JPH1172136A - Vibration resistant device and exposing device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To restrain vibration from being generated in a vibration resistant device since pressure in an air spring rapidly increases when thrust is generated in the air spring by opening a valve interposed between the air spring to support a vibration resistant stand and an air source to supply pneumatic pressure to the air spring. SOLUTION: An air source 40T and an air spring 4A are connected to each other by a pipeline 40H. A solenoid valve 40V is arranged in the middle of the pipeline 40H. When thrust of the air spring 4A is increased, the solenoid valve 40V is opened. At this time, when a valve opening signal is issued to the solenoid valve 40V, first of all, a pulse wave is impressed. Therefore, before the solenoid valve 40V is switched to a fully opening condition from a fully closed condition, preliminary opening operation is performed. A pulse with of this pulse wave is set shorter than transition time necessary until the solenoid valve becomes a fully opening condition from a fully closed condition, and this valve opening pulse signal is periodically issued over prescribed times. The solenoid valve repeats half-opening operation by this pulse signal, and the thrust generated in the air spring 4A gradullay increases.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an anti-vibration apparatus and an exposure apparatus, and more particularly, to a so-called active type anti-vibration apparatus in which an anti-vibration table is driven by an actuator so as to cancel the vibration of the anti-vibration table. The present invention relates to an exposure apparatus provided with a vibration isolator.

[0002]

2. Description of the Related Art With the advancement of precision equipment such as a step-and-repeat type reduction projection type exposure apparatus, that is, a so-called stepper, a micro-vibration acting on a surface plate (anti-vibration table) from an installation floor is micro-G. There is a need for isolation at the level. Various types of vibration damping pads, such as mechanical dampers or pneumatic dampers in which a compression coil spring is placed in a damping liquid, are used as vibration damping pads for supporting the vibration damping table of the vibration damping device.The vibration damping pads themselves have a certain degree of centering function. Have. Especially,
An air spring vibration isolator provided with a pneumatic damper can set a small spring constant and can insulate vibrations of about 10 Hz or more, and is widely used for supporting precision equipment. Recently, an active anti-vibration device has been proposed in order to overcome the limitations of the conventional passive anti-vibration device (for example, see Japanese Patent Application Laid-Open No. H8-166043, which is the same applicant as the present application). In this method, the vibration of the anti-vibration table is detected by a sensor, and the vibration is controlled by driving the actuator based on the output of this sensor.This provides an ideal vibration isolation effect without a resonance peak in the low frequency control band. You can have.

In the above-described vibration isolation device, a control loop of the vibration isolation table is constituted mainly by a combination of a speed loop for performing vibration isolation and a position loop for positioning the main body. Six vibration sensors and six position sensors are attached to the vibration isolation table, and the displacement and vibration in the directions of six degrees of freedom determined from these sensors are determined for convenience when designing the vibration isolation device. The motion is converted into motion in the direction of six degrees of freedom in the orthogonal coordinate system (coordinate system for machine design), and a plurality of actuators are driven based on the conversion result to perform vibration suppression feedback control.

According to such an active vibration isolator,
Although a high vibration isolation effect can be obtained, when a constant disturbance acts on the active vibration isolation device, heat generation of the actuator and accompanying problems may occur. That is, for example, when a steady disturbance acts due to the elastic force of the cable connecting the stepper body and the peripheral device, or its own weight, the slight displacement caused by the disturbance is corrected to maintain the position of the vibration damping device. To do
A steady thrust is generated in the direction of canceling disturbance with respect to the actuator constituting the active vibration damping device. If the actuator needs to supply a steady current to generate a steady thrust, such as an electromagnetic actuator, the actuator may locally generate heat.

On the other hand, the stepper and the like are housed in a chamber maintained at a constant temperature and humidity to maintain the accuracy. However, when the actuator locally generates heat as described above, the air in the chamber fluctuates. . Due to this fluctuation, for example, the measurement accuracy of a laser interferometer or the like that measures the amount of movement of the XY stage may decrease.

As a solution to this problem, the following vibration damping device has been proposed to reduce the steady thrust of the actuator and prevent heat generation. That is,
In this vibration damping device, the vibration isolation table is supported by an air spring for isolating vibration transmitted from the floor surface to the vibration isolation table, and is mounted on the vibration isolation table or vibration that cannot be completely blocked by the air spring. The sensor detects vibrations generated when the exposure device or the like operates, and drives the active vibration damping actuator based on the detected vibrations.At this time, a thrust is also generated by an air spring, and the thrust is generated. This reduces the load on the actuator. That is, of the thrust of the actuator, which changes from moment to moment, a low-frequency component close to a steady thrust is detected, and based on the detected value, a low-frequency component is disposed in a pipeline that communicates the air pressure source for the air spring with the air spring. The opened / closed valve is opened / closed to adjust the thrust of the air spring. As a result, the current supplied to the actuator is reduced, and heat generation can be reduced.

However, when the thrust of the air spring is adjusted by driving the on-off valve as described above, the vibration isolator may be shaken. This will be described with reference to FIG. In FIG. 7, the solenoid valve opens in response to a change in the control signal of the on-off valve (solenoid valve), and accordingly a large amount of air flows into the air spring. 6 is a time chart showing a state where an exposure apparatus installed above swings. And as shown in
When the thrust of the air spring rises sharply, the exposure device on the anti-vibration table swings greatly as shown in FIG. The vibration damping device attempts to control the vibration by driving the actuator based on the vibration detected by the sensor. However, when the shaking is excessive, residual vibration occurs as shown in FIG.

[0008] An object of the present invention is to control the opening and closing of an on-off valve provided in a pipe communicating an air pressure source for an air spring and the air spring, whereby the thrust of the air spring changes suddenly, thereby causing residual vibration. It is an object of the present invention to provide an anti-vibration apparatus capable of preventing the occurrence of the vibration and an exposure apparatus having the same.

[0009]

[Means for Solving the Problems]

(1) The present invention will be described with reference to FIGS. 1, 3 and 4 showing an embodiment. The invention according to claim 1 supports the floor surface via air springs 4A to 4D. A vibration isolation table 6; an air pressure source 40T for supplying air pressure to the air springs 4A to 4D; an air spring 4A to 4D and an air pressure source 40
A conduit 40H communicating with T; disposed on the conduit 40H;
Valve opening / closing means 4 that can be switched between an open state for communicating between the air pressure source 40T and the air springs 4A to 4D or a closed state for shutting off.
0V; actuators 7A to 7D arranged in parallel with the air spring 4A and capable of driving the anti-vibration table 6 in substantially the same direction as the supporting direction of the air springs 4A to 4D; and detecting the displacement of the anti-vibration table 6. Displacement sensors 10Z1 to 10Z3; drive control of actuators 7A to 7D based on at least the output from displacement sensors 10Z1 to 10Z3 so as to suppress vibration of anti-vibration table 6, and open / close drive of valve opening / closing means 40V to generate air. The present invention is applied to a vibration isolation device having a vibration isolation table control system 61 that controls the driving so as to adjust the thrust of the springs 4A to 4D and reduce the load on the vibration isolation table actuators 7A to 7D.
The above-mentioned object is achieved by performing at least one preliminary opening / closing operation when switching the valve opening / closing means 40V from the closed state to the open state. (2) Explaining in connection with FIG. 1 and FIG. 8 showing one embodiment, the invention according to claim 2 is applied to a floor surface.
Anti-vibration table 6 supported via air springs 4A to 4D; air pressure source 40T for supplying air pressure to air springs 4A to 4D
Variable pressure adjusting means 90A to 90C capable of adjusting the air pressure supplied to the air springs 4A to 4D while allowing a part of the air pressure supplied from the air pressure source 40T to flow while bypassing the air springs 4A to 4D. And actuators 7A to 7D arranged in parallel with the air springs 4A to 4D and capable of driving the anti-vibration table 6 in substantially the same direction as the support direction of the air springs 4A to 4D; Displacement sensors 10Z1 to 10Z3
And drive control of the actuators 7A to 7D based on at least the output from the displacement sensors 10Z1 to 10Z3 so as to suppress the vibration of the anti-vibration table 6, and control the variable pressure adjusting means 90A to 90C to control the air springs 4A to 4C. And a vibration isolation table control system 11A that adjusts the 4D thrust and reduces the load on the actuators 7A to 7D. This will be described with reference to FIGS. 1 and 10 showing one embodiment. (3) The invention according to claim 3 is an anti-vibration table 6 supported on the floor via a plurality of air springs 4A to 4D; and an air supply for supplying air pressure to the air springs 4A to 4D. Pressure source 40T
Pressure adjusting means 90A to 90C that can independently adjust the air pressure supplied from the air pressure source 40T to each of the plurality of air springs 4A to 4D; and are provided in parallel with the air springs 4A to 4D to isolate the vibration. Actuators 7A to 7D capable of driving the table 6 in a direction substantially the same as the direction in which the air springs 4A to 4D are supported; and moving tables 20 and 27 movably mounted on the vibration isolation table 6
Table displacement output means 94 for outputting a signal relating to the displacement of the movable tables 20 and 27; displacement sensors 10Z1 to 10Z3 for detecting the displacement of the vibration isolation table 6; and at least outputs from the displacement sensors 10Z1 to 10Z3. The actuators 7A to 7D are driven and controlled based on the vibrations of the vibration isolation table 6, and the variable pressure adjusting means 90A to 9D are controlled.
0C is controlled to adjust the thrust of the air springs 4A to 4D to reduce the loads on the actuators 7A to 7D, and the position of the center of gravity of the anti-vibration table 6 obtained based on the signal output from the table moving amount output means 94 It has anti-vibration table control systems 95, 96, and 61B that adjust the respective thrusts of the plurality of air springs 4A to 4D in accordance with the change. (4) In the invention described in claim 4, the pressure adjusting means 9
Reference numerals 0A to 90C denote variable relief valves capable of gradually changing the pressure. (5) The invention according to claim 5 is an exposure apparatus for transferring a pattern formed on a mask R to a substrate on a substrate stage via a projection optical system PL. Of the present invention.

In the section of the means for solving the above-mentioned problems, which explains the configuration of the present invention, the drawings of the embodiments of the present invention are used for easy understanding of the present invention. However, the present invention is not limited to this.

[0011]

BEST MODE FOR CARRYING OUT THE INVENTION

-First Embodiment- Hereinafter, a first embodiment of the present invention will be described with reference to FIGS.
This will be described with reference to FIG.

FIG. 1 shows steps according to an embodiment.
FIG. 1 shows a schematic perspective view of an AND-scan type exposure apparatus 100. In FIG. 1, a rectangular plate-shaped pedestal 2 is installed on a floor as an installation surface, and air springs 4A to 4D (however, in FIG.
Are not shown), and these air springs 4A to 4D
A rectangular surface plate 6 as an anti-vibration table is installed on the top. Here, as will be described later, in the present embodiment, the projection optical system PL is used, so the Z axis is taken in parallel with the optical axis of the projection optical system PL, and the platen 6 The X axis is taken in the longitudinal direction, and the Y axis is taken in a direction perpendicular to the X axis. The directions of rotation about the respective axes are defined as Zθ, Xθ, and Yθ directions. In the following description, if necessary,
The directions indicated by the arrows indicating the X, Y, and Z axes in FIG.
+ Y, + Z directions, opposite directions to -X, -Y, -Z
It shall be used separately from the direction.

The air springs 4A to 4D are arranged near four corners of the rectangular bottom surface of the platen 6, respectively. An actuator 7A is provided between the pedestal 2 and the surface plate 6 in parallel with the air spring 4A. Actuator 7
A includes a stator 9A fixed on the pedestal 2 and a mover 8A fixed on the bottom surface of the surface plate 6, and includes a controller 11
In response to an instruction from the pedestal 2 (not shown in FIG. 1, see FIG. 4), a biasing force in the Z direction from the pedestal 2 to the bottom surface of the surface plate 6 or a suction force from the bottom surface of the surface plate 6 toward the pedestal 2 is generated. In the vicinity of the other air springs 4B to 4D, similarly to the air spring 4A, the actuators 7B to 7D are arranged in parallel with the respective air springs.
D (although the actuators 7C and 7D on the back side of the paper are not shown in FIG. 1), these actuators 7
The biasing force or suction force of B to 7D is also controlled by the control device 11 respectively.
(Not shown in FIG. 1, see FIG. 4). In addition, regarding the control method of the actuators 7A to 7D,
It will be described later.

Next, a specific configuration of the actuators 7A to 7D will be described with reference to FIG.

FIG. 2A shows an example of the configuration of the actuator 7A. In FIG. 2A, the stator 9A has an S-pole shaft 9Ab on both sides of an N-pole shaft 9Aa.
It consists of a magnet on which 9Ac is formed. The mover 8A includes an inner cylinder 12 loosely fitted on the shaft 9Aa, a coil 13 wound around the outer side of the inner cylinder 12, and an outer cylinder 14 covering the coil 13. By the adjustment, a thrust is generated between the stator 9A and the mover 8A in a direction parallel to the axis 9Aa (± Z direction).

FIG. 2B shows another example of the actuator 7A. In FIG. 2B, a stator 16 made of a magnetic material is fixed to the first member 15 and the second member 17 is fixed.
The inner cylinders 18A and 18B are fixed so as to sandwich the stator 16 therebetween, and the coils 1 are respectively provided outside the inner cylinders 18A and 18B.
9A and 19B are wound. Also in this case, by adjusting the current flowing through the coils 19A and 19B, the balance of the attraction force between the first member 15 and the second member 17 is changed to generate a force. The other actuators 7B to 7D have the same configuration as the actuator 7A.

Returning to FIG. 1, acceleration sensors 5Z1 and 5Z2 as vibration sensors for detecting the Z-direction acceleration of the surface plate 6 are attached to the side surface of the surface plate 6 on the + Y direction side.
An acceleration sensor 5Y as a vibration sensor for detecting the acceleration in the Y direction of the surface plate 6 is provided at the + Y direction end of the upper surface of the surface plate 6.
1, 5Y2 are mounted, and an acceleration sensor 5X as a vibration sensor for detecting the X-direction acceleration of the surface plate 6 is mounted on the + X direction end of the upper surface of the surface plate 6. As these acceleration sensors 5Z1, 5Z2, 5Y1, 5Y2, 5X, for example, semiconductor acceleration sensors are used. These acceleration sensors 5Z1, 5Z2, 5Y1, 5Y2, 5
The output of X is also supplied to the control device 11 (not shown in FIG. 1, see FIG. 4).

Further, rectangular metal plates (conductive materials) 231 and 232 having a predetermined area are adhered to the side surface on the + Y direction side of the surface plate 6. In the present embodiment, a ceramic surface plate, which is a non-conductive material, is used as the surface plate 6, and the Y of the surface plate is located at a position facing the metal plates 231 and 232.
Displacement sensors 10Y1 and 10Y2 for detecting directional displacement (not shown in FIG. 1 to avoid complicating the drawing, see FIG. 4) are provided. These displacement sensors 10Y1, 10Y
As 2, for example, an eddy current displacement sensor is used.
According to this eddy current displacement sensor, an AC voltage is applied to a coil wound on an insulator in advance, and when the sensor approaches an object to be measured made of a conductive material (conductive material), the AC magnetic field generated by the coil causes the AC magnetic field to be applied to the conductive material. An eddy current is generated, and the magnetic field generated by the eddy current is in the opposite direction to the magnetic field created by the coil current, and these two magnetic fields overlap to affect the output of the coil, and the current flowing through the coil The intensity and phase change. This change becomes larger as the object is closer to the coil, and becomes smaller as the object is farther from the coil.
You can know the displacement. In addition, as a displacement sensor, a capacitance-type non-contact displacement that detects the distance between the sensor and the measurement object in a non-contact manner by utilizing that the capacitance is inversely proportional to the distance between the electrode of the sensor and the measurement object A sensor may be used. If the configuration is such that the influence of the background light can be prevented, a PSD (semiconductor light position detector) or the like can be used as the displacement sensor.

Further, metal plates 233 and 234 having a predetermined area are attached to the + Y direction end of the upper surface of the surface plate 6. A displacement sensor 1 composed of an eddy current displacement sensor for detecting the displacement of the surface plate 6 in the Z direction facing these metal plates 233 and 234
0Z1 and 10Z2 (not shown in FIG. 1, see FIG. 4) are provided. Further, a metal plate 235 having a predetermined area is adhered to a side surface in the + X direction of the upper surface of the surface plate 6, and a displacement sensor including an eddy current displacement sensor which detects the displacement of the surface plate 6 in the X direction opposite to the metal plate 235. 10X (not shown in FIG. 1; see FIG. 4). Displacement sensor 10Y
The outputs of 1, 10Y2, 10Z1, 10Z2, and 10X are also supplied to the control device 11 (not shown in FIG. 1, see FIG. 4).

An XY as a substrate stage driven in a two-dimensional XY direction by driving means (not shown)
The stage 20 is mounted. Further, a wafer W as a photosensitive substrate is suction-held on the XY stage 20 via a Z leveling stage, a θ stage (both not shown) and a wafer holder 21. Further, a first column 24 is planted on the surface plate 6 so as to surround the XY stage 20, and a projection optical system PL is provided at the center of the upper plate of the first column 24.
Is fixed, and a second column 26 is implanted on the upper plate of the first column 24 so as to surround the projection optical system PL.
A reticle R as a mask is placed via a reticle stage 27 at the center of the upper plate.

The XZ leveling stage is configured so that the drive in the Z-axis direction and the inclination with respect to the Z-axis can be adjusted, and the θ stage is configured to be capable of minute rotation about the Z-axis. Therefore, the XY stage 20, the Z leveling stage and θ
The stage enables the wafer W to be positioned three-dimensionally.

The reticle stage 27 is a reticle R of Y
Fine adjustment in the axial direction and adjustment of the rotation angle are possible. The reticle stage 27 is driven in the X direction by driving means (not shown).

Further, an illumination optical system (not shown) is disposed above the reticle R, and a main controller (not shown) performs relative positioning (alignment) between the reticle R and the wafer W.
The image of the pattern of the reticle R via the projection optical system PL is sequentially transmitted to each shot area of the wafer W under the illumination light EL for exposure from the illumination optical system while performing autofocus by a focus detection system (not shown). It is designed to be exposed. In the present embodiment, when exposing each shot area, the XY stage 20 and the reticle stage 27 are relatively scanned by the main controller at a predetermined speed ratio along the X-axis direction (scanning direction) via respective driving means. Is done.

The first column 24 has four legs 24a-2
4d (however, the leg 24d on the back side of the drawing is not shown in FIG. 1) and is installed on the surface plate 6. + On the leg 24b
An acceleration sensor 5Z3 for detecting the acceleration of the first column 24 in the Z direction is attached to the side surface in the X direction. As the acceleration sensor 5Z3, for example, a piezoresistance effect type or capacitance type semiconductor acceleration sensor is used. The output of the acceleration sensor 5Z3 is
(Not shown in FIG. 1, see FIG. 4). In addition, at the + Y direction end of the upper plate upper surface of the first column 24 and +
A metal plate 236 having a predetermined area is attached to a corner portion which is an end in the X direction. A displacement sensor 10 </ b> Z <b> 3 (not shown in FIG. 1, see FIG. 4) formed of an eddy current displacement sensor that detects the displacement of the first column 24 in the Z direction is provided facing the metal plate 236.

Further, a pin 35A is embedded in a side surface of the first column 24 in the -X direction, and an actuator 32A is mounted between the pin 35A and a column (not shown) fixed on the floor. Like the actuator 7A, the actuator 32A includes a stator 34A made of a magnet fixed to a support (not shown) and a mover 33A including a coil attached to a pin 35A. By adjusting the current flowing through the coil, a force can be applied to the pin 35A in the ± Y direction. Similarly, a pin 35B is embedded in a side surface in the + X direction of the first column 24, and an actuator 32B having the same configuration as the actuator 32A is mounted between the pin 35B and a support (not shown) fixed on the floor. Can apply a force in the ± Y direction to the pin 35B in accordance with an instruction from the user.
Further, an actuator 32C having the same configuration as the actuator 32A is installed between the center of the side surface in the + X direction of the first column 24 and a support (not shown) on the floor.
1 through the actuator 32C according to an instruction from
A force can be applied to the column 24 in the ± X direction. Actuators 32A to 32 by control device 11
The control method of C will be described later.

In the present embodiment, the exposure apparatus main body 70 (see FIG. 1) includes the surface plate 6, the XY stage 20, the wafer holder 21, the first column 24, the projection optical system PL, the second column 26, the reticle stage 27, and the like. ) Is configured.

Next, the air spring 4A will be described with reference to FIG. The air spring 4A is connected to a pneumatic source 40T via a conduit 40H and an electromagnetic valve 40V. The opening and closing of the electromagnetic valve 40V is controlled by an air spring control unit 61 (details of the air spring control unit 61 will be described later). With the opening of the electromagnetic valve 40V, air is sent from the air pressure source to the air spring 4A, and the thrust of the air spring 4A increases. Although FIG. 3 shows only the air spring 4A, the air springs 4B to 4D have the same configuration.

Next, the control system of the actuators 7A to 7D and 32A to 32C for vibration isolation of the exposure apparatus main body 70 will be described with reference to the block diagram of FIG.

The control device 11 is constituted by a CPU (not shown) and includes displacement sensors 10Z1, 10Z2, 10Z3, and 10Y.
1, 10Y2, 10X and acceleration sensors 5Z1, 5Z
Actuators 7A, 7B, 7C, 7D, 32A, 32 so as to suppress vibration of exposure apparatus main body 70 including surface plate 6 based on the outputs of 2, 5Z3, 5Y1, 5Y2, 5X.
B and 32C are drive-controlled.

The control device 11 includes a first coordinate converter 42, six subtractors 46a to 46f, and position controllers XPI, YPI, ZPI, XθPI, YθPI, Z
θPI, six speed conversion gains 52a to 52f, a second coordinate conversion unit 48, and six integrators 50a to 50f
, Six subtractors 54a to 54f, and speed controllers VXPI, VYPI, VZPI, VXθPI, VYθP
I, VZθPI, a decoupling calculation unit 56, and seven thrust gains 58a to 58g. Then, the first coordinate conversion unit 42 includes the displacement sensors 10Z1, 10Z2, and 10Z.
The outputs of 3, 10Y1, 10Y2, and 10X are not shown in A
/ D converter, respectively, and the 6-degree-of-freedom directions (X, Y, Z, Xθ, Y
θ, Zθ: Refer to FIG. 1) (x, y, z, θx, θ)
y, θz). The subtractors 46a to 46f are connected to the first
The amount of displacement (x, y, z, θx, θy, θz) of the center of gravity in the six degrees of freedom after the conversion by the coordinate conversion unit 42 is calculated based on the position of the center of gravity in the six degrees of freedom input from the target value output unit 44. The position deviations (Δx = x0−x, Δy = y0−y, Δz = z0−z, Δx = x0−x, Δy = y0−y, Δx = x0−x, Δx = x0−x,
Δθx = θx0−θx, Δθy = θy0−θy, Δθz
= Θz0−θz). Position controllers XPI, YPI, ZPI, XθPI, YθPI, Zθ
PI is a positional deviation Δx, Δ in each direction having six degrees of freedom.
A PI controller that performs a control operation using y, Δz, Δθx, Δθy, and Δθz as operation signals. The speed conversion gains 52a to 52f are determined by the position controllers XPI and YP.
Outputs from I, ZPI, XθPI, YθPI, and ZθPI are converted into velocity command values x0 ′, y0 ′, z0 ′, θx0 ′, θy
0 ′ and θz0 ′. The second coordinate conversion unit 48 includes acceleration sensors 5Z1, 5Z2, 5Z3, 5Y
The outputs of 1, 5Y2, and 5X are input via A / D converters (not shown), respectively, and the accelerations (x ″, y ″, x ″, y ″,
z ″, θx ″, θy ″, θz ″). The six integrators 50a to 50f convert the acceleration components (x ″,
y ", z", [theta] x ", [theta] y", [theta] z ") and integrate the velocity components (x ', y', z ', [theta]) in the respective directions.
x ′, θy ′, θz ′). Six subtractors 54
a to 54f are speed command values (x0 ′, y0 ′, z0 ′, θ′x) output from the speed command gains 52a to 52f.
0, θ′y0, θ′z0) and the outputs (x ′, y ′, z ′, θx ′, θy ′, θz ′) of the integrators 50a to 50f are respectively subtracted to obtain the velocity in each direction with six degrees of freedom. Deviation (Δx ′ = x0′−x ′, Δy ′ = y0′−y ′, Δ
z ′ = z0′−z ′, Δθx ′ = θx0′−θx ′, Δ
θy ′ = θy0′−θy ′, Δθz ′ = θz0′−θ
z ′) is calculated. Speed controller VXPI, VYP
I, VZPI, VXθPI, VYθPI, VZθPI
Are velocity deviations Δx ′, Δ in six directions of freedom in respective directions.
y ′, Δz ′, Δθx ′, Δθy ′, Δθz ′, and a PI controller that performs a control operation using an operation signal,
Speed control is performed in each direction with six degrees of freedom. The decoupling calculation unit 56 performs decoupling calculation for converting the speed control amounts output from the adders 601 to 606 into speed command values to be generated at the positions of the actuators. The thrust gains 58a to 58g convert the speed command value to be generated at the position of each actuator after conversion by the decoupling calculation unit 56 into the thrust to be generated by each actuator.

The control device 11 further has an air spring controller 61 for controlling the thrust generated in the air spring.
The Z-direction displacement (height) of the surface plate 6 measured by the displacement sensors 10Z1, 10Z2, and 10Z3 is the air spring control unit 6.
1 (FIG. 4), and based on these data, the air spring control unit 61 sets the height of the platen 6 to a preset value and maintains each air spring 4 to maintain the horizontal level.
The height of A to 4D is calculated. Then, the air spring control unit 61 sets the heights of the air springs 4A to 4D to the calculated heights, and maintains the level of the base 6. This allows
The XY stage 20 on the stool 6 is maintained at a high positioning accuracy and the like without causing distortion on the stool 6.

The air spring control unit 61 controls the thrust of the air springs 4A to 4D in addition to controlling the horizontal maintenance of the surface plate 6 described above. Describing this, the air spring control unit 61 uses the thrust generated by the actuators 7A to 7D as:
Detection is performed via the low-pass filters 60a to 60d, that is, low-frequency components of thrust generated in the actuators 7A to 7D are detected. Then, the necessity of the thrust by the air springs 4A to 4D is determined based on the detected thrust value, and when it is determined that the thrust is necessary, the electromagnetic valves 40V installed corresponding to the respective air springs 4A to 4D are determined. (FIG. 3) is controlled to open. By controlling the thrusts of the air springs 4A to 4D in this manner, the loads on the actuators 7A to 7D are reduced, and heat is locally prevented from being generated from the actuators 7A to 7D. The valve opening control of the solenoid valve 40V at this time will be described with reference to FIG. 5, taking the air spring 4A as an example.

FIG. 5 is a time chart similar to that shown in FIG. The air spring control unit 61 (FIG. 4) switches the solenoid valve 40V (FIG. 3) from the fully closed state to the fully opened state.
A pulse width t1 as shown in FIG.
Periodically emits a square wave. The pulse width t1 is set to a time shorter than the time required for the solenoid valve 40V to reach the fully open state from the fully closed state. On the other hand, the pulse interval t
In 2, a time required for the electromagnetic valve 40V that is being opened to return to the fully closed state is set. The air in the air pressure source 40T shown in FIG. 3 is supplied little by little to the air springs 4A to 4D by repeating the half-opening operation of the solenoid valve 40V as shown in FIG. Air spring 4A
推 4D Z thrust gradually increases. Thereby, as shown in FIG. 5, the occurrence of residual vibration of the exposure apparatus main body due to an increase in the thrust of the air spring is suppressed.

In the above description, the solenoid valve 4
An example in which a pulse wave having a constant cycle is generated for 0 V has been described, but the pulse width may be gradually increased from t1 to tn as shown in the time chart of FIG. this is,
This is to compensate for the decrease in the amount of air flowing into the air spring for the same valve opening time as the internal pressure of the air springs 4A to 4D increases. By gradually increasing the valve opening of the solenoid valve 40V in this way, the thrust generated in the air springs 4A to 4D can be settled in a shorter time than that in the example described with reference to FIG. Becomes

In the above description with reference to FIGS. 5 and 6, half-opening operation of the solenoid valve 40V is repeated as a preliminary opening / closing operation when switching the solenoid valve 40V from the closed state to the open state. However, instead of repetition of the half-opening operation of the solenoid valve 40V, full opening and full closing may be intermittently repeated. That is, depending on the pressure of the air pressure source 40T shown in FIG. 3, the amount of air flowing in the conduit 40H when the solenoid valve 40V is open, or the capacity of the air spring 4A, the solenoid valve 40V is fully opened, By intermittently repeating the full-close operation, the stabilization can be performed in a shorter time than in the above-described example without generating vibration on the surface plate 6.

In the description of the above embodiment,
Although the operation when air is supplied from the air pressure source 40T to the air springs 4A to 4D shown in FIG. 3 has been described, the above-described drive control method of the electromagnetic valve 40V is performed by, for example, a valve (not shown) from the air springs 4A to 4D. It is also effective when applied to discharge air and reduce thrust.

-Second Embodiment- A second embodiment of the present invention will be described with reference to FIGS. FIG. 8 is a block diagram illustrating a configuration of a control device 11A of an exposure apparatus to which the anti-vibration device according to the second embodiment is applied, and a solenoid valve connected to the control device 11A. The control device 11A shown in FIG. 8 is the same as the control device 11A shown in FIG.
2 shows only a portion different in configuration from the control device 11 shown in FIG. The configuration of the parts not shown in FIG. 8 is the same as that of FIG. Here, the description will focus on the differences from the first embodiment.

In FIG. 8, a 3-port solenoid valve 86A-86C and a 2-port solenoid valve 88A are provided in an air spring control section 61A.
To 88C, and proportional electromagnetic relief valves (hereinafter, referred to as relief valves) 90A to 90C are connected. Air pressure source 4
The inlets of the throttle valves 82A to 82C and the throttle valves 83A to 83C are connected to 0T via a pipeline 81. The opening diameter of the orifices of the throttle valves 82A to 82C is
It is set to be larger than the opening diameter of the orifice of ~ 83C. Throttle valves 82A, 83A, 82B, 83B, 82C,
The outlet side of 83C is connected to pipelines 84A, 85A, 84A, respectively.
3 port solenoid valve 8 via B, 85B, 84C, 85C
It is connected to the entrance side of 6A-86C.

The outlets of the three-port solenoid valves 86A to 86C are connected to the inlets of the two-port solenoid valves 88A to 88C via pipes 87A to 87C, respectively. The outlet sides of the two-port solenoid valves 88A to 88C are connected to pipes 89A to 89A, respectively.
It is connected to the inlet side of relief valves 90A to 90C via 89C. The outlet side of each of the relief valves 90A to 90C is connected to an exhaust port 92 via a pipe 91.

The outlet side of the 2-port solenoid valve 88A and the air springs 4A, 4B are connected via a pipe 93A to the 2-port solenoid valve 8A.
The outlet side of 8B and the air spring 4C are connected via a pipe 93B.
The outlet side of the two-port solenoid valve 88C is connected to the air spring 4D via a pipe 93C.

Here, the operation of the vibration damping device according to the second embodiment configured as described above will be described with reference to FIG. At the start of the operation of the exposure apparatus 100, the air spring control unit 61A sets the displacement sensors 10Z1, 10Z2, 10Z
A relief valve 90A based on a signal output from Z3 (FIG. 4) regarding Z (height) displacement of the platen 6 (FIG. 1).
A signal is issued to .about.90C to control to a predetermined relief pressure (timing in FIG. 9). Subsequently, the air spring control unit 61A
Sends a signal to the three-port solenoid valves 86A to 86C to cross-connect these three-port solenoid valves 86A to 86C,
That is, the pipe 84A and the pipe 87A, the pipe 84B and the pipe 8
7B, control is performed so that the pipeline 84C and the pipeline 87C communicate with each other (timing). Air spring controller 61A
Sends a signal to the two-port solenoid valves 88A to 88C to control the two-port solenoid valves 88A to 88C to be in an open state (timing). In addition, four air springs 4A ~
Of the 4Ds, the air springs 4A and 4B communicate with each other via a pipe as shown in FIG. 8, and therefore are always controlled at the same air pressure. Therefore, the four air springs 4A to 4D are composed of the air spring 4A + the air spring 4B, the air spring 4C, and the air spring 4A.
D and three blocks, and the thrust is controlled independently for each block. In the following description, in order to avoid complication, the independent control of the thrust generated from the air springs 4A to 4D will not be described.

With the above control by the air spring control section 61A, the air supplied from the pneumatic source 40T flows through the pipe 81,
Throttle valves 82A to 82C, pipelines 84A to 84C, pipeline 8
The air springs are guided to the air springs 4A to 4D via the pipes 7A to 87C and the pipes 93A to 93C, respectively. As described above, thrust is generated in the air springs 4A to 4D, and the platen 6 starts to rise (between timing and). At this time, the throttle valves 82A-
As described above, the orifice opening diameter of 82C is
Since the orifice opening diameters of A to 83C are set to be larger, the flow rate of the air passing through the throttle valves 82A to 82C is relatively large. Thereby, the thrust of the air springs 4A to 4D can be increased in a relatively short time. That is, the throttle valves 82A to 82C are
It is used when roughly adjusting the thrust generated from A to 4D.

The air spring control section 61A includes the displacement sensor 10
It is determined that the Z-direction position of the surface plate 6 detected in each of Z1, 10Z2, and 10Z3 falls within a predetermined error with respect to the target position, and the three-port solenoid valves 86A to 86C are determined.
In a straight connection state, that is, the pipes 85A and 87
A, Pipe 85B and Pipe 87B, Pipe 85C and Pipe 87C
Is controlled so as to communicate with (timing). Thereby, the air supplied from the air pressure source 40T passes through the throttle valves 83A to 83C having a relatively small orifice opening diameter.
As a result, the speed of increasing the thrust of the air springs 4A to 4D decreases. That is, the throttle valves 83A to 83C are
It is used when finely adjusting the thrust generated from A to 4D. As described above, a variable throttle valve can be used instead of switching the throttle valve having a different orifice opening diameter.

The air spring controller 61A controls the position of the surface plate 6 in the Z direction within the target position as described above. When the thrust of the air springs 4A to 4D, that is, the pressure in the air springs 4A to 4D reaches the above-described relief pressure, the excess pressure component of the air pressure supplied from the air pressure source 40T becomes the relief valve 90A.
９０90C, and the air pressure of the air springs 4AＤ4D is kept constant (timing 〜).

Thereafter, the air spring controller 61A controls the thrust of the air springs 4A to 4D by adjusting the relief pressure of the relief valves 90A to 90C. At this time, as described in the first embodiment, the air spring control unit 61A removes only low frequency component signals from the signals for driving the actuators 7A to 7D (FIG. 4) via the low-pass filters 60a to 60d. input. And the air spring controller 6
1A is a relief valve 90 according to the input result of this signal.
Control the relief pressure from A to 90C. With continued reference to FIG. 9, air springs 4A to 4D by air spring control unit 61A
The method of controlling the thrust will be described.

When the air spring control unit 61A determines that it is necessary to reduce the thrust of the air springs 4A to 4D in accordance with the input of the signal, the air spring control unit 61A reduces the relief pressure of the relief valves 90A to 90C. Gradually lower (timing ~). Conversely, when the air spring control unit 61A determines that it is necessary to increase the thrust of the air springs 4A to 4D, the relief pressures of the relief valves 90A to 90C are gradually increased (timing to).

As described above, the air spring control section 61A controls the excess pressure of the air pressure constantly supplied to each of the air springs 4A to 4D from the air pressure source 40T through the relief valves 90A to 90C. Discharge. At this time, the relief pressure of the relief valves 90A to 90C is controlled by the air spring control unit 61 so as to gradually change, so that the thrust generated by the air springs 4A to 4D does not suddenly change.
Therefore, undesired shaking (residual vibration) generated in the exposure apparatus main body 70 (FIG. 4) can be suppressed. In addition, the air spring control unit controls the actuator 7 as described above.
Low-pass filter 60 from among the signals for driving A to 7D.
The thrusts of the air springs 4A to 4D are adjusted based on the result of inputting only the signal of the low-frequency component via a to 60d. Thereby, the steady thrust generated in the actuators 7A to 7D can be reduced, and the heat generation from the actuators 7A to 7D can be suppressed.

Third Embodiment A third embodiment of the present invention will be described with reference to FIG. FIG. 10 is a block diagram illustrating a configuration of a control device 11B of an exposure apparatus to which the vibration damping device according to the third embodiment is applied, and a solenoid valve connected to the control device 11B. As for the control device 11B shown in FIG. 10, similarly to FIG. 8, only a portion having a different configuration from the control device 11 shown in FIG. 4 referred to when describing the first embodiment is shown, and is not shown in FIG. The configuration of the part is the same as that of FIG. In FIG. 10, the same components as those in FIG. 8 are denoted by the same reference numerals, the description thereof will be omitted, and the description will focus on differences from the second embodiment.

In FIG. 10, the stage control unit 94
This is for controlling the positions of the reticle stage 27 and the XY stage 20. The center-of-gravity position calculating section 95 is a reticle stage 27 output from the stage control section 94.
Signals RX and RY relating to the amount of movement in the X and Y directions, and a signal W relating to the amount of movement of the XY stage 20 in the X and Y directions
Input X and WY. The center-of-gravity position calculating unit 95 calculates the amount of change in the center-of-gravity position of the exposure apparatus main body 70 based on the input result of the above-described signal. Then, the center-of-gravity position calculating unit 95 outputs a signal CG relating to the amount of change in the center-of-gravity
X and CGY are output to the thrust compensation amount calculation unit 96.

The thrust compensation amount calculating section 96 detects the air spring 4A based on the signals CGX and CGY in order to prevent the position of the center of gravity of the exposure apparatus main body 70 from changing and the exposure apparatus main body 70 from tilting. To 4D, the compensation amount of the thrust generated from each of the 4D to 4D is calculated, and the signal ΔPAB,
ΔPC and ΔPD are output to the air spring controller 61B. That is, the exposure device main body 70 mainly includes the air spring 4
A to 4D are supported in the Z direction.
Exposure apparatus main body 70 acting in a distributed manner on each of 4D
The balance equation of the moment about the center of gravity of the exposure device 70 is solved with respect to the load and the thrust generated from the air springs 4A to 4D. The air spring 4 moves with the movement of the position of the center of gravity.
A thrust value to be generated from each of the air springs 4A to 4D is obtained, and the compensation amount of the thrust described above is obtained from the difference between this new thrust value and the thrust value currently generated in each of the air springs 4A to 4D. Ask.

The air spring control section 61B outputs signals ΔPAB, ΔP corresponding to the thrust compensation amount obtained as described above.
C, ΔPD, displacement sensors 10Z1, 10Z2,
A signal related to the Z-direction position of the base 6 output from the 10Z3 and a signal of a low-frequency component among signals for driving the actuators 7A to 7D obtained through the low-pass filters 60a to 60d are input. And the air spring controller 6
1B is 3 in the same manner as described in the second embodiment.
Port solenoid valves 86A-86C, 2-port solenoid valves 88A-
88C, the thrust generated from the air springs 4A to 4D is adjusted by controlling the relief valves 90A to 90C.

As described above, according to the anti-vibration apparatus according to the third embodiment, the position of the center of gravity of the exposure apparatus main body 70 is changed according to the movement of the reticle stage 27 or the XY stage 20. By adjusting the thrusts of the air springs 4A to 4D, the attitude of the platen 6 can be always kept constant. As a result, the exposure apparatus main body 7 is moved with the movement of the reticle stage 27 or the XY stage 20.
Undesired shaking (residual vibration) occurring at zero can be suppressed.

In the second and third embodiments described above, of the air pressure supplied from the air pressure source 40T, the excess air pressure is released by the relief valves 90A to 90C to thereby release the air springs 4A to 4A. Although the control of the thrust of 4D has been described, the control of the thrust of the air springs 4A to 4D may be performed as follows instead. That is, FIG.
Alternatively, in FIG. 10, the relief valves 90A to 90C are replaced with throttle valves having fixed orifice diameters, and the two-port solenoid valves 88A to 88C are used.
By replacing 8C with proportional electromagnetic pressure control valves, it is possible to control the thrust of the air springs 4A to 4D.

In the above description of the first to third embodiments, a first column 24 is erected on the upper surface of the surface plate 6 as shown in FIG. A second column 26 is provided upright, and the stool 6, the first column 24, and the second column 26 form a skeleton of the exposure apparatus main body 70. On the other hand, the anti-vibration apparatus according to the present invention can be applied to an exposure apparatus in which a skeleton having a structure different from that shown in FIG. 1 is formed. This will be described with reference to FIG. In the exposure apparatus shown in FIG. 11, the same components as those shown in FIG. 1 are denoted by the same reference numerals, and description thereof will be omitted. Also,
Also in FIG. 11, the Z axis is taken in parallel with the optical axis of the projection optical system PL, and X is set in the longitudinal direction of the surface plate 6A in a plane perpendicular to the Z axis.
Let the axis be the Y axis in a direction perpendicular to it. The directions of rotation about the respective axes are defined as Zθ, Xθ, and Yθ directions. Further, if necessary, the directions indicated by the arrows indicating the X, Y, and Z axes in FIG. 11 are used by distinguishing from the + X, + Y, + Z directions, and the directions opposite thereto from the -X, -Y, -Z directions. .

In FIG. 11A, actuators 7A to 7D are provided on the upper surface of the pedestal 2 (however, the actuator 7D on the far side of the drawing is not shown in FIG. 11A).
An air spring 4A is mounted on these actuators 7A to 7D.
4D (however, in FIG. 11A, the air spring
D is not shown), and a surface plate 6A is installed on these. Details of these actuators 7A to 7D and air springs 4A to 4D will be described later.

A lower base 6B is suspended from the surface plate 6A.
The wafer stage 20 is set on the lower base 6B. The projection optical system PL is fixed to the surface plate 6A so as to penetrate the surface plate 6A. A reticle stage 27 is provided above the projection optical system PL. A column 26A is fixed on the surface plate 6A so as to surround the projection optical system PL, and a mirror 152 is fixed above the column 26A via a mirror holding unit 154. An illumination optical system IL is installed on the upper part of the column 26A. The illumination light emitted from the illumination optical system IL is reflected by the above-described mirror 152 and guided to the reticle R.

As described above, the exposure apparatus 100A shown in FIG. 11A uses the base 6A with the base 6A as a core.
An exposure apparatus main body 70A having a skeletal structure in which a lower base 6B is suspended and supported, and a column 26A is fixed on the upper surface of the surface plate 6A. The air springs 4A to 4D and the actuators 7A to 7D are connected to the platen 6 serving as a core of the above-described skeletal structure.
Support A. With such a structure, the rigidity of the entire exposure apparatus main body 70A can be easily increased. Further, as compared with the exposure apparatus 100 having the structure shown in FIG.
In the exposure apparatus 100A having the structure shown in FIG. 7A, the difference between the height of the center of gravity of the exposure apparatus main body 70A and the height of the support position of the surface plate 6A can be reduced. Accordingly, when the exposure apparatus main body 70A is tilted, the air springs 4A to 4D and the actuators 7A to 7D are used to correct the tilt.
The thrust to be generated from the above can be made smaller than that shown in FIG. Therefore, the stability of the exposure apparatus main body 70A can be easily increased.

Here, referring to FIG. 11B, actuators 7A to 7A for performing vibration isolation of the exposure apparatus main body 70 will be described.
The connection state of D and the air springs 4A to 4D will be described. The actuators 7A to 7D or the air springs 4A to 4D have the same configuration, and only the actuator 7A and the air spring 4A will be described here.

As described with reference to FIG. 2A, the actuator 7A includes the stator 9A and the mover 8A, and generates a thrust in the ± Z direction by electromagnetic force.
The stator 9A is fixed to the lower portion inside the fixed frame 7Aa, and the mover 8A is connected to the movable frame 4c. Air spring 4A
Is composed of a fixed part 4e and a movable part 4f. The fixed portion 4e of the air spring 4A is fixed on the fixed frame 7Aa, while the movable portion 4f is connected to the movable frame 4c. With such a configuration, both the thrust generated from the actuator 7A and the air spring 4A is transmitted to the movable frame 4c. The thrust generated from the actuator 7A is adjusted by the control device 11 (FIG. 1). To the air spring 4,
Compressed air is sent from the air pressure source 40T (FIG. 3) through the air supply hole 4b. The thrust generated from the air spring 4A is adjusted by the air spring control unit 61 (FIG. 4) based on a control signal generated by the control device 11.

A dowel 4a is projected from the top surface of the movable frame 4c, and is used for positioning by fitting a hole (not shown) formed in the bottom surface of the surface plate 6A. It is.

Referring again to FIG. 11A, the sensors and the like installed on the surface plate 6A will be described. The acceleration sensor 105 is located near both ends on the + Y direction side on the upper surface of the surface plate 6A.
A and 105B are respectively fixed. In addition, surface plate 6
An acceleration sensor 105C is fixed near the end on the −Y direction side on the upper surface of A.
The vibration of the surface plate 6A is detected by 105C. further,
Displacement sensors 1 near both ends of the side surface on the + X direction side of surface plate 6A
06B and 106C are fixed, and the displacement sensor 1 is located near the + Y side end of the side surface on the −X direction side of the surface plate 6A.
06A is fixed. Gate-shaped frames 102A and 102B are fixed near both ends on the ± X side of the pedestal 2, respectively. The displacement sensors 106A to 106C detect the relative displacement between the frame 102A or 102B and the surface plate 6A. These acceleration sensors 105A to 105C
The displacement sensors 106A to 106C are all connected to the control device 11 (FIG. 4).

The above-mentioned acceleration sensors 105A to 105C,
Then, the vibration detection direction or the displacement detection direction of the displacement sensors 106A to 106C will be described. Acceleration sensor 1
05B is the ± X direction, ± Y direction, ± Z direction generated on the surface plate 6A.
It is composed of three acceleration sensors that detect the acceleration in each direction. The acceleration sensor 105A includes two acceleration sensors that detect acceleration in the ± Y direction and ± Z direction generated on the surface plate 6A. Acceleration sensor 105C
Is composed of a sensor for detecting the acceleration in the ± Z direction of the surface plate 6A. Similarly, the displacement sensor 106B includes three displacement sensors that detect relative displacements in the ± X direction, ± Y direction, and ± Z direction between the surface plate 6A and the frame 102B. The displacement sensor 106A includes the surface plate 6A and the frame 1
02A and two displacement sensors for detecting relative displacement in the ± Y direction and ± Z direction generated between the two displacement sensors. The displacement sensor 106C is composed of a surface plate 6A and a frame 102B.
And a sensor for detecting a relative displacement in the ± Z direction occurring between the two. These acceleration sensors 105A to 105C
By processing the signals output from the displacement sensors 106A to 106C, the directions of 6 degrees of freedom of the surface plate 6A, that is, ± X direction, ± Y direction, ± Z direction, ± Xθ direction, ± X
Displacement and vibration in the Yθ direction and ± Zθ direction can be detected.

The Y actuator 32A fixed near the upper end of the frame 102A and the + Y side, and the Y actuator 32B and X actuator 32C fixed near the upper + Y end and the center of the frame 102B, respectively. explain. X actuator 3
2C provides a thrust in the ± X direction to the surface plate 6A. The Y actuators 32A and 32B have a surface plate 6A.
To give a thrust in the ± Y direction. At this time, by adjusting the thrust generated from each of the Y actuators 32A and 32B, ±
A rotational force in the Zθ direction can also be generated. Surface plate 6A
Blocks 35A, 35B, and 35C are fixedly mounted on the upper surface of the device so as to face the respective actuators. And the thrust generated from each actuator is
The signal is transmitted to the platen 6A via the blocks 35A, 35B, 35C facing the respective actuators.

The control device 11 includes the acceleration sensors 105A to 105C and the displacement sensors 106A to 106A described above.
Based on the vibration and displacement of the surface plate 6A detected at 06B, the air springs 4A to 4D and the actuators 7A to
7D, X actuators 32A and 32B, and Y
The thrust generated by the actuator 32C is controlled.

The exposure apparatus main body 70A shown in FIG.
Can be applied to any of the vibration isolators described in any of the first to third embodiments, whereby the position of the exposure apparatus main body 70A is kept constant. ,
And it is isolated. At this time, the air spring control unit 61 (FIG. 4), 61A (FIG. 8), or 61B (FIG. 10)
As described in the first to third embodiments, the air spring 4A
When adjusting the thrust generated from 4D, the air spring 4A
There is no sudden change in thrust generated from ４4D. This suppresses the occurrence of residual vibration of the exposure apparatus main body 70A due to an increase in the thrust of the air springs 4A to 4D.

In the above description of the first to third embodiments, the case where the anti-vibration apparatus according to the present invention is applied to a step-and-scan type scanning exposure type projection exposure apparatus has been described. The anti-vibration apparatus of the present invention can be suitably applied to a stepper type projection exposure apparatus since the stage moves on the surface plate.

Further, the anti-vibration apparatus according to this embodiment is not limited to the optical exposure apparatus described in the above embodiment,
The present invention is also applicable to a charged particle beam exposure apparatus.

In the correspondence between the above-described embodiment and the claims, the control devices 11, 11A and 11B control the vibration isolating table control system, the solenoid valve 40V controls the valve opening / closing means, and the relief valve 9
0A to 90C correspond to the variable pressure adjusting means,
4 is a table moving amount output means,
The XY stage 20 and the XY stage 20 constitute a moving table, and the exposure apparatus main bodies 70 and 70A constitute an exposure apparatus main body.

[0069]

【The invention's effect】

(1) According to the vibration damping device of the first aspect, when the valve is opened to increase the thrust of the air spring and reduce the load on the actuator, the valve is preliminarily opened and closed so that the valve can be opened and closed. Can be gradually guided into the air spring. Along with this, the thrust of the air spring gradually increases, so that residual vibration generated in the vibration isolation table can be suppressed. (2) According to the vibration isolation device of the second aspect, the air pressure supplied to the air spring is adjusted while a part of the air pressure supplied from the air pressure source is caused to flow while bypassing the air spring. Thus, the adjustment can be performed while gradually changing the thrust of the air spring. Thereby, the residual vibration generated in the vibration isolation table can be suppressed. (3) According to the vibration damping device of the third aspect, the thrust of each of the plurality of air springs is adjusted in accordance with the change of the center of gravity of the vibration damping table due to the movement of the moving table, thereby removing the vibration. The posture of the shaking table can always be kept constant. Thereby, undesired shaking (residual vibration) generated in the vibration isolation table can be suppressed. (4) According to the vibration damping device of the fourth aspect, by gradually changing the relief pressure of the relief valve, the thrust of the air spring can be adjusted while gradually changing.
Thereby, the residual vibration generated in the vibration isolation table can be suppressed. (5) According to the exposure apparatus of the fifth aspect, it is possible to suppress undesired residual vibration generated in the vibration isolation table, and thereby it is possible to improve the throughput and exposure accuracy of the exposure apparatus.

[Brief description of the drawings]

FIG. 1 is a perspective view showing a projection exposure apparatus according to an embodiment of the present invention.

FIG. 2A is an enlarged sectional view showing an example of an actuator 7A, and FIG. 2B is an enlarged sectional view showing another example of the actuator 7A.

FIG. 3 shows an air spring 4A, a solenoid valve 40V, and an air pressure source 4.
The figure which shows the connection state of 0T.

FIG. 4 is a control block diagram illustrating a configuration of a control device of the vibration isolation table according to the first embodiment.

FIG. 5 is a timing chart illustrating an example of the operation of the solenoid valve.

FIG. 6 is a timing chart for explaining another example of the operation of the solenoid valve.

FIG. 7 is a timing chart illustrating the operation of a solenoid valve in a projection exposure apparatus according to a conventional technique.

FIG. 8 is a control block diagram illustrating a configuration of a control device for a vibration isolation table according to a second embodiment.

FIG. 9 is a timing chart illustrating a control sequence of an air spring control unit.

FIG. 10 is a control block diagram illustrating a configuration of a control device for a vibration isolation table according to a third embodiment.

FIG. 11 is a diagram illustrating another example of a projection exposure apparatus to which the vibration damping device according to the present invention is applied.

[Explanation of symbols]

4A-4D air spring 5Z1-5Z3, 5Y1, 5Y2, 5X, 105A-1
05C acceleration sensor (vibration sensor) 6, 6A surface plate (vibration isolation table) 7A to 7D actuator 10Z1 to 10Z3, 10Y1, 10Y2, 10X, 1
06A to 106C Displacement sensor 11, 11A, 11B Controller 32A, 32B X actuator 32C Y actuator 40T Pneumatic pressure source 40V Solenoid valve 40H Pipe 61, 61A, 61B Air spring controller 70, 70A Exposure device main body 90A to 90C Proportion Electromagnetic relief valve (relief valve) 94 Stage controller 95 Center of gravity position calculator 96 Thrust compensation amount calculator 100, 100A Exposure device

Claims (5)

[Claims] 1. An anti-vibration table supported on a floor via an air spring, an air pressure source for supplying air pressure to the air spring, and communication between the air spring and the air pressure source A valve opening / closing means which is disposed in the pipe and which can be switched to an open state for communicating between the pneumatic source and the air spring, or a closed state for shutting off, and in parallel with the air spring. An actuator disposed and capable of driving the anti-vibration table in a direction substantially the same as the supporting direction of the air spring; a displacement sensor for detecting a displacement of the anti-vibration table; and at least based on an output from the displacement sensor. The actuator is driven and controlled so as to suppress the vibration of the vibration isolation table, and the valve opening and closing means is driven to open and close to adjust the thrust of the air spring and reduce the load on the vibration isolation table actuator. With vibration isolation table control system An anti-vibration apparatus characterized in that at least one preliminary opening / closing operation is performed when the valve opening / closing means is switched from the closed state to the open state. 2. An anti-vibration table supported on a floor surface via an air spring, an air pressure source for supplying air pressure to the air spring, and an air pressure source supplied from the air pressure source. A variable pressure adjusting means capable of adjusting a pneumatic pressure supplied to the air spring while flowing a part of the air spring by bypassing the air spring; An actuator drivable in substantially the same direction as the supporting direction of the vibration isolator, a displacement sensor for detecting displacement of the vibration isolator, and a vibration sensor for suppressing vibration of the vibration isolator based on at least an output from the displacement sensor. An anti-vibration apparatus comprising: a vibration control table that controls the driving of an actuator, controls the variable pressure adjusting means to adjust the thrust of the air spring, and reduces the load on the actuator. 3. An anti-vibration table supported on a floor surface via a plurality of air springs; an air pressure source for supplying air pressure to the air spring; and the plurality of air from the air pressure source. Pressure adjusting means for independently adjusting the air pressure supplied to each of the springs, disposed in parallel with the air spring, and capable of driving the anti-vibration table in substantially the same direction as the supporting direction of the air spring. An actuator, a moving table installed movably on the vibration isolation table, a table movement amount output unit that outputs a signal relating to a movement amount of the movement table, a displacement sensor that detects a displacement of the vibration isolation table, The actuator is controlled by driving and controlling the actuator based on at least the output from the displacement sensor to suppress the vibration of the vibration isolation table and to control the variable pressure adjusting means to adjust the thrust of the air spring. Anti-vibration table control that reduces the load and adjusts the thrust of each of the plurality of air springs in accordance with a change in the center of gravity of the anti-vibration table determined based on a signal output from the table movement amount output unit. And a vibration isolator. 4. A vibration isolator according to claim 2, wherein said pressure adjusting means is a variable relief valve capable of gradually changing a pressure. 5. An exposure apparatus for projecting a pattern formed on a mask onto a substrate on a substrate stage via a projection optical system, wherein the vibration removing apparatus according to any one of claims 1 to 4. An exposure apparatus, comprising: (1) as a vibration isolator of an exposure apparatus main body.