JPH11320616A - Manufacture of disk substrate and disk substrate - Google Patents

Manufacture of disk substrate and disk substrate

Info

Publication number
JPH11320616A
JPH11320616A JP10133474A JP13347498A JPH11320616A JP H11320616 A JPH11320616 A JP H11320616A JP 10133474 A JP10133474 A JP 10133474A JP 13347498 A JP13347498 A JP 13347498A JP H11320616 A JPH11320616 A JP H11320616A
Authority
JP
Japan
Prior art keywords
injection molding
sec
pressure
disk substrate
peripheral portion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP10133474A
Other languages
Japanese (ja)
Inventor
Yoshihiko Kodama
吉彦 児玉
Hiroshi Otsuki
洋 大槻
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP10133474A priority Critical patent/JPH11320616A/en
Publication of JPH11320616A publication Critical patent/JPH11320616A/en
Abandoned legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C45/00Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
    • B29C45/17Component parts, details or accessories; Auxiliary operations
    • B29C45/26Moulds
    • B29C45/263Moulds with mould wall parts provided with fine grooves or impressions, e.g. for record discs

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Injection Moulding Of Plastics Or The Like (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Manufacturing Optical Record Carriers (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a uniform high recording and reproducing characteristic by changing stepwise a reduced pressure of an injection molding pressure after the injection molding. SOLUTION: A stamper 26 is mounted on a surface of a signal face mirror member 11, and a cavity 14 is closed by moving a read face mirror member 12 so that a molten resin is injected into the cavity 14 through a gate 15. The injection molding pressure is applied, e.g. in five stages: in a first step the injection molding pressure is 13 tons or more and the injection molding pressure time is 0.4 sec or more; the switching time to a second step is 0-5 sec, the reduced pressure is 0-13 ton and the reduced pressure time is 0-3 sec; the switching time to a third, fourth, and fifth steps 0-5 sec respectively, the reduced pressure 0-13 ton respectively and the reduced pressure time 0-5 sec respectively. This results in substantial uniformity in an each CNR in the inner circumferential portion, intermediate circumferential portion, and outer circumferential portion of a magneto-optical disk.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、情報を記録するデ
ィスクに用いられる基板の製造方法及びディスク用基板
に関するものである。
[0001] 1. Field of the Invention [0002] The present invention relates to a method of manufacturing a substrate used for a disk for recording information and a disk substrate.

【0002】[0002]

【従来の技術】情報記録ディスクの1つである例えばC
D−ROM等の光ディスクに用いられる基板は、一般に
ポリカーボネート等のプラスチック材料を射出成形する
ことにより製造されている。この射出成形法は、光ディ
スクの情報の記録に必要なピット・グルーブが反転形成
されているスタンパと呼ばれる約0.3mm厚のNi
(ニッケル)原盤を、射出成形機の成形用金型を構成す
る一対のミラー部材の一方のミラー部材の表面に装着
し、スタンパと他方のミラー部材との間に形成されるキ
ャビティ内に溶融樹脂を射出し、スタンパからピット・
グルーブを転写して光ディスク用基板を成形する方法で
ある。
2. Description of the Related Art One of information recording disks, for example, C
A substrate used for an optical disk such as a D-ROM is generally manufactured by injection molding a plastic material such as polycarbonate. This injection molding method employs a stamper in which pits and grooves necessary for recording information on an optical disk are formed in an inverted manner, and is called a stamper of about 0.3 mm thickness.
A (nickel) master is mounted on the surface of one of a pair of mirror members constituting a molding die of an injection molding machine, and molten resin is placed in a cavity formed between the stamper and the other mirror member. Pits from the stamper
This is a method of forming an optical disc substrate by transferring a groove.

【0003】ここで、光ディスク用基板の要求特性とし
ては、寸法・反り・真円度等の機械特性、複屈折率等の
光学特性、ピット・グルーブ等の転写特性、そして異物
・傷・成形不良等の欠陥特性等が挙げられる。これらの
特性のうち複屈折率は、アニールの有無にかかわらず、
成膜前において光ディスク用基板の内周部から外周部に
かけての全ての半径方向位置で0nmに近い状態にする
ことが望ましいとされている。
Here, the required characteristics of the optical disk substrate include mechanical characteristics such as dimensions, warpage, and roundness, optical characteristics such as birefringence, transfer characteristics such as pits and grooves, foreign matter, scratches, and molding defects. And other defect characteristics. Of these properties, the birefringence, with or without annealing,
Prior to film formation, it is desirable that all radial positions from the inner peripheral portion to the outer peripheral portion of the optical disk substrate be close to 0 nm.

【0004】従来は、各特性を満たすように、樹脂温度
及び金型温度や、射出速度、射出成形圧(型締力)、減
圧(型締力)及び型締時間等で表される成形サイクル等
の射出成形条件のパラメータを制御して光ディスク用基
板を成形している。例えば図7に示す射出成形サイクル
により光ディスク用基板を成形することにより、図8に
示すように光ディスク用基板の内周部、中周部、外周部
における各半径方向位置での複屈折率を略0nmとする
ことができる。
Conventionally, a molding cycle represented by a resin temperature and a mold temperature, an injection speed, an injection molding pressure (mold clamping force), a pressure reduction (mold clamping force), a mold clamping time, etc., so as to satisfy each characteristic. By controlling the parameters of the injection molding conditions such as the above, the optical disk substrate is molded. For example, by molding the optical disc substrate by the injection molding cycle shown in FIG. 7, the birefringence at each radial position in the inner, middle and outer peripheral portions of the optical disc substrate is substantially reduced as shown in FIG. It can be 0 nm.

【0005】[0005]

【発明が解決しようとする課題】上述した光ディスク用
基板の成形方法により、情報記録ディスクの1つである
例えば記録再生用のミニディスク(Recordabl
e MD(登録商標))等の光磁気ディスクに用いられ
る基板を成形して、光磁気ディスク用基板の内周部、中
周部、外周部における各半径方向位置での複屈折率を略
0nmとしたところ、図9に示すように、成膜後の電気
特性の1つであるCNR(記録感度特性)が、光磁気デ
ィスクの内周部と外周部において1dB以上の差が生じ
ることが判明した。このように光磁気ディスク用基板の
外周部のCNRが内周部のCNRより1dB以上低下す
ると、光磁気ディスクとしたときの外周部での情報の記
録再生特性が内周部での情報の記録再生特性より悪化す
るので、記録再生特性のばらつきを有する光磁気ディス
クになってしまうという問題があった。
According to the optical disk substrate molding method described above, one of the information recording disks, for example, a recording / reproducing mini disk (Recordable) is used.
e MD (registered trademark)), etc., a substrate used for a magneto-optical disk is formed, and the birefringence at each radial position in the inner, middle and outer peripheral portions of the magneto-optical disk substrate is set to approximately 0 nm. As shown in FIG. 9, it was found that a CNR (recording sensitivity characteristic), which is one of the electrical characteristics after film formation, had a difference of 1 dB or more between the inner and outer peripheral portions of the magneto-optical disk. did. As described above, when the CNR at the outer peripheral portion of the magneto-optical disk substrate is lower than the CNR at the inner peripheral portion by 1 dB or more, the recording / reproducing characteristics of information on the outer peripheral portion when the magneto-optical disk is formed is such that the recording of information on the inner peripheral portion is performed. Since the read / write characteristics are worse than the read / write characteristics, there is a problem that the magneto-optical disk has a variation in the read / write characteristics.

【0006】本発明は、上述した事情から成されたもの
であり、全面にわたって均一な高記録再生特性を備えた
ディスクとすることができるディスク用基板の製造方法
及びディスク用基板を提供することを目的とする。
The present invention has been made in view of the above circumstances, and provides a method of manufacturing a disk substrate and a disk substrate capable of forming a disk having uniform high recording / reproducing characteristics over the entire surface. Aim.

【0007】[0007]

【課題を解決するための手段】上記目的は、本発明にあ
っては、情報を記録するディスクに用いられる基板を射
出成形により製造する方法において、前記射出成形後の
射出成形圧の減圧をステップ状に変化させることにより
達成される。また、上記目的は、本発明にあっては、情
報を記録するディスクに用いられる基板において、内周
部から外周部にかけての複屈折率が変化するように形成
されていることにより達成される。
According to the present invention, there is provided a method for manufacturing a substrate used for a disk for recording information by injection molding, the method comprising the steps of reducing the injection molding pressure after the injection molding. This is achieved by changing the shape. Further, in the present invention, the above object is achieved by forming a substrate used for a disc for recording information such that a birefringence from an inner peripheral portion to an outer peripheral portion is changed.

【0008】上記構成によれば、射出後の射出成形圧の
減圧をステップ状に変化させることにより、ディスク用
基板の内周部から外周部にかけての複屈折率を変化させ
ることができるので、ディスク用基板の全面にわたって
電気特性を均一にすることができる。即ち、ディスク用
基板の内周部と外周部の電気特性の相違は、ディスク用
基板の内周部から外周部にかけての複屈折率のトレンド
やピット・グルーブ等の微妙な形状変化に要因している
ので、ディスク用基板の全面にわたって電気特性が均一
になるように、射出後の射出成形圧の減圧をステップ状
に変化させて、ディスク用基板の内周部から外周部にか
けての複屈折率を変化させることにより対応可能とな
る。
According to the above construction, the birefringence from the inner peripheral portion to the outer peripheral portion of the disk substrate can be changed by changing the pressure of the injection molding pressure after the injection stepwise. The electrical characteristics can be made uniform over the entire surface of the substrate. That is, the difference in the electrical characteristics between the inner and outer peripheral portions of the disk substrate is caused by the trend of the birefringence from the inner peripheral portion to the outer peripheral portion of the disk substrate and the subtle shape change such as pits and grooves. In order to make the electrical characteristics uniform over the entire surface of the disk substrate, the pressure drop of the injection molding pressure after injection is changed in a step-like manner, and the birefringence index from the inner peripheral portion to the outer peripheral portion of the disk substrate is reduced. It is possible to respond by changing.

【0009】[0009]

【発明の実施の形態】以下、本発明の好適な実施形態を
添付図面に基づいて詳細に説明する。なお、以下に述べ
る実施形態は、本発明の好適な具体例であるから、技術
的に好ましい種々の限定が付されているが、本発明の範
囲は、以下の説明において、特に本発明を限定する旨の
記載がない限り、これらの形態に限られるものではな
い。
Preferred embodiments of the present invention will be described below in detail with reference to the accompanying drawings. Note that the embodiments described below are preferred specific examples of the present invention, and therefore, various technically preferable limitations are added. However, the scope of the present invention is not limited to the following description in the following description. It is not limited to these forms unless otherwise stated.

【0010】図1は、本発明のディスク用基板の製造方
法の実施形態で用いられる射出成形機の一例を示す断面
平面図である。この射出成形機10は、成形手段である
固定金型側の信号面ミラー部材11と可動金型側の読取
面ミラー部材12を備えている。信号面ミラー部材11
の一端面には、スタンパ26がスタンパ押さえ13を介
して取り付けられている。読取面ミラー部材12の一端
面には、溶融樹脂が射出されてディスク用基板が形成さ
れるキャビティ14が設けられている。さらに、受板の
他端面からキャビティ14の中央に貫通し、キャビティ
14内に溶融樹脂を導くためのゲート15が設けられて
いる。読取面ミラー部材12には、ディスク用基板のセ
ンター穴となる部分を切断するためのカットパンチ16
が備えられている。
FIG. 1 is a sectional plan view showing an example of an injection molding machine used in an embodiment of the method of manufacturing a disk substrate according to the present invention. The injection molding machine 10 includes a signal surface mirror member 11 on a fixed mold side and a reading surface mirror member 12 on a movable mold side, which are molding means. Signal surface mirror member 11
A stamper 26 is attached to the one end face of the substrate through a stamper retainer 13. On one end surface of the reading surface mirror member 12, there is provided a cavity 14 in which a molten resin is injected to form a disk substrate. Further, a gate 15 is provided that penetrates from the other end surface of the receiving plate to the center of the cavity 14 and guides the molten resin into the cavity 14. The reading surface mirror member 12 has a cut punch 16 for cutting a portion to be a center hole of the disk substrate.
Is provided.

【0011】このような構成の射出成形機10による光
磁気ディスク用基板の射出成形工程例について図2を参
照して説明する。ここで、図3は、光磁気ディスク用基
板の内周部、中周部、外周部における光学特性である各
複屈折率を変化させたときの成膜後の電気特性であるC
NRの変化を示す図である。このように複屈折率とCN
Rとは相関関係があるので、光磁気ディスク用基板の内
周部、中周部、外周部における各複屈折率を適切な値に
することにより、光磁気ディスク用基板の内周部、中周
部、外周部における各CNRを略均一にすることができ
る。
An example of an injection molding process of a substrate for a magneto-optical disk by the injection molding machine 10 having such a configuration will be described with reference to FIG. FIG. 3 shows the electrical characteristics after film formation when the birefringence, which is the optical characteristic at the inner, middle, and outer peripheral portions of the magneto-optical disk substrate, is changed.
It is a figure showing change of NR. Thus, the birefringence and CN
Since there is a correlation with R, the inner, middle, and middle portions of the magneto-optical disk substrate are adjusted by setting the respective birefringence indices at the inner, middle, and outer peripheral portions of the magneto-optical disk substrate to appropriate values. Each CNR in the peripheral portion and the outer peripheral portion can be made substantially uniform.

【0012】即ち、複屈折率の規格値は、±100nm
であり、CNRの規格値は、47dB以上であることか
ら、内周部の複屈折率を30nm〜−50nm、中周部
の複屈折率を20nm〜−60nm、外周部の複屈折率
を0nm〜−100nmの範囲内にすることにより、各
部のCNRを47dB〜48.5dBの範囲内にするこ
とができる。
That is, the standard value of the birefringence is ± 100 nm.
Since the standard value of CNR is 47 dB or more, the birefringence of the inner periphery is 30 nm to -50 nm, the birefringence of the middle is 20 nm to -60 nm, and the birefringence of the outer periphery is 0 nm. By setting it within the range of -100 nm, the CNR of each part can be set within the range of 47 dB to 48.5 dB.

【0013】そして、従来技術でも述べたように、光磁
気ディスク用基板の複屈折率等の光学特性は、樹脂温度
及び金型温度や、射出速度、射出成形圧(型締力)、減
圧(型締力)及び型締時間等で表される成形サイクル等
の射出成形条件のパラメータを制御することにより変化
させることができる。従って、例えば光磁気ディスク用
基板の全面にわたってCNRが48dBになるようにす
るには、光磁気ディスク用基板の内周部の複屈折率を略
−10nm、中周部の複屈折率を略−30nm、外周部
の複屈折率を略−60nmにすれば良く、このために
は、例えば図4に示すように、射出後の射出成形圧の減
圧をステップ状に変化させることが特徴的な成形サイク
ルとすれば良い。
As described in the prior art, the optical characteristics such as the birefringence of the substrate for a magneto-optical disk include resin temperature and mold temperature, injection speed, injection molding pressure (clamping force), and pressure reduction (clamping force). It can be changed by controlling parameters of injection molding conditions such as a molding cycle represented by a mold clamping force) and a mold clamping time. Therefore, for example, in order to make the CNR 48 dB over the entire surface of the magneto-optical disk substrate, the birefringence index of the inner peripheral portion of the magneto-optical disk substrate is approximately −10 nm and the birefringence index of the middle peripheral portion is approximately −10 nm. It is sufficient to set the birefringence of the outer periphery to about -60 nm, for example, by changing the injection molding pressure after injection into a step shape as shown in FIG. It should be a cycle.

【0014】即ち、射出後の射出成形圧の減圧を5段階
に分けて行っている。第1ステップの射出成形圧P1
は、転写特性を考慮して13ton以上、射出成形圧時
間T1は、0.4sec以上、第1ステップから第2ス
テップへの切換え時間t1は、0sec〜5sec、第
2ステップの減圧P2は、0ton〜13ton、減圧
時間T2は、0sec〜3sec、第2ステップから第
3ステップへの切換え時間t2は、0sec〜5sec
となっている。
That is, the injection molding pressure after injection is reduced in five stages. Injection molding pressure P1 in the first step
Is 13 ton or more in consideration of transfer characteristics, the injection molding pressure time T1 is 0.4 sec or more, the switching time t1 from the first step to the second step is 0 sec to 5 sec, and the pressure reduction P2 in the second step is 0 ton. 1313 ton, decompression time T2 is 0 secse3 sec, and switching time t2 from the second step to the third step is 0 sec〜5 sec.
It has become.

【0015】さらに、第3ステップの減圧P3は、0t
on〜13ton、減圧時間T3は、0sec〜5se
c、第3ステップから第4ステップへの切換え時間t3
は、0sec〜5sec、第4ステップの減圧P4は、
0ton〜13ton、減圧時間T4は、0sec〜5
sec、第4ステップから第5ステップへの切換え時間
t4は、0sec〜5sec、第5ステップの減圧P5
は、0ton〜13ton、減圧時間T5は、0sec
〜5secとなっている。尚、減圧切換え後の減圧時間
が0secのときは、そのステップが無いことを表して
いる。従って、射出成形後の射出成形圧P1と最終段階
の圧力P5との比P1/P5は、1以上となる。
Further, the pressure reduction P3 in the third step is 0t
on to 13 ton, decompression time T3 is 0 sec to 5 sec
c, switching time t3 from the third step to the fourth step
Is 0 sec to 5 sec, the decompression P4 in the fourth step is
0 to 13 tons, decompression time T4 is 0 sec to 5
The switching time t4 from the fourth step to the fifth step is 0 sec to 5 sec.
Is 0 to 13 ton, and the decompression time T5 is 0 sec
55 sec. When the pressure reduction time after the pressure reduction switching is 0 sec, it indicates that there is no step. Therefore, the ratio P1 / P5 of the injection molding pressure P1 after the injection molding to the final stage pressure P5 is 1 or more.

【0016】以上のような構成の光磁気ディスク用基板
を成形する際は、先ず、信号面ミラー部材11の表面に
スタンパ26を取り付け、読取面ミラー部材12を移動
させてキャビティ14を閉じて金型温度を100°C〜
120°Cに昇温すると共に、樹脂温度を270°C〜
320°Cに昇温する(図2(A))。そして、ゲート
15を介してキャビティ14内に溶融樹脂を80mm/
2 〜120mm/s2 の射出速度で射出して充填する
(図2(B))。
In forming the magneto-optical disk substrate having the above-described structure, first, a stamper 26 is attached to the surface of the signal surface mirror member 11, the reading surface mirror member 12 is moved to close the cavity 14, and the metal is closed. Mold temperature 100 ° C ~
The temperature is raised to 120 ° C and the resin temperature is raised from 270 ° C to
The temperature is raised to 320 ° C. (FIG. 2A). Then, the molten resin is injected into the cavity 14 through the gate 15 by 80 mm /
Inject and fill at an injection speed of s 2 to 120 mm / s 2 (FIG. 2B).

【0017】第1ステップとして、射出成形圧P1が1
3tonになったら、0.8secの射出成形圧時間T
1で保持する。その間に溶融樹脂を充填した後に樹脂が
半溶融状態となったら、カットパンチ16をキャビティ
14内に突出させて半溶融樹脂の内径を切断する(図2
(C))。第2ステップとして、射出成形圧時間T1の
経過直後、0.4secの切換え時間で減圧P2が10
tonになるまで減圧し、0.8secの減圧時間T2
で保持する。
As a first step, the injection molding pressure P1 is 1
At 3 tons, 0.8 sec injection molding pressure time T
Hold at 1. If the resin is in a semi-molten state after filling the molten resin during that time, the cut punch 16 is projected into the cavity 14 to cut the inner diameter of the semi-molten resin (FIG. 2).
(C)). As a second step, immediately after the injection molding pressure time T1 elapses, the pressure reduction P2 is reduced by 10 with a switching time of 0.4 sec.
decompression until the pressure reaches ton, and a decompression time T2 of 0.8 sec.
Hold with.

【0018】第3ステップとして、減圧時間T2の経過
直後、0.2secの切換え時間で減圧P3が8ton
になるまで減圧し、1.4secの減圧時間T3で保持
する。第4ステップとして、減圧時間T3の経過直後、
0.3secの切換え時間で減力P4が6tonになる
まで減圧し、1.2secの減圧時間T4で保持する。
第5ステップとして、減圧時間T4の経過直後、0.5
secの切換え時間で減圧P5が4tonになるまで減
圧し、1secの減圧時間T5で保持する。そして、減
圧時間T5の経過直後、圧力が0になるまで減圧する。
As a third step, immediately after the elapse of the decompression time T2, the decompression P3 is reduced to 8 tons with a switching time of 0.2 sec.
The pressure is reduced until the pressure is reduced, and the pressure is maintained for a reduced pressure time T3 of 1.4 sec. As a fourth step, immediately after the elapse of the decompression time T3,
The pressure is reduced until the reduction P4 becomes 6 tons in the switching time of 0.3 sec, and the pressure is maintained for the decompression time T4 of 1.2 sec.
As a fifth step, immediately after the elapse of the decompression time T4, 0.5
The pressure is reduced until the pressure reduction P5 becomes 4 tons in the switching time of sec, and is maintained for the pressure reduction time T5 of 1 sec. Then, immediately after the elapse of the decompression time T5, the pressure is reduced until the pressure becomes zero.

【0019】以上のステップにより、半溶融樹脂は冷却
されて固化するので(図2(D))、カットパンチ16
を読取面ミラー部材12内に戻すと共に読取面ミラー部
材12を移動させてキャビティ14を開く(図2
(E))。最後に、キャビティ14内から光磁気ディス
ク用基板30及びスプルー(カットパンチ16により切
断された樹脂の内径の部分)31を取り出し、光磁気デ
ィスク用基板30を次の工程に搬送し、スプルー31を
廃棄する(図2(F))。尚、この例では、スタンパ2
6を信号面ミラー部材11のみに取り付けたが、読取面
ミラー部材12にも取り付けて射出成形する場合の工程
は上記工程と基本的に同じである。
By the above steps, the semi-molten resin is cooled and solidified (FIG. 2 (D)).
Is returned into the reading surface mirror member 12 and the reading surface mirror member 12 is moved to open the cavity 14 (FIG. 2).
(E)). Finally, the magneto-optical disk substrate 30 and the sprue (portion of the inner diameter of the resin cut by the cut punch 16) 31 are taken out of the cavity 14, and the magneto-optical disk substrate 30 is transported to the next step, and the sprue 31 is removed. Discard (FIG. 2 (F)). In this example, the stamper 2
Although 6 is attached only to the signal surface mirror member 11, the process for injection molding by attaching it to the reading surface mirror member 12 is basically the same as the above process.

【0020】以上の射出成形工程により、光磁気ディス
ク用基板30の内周部、中周部、外周部における各半径
方向位置での複屈折率が、図5に示すように、略−5n
m〜略−75nmまで2次曲線状に変化したものが得ら
れる。従って、図6に示すように、光磁気ディスク用基
板30の成膜後のCNRは、光磁気ディスクの内周部と
中周部と外周部において略48dBと同一になるので、
全面において情報の記録再生特性が均一で高特性の光磁
気ディスクを得ることができる。
By the above-described injection molding process, the birefringence index at each radial position in the inner, middle and outer peripheral portions of the magneto-optical disk substrate 30 is substantially -5n, as shown in FIG.
Those that change in a quadratic curve from m to about -75 nm are obtained. Therefore, as shown in FIG. 6, the CNR after the film formation of the magneto-optical disk substrate 30 is substantially equal to 48 dB at the inner, middle and outer peripheral portions of the magneto-optical disk.
It is possible to obtain a magneto-optical disk having uniform information recording / reproducing characteristics over the entire surface and high characteristics.

【0021】[0021]

【発明の効果】以上のように、本発明によれば、全面に
わたって均一な高記録再生特性を備えたディスクとする
ことができる。
As described above, according to the present invention, it is possible to provide a disk having uniform high recording and reproducing characteristics over the entire surface.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明のディスク用基板の製造方法の実施形態
で用いられる射出成形機の一例を示す断面平面図。
FIG. 1 is a cross-sectional plan view showing an example of an injection molding machine used in an embodiment of a method for manufacturing a disk substrate of the present invention.

【図2】図1の射出成形機によるディスク用基板の射出
成形工程例を示す図。
FIG. 2 is a view showing an example of an injection molding process of a disk substrate by the injection molding machine of FIG. 1;

【図3】ディスク用基板の内周部、中周部、外周部にお
ける光学特性である各複屈折率を変化させたときの成膜
後の電気特性であるCNRの変化を示す図。
FIG. 3 is a diagram showing a change in CNR, which is an electrical characteristic after film formation, when a birefringence, which is an optical characteristic, is changed in an inner peripheral portion, a middle peripheral portion, and an outer peripheral portion of a disk substrate.

【図4】図1の射出成形機による成形圧力と成形時間と
の関係を示す射出成形サイクル例を示す図。
FIG. 4 is a view showing an example of an injection molding cycle showing a relationship between molding pressure and molding time by the injection molding machine of FIG. 1;

【図5】図4の射出成形サイクルにより成形されたディ
スク用基板の半径方向位置における光学特性である各複
屈折率を示す図。
FIG. 5 is a diagram showing each birefringence as an optical characteristic at a radial position of a disk substrate formed by the injection molding cycle of FIG. 4;

【図6】図4の射出成形サイクルにより成形されたディ
スク用基板の成膜後の内周部、中周部、外周部における
電気特性であるCNRを示す図。
6 is a view showing CNR which is an electrical characteristic of an inner peripheral portion, a middle peripheral portion, and an outer peripheral portion of the disk substrate formed by the injection molding cycle of FIG. 4 after film formation.

【図7】従来の射出成形機による成形圧力と成形時間と
の関係を示す射出成形サイクル例を示す図。
FIG. 7 is a diagram showing an example of an injection molding cycle showing a relationship between molding pressure and molding time by a conventional injection molding machine.

【図8】図7の射出成形サイクルにより成形されたディ
スク用基板の半径方向位置における光学特性である各複
屈折率を示す図。
FIG. 8 is a diagram showing each birefringence which is an optical characteristic at a radial position of a disk substrate molded by the injection molding cycle of FIG. 7;

【図9】図7の射出成形サイクルにより成形されたディ
スク用基板の成膜後の内周部、中周部、外周部における
電気特性であるCNRを示す図。
9 is a diagram showing CNR which is an electrical characteristic of an inner peripheral portion, a middle peripheral portion, and an outer peripheral portion of the disk substrate formed by the injection molding cycle of FIG. 7 after film formation.

【符号の説明】[Explanation of symbols]

10・・・射出成形機、11・・・信号面ミラー部材、
12・・・読取面ミラー部材、26・・・スタンパ
10 ... injection molding machine, 11 ... signal surface mirror member,
12: reading surface mirror member, 26: stamper

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 情報を記録するディスクに用いられる基
板を射出成形により製造する方法において、 前記射出成形後の射出成形圧の減圧をステップ状に変化
させることを特徴とするディスク用基板の製造方法。
1. A method of manufacturing a substrate used for a disk for recording information by injection molding, wherein the pressure of the injection molding pressure after the injection molding is changed stepwise. .
【請求項2】 前記射出成形後の射出成形圧と最終段階
の圧力との比が、1以上である請求項1に記載のディス
ク用基板の製造方法。
2. The method for manufacturing a disk substrate according to claim 1, wherein a ratio of an injection molding pressure after the injection molding to a final stage pressure is 1 or more.
【請求項3】 情報を記録するディスクに用いられる基
板において、 内周部から外周部にかけての複屈折率が変化するように
形成されていることを特徴とするディスク用基板。
3. A substrate for a disk for recording information, wherein the substrate for a disk is formed so that the birefringence varies from an inner peripheral portion to an outer peripheral portion.
【請求項4】 前記複屈折率が、内周部から外周部にか
けて徐々に小さくなるように形成されている請求項3に
記載のディスク用基板。
4. The disk substrate according to claim 3, wherein the birefringence is formed so as to gradually decrease from an inner peripheral portion to an outer peripheral portion.
【請求項5】 内周部の前記複屈折率が、30nm〜−
50nmとなるように形成され、中周部の前記複屈折率
が、20nm〜−60nmとなるように形成され、外周
部の前記複屈折率が、0nm〜−100nmとなるよう
に形成されている請求項4に記載のディスク用基板。
5. The method according to claim 1, wherein the inner peripheral portion has a birefringence of 30 nm to-.
It is formed so that it may be set to 50 nm, the birefringence of the middle part may be set to be 20 nm to -60 nm, and the birefringence of the outer part may be set to be 0 nm to -100 nm. The disk substrate according to claim 4.
JP10133474A 1998-05-15 1998-05-15 Manufacture of disk substrate and disk substrate Abandoned JPH11320616A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10133474A JPH11320616A (en) 1998-05-15 1998-05-15 Manufacture of disk substrate and disk substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10133474A JPH11320616A (en) 1998-05-15 1998-05-15 Manufacture of disk substrate and disk substrate

Publications (1)

Publication Number Publication Date
JPH11320616A true JPH11320616A (en) 1999-11-24

Family

ID=15105632

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10133474A Abandoned JPH11320616A (en) 1998-05-15 1998-05-15 Manufacture of disk substrate and disk substrate

Country Status (1)

Country Link
JP (1) JPH11320616A (en)

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