JPH1150269A - Effective component measuring instrument for chemically dissolving liquid of copper or copper alloy and measuring method therefor - Google Patents

Effective component measuring instrument for chemically dissolving liquid of copper or copper alloy and measuring method therefor

Info

Publication number
JPH1150269A
JPH1150269A JP9220898A JP22089897A JPH1150269A JP H1150269 A JPH1150269 A JP H1150269A JP 9220898 A JP9220898 A JP 9220898A JP 22089897 A JP22089897 A JP 22089897A JP H1150269 A JPH1150269 A JP H1150269A
Authority
JP
Japan
Prior art keywords
copper
copper alloy
chemical solution
alloy
anode electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9220898A
Other languages
Japanese (ja)
Inventor
Taro Kuroda
太郎 黒田
Masaaki Isono
誠昭 磯野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kobe Steel Ltd
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Priority to JP9220898A priority Critical patent/JPH1150269A/en
Publication of JPH1150269A publication Critical patent/JPH1150269A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To continuously control the oxidizing agent concn. in a chemically dissolving liquid by continuously recognizing the concn. of an oxidizing agent (hydrogen peroxide in the case of a sulfuric acid + hydrogen peroxide system) of various kinds of the chemically dissolving liquid of copper or copper alloy. SOLUTION: The measuring instrument formed by electrically connecting an anode electrode 1 consisting of Cu or Cu alloy and a cathode electrode 2 consisting of a conductive material (Pt, Au, Ag, graphite, stainless steel) of the potential nobler than the potential of the anode electrode in the chemically dissolving liquid of the copper or copper alloy and installing an ammeter 4 therebetween is used. The anode electrode and the cathode electrode are immersed into the chemical dissolving liquid of the copper or copper alloy and the oxidizing agent concn. in the dissolving liquid is recognized with the current value (which indicates the value corresponding to the oxidizing agent concn.) flowing between both electrodes as a management index. The management of the oxidizing agent concn. in the chemical dissolving liquid is executed by properly feeding the oxidizing agent.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は銅又は銅合金を化学
的溶解する際に、液中の有効成分のその場測定をする装
置及びその方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus and a method for in-situ measurement of an active ingredient in a liquid when copper or a copper alloy is chemically dissolved.

【0002】[0002]

【従来の技術】銅及び銅合金はその導電率の高さから、
電子材料分野で広く利用されている。これら銅及び銅合
金の素材の製造工程や電子部品の組立工程では、表面の
化学的溶解処理が行われる場合が多々ある。例えば素材
の製造工程では、焼鈍で生成する厚い酸化膜の除去ある
いは表面バフ研磨などの後の研磨バリの除去のため、化
学研磨や化学エッチングなどの化学的溶解処理が行われ
ることがある。また、電子部品の組立工程では、めっき
前の表面調整として化学研磨や化学エッチングなどの化
学的溶解処理が行われることがある。
2. Description of the Related Art Copper and copper alloys have high electrical conductivity.
Widely used in the field of electronic materials. In the process of manufacturing these copper and copper alloy materials and the process of assembling electronic components, the surface is often subjected to a chemical dissolution treatment. For example, in a material manufacturing process, a chemical dissolution treatment such as chemical polishing or chemical etching may be performed to remove a thick oxide film generated by annealing or to remove polishing burrs after surface buffing or the like. In addition, in an electronic component assembling process, a chemical dissolution treatment such as chemical polishing or chemical etching may be performed as a surface adjustment before plating.

【0003】ここで用いられる化学的溶解液としては硫
酸+過酸化水素、硫酸+過酸化物、硝酸、硝酸+硫酸、
硝酸+りん酸、硫酸+過酸化水素+フッ化物、硫酸+過
酸化物+フッ化物などの酸化剤を含む酸や、これらに必
要に応じて界面活性剤や分解抑制剤などの添加物を加え
た液が用いられる。なお、銅及び銅合金を化学的溶解す
る際には、過酸化水素や過酸化物などの酸化剤が有効成
分となり、従ってこれらの有効成分の濃度により化学的
溶解速度が変化し、これらが入っていないと銅はほとん
ど溶解しない(ただし、硝酸は硝酸そのものが酸化剤と
なる)。
The chemical dissolving solution used here is sulfuric acid + hydrogen peroxide, sulfuric acid + peroxide, nitric acid, nitric acid + sulfuric acid,
Acids containing oxidizing agents such as nitric acid + phosphoric acid, sulfuric acid + hydrogen peroxide + fluoride, sulfuric acid + peroxide + fluoride, and additives such as surfactants and decomposition inhibitors as necessary Solution is used. When chemically dissolving copper and copper alloys, an oxidizing agent such as hydrogen peroxide or peroxide becomes an active ingredient, and therefore, the chemical dissolution rate changes depending on the concentration of these active ingredients, and these are contained. If not, copper hardly dissolves (however, nitric acid itself becomes an oxidizing agent).

【0004】従来この銅又は銅合金の化学的溶解液の有
効成分の定量及び補給方法としては、特に有効成分の定
量はせず経験的に処理面積に応じて有効成分を補給する
方法や、定期的に液をサンプリングして機器分析で有効
成分を定量し、それに応じて補給する方法や、特開平6
−240474号公報のように、化学的溶解液中での被
溶解物又は被溶解物と同一組成材の浸漬電位を制御指標
として有効成分を補給する方法が考案されている。
[0004] Conventionally, as a method for quantifying and replenishing the effective component of the chemical solution of copper or copper alloy, a method of empirically replenishing the active component according to the treated area without particularly quantifying the effective component, A method of quantitatively sampling the liquid and quantitatively determining the active ingredient by instrumental analysis, and replenishing the liquid accordingly.
As in JP-A-2004474, a method has been devised in which an active ingredient is replenished using the immersion potential of a substance to be dissolved in a chemical solution or the same composition material as the substance to be dissolved as a control index.

【0005】[0005]

【発明が解決しようとする課題】しかし、処理面積に応
じて有効成分を補給する方法では、連続的な補給がし難
いため化学的溶解速度を一定にすることが難しく、その
ため化学的溶解量も正確には分からない。定期的に液を
サンプリングして機器分析で有効成分を定量し補給する
方法では有効成分の測定値は正確にでるが、分析に時間
がかかるため必ずサンプリングから補給までにタイムラ
グが生じ、化学的溶解速度を一定にすることが難しい。
また、特開平6−240474号公報の方法では、タイ
ムラグを生じることなく有効成分を連続的に補給するこ
とが可能であるが、液の攪拌や、被溶解物自体の浸漬電
位を制御指標とする場合は被溶解物の流通が測定値に影
響を及ぼしたり、また適用対象が硫酸+過酸化水素系の
化学的溶解液を用いる場合に限られるといった問題点が
あった。
However, in the method of replenishing the active ingredient in accordance with the treatment area, it is difficult to make the replenishment continuous, so that it is difficult to keep the chemical dissolution rate constant, and therefore the chemical dissolution amount is also low. I don't know exactly. In the method of periodically sampling the liquid and quantifying and replenishing the active ingredient by instrumental analysis, the measured value of the active ingredient is accurate, but the analysis takes time, so a time lag always occurs from sampling to replenishment, and chemical dissolution occurs. It is difficult to keep the speed constant.
In the method disclosed in JP-A-6-240474, the active ingredient can be continuously replenished without causing a time lag. However, the stirring of the liquid or the immersion potential of the substance to be dissolved is used as a control index. In this case, there is a problem that the flow of the substance to be dissolved affects the measured value, and the application is limited to a case where a chemical dissolution solution of sulfuric acid + hydrogen peroxide is used.

【0006】そこで、本発明は、銅又は銅合金の各種化
学的溶解液の有効成分濃度を連続的に把握し、化学的溶
解液中の有効成分濃度を連続的に管理できるようにし、
一定の化学的溶解速度が得られるようにすることを目的
とする。
Accordingly, the present invention is to continuously grasp the active ingredient concentration of various chemical solutions of copper or copper alloy, and to be able to continuously manage the active ingredient concentration in the chemical solution.
The purpose is to obtain a constant chemical dissolution rate.

【0007】[0007]

【課題を解決するための手段】本発明者らは、上記の目
的のもとに種々研究を行った結果、Cu又はCu合金の
1種をアノード電極とし、それよりも電位の貴な導電性
物質の1種をカソード電極とし、これらを電気的に接続
してその電極部のみを化学的溶解液の中に浸漬したと
き、アノード電極とカソード電極の間を流れる電流値が
化学的溶解液中の有効成分濃度と対応していることを見
いだした。本発明はその知見に基づいてなされたもので
ある。
Means for Solving the Problems The inventors of the present invention have conducted various studies on the above-mentioned objects, and as a result, it has been found that one kind of Cu or Cu alloy is used as an anode electrode and a conductive material having a potential higher than that of the anode. When one kind of substance is used as a cathode electrode, these are electrically connected, and only the electrode portion is immersed in the chemical solution, the electric current flowing between the anode electrode and the cathode electrode is changed in the chemical solution. Was found to correspond to the concentration of the active ingredient. The present invention has been made based on this finding.

【0008】すなわち、本発明に係る銅又は銅合金の化
学的溶解液の有効成分測定装置は、Cu又はCu合金か
らなるアノード電極と、該アノード電極よりも銅又は銅
合金の化学的溶解液の液中で電位が貴な導電性物質から
なるカソード電極を電気的に接続し、その間に電流計を
設置したものである。カソード電極を構成する導電性物
質として、Pt、C(グラファイト)、Au、Ag、ス
テンレス鋼等を挙げることができる。また、アノード電
極とカソード電極の極間距離は2mm〜10m、アノー
ド電極とカソード電極の面積比(アノード電極面積/カ
ソード電極面積)は0.0025〜400の範囲内とす
るのが好ましい。
That is, the apparatus for measuring the effective component of a chemical solution of copper or a copper alloy according to the present invention comprises an anode electrode made of Cu or a Cu alloy, and a chemical solution of copper or a copper alloy that is higher than the anode electrode. A cathode electrode made of a conductive substance having a noble potential in a liquid is electrically connected, and an ammeter is provided between the cathode electrodes. Pt, C (graphite), Au, Ag, stainless steel, and the like can be given as examples of the conductive material constituting the cathode electrode. The distance between the anode and the cathode is preferably 2 mm to 10 m, and the area ratio between the anode and the cathode (the area of the anode / the area of the cathode) is preferably in the range of 0.0025 to 400.

【0009】本発明に係る銅又は銅合金の化学的溶解液
の有効成分測定方法は、アノード電極とカソード電極を
電気的に接続し、その間に電流計を設置した上記測定装
置を用い、そのアノード電極とカソード電極を銅又は銅
合金の化学的溶解液に浸漬し、その間に流れる電流値を
指標として化学的溶解液中の有効成分濃度を検知するも
のである。この方法によれば、電極間の電流値を管理指
標として、適宜有効成分を補給するなど、化学的溶解液
中の有効成分濃度を連続的に管理することができる。
The method for measuring the effective component of a chemical solution of copper or a copper alloy according to the present invention uses the above-described measuring apparatus in which an anode electrode and a cathode electrode are electrically connected and an ammeter is installed between the anode electrode and the cathode electrode. The electrode and the cathode electrode are immersed in a chemical solution of copper or a copper alloy, and the concentration of the active ingredient in the chemical solution is detected using the value of the current flowing therebetween as an index. According to this method, the concentration of the active ingredient in the chemical solution can be continuously managed, for example, by replenishing the active ingredient appropriately using the current value between the electrodes as a management index.

【0010】[0010]

【発明の実施の形態】Cu又はCu合金の1種をアノー
ド電極とし、それよりも電位の貴な導電性物質の1種を
カソード電極として、これらを電気的に接続したものの
電極部のみを化学的溶解液の中に浸漬すると、アノード
電極とカソード電極の間を電流が流れる。このとき流れ
る電流は、アノード電極とカソード電極の電位差により
アノード電極が化学的溶解液中で少しずつ溶解して電子
が放出され、その電子量に見合うだけの反応がカソード
電極表面上で起こるために発生し、その電流値は化学的
溶解液中の有効成分濃度と対応する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS One type of Cu or Cu alloy is used as an anode electrode, and one type of conductive material having a higher potential than that is used as a cathode electrode. When immersed in a typical solution, a current flows between the anode electrode and the cathode electrode. The current flowing at this time is due to the potential difference between the anode electrode and the cathode electrode, which causes the anode electrode to gradually dissolve in the chemical dissolving solution and release electrons, and a reaction corresponding to the amount of electrons occurs on the cathode electrode surface. Occurs and the current value corresponds to the concentration of the active ingredient in the chemical lysis solution.

【0011】このカソード電極上での反応は化学的溶解
液中の有効成分が還元されることで消費される。従っ
て、カソード電極は、アノード電極となるCu又はCu
合金よりも化学的溶解液中で電位が貴であればよく、例
えばPt、C、Au、Ag、ステンレス鋼を用いること
ができる。なお、電極自体は接液部が所定の導電性物質
であればよく、例えばカソード電極として導電性物質に
Ptめっき、Auめっき、Agめっきしたものなどを用
いることができる。
[0011] The reaction on the cathode electrode is consumed by the reduction of the active ingredient in the chemical solution. Therefore, the cathode electrode is Cu or Cu
It is sufficient that the potential is higher in the chemical solution than in the alloy. For example, Pt, C, Au, Ag, and stainless steel can be used. Note that the electrode itself only needs to be a predetermined conductive material in the liquid contact portion. For example, a conductive material obtained by plating a conductive material with Pt plating, Au plating, or Ag plating can be used as the cathode electrode.

【0012】カソード電極とアノード電極は両極を常に
近傍に設置する必要はないが、10mより長く離すと電
極間に流れる電流値が振れる場合があり、好ましくは1
0m以下の距離に設置する方がよい。また、2mmより
短い距離になると、電極間に液が停滞することがあり、
有効成分の真値を測定できないことがあるため、2mm
以上離す方がよい。また、カソード電極とアノード電極
の接液部の面積比(アノード電極面積/カソード電極面
積)が0.0025未満あるいは400より大きくなる
と、電流値が振れる場合があるため、面積比は0.00
25〜400が好ましい。
It is not necessary that the cathode electrode and the anode electrode are always disposed close to each other, but if the distance is longer than 10 m, the value of the current flowing between the electrodes may fluctuate.
It is better to install at a distance of 0 m or less. If the distance is shorter than 2 mm, the liquid may stagnate between the electrodes,
2mm because the true value of the active ingredient may not be measured
It is better to separate them. If the area ratio (anode electrode area / cathode electrode area) of the liquid contact portion between the cathode electrode and the anode electrode is less than 0.0025 or more than 400, the current value may fluctuate.
25-400 is preferred.

【0013】本発明ではアノード電極としてCu又はC
u合金を使用するため、これが銅又は銅合金の化学的溶
解液に溶解しても、特にアノード電極がCu又は被溶解
銅合金と同じ成分からなるCu合金のとき、それがコン
タミ(汚染物質)となることはない。なお、液中に解け
出しても問題とならないならば、異種成分を含むCu合
金やCu又はCu合金以外の金属(例えばZn、Fe、
Sn、Niやこれらの合金など)をアノード電極として
使用できる。
In the present invention, Cu or C is used as the anode electrode.
Because u alloy is used, even if it is dissolved in copper or a chemical solution of copper alloy, it is contaminant, especially when the anode electrode is Cu or Cu alloy consisting of the same components as the copper alloy to be melted. Will not be. In addition, if there is no problem even if it dissolves in the liquid, Cu alloy containing different components and metals other than Cu or Cu alloy (for example, Zn, Fe,
Sn, Ni, alloys thereof, etc.) can be used as the anode electrode.

【0014】図1は、本発明に係る測定装置の一例を示
すもので、Cu又はCu合金からなるアノード電極1
と、それより電位の貴な例えばPt等からなるカソード
電極2が電気的に接続され、その間に電流計4が設置さ
れ、電流計4の信号が電圧変換器5を経てX−Yレコー
ダー6に記録されるようになっている。3は電極を固定
する固定冶具であり、絶縁材からなる。さらに、電流計
をパソコンと接続し、パソコンを通して有効成分の補給
装置を連動させ、その自動運転を行わせることも可能で
ある。
FIG. 1 shows an example of a measuring apparatus according to the present invention, in which an anode electrode 1 made of Cu or a Cu alloy is used.
And a cathode electrode 2 made of, for example, Pt having a higher potential than the cathode electrode 2 is electrically connected. An ammeter 4 is provided between the cathode electrode 2 and the signal of the ammeter 4 is supplied to the XY recorder 6 via the voltage converter 5. It is to be recorded. Reference numeral 3 denotes a fixing jig for fixing the electrodes, which is made of an insulating material. Further, it is also possible to connect an ammeter to a personal computer, link the active ingredient replenishing device through the personal computer, and perform the automatic operation thereof.

【0015】[0015]

【実施例】次に、本発明に係る測定装置を使用し、その
電流計で測定される電流値と化学的溶解液中の有効成分
濃度が対応することを実施例として示す。銅合金(Cu
−0.1Fe−0.03P)を溶解鋳造後、熱間圧延、
冷間圧延、焼鈍を含む量産規模での製造工程により作製
し、焼鈍後の化学エッチング工程で、硫酸−過酸化水素
系のエッチング液を使用して銅合金板のエッチングを行
った。このとき図1に示す測定装置のアノード電極及び
カソード電極のみエッチング液中に浸漬して電流値の変
化を測定した。なお、アノード電極は無酸素銅(面積:
2cm2)、カソード電極はPt(面積:1cm2)で構
成し、両電極間距離Lを65mmとした。また同時に有
効成分である過酸化水素濃度を滴定により随時分析し
た。これらの結果を図2に示す。
Next, an example will be described in which the measurement device according to the present invention is used and the current value measured by the ammeter corresponds to the concentration of the active ingredient in the chemical solution. Copper alloy (Cu
-0.1Fe-0.03P) after melting and casting, hot rolling,
The copper alloy plate was manufactured by a manufacturing process on a mass production scale including cold rolling and annealing, and in a chemical etching process after annealing, a copper alloy plate was etched using a sulfuric acid-hydrogen peroxide-based etchant. At this time, only the anode electrode and the cathode electrode of the measuring apparatus shown in FIG. The anode electrode is oxygen-free copper (area:
2 cm 2 ), the cathode electrode was composed of Pt (area: 1 cm 2 ), and the distance L between both electrodes was 65 mm. At the same time, the concentration of hydrogen peroxide as an active ingredient was analyzed at any time by titration. These results are shown in FIG.

【0016】図2において、エッチング液中の過酸化水
素濃度をみると、1回目の過酸化水素補給によって濃度
が上昇し、時間の経過とともにしだいに低下し、2回目
の補給により再び濃度が上昇し、時間の経過とともにし
だいに低下している。一方、測定装置の電流値は、随時
分析した過酸化水素濃度の上記変化にちょうど対応した
変化を示している。このように、この測定装置の電流値
は過酸化水素濃度と対応しているから、この電流値を指
標として、過酸化水素濃度自体を分析しなくても、エッ
チング液中の過酸化水素濃度を連続的に把握することが
でき、また、この電流値を管理指標として、適宜過酸化
水素を補給するなど、エッチング液中の過酸化水素濃度
の管理を行うことができる。
Referring to FIG. 2, the concentration of hydrogen peroxide in the etching solution is increased by the first replenishment of hydrogen peroxide, gradually decreased with time, and increased again by the second replenishment. And gradually declines over time. On the other hand, the current value of the measuring device shows a change just corresponding to the above change in the concentration of hydrogen peroxide analyzed as needed. As described above, since the current value of this measuring device corresponds to the hydrogen peroxide concentration, the hydrogen peroxide concentration in the etching solution can be measured using the current value as an index without analyzing the hydrogen peroxide concentration itself. The concentration of hydrogen peroxide in the etching solution can be controlled by, for example, replenishing hydrogen peroxide appropriately using the current value as a control index.

【0017】なお、上記の硫酸−過酸化水素系のエッチ
ング液に限らず、銅又は銅合金の他の化学的溶解液であ
っても、本発明に係る測定装置の電流値は化学的溶解液
中の有効成分(酸化剤)の濃度と対応する。従って、そ
の電流値を指標として化学的溶解液中の有効成分の濃度
を連続的に把握でき、また、その電流値を管理指標とし
て有効成分の濃度管理を行うことが可能である。
The current value of the measuring apparatus according to the present invention is not limited to the above sulfuric acid-hydrogen peroxide-based etchant, but may be any other chemical dissolution solution of copper or copper alloy. It corresponds to the concentration of the active ingredient (oxidizing agent) in it. Therefore, the concentration of the active ingredient in the chemical solution can be continuously grasped using the current value as an index, and the concentration of the active ingredient can be controlled using the current value as a control index.

【0018】[0018]

【発明の効果】本発明によれば、簡単な装置を使用しそ
の電流値を指標として、銅又は銅合金の化学的溶解液中
の有効成分濃度を連続的に把握し、かつその濃度を連続
的に管理することができる。従って、被溶解物の化学的
溶解速度を常に一定範囲に保つことも可能となる。ま
た、銅又は銅合金の各種化学的溶解液に広く適用できる
利点がある。
According to the present invention, the concentration of an active ingredient in a chemical solution of copper or a copper alloy is continuously grasped using a simple device and its current value is used as an index, and the concentration is continuously measured. Can be managed. Therefore, it is possible to keep the chemical dissolution rate of the substance to be dissolved within a certain range at all times. Further, there is an advantage that it can be widely applied to various chemical solutions of copper or copper alloy.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明に係る有効成分測定装置の模式図であ
る。
FIG. 1 is a schematic view of an active ingredient measuring device according to the present invention.

【図2】 エッチング液中の過酸化水素濃度と有効成分
測定装置の電流値の対応を示すグラフである。
FIG. 2 is a graph showing the correspondence between the concentration of hydrogen peroxide in an etching solution and the current value of an effective component measuring device.

【符号の説明】[Explanation of symbols]

1 アノード電極 2 カソード電極 1 Anode electrode 2 Cathode electrode

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 Cu又はCu合金からなるアノード電極
と、該アノード電極よりも銅又は銅合金の化学的溶解液
の液中で電位が貴な導電性物質からなるカソード電極を
電気的に接続し、その間に電流計を設置したことを特徴
とする銅又は銅合金の化学的溶解液の有効成分測定装
置。
An anode electrode made of Cu or a Cu alloy is electrically connected to a cathode electrode made of a conductive material having a potential higher in a solution of a chemical solution of copper or a copper alloy than the anode electrode. An active ingredient measuring device for a chemical solution of copper or a copper alloy, wherein an ammeter is installed in the meantime.
【請求項2】 上記カソード電極を構成する導電性物質
が、Pt、C(グラファイト)、Au、Ag、ステンレ
ス鋼から選ばれた1種であることを特徴とする請求項1
に記載された銅又は銅合金の化学的溶解液の有効成分測
定装置。
2. The conductive material constituting the cathode electrode is one selected from Pt, C (graphite), Au, Ag, and stainless steel.
An apparatus for measuring an effective component of a chemical solution of copper or a copper alloy described in the above item.
【請求項3】 上記アノード電極とカソード電極の極間
距離が2mm〜10mで、かつアノード電極面積とカソ
ード電極面積の比(アノード電極面積/カソード電極面
積)が0.0025〜400であることを特徴とする請
求項1又は2に記載された銅又は銅合金の化学的溶解液
の有効成分測定装置。
3. The method according to claim 1, wherein the distance between the anode electrode and the cathode electrode is 2 mm to 10 m, and the ratio of the anode electrode area to the cathode electrode area (anode electrode area / cathode electrode area) is 0.0025 to 400. 3. An apparatus for measuring an effective component of a chemical solution of copper or copper alloy according to claim 1 or 2.
【請求項4】 Cu又はCu合金からなるアノード電極
と、該アノード電極よりも銅又は銅合金の化学的溶解液
の液中で電位が貴な導電性物質からなるカソード電極を
電気的に接続し、その間に電流計を設置した測定装置を
用い、そのアノード電極とカソード電極を銅又は銅合金
の化学的溶解液に浸漬し、その間を流れる電流値を指標
として化学的溶解液中の有効成分濃度の測定を行うこと
を特徴とする銅又は銅合金の化学的溶解液の有効成分測
定方法。
4. An electrical connection is made between an anode electrode made of Cu or a Cu alloy and a cathode electrode made of a conductive substance having a higher potential in a solution of a chemical solution of copper or a copper alloy than the anode electrode. The anode and cathode electrodes are immersed in a chemical solution of copper or copper alloy using a measuring device with an ammeter between them, and the concentration of the active ingredient in the chemical solution is determined by using the current value flowing between them as an index. A method for measuring the effective component of a chemical solution of copper or a copper alloy, comprising measuring the content of copper.
【請求項5】 Cu又はCu合金からなるアノード電極
と、該アノード電極よりも銅又は銅合金の化学的溶解液
の液中で電位が貴な導電性物質からなるカソード電極を
電気的に接続し、その間に電流計を設置した測定装置を
用い、そのアノード電極とカソード電極を銅又は銅合金
の化学的溶解液に浸漬し、その間に流れる電流値を管理
指標として化学的溶解液中の有効成分濃度の管理を行う
ことを特徴とする銅又は銅合金の化学的溶解液の有効成
分管理方法。
5. An electrical connection is made between an anode electrode made of Cu or a Cu alloy and a cathode electrode made of a conductive substance having a potential higher in a solution of a chemical solution of copper or a copper alloy than the anode electrode. The anode and cathode electrodes are immersed in a chemical solution of copper or a copper alloy using a measuring device with an ammeter between them, and the current flowing between them is used as a control index to determine the effective components in the chemical solution. A method for controlling an effective component of a chemical solution of copper or a copper alloy, wherein the concentration is controlled.
JP9220898A 1997-07-31 1997-07-31 Effective component measuring instrument for chemically dissolving liquid of copper or copper alloy and measuring method therefor Pending JPH1150269A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9220898A JPH1150269A (en) 1997-07-31 1997-07-31 Effective component measuring instrument for chemically dissolving liquid of copper or copper alloy and measuring method therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9220898A JPH1150269A (en) 1997-07-31 1997-07-31 Effective component measuring instrument for chemically dissolving liquid of copper or copper alloy and measuring method therefor

Publications (1)

Publication Number Publication Date
JPH1150269A true JPH1150269A (en) 1999-02-23

Family

ID=16758268

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9220898A Pending JPH1150269A (en) 1997-07-31 1997-07-31 Effective component measuring instrument for chemically dissolving liquid of copper or copper alloy and measuring method therefor

Country Status (1)

Country Link
JP (1) JPH1150269A (en)

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