromagnetic film increases. That is, when the film thickness is increased, it becomes difficult to make the SAL film into a single magnetic domain, and a part of the magnetization of the SAL film is not fixed in the lateral direction. The magnetization that is not fixed changes its direction due to a disturbance magnetic field and causes Barkhausen noise.

【0010】図6及び図7にSAL膜の磁化の向きの変
化を示す。反強磁性膜4とSAL膜2の接合において、
膜厚が厚いとSAL膜が多磁区化して、これらの磁区の
磁化の向きが揃わなくなる。図7は反強磁性膜4の磁化
制御方向M1と、SAL膜2中の磁化M2、M3、M4
の向きの相違を示す立体図である。図6は図7の構造を
反強磁性膜4の膜面に垂直な向き(図中座標のz軸)か
らみた上面図であり、反強磁性膜4に最も近接する磁化
M2はM1と重なって見える。外乱磁界の向きは図6、
7中の座標のx軸方向であり、横方向はy軸方向で表
す。SAL膜2中の複数の磁化のうち、反強磁性膜4に
近い磁化M2は交換結合磁界によりその向きを横方向に
固定されるが、磁化の位置がM3、M4のように反強磁
性膜4から離れるにつれて交換結合磁界が弱くなり、外
部磁界の影響で磁化の向きが横方向以外に向き易くな
る。
FIGS. 6 and 7 show changes in the direction of magnetization of the SAL film. In joining the antiferromagnetic film 4 and the SAL film 2,
When the film thickness is large, the SAL film has multiple magnetic domains, and the magnetization directions of these magnetic domains are not aligned. FIG. 7 shows the magnetization control direction M1 of the antiferromagnetic film 4 and the magnetizations M2, M3, M4 in the SAL film 2.
FIG. 4 is a three-dimensional view showing a difference in the direction of the image. FIG. 6 is a top view of the structure of FIG. 7 as viewed from the direction perpendicular to the film surface of the antiferromagnetic film 4 (the z-axis in the figure), and the magnetization M2 closest to the antiferromagnetic film 4 overlaps M1. I can see The direction of the disturbance magnetic field is shown in FIG.
7 is the x-axis direction of the coordinates, and the horizontal direction is the y-axis direction. Of the plurality of magnetizations in the SAL film 2, the magnetization M2 close to the antiferromagnetic film 4 is fixed in the lateral direction by the exchange coupling magnetic field, but the magnetization position is the antiferromagnetic film like M3 and M4. 4, the exchange-coupling magnetic field becomes weaker, and the direction of magnetization becomes more likely to be directed to a direction other than the lateral direction due to the influence of the external magnetic field.

【0011】一方で、SAL膜全体を十分に磁区を固定
するためにSAL膜の厚さを薄くすると、SAL膜の飽
和磁化の総量を増大できずMR膜により大きな横バイア
ス磁界を印加できなくなる。そこで本発明は、反強磁性
膜を用いてSAL膜の磁化を十分に固定しつつ、SAL
膜の飽和磁化の総量を増加して、MR膜に横方向バイア
ス磁界を印加することを目的とする。
On the other hand, if the thickness of the SAL film is reduced in order to sufficiently fix the magnetic domain in the entire SAL film, the total saturation magnetization of the SAL film cannot be increased and a larger lateral bias magnetic field cannot be applied to the MR film. Accordingly, the present invention provides an SAL film while sufficiently fixing the magnetization of the SAL film using an antiferromagnetic film.
An object is to apply a lateral bias magnetic field to the MR film by increasing the total amount of saturation magnetization of the film.

【0012】[0012]

【課題を解決するための手段】本発明はSAL膜を2層
の軟磁性膜から構成して、これらの軟磁性膜の間に反強
磁性膜を配置するにすることにより、SAL膜の磁化を
横方向に固定するSALバイアスMRヘッドを提供する
ものである。MR膜、スペーサ、第一の軟磁性膜、反強
磁性膜、第二の軟磁性膜の順に接合した多層膜を備える
本発明の構造は、反強磁性膜の交換結合磁界が十分に及
ぶ程度の膜厚を有する軟磁性膜を2層設けることで、M
R膜に十分な横バイアス磁界を印加するとともに、SA
L膜を構成する軟磁性膜の磁区を固定できる。
According to the present invention, the SAL film is composed of two soft magnetic films, and an antiferromagnetic film is arranged between these soft magnetic films to thereby reduce the magnetization of the SAL film. Is provided in the SAL bias MR head for fixing the horizontal direction. The structure of the present invention including the multilayer film joined in the order of the MR film, the spacer, the first soft magnetic film, the antiferromagnetic film, and the second soft magnetic film has a structure in which the exchange coupling magnetic field of the antiferromagnetic film sufficiently reaches. By providing two soft magnetic films having a thickness of
While applying a sufficient lateral bias magnetic field to the R film,
The magnetic domains of the soft magnetic film constituting the L film can be fixed.

【0013】また、軟磁性膜の間に反強磁性膜を配置す
ることで、反強磁性膜の両面を磁区の固定に利用でき
る。係るSAL膜と反強磁性膜の接合を製作するには、
反強磁性膜の異方性の方向を磁界中製膜もしくは磁界中
熱処理して、SAL膜の磁化方向を反強磁性膜の異方性
の向きに揃って固定する。反強磁性膜の上記機能によっ
てSAL膜の磁化が固定されると、センス電流の変動や
外乱磁界があっても、SAL膜の磁化の向きは変化せ
ず、SAL膜と磁気的に結合しているMR膜の磁化の向
きも変化しない。
Further, by disposing an antiferromagnetic film between the soft magnetic films, both surfaces of the antiferromagnetic film can be used for fixing magnetic domains. To fabricate the junction between the SAL film and the antiferromagnetic film,
The direction of the anisotropy of the antiferromagnetic film is formed in a magnetic field or subjected to a heat treatment in a magnetic field, so that the magnetization direction of the SAL film is fixed to the direction of the anisotropy of the antiferromagnetic film. When the magnetization of the SAL film is fixed by the above function of the antiferromagnetic film, the direction of the magnetization of the SAL film does not change even if there is a fluctuation in the sense current or a disturbance magnetic field, and the SAL film is magnetically coupled to the SAL film. The direction of magnetization of the existing MR film does not change.

【0014】また、本発明は絶縁膜を介して、シールド
間にMR膜及びSALバイアス構造を設ける際に、タン
タル膜を下地膜として用いることで、SAL膜および反
強磁性膜の結晶性を向上できる。具体的には、下部シー
ルド、絶縁膜、タンタル膜、第二の軟磁性膜、反強磁性
膜、第一の軟磁性膜、スペーサ、MR膜、キャップ、絶
縁膜、ミッドシールドの順に積層する。しかし、係る多
層構造では積層する膜の数を増加する程、膜の平滑性と
結晶性が劣化し易い。SAL膜や反強磁性膜に必要な磁
気特性を発揮させるためには、それぞれfcc(面心立
方格子)、fct(面心正方格子)といった特定の結晶
構造を保持させることが必要になる。そこで、本発明で
は多層構造を積層する際に、タンタルの下地膜を用いる
ことでSAL膜と反強磁性膜の結晶性を保持するもので
ある。
The present invention improves the crystallinity of the SAL film and the antiferromagnetic film by using a tantalum film as a base film when providing an MR film and a SAL bias structure between shields via an insulating film. it can. Specifically, a lower shield, an insulating film, a tantalum film, a second soft magnetic film, an antiferromagnetic film, a first soft magnetic film, a spacer, an MR film, a cap, an insulating film, and a mid shield are stacked in this order. However, in such a multilayer structure, as the number of films to be stacked increases, the smoothness and crystallinity of the films tend to deteriorate. In order to exhibit the magnetic properties required for the SAL film and the antiferromagnetic film, it is necessary to maintain specific crystal structures such as fcc (face-centered cubic lattice) and fct (face-centered square lattice), respectively. Therefore, in the present invention, the crystallinity of the SAL film and the antiferromagnetic film is maintained by using a tantalum base film when stacking a multilayer structure.

【0015】[0015]

【発明の実施の形態】BEST MODE FOR CARRYING OUT THE INVENTION

(実施例1)図1に本発明のSALバイアスMRヘッド
の断面図を示す。このMRヘッドは下部シールド膜上に
下部再生ギャップの絶縁層8を90[nm]の厚さで形
成した後、この絶縁層8上に最初に下地膜5aのタンタ
ル膜を3[nm]の厚さでスパッタ法により形成した。
ついで同じスパッタ装置を用いて第二の軟磁性膜2bの
NiFeCr膜を5[nm]の厚さで、反強磁性膜4の
NiMnを30[nm]の厚さで、第一の軟磁性膜2a
のNiFeCr膜を15[nm]の厚さで形成した後、
さらに同じスパッタ装置を用いてスペーサ5bのタンタ
ル膜を10[nm]の厚さで形成し、続いてMR膜1と
してNiFe膜を20[nm]の厚さで形成した。最後
にキャップとして再びタンタル膜を3[nm]形成し
た。各々の膜を形成するときには縦方向に磁界を印加
し、SALバイアス構造形成後に横方向に磁界を印加し
て250℃の熱処理を3時間行い、反強磁性膜及びSA
L膜の磁化を横方向に固定した。
(Embodiment 1) FIG. 1 is a sectional view of a SAL bias MR head according to the present invention. In this MR head, after forming an insulating layer 8 of a lower reproducing gap with a thickness of 90 [nm] on a lower shield film, a tantalum film of a base film 5a is first formed on the insulating layer 8 with a thickness of 3 [nm]. Then, it was formed by a sputtering method.
Then, using the same sputtering apparatus, the NiFeCr film of the second soft magnetic film 2b has a thickness of 5 [nm], and the NiMn of the antiferromagnetic film 4 has a thickness of 30 [nm]. 2a
After forming a NiFeCr film with a thickness of 15 [nm],
Further, using the same sputtering apparatus, a tantalum film of the spacer 5b was formed with a thickness of 10 [nm], and subsequently, a NiFe film was formed as the MR film 1 with a thickness of 20 [nm]. Finally, a 3 nm thick tantalum film was formed again as a cap. When forming each film, a magnetic field is applied in the vertical direction, and after forming the SAL bias structure, a magnetic field is applied in the horizontal direction and a heat treatment at 250 ° C. is performed for 3 hours.
The magnetization of the L film was fixed in the lateral direction.

【0016】上記のように連続スパッタにより形成した
7層の膜をストライプの形状に加工するため、パターン
化したフォトレジストをマスクに用いてイオンミリング
法により加工した。ついでイオンミリング加工したスト
ライプのオフトラック領域に縦方向バイアス用の永久磁
石膜3のCoCrPt膜を40[nm]の厚さで形成し
た。さらに、電極6としてMo膜を形成した。電極形成
後に室温で縦方向に磁界を印加して永久磁石膜3の磁化
を縦方向に固定した。
In order to process the seven-layer film formed by continuous sputtering as described above into a stripe shape, the film was processed by ion milling using a patterned photoresist as a mask. Next, a CoCrPt film of a permanent magnet film 3 for longitudinal bias was formed to a thickness of 40 [nm] in the off-track region of the stripe subjected to ion milling. Further, a Mo film was formed as the electrode 6. After the electrodes were formed, a magnetic field was applied in the vertical direction at room temperature to fix the magnetization of the permanent magnet film 3 in the vertical direction.

【0017】以上の方法で形成したMRストライプ上に
上部再生ギャップの絶縁層を90[nm]の厚さで形成
し、MR素子部の形成を完了した。なお、詳細は省略す
るが、MR素子部上にはコイルおよび上部磁極からなる
記録部を形成してMRヘッドのウェハー工程を完了し
た。また、シールドの記載は省略した。図8に記録部を
含めたMRヘッドの立面図を示す。SALバイアス構造
は下部シールド9とミッドシールド10の間に配置され
る。ミッドシールドと上部磁極12は記録用の磁気回路
を構成し、コイル13は前記磁気回路に巻回されてい
る。図8において、層間の絶縁膜の記載は省略した。
On the MR stripe formed by the above method, an insulating layer of an upper reproducing gap was formed with a thickness of 90 [nm], and the formation of the MR element portion was completed. Although not described in detail, a recording section including a coil and an upper magnetic pole was formed on the MR element section, and the wafer process of the MR head was completed. The description of the shield is omitted. FIG. 8 shows an elevation view of the MR head including the recording section. The SAL bias structure is disposed between the lower shield 9 and the mid shield 10. The mid shield and the upper magnetic pole 12 constitute a magnetic circuit for recording, and the coil 13 is wound around the magnetic circuit. In FIG. 8, the description of the interlayer insulating film is omitted.

【0018】その後、ウェハーはスライダー工程でMR
高さ(デプス)を所定の寸法に研磨加工し、更にABS
面(媒体対向面)の浮上加工を行った。さらに、このス
ライダーをサスペンション52に固定し、HGA(ヘッ
ド・ジンバル・アッセンブリー)とすることによりMR
ヘッドHGAを完成した。図9にMRヘッドを備えたス
ライダの立体図を示す。スライダのABS面51の流出
端側50に図8のMRヘッドが位置する。
Thereafter, the wafer is subjected to MR process in a slider process.
The height (depth) is polished to a predetermined size, and the ABS
The surface (media facing surface) was subjected to levitation processing. Further, the slider is fixed to the suspension 52, and the head is provided with an HGA (head gimbal assembly).
The head HGA was completed. FIG. 9 shows a three-dimensional view of a slider having an MR head. The MR head of FIG. 8 is located on the outflow end side 50 of the ABS surface 51 of the slider.

【0019】図10にSAL膜が2層の軟磁性膜からな
る実施例1のMRヘッドと、SAL膜が1層の従来のM
Rヘッドについて、トータルのSAL膜の膜厚に対する
MRヘッドの再生出力変動(%)と、トラック幅換算再
生出力(μV/μm)の特性を示す。実施例1のMRヘ
ッドは従来のMRヘッドに比べて、再生出力変動が低
く、トラック幅換算再生出力が増大した。また、MRヘ
ッドに要求されるスペックが再生出力変動で2(%)以
下、トラック幅換算再生出力で200(μV/μm)以
上の場合には、実施例1のMRヘッドは従来のMRヘッ
ドに比べて、利用可能なトータルのSAL膜厚の範囲が
拡大した。この範囲を図10中の矢印で示す。
FIG. 10 shows an MR head according to the first embodiment in which the SAL film is composed of two soft magnetic films, and a conventional M head having one SAL film.
For the R head, the characteristics of the reproduction output variation (%) of the MR head with respect to the total thickness of the SAL film and the track width converted reproduction output (μV / μm) are shown. The MR head of the first embodiment has a lower reproduction output fluctuation and an increased track width converted reproduction output as compared with the conventional MR head. Further, when the specifications required for the MR head are 2 (%) or less in reproduction output fluctuation and 200 (μV / μm) or more in track width converted reproduction output, the MR head of the first embodiment is different from the conventional MR head. In comparison, the range of available total SAL film thickness has been expanded. This range is indicated by an arrow in FIG.

【0020】(実施例2)図2に本発明のSALバイア
スMRヘッドの断面図を示す。このMRヘッドは下部シ
ールド膜上に下部再生ギャップの絶縁層8を90[n
m]の厚さで形成した後、この絶縁層上に最初に下地膜
5aのタンタル膜を3[nm]の厚さでスパッタ法によ
り形成した。ついで同じスパッタ装置を用いてMR膜1
のNiFe膜を20[nm]の厚さで形成した後、さら
に同じスパッタ装置を用いてスペーサ5bのタンタル膜
を10[nm]の厚さで形成し、続いて第一の軟磁性膜
2aとしてNiFeCr膜を15[nm]の厚さで形成
し、続いて反強磁性膜4のNiMn膜を30[nm]の
厚さで形成し、第二の軟磁性膜2bとしてNiFeCr
膜を5[nm]の厚さで形成した。最後にキャップ5c
として再びタンタル膜を3[nm]形成した。スパッタ
中の磁界の向きと、電極6等を形成するプロセスは実施
例1と同様である。
(Embodiment 2) FIG. 2 is a sectional view of a SAL bias MR head according to the present invention. In this MR head, an insulating layer 8 of a lower read gap is formed on the lower shield film by 90 [n].
m], a tantalum film as a base film 5a was first formed on this insulating layer to a thickness of 3 [nm] by a sputtering method. Then, the MR film 1 was formed using the same sputtering apparatus.
Is formed to a thickness of 20 [nm], and then a tantalum film of the spacer 5b is formed to a thickness of 10 [nm] by using the same sputtering apparatus, and then as a first soft magnetic film 2a. A NiFeCr film is formed with a thickness of 15 [nm], a NiMn film of the antiferromagnetic film 4 is formed with a thickness of 30 [nm], and NiFeCr is formed as a second soft magnetic film 2b.
The film was formed with a thickness of 5 [nm]. Finally, cap 5c
Then, a 3 [nm] tantalum film was formed again. The direction of the magnetic field during the sputtering and the process of forming the electrodes 6 and the like are the same as in the first embodiment.

【0021】(実施例3)実施例1または実施例2にお
いて、第一の軟磁性膜、及び第二の軟磁性膜の厚さの範
囲を4から30[nm]としたMRヘッド。
(Embodiment 3) An MR head in which the thickness range of the first soft magnetic film and the second soft magnetic film in the first or second embodiment is 4 to 30 [nm].

【0022】(実施例4)実施例1または実施例2にお
いて、導電性を有するFeMn、NiMn、CoMn、
PtMn、IrMn、FeMn系、NiMn系、CoM
n系、PtMn系、IrMn系もしくはこれらの混相か
らなる反強磁性膜を用いたMRヘッド。
(Embodiment 4) In the embodiment 1 or 2, the conductive FeMn, NiMn, CoMn,
PtMn, IrMn, FeMn, NiMn, CoM
An MR head using an antiferromagnetic film made of n-based, PtMn-based, IrMn-based, or a mixed phase thereof.

【0023】(実施例5)実施例1または実施例2にお
いて、絶縁性を有するNiO、CoO、NiO系、Co
O系もしくはこれらの混相からなる反強磁性膜を用いた
MRヘッド。
(Example 5) In Example 1 or Example 2, NiO, CoO, NiO-based,
An MR head using an antiferromagnetic film made of O-based or a mixed phase thereof.

【発明の効果】以上で説明したように、本発明のSAL
バイアスMRヘッドは2層の軟磁性膜の磁化を反強磁性
膜で横方向に固定することにより、SALバイアスにお
けるバルクハウゼンノイズを抑制しつつMR膜に十分な
横バイアス磁界を印加する。その結果、SAL膜のバル
クハウゼンノイズに起因するMR素子出力のノイズを低
減することができる。
As described above, the SAL of the present invention
The bias MR head applies a sufficient lateral bias magnetic field to the MR film while suppressing Barkhausen noise in the SAL bias by fixing the magnetization of the two soft magnetic films in the lateral direction with the antiferromagnetic film. As a result, noise of the output of the MR element due to Barkhausen noise of the SAL film can be reduced.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明のSALバイアスMRヘッドの断面図。FIG. 1 is a cross-sectional view of a SAL bias MR head according to the present invention.

【図2】本発明のSALバイアスMRヘッドの断面図。FIG. 2 is a sectional view of a SAL bias MR head according to the present invention.

【図3】従来のSALバイアスMRヘッドの断面図。FIG. 3 is a sectional view of a conventional SAL bias MR head.

【図4】従来のSALバイアスMRヘッドの断面図。FIG. 4 is a sectional view of a conventional SAL bias MR head.

【図5】従来のSALバイアスMRヘッドの断面図。FIG. 5 is a sectional view of a conventional SAL bias MR head.

【図6】SAL膜の磁化と反強磁性膜の磁化の関係。FIG. 6 shows the relationship between the magnetization of the SAL film and the magnetization of the antiferromagnetic film.

【図7】SAL膜の磁化と反強磁性膜の磁化の関係。FIG. 7 shows the relationship between the magnetization of the SAL film and the magnetization of the antiferromagnetic film.

【図8】記録部も含めたMRヘッドの断面図。FIG. 8 is a cross-sectional view of the MR head including a recording unit.

【図9】MRヘッドを備えたスライダの立体図。FIG. 9 is a three-dimensional view of a slider including an MR head.

【図10】SAL膜の膜厚に対するMRヘッドの再生出
力変動と、トラック幅換算再生出力の特性。
FIG. 10 shows the reproduction output fluctuation of the MR head with respect to the thickness of the SAL film and the characteristics of the reproduction output in terms of track width.

【符号の説明】[Explanation of symbols]

1 MR膜、2 SAL膜、2a 第一の軟磁性膜、2
b 第二の軟磁性膜、3 永久磁石膜、4 反強磁性
膜、5a 下地膜、5b スペーサ、5c キャップ、
6 電極、7 電源、8 絶縁層、9 下部シールド、
10 ミッドシールド、12 上部磁極、13 コイ
ル、21 MR膜の磁化、21a MR膜の磁化の縦方
向成分、21b MR膜の磁化の横方向成分、22 セ
ンス電流磁界、23 SAL膜の磁化、24 永久磁石
の磁化、27 交換結合磁界がSAL膜の磁化を固定す
る方向、50 MRヘッドの位置する流出端、51 ス
ライダのABS面、52 サスペンション
1 MR film, 2 SAL film, 2a First soft magnetic film, 2
b second soft magnetic film, 3 permanent magnet film, 4 antiferromagnetic film, 5a under film, 5b spacer, 5c cap,
6 electrodes, 7 power supply, 8 insulating layer, 9 lower shield,
Reference Signs List 10 mid shield, 12 upper magnetic pole, 13 coil, 21 MR film magnetization, 21a longitudinal component of MR film magnetization, 21b transverse component of MR film magnetization, 22 sense current magnetic field, 23 SAL film magnetization, 24 permanent Magnet magnetization, 27 direction in which exchange coupling magnetic field fixes magnetization of SAL film, 50 outflow end where MR head is located, 51 ABS surface of slider, 52 suspension

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】磁気抵抗効果膜と、磁気抵抗効果膜を横方
向にバイアスするSAL膜と、磁気抵抗効果膜とSAL
膜を分離するスペーサと、磁気抵抗効果膜を縦方向にバ
イアスする永久磁石膜と、磁気抵抗効果膜にセンス電流
を供給する電極と、記録用の上部磁極とを有するMRヘ
ッドにおいて、前記SAL膜が第一の軟磁性膜と第二の
軟磁性膜からなり、前記第一と第二の軟磁性膜の間に反
強磁性膜を配置することを特徴とするSALバイアスM
Rヘッド。
A magnetoresistive film; a SAL film for laterally biasing the magnetoresistive film; a magnetoresistive film;
In the MR head having a spacer for separating a film, a permanent magnet film for vertically biasing the magnetoresistive film, an electrode for supplying a sense current to the magnetoresistive film, and an upper magnetic pole for recording, the SAL film Comprises a first soft magnetic film and a second soft magnetic film, and an antiferromagnetic film is disposed between the first and second soft magnetic films.
R head.
【請求項2】請求項1に記載のSALバイアスMRヘッ
ドにおいて、前記SAL膜の磁区を横方向に固定するこ
とを特徴とするSALバイアスMRヘッド。
2. The SAL bias MR head according to claim 1, wherein the magnetic domain of the SAL film is fixed in a lateral direction.
【請求項3】請求項1に記載のSALバイアスMRヘッ
ドにおいて、前記第一の軟磁性膜が前記第二の軟磁性膜
よりも大きい膜厚を有し且つ磁気抵抗効果膜に近接する
ことを特徴とするSALバイアスMRヘッド。
3. The SAL bias MR head according to claim 1, wherein said first soft magnetic film has a larger thickness than said second soft magnetic film and is close to said magnetoresistive film. Characteristic SAL bias MR head.
JP16013297A 1997-06-17 1997-06-17 Sal bias mr head Withdrawn JPH117611A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16013297A JPH117611A (en) 1997-06-17 1997-06-17 Sal bias mr head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16013297A JPH117611A (en) 1997-06-17 1997-06-17 Sal bias mr head

Publications (1)

Publication Number Publication Date
JPH117611A true JPH117611A (en) 1999-01-12

Family

ID=15708571

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16013297A Withdrawn JPH117611A (en) 1997-06-17 1997-06-17 Sal bias mr head

Country Status (1)

Country Link
JP (1) JPH117611A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6714389B1 (en) * 2000-11-01 2004-03-30 Seagate Technology Llc Digital magnetoresistive sensor with bias

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6714389B1 (en) * 2000-11-01 2004-03-30 Seagate Technology Llc Digital magnetoresistive sensor with bias

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